75 results about "Focused beams" patented technology

The invention provides a measurement system, method, device and equipment, a medium and a product, and belongs to the technical field of optics. The system comprises a beam expander used for generating a first transmission light beam and a first reflection light beam when a light beam after beam expansion reaches a tested sample at a first preset position; a beam compressor; the receiver is positioned at a first position and is used for receiving the first transmission light beam to generate a first interferogram of the detected sample; the receiver is positioned at a second position and is used for receiving the first reflected light beam to generate a second interferogram of the detected sample; the first microscope objective is used for generating a second transmission light beam and a second reflection light beam by enabling the focused light beam to reach a detected sample at a second preset position; a second microscope objective; the receiver is positioned at a third position and is used for receiving the second transmission light beam to generate a third interference pattern of the detected sample; and the receiver at the second position is also used for receiving the second reflected light beam to generate a fourth interferogram of the tested sample.

High speed, accurate, scalable, and dimension-insensitive additive manufacturing of a Three-Dimensional (3D) object may use incrementally solidifying light-sensitive resin layers. A new layer is formed by supplying the resin liquid via a cavity in the formed 3D object, and curing the supplied resin by a focused light beam, such as a laser beam. The added layers are formed by supplying, 2024 / 184876 using a pump, the light-cured resin fluid to one or more bottom openings to be output from the top opening (or to multiple openings) via a vertical cavity (or multiple cavities) of the 3D object. The curing is by focusing a light beam to the area of the resin output from the top opening, while keeping the top opening non-cured, so that resin can be passed via the cavity. Such 3D printing may be directly applied to any surface, such as a floor, wall, wing structure, or machined part.

Disclosed in the present invention are a conical optical illumination-based reflective scanning super-resolution optical microscopy system and method. The system comprises a sample displacement module, an optical microscopic imaging module, an annular focused beam generation module, a beam scanning module, a super-resolution focused illumination and collection module, a super-resolution optical imaging module and a computer. By means of using the advantages of annular focused beam illumination, high focusing efficiency of traditional lenses, and high beam scanning speed, high-efficiency super-resolution focused illumination with an extended depth of focus is achieved, and further traditional optical lenses can be used to achieve fast super-resolution optical microscopic imaging; fast label-free far-field super-resolution two-dimensional microscopic imaging is implemented by means of two-dimensional beam scanning; by means of performing label-free far-field super-resolution two-dimensional microscopic imaging on samples at different axial positions, super-resolution two-dimensional microscopic images of different cross sections of samples are obtained, thereby achieving three-dimensional tomography. The present invention can be applied to fast label-free super-resolution microscopic imaging of biological samples, and can also be applied to other fields such as industrial super-resolution microscopic inspection.

The application discloses an in-situ laser-assisted machining system based on beam shaping, which comprises a laser generating device for generating and emitting a low-power Gaussian laser; a beam shaping device for shaping the Gaussian laser into a focused beam with specific size, shape and energy distribution form according to the thermodynamic performance of the material to be machined, the size of the focused beam being smaller than the height of the cutting edge of the cutting tool from the upper surface thereof; wherein the shaping target of the beam shaping device is determined by simulating the temperature field of the material in the cutting area for different workpiece materials and different spot sizes, shapes and energy distributions, and the uniform temperature field is taken as an evaluation index; and a focal point adjusting device for adjusting the positions of the three degrees of freedom of the beam shaping device, so that the focused beam is passed through the cutting tool and emitted near the cutting edge thereof, and the laser focal plane is coincided with the machining plane. The application can effectively inhibit the surface and subsurface damage of the material to be machined and prolong the service life of the cutting tool.

The invention relates to the technical field of crystallization control, and discloses a programmed cooling crystallization kettle and method capable of regulating and controlling sugar alcohol crystal granularity, and the method comprises the following steps: constructing a basic nonlinear cooling model in advance, and respectively collecting real-time torque and actual average chord length of the crystal by using a torque sensor and a focused light beam reflection measurement probe in the crystallization process; and the control system calculates the cooling rate correction according to the granularity deviation through a PID algorithm, calculates a rheology correction factor according to the torque change, and performs attenuation treatment on the sum of the basic rate and the correction by using the rheology correction factor to obtain a final cooling instruction to adjust the temperature in the kettle. Through dual feedback of coupling granularity and rheology, the contradiction between crystal growth and mass transfer resistance under a high-viscosity system is solved, the inclusion amount of the mother liquor is remarkably reduced while the target particle size is realized, and the purity and uniformity of the product are improved.

