126 results about "Beam source" patented technology

A method of processing a substrate includes providing a substrate with a line pattern including lines extending in a longitudinal direction and exposing the line pattern to a directional beam. The directional beam has an azimuthal component substantially parallel to the longitudinal direction. Exposing the