A laboratory-based 3D scanning X-ray scanning Laue microdiffraction system and method for crystal material characterization, comprising: focusing optics, a sample located at a distance from the focusing optics, a laboratory X-ray source, a stage to translate and rotate the sample, a detector arranged to detect a Laue diffraction pattern of diffracted X-rays. The method comprises scanning each layer of the sample by translating the sample at different rotations relative to the focused beam to illuminate each voxel in the layer in more than one rotation, and indexing each voxel in the layer using recorded Laue diffraction patterns in different rotations. By repeating the translation and rotation for different layers of the sample, a 3D image of the sample grain structure is reconstructed.

A method of producing cytopathologic cell samples, the method including insonating a target tissue by ultrasound energy with a focused beam at that generates shear waves within the tissue. A method of producing cytopathologic cell samples, the method including insonating a target tissue by ultrasound energy at a first intensity level during a first period, insonating the target tissue by ultrasound energy at a second intensity level during a second period, wherein the first intensity level is higher than the second intensity level. Related apparatus and methods are also described.

Systems and methods are provided for an open path gas detection system having a receiver with an optical sensor configured to continuously capture optical image data. A field of view of the optical sensor may include a path of a focused light beam received by a light sensor of the receiver. The receiver may be configured to receive and temporarily store the optical image data in the memory buffer, and then transmit the optical image data to the persistent memory region upon receipt of a transfer command. In various cases, a transmission command may be provided, such as when a receiver requests, when a predefined object of interest is identified in the optical image data, or when an occlusion occurs and the light sensor no longer receives the focused beam.

The invention provides a linear injector system and a beam control method, and the system comprises a radio frequency quadrupole accelerator which comprises a first bunching segment disposed at the tail end of the radio frequency quadrupole accelerator, and the first bunching segment is used for carrying out the initial phase width compression of a beam; the at least one interdigital drift tube linear accelerator comprises at least one KONUS period, and each KONUS period sequentially comprises a second bunching section used for compressing the phase width of the beam from the upstream to obtain the beam subjected to phase width compression from the input end to the output end; the acceleration section is used for accelerating the beam current after the phase width compression at a constant synchronous phase to obtain an accelerated beam current; and the focusing section is used for focusing the accelerated beam on a plane perpendicular to the transmission direction to obtain a focused beam.

A method of producing cytopathologic cell samples, the method including insonating a target tissue by ultrasound energy with a focused beam at that generates shear waves within the tissue. A method of producing cytopathologic cell samples, the method including insonating a target tissue by ultrasound energy at a first intensity level during a first period, insonating the target tissue by ultrasound energy at a second intensity level during a second period, wherein the first intensity level is higher than the second intensity level. Related apparatus and methods are also described.

The application discloses a multi-mode vortex laser with adjustable order, comprising: a cavity lens coated with a laser wavelength anti-reflection film system, a first laser output mirror and a second laser output mirror, both of which are plane mirrors, and both of which are coated with a film system partially transmitting laser wavelength on one side and an anti-reflection film system for laser wavelength on the other side; a high-order Laguerre-Gaussian beam is focused by the cavity lens, and the focused beam waist positions of each-order Laguerre-Gaussian mode vortex light are separated under the action of spherical aberration of the cavity lens, and the higher the mode order and the larger the spot size, the closer the focused beam waist of the mode to the cavity lens; the positions of the first laser output mirror and the second laser output mirror are adjusted so as to be located at the waist positions of a certain mode, and the first laser output mirror and the second laser output mirror located at different positions provide feedback for two different-order Laguerre-Gaussian mode vortex lights, so that multi-mode vortex laser oscillation and output are formed.

The invention discloses a water-guided coupling system of a long-focal-depth homogenized focused light beam and a water-guided coupling homogenized focused light beam forming method thereof. At present, a processing mode for realizing the water-guided coupling homogenized focused light beam in a standardized manner does not exist. A first lens, a second lens, a third lens and a fourth lens are vertically arranged in parallel, the first lens, the second lens, the third lens and the fourth lens are sequentially, vertically and coaxially arranged, the two sides of the first lens are a first curved surface and a second curved surface respectively, the first curved surface is a convex mirror surface, and the two sides of the second lens are a third curved surface and a fourth curved surface respectively. The two sides of the third lens are a fifth curved surface and a sixth curved surface respectively, the two sides of the fourth lens are a seventh curved surface and an eighth curved surface respectively, the third curved surface, the fifth curved surface and the seventh curved surface are concave mirror surfaces, the distance between the center of the second curved surface and the center of the third curved surface is L1, the distance between the center of the fourth curved surface and the center of the fifth curved surface is L2, and L1 is a positive integer. The distance between the center of the sixth curved surface and the center of the seventh curved surface is L3.

A method for processing a substrate includes receiving the substrate including a patterned mask disposed over a layer stack including a second layer disposed over a first layer, the patterned mask including a feature pattern, and etching the substrate to transfer the feature pattern to the second layer and form first openings that expose the first layer. The method further includes exposing a first sidewall of the first openings to a first focused beam at a first processing angle to extend the first openings in a first direction and form second openings, and etching the substrate to transfer the second openings through the first layer and form third openings, And the method further includes exposing the first sidewall of the third openings to a second focused beam at a second processing angle to form fourth openings.

The present invention provides a light-emitting device (1000), comprising: (i) n laser light sources (10), (ii) focusing optics (20), and (iii) a luminescent body (200), wherein: (A) the n laser light sources (10) are configured to generate laser light source light (11); wherein the focusing optics (20) are configured to focus the laser light source light (11) into a focused beam (21) of the laser light source light (11); wherein n≥2; (B) the luminescent body (200) comprises a luminescent material (210), wherein the luminescent body (200) is configured to be in an optical receiving relationship with the n laser light sources (10), wherein the luminescent material (210) is configured to convert at least a part of the laser light source light (11) into luminescent material light (211); (C) the n laser light sources (10) and the focusing optics (20) are configured to provide a spot (300) of the laser light source light (11) on the luminescent body (200) in an operating mode; wherein k groups of spots (300) each have a separately selected number m of spots (300), wherein two or more spots (300) within each group have partial overlap, wherein 2≤m≤n and 1≤k<n; and (D) wherein a first spot region (310) is defined by 10%-100% of the maximum intensity of the spot (300), wherein for at least one spot (300) within at least one of the k groups, it is applicable to overlap with at least another first spot region within the range of 5%-80% of its first spot region (310).

The application provides a multi-geometry diffraction guiding device and an X-ray diffraction equipment, the device is used for guiding a diffraction beam to reach a target detector in the X-ray diffraction equipment; the device comprises: a shell, a parallel light path component and a quasi-focusing light path component; the parallel light path component and the quasi-focusing light path component are arranged on the inner side of the shell; the shell is provided with a mounting connecting part corresponding to the target detector; when the diffraction beam is a parallel beam geometry, the parallel light path component is configured to guide the diffraction beam to reach a first detection area of the target detector; when the diffraction beam is a quasi-focusing beam geometry, the quasi-focusing light path component is configured to guide the diffraction beam to reach a second detection area of the target detector. The application can realize fast and efficient mode switching to measure diffraction beams of different geometries, optimize the use efficiency of a large-area detector, and avoid or eliminate manual or mechanical intervention on optical devices during switching.

The invention discloses an experimental device for a drug crystallization process. The experimental device comprises a reactor, a lifting probe assembly, a crystallization guide assembly and a control system. The reactor comprises a reaction kettle and a heating base which are in heat conduction connection; the lifting probe assembly is mounted on the reaction kettle and can extend below the liquid level to shoot crystal images; the crystallization guide assembly comprises a rotary driving mechanism, a shaft tube, a first ultrasonic transducer, a second ultrasonic transducer, a focused light beam reflection measuring instrument, a turbidity sensor and a stirring piece; wherein the frequency of the first ultrasonic transducer is lower than that of the second ultrasonic transducer, and the first ultrasonic transducer and the second ultrasonic transducer are used for inducing nucleation and fine grain elimination; the focused beam reflection measuring instrument monitors the number and granularity of crystals; the heating base, the lifting probe assembly, the rotary driving mechanism, the first ultrasonic transducer, the second ultrasonic transducer, the focused light beam reflection measuring instrument and the turbidity sensor are all electrically connected with the control system, so that monitoring and control of the experiment process are realized, the crystallization efficiency is effectively improved, and high-quality crystals are obtained.

The application discloses an optical fiber device, a preparation method of the optical fiber device and a coupling device, and belongs to the technical field of micro-nano photonics. The application sequentially arranges a mode field expansion area and a phase modulation area at an exit end of an optical fiber, uses the mode field expansion area to expand a beam mode field diameter, uses a substrate film matched with the mode field expansion area in refractive index and a micro-nano unit with high refractive index to form the phase modulation area, realizes a target phase distribution based on geometric sizes and / or a rotation angle of the micro-nano unit, and then performs phase modulation and wavefront shaping on the expanded beam, so as to output a target light field such as a focused beam, a collimated beam, a Bessel beam or a Bessel beam array. The optical fiber device can realize high coupling efficiency, high alignment tolerance and multi-functional wavefront regulation at the exit end of the optical fiber, can solve the mode field mismatch problem in optical fiber-chip coupling, can reduce system complexity and realize multi-functional integration.

This application provides a two-step flocculation adaptive control method for tailings slurry based on FBRM online monitoring, relating to the field of tailings treatment technology in the mineral processing industry. The method includes: online monitoring of the original tailings slurry using focused beam reflection measurement under no-doping conditions to obtain the particle size baseline characteristics of the original slurry; adding a primary flocculant to obtain a first slurry, and monitoring the dynamic particle size characteristics of the flocs during the flocculation process in real time; based on the dynamic particle size characteristics of the first slurry, determining whether the first slurry has reached a ready state suitable for secondary flocculation according to a preset primary flocculation completion criterion; when the first slurry reaches the ready state, automatically initiating the addition of a secondary flocculant to obtain a second slurry, and providing real-time feedback on the particle size distribution change in the second slurry as a control signal to adaptively adjust the dosing rate of the secondary flocculant. This method can automatically adapt to changes in ore properties, solid content, and operating conditions, and has strong potential for widespread application.

Optical systems have uses, such as in spectrometers, for directing a beam. A spectrometer, for example, utilizes an optical system for directing an incident beam toward a sample and receiving a spectroscopy signal from the sample. In various implementations, for example, an optical system may be further configured to move a beam with respect to a target, such as a sample, and still provide a home position where the beam is directed in a stationary configuration. A self-homing (e.g., self-centering) optical system may provide a “home” position in which the beam is directed in a first stationary mode while still allowing a focused beam to be moved with respect to a target in a second dynamic mode.

Disclosed is a method for measuring a triangular profile based on a broad spectrum light source, including the following steps: first, building a triangular laser measurement model; putting a calibrator in the triangular laser measurement model, measuring object plane coordinates (x, z) of the calibrator by virtue of a measuring instrument, moving the calibrator many times to acquire object plane coordinates of a plurality of groups of calibrators and corresponding image plane coordinates, so as to obtain a coefficient-determined relational expression of a two-variable linear function; and finally, putting a measured object in the triangular laser measurement model, acquiring, by an imaging detector, image plane coordinates (u, v) of a measured object plane, calculating a coordinate z of the measured object plane through the relational expression of the function, driving, by a displacement moving mechanism, the measured object to move relative to an optical axis of a focused light beam in a perpendicular direction to measure a coordinate y, and splicing an object plane profile (x, z) in a displacement distance to obtain a whole object plane profile of the measured object, so as to obtain a 3D size of the whole measured object. The present invention features a large tolerance angle, high compatibility, and a high measurement accuracy, and the volume and cost are greatly reduced.

The disclosed systems and techniques relate to interferometric-based sample thickness metrology in manufacturing systems. For example, the disclosed techniques include directing a focused beam to a plurality of locations of a sample and detecting interference patterns (IPs) associated with light exiting the respective locations and generated after the focused beam interacts with the sample. The technique further includes determining a magnitude and sign of a difference between a first thickness of the sample at the first location and a second thickness of the sample at the second location based on a first IP associated with first light exiting the first location and a second IP associated with second light exiting the second location.

The present invention includes a focusing device comprising micro-diffraction elements configured to diffract incident light applied by a user into G focused beams, wherein each micro-diffraction element belongs to one of the G groups, the micro-diffraction element belonging to the g-th group of the G groups generates the g-th focused beam, the density distribution of the micro-diffraction elements belonging to the g-th group is adjusted to apply an arbitrary intensity distribution to the g-th focused beam before it is focused, the position of the micro-diffraction elements belonging to the g-th group is adjusted to apply an arbitrary wavefront to the g-th focused beam before it is focused, and G is 2 or greater.

The application discloses a reflection type super-large depth of field super-resolution wide-field optical microscopic system and method, and the system comprises a sample displacement module, a ring-shaped focusing light beam generation module, a light beam scanning module, a super-large depth of field super-resolution wide-field optical microscopic imaging module, an optical microscopic imaging module and a computer. Through the advantages of the ring-shaped focusing light beam illumination, the high focusing efficiency of the traditional lens and the high scanning speed of the light beam, efficient and fast super-long focal depth super-resolution focusing scanning illumination is realized, and then the traditional optical microscopic system can be used to realize fast, super-large depth of field super-resolution wide-field optical microscopic imaging. The application can be applied to non-labeled super-resolution microscopic fast imaging of biological samples, and can also be applied to industrial related super-resolution microscopic detection, real-time imaging of micro-operation and other fields.

The application discloses a device and method for measuring infrared refractive index of materials, which comprises an infrared light source assembly, a collimating mirror, a first filter group, a converging lens, a displacement platform and a photoacoustic power assembly arranged in sequence along the horizontal axis direction; the displacement platform carries the material to be measured and can move in the preset range of the focal point of the converging lens along the horizontal axis direction; the infrared light beam is emitted by the infrared light source assembly, the parallel light of a specific spectral band after the collimating mirror and the first filter group is incident to the converging lens, the focused light beam passes through the material to be measured moving in the preset range to form a test light beam, the test light beam enters the photoacoustic power assembly, the photoacoustic power assembly detects and analyzes the change of the light power caused by the movement of the material to be measured, and the infrared refractive index of the material to be measured is given. The application has simple light path, high measurement precision, wide measurement band and strong application in the measurement of the refractive index change of materials.

This invention relates to electromagnetic logging technology and discloses a forward-focusing electromagnetic logging method while drilling, comprising two stages: (1) Pre-testing stage: using a magnetic ring antenna array arranged in a straight line along the drill collar, the last antenna is used as a reference antenna to transmit signals, and the preceding antennas simultaneously receive them, so as to synchronously acquire the amplitude and phase delay of the received signals of each preceding antenna. (2) Forward focusing stage: configuring the transmission parameters for the preceding antennas, setting their initial phase to the negative value of the measured phase delay, and calculating an inversely proportional weighting coefficient based on the received amplitude, thereby configuring the driving amplitude of each preceding antenna; finally, driving the reference antenna and the configured preceding antennas to transmit synchronously, and coherently superimposing them in front of the drill bit to form a focused beam, while weakening the signal interference from the instrument's sides and back to the formation. This invention does not require pre-setting equipment in un-drilled formations, is fully compatible with existing instruments, and can significantly improve the signal strength and signal-to-noise ratio of forward detection.

This invention provides an optometry platform and method for inspecting the internal annular focusing lens assembly of an internal powder-feeding cladding nozzle. It includes a parallel light source device, an annular focusing lens assembly, and a photoelectric detection device arranged sequentially along the optical path. The photoelectric detection device is located on a defocus adjustment device, which allows adjustment of the defocus height to accommodate annular focusing lens assemblies with different focal lengths. A parallel light beam is obtained through the parallel light source device. The annular focusing lens assembly performs optical path conversion on the incident parallel light beam to obtain a hollow annular focused beam, which is projected onto the plane of the photoelectric detection device, resulting in a hollow annular focused light spot. The photoelectric detection device then performs photoelectric conversion to obtain an image of the light spot. By analyzing the different results of the focused light spot, quality defects of the annular focusing lens assembly under different conditions can be judged and inspected.

Systems and methods are provided for an open path gas detection system having a receiver with an optical sensor configured to continuously capture optical image data. The field of view of the optical sensor can include the path of a beam of focused light received by a light sensor of the receiver. The receiver can be configured to receive and temporarily store the optical image data in a memory buffer, and then transfer the optical image data to a persistent memory area upon receipt of a transfer command. A transfer command may be provided in various situations, such as when requested by a receiver, when a predefined object of interest is identified in the optical image data, or when a blockage occurs and light sensor is no longer receiving the beam of focused light.

The invention discloses an X-ray diffraction morphology instrument, and relates to the technical field of X-ray diffraction detection.The X-ray diffraction morphology instrument comprises a light source structure, a sample bearing structure and an X-ray detector, the sample bearing structure is used for bearing a sample, the light source structure comprises a light source and a capillary element, a tungsten target is adopted as a target material of the light source, and the capillary element is arranged on the light source; the light source is used for generating divergent X-ray light beams, the capillary element is used for gathering the X-ray light beams generated by the light source into focused light beams or collimated light beams and irradiating the focused light beams or collimated light beams onto a sample, and the X-ray detector is used for collecting diffraction imaging signals generated by the sample. The X-ray diffraction morphology instrument provided by the invention can efficiently test the X-ray diffraction morphology of the crystal.

The application provides a kind of corrective etching method and equipment, it is related to integrated circuit manufacturing technical field.The method comprises the following steps: providing etched wafer; the surface of the wafer is non-destructive measurement, obtains the surface parameter of each surface area of wafer; based on the surface parameter and collation target value, the required correction etching amount of each surface area of wafer is calculated; the surface of wafer is irradiated by focused light beam to induce etching; based on the position information and the correction etching amount, the light irradiation parameter of the focused light beam is adjusted accordingly, different irradiation amount is applied to each surface area of wafer, to obtain the required correction etching amount, the light irradiation parameter includes light intensity and / or irradiation time length.The application can correct the surface of etched wafer, so that the size of each area of wafer surface is consistent, improve etching uniformity, so as to improve the performance and yield of final product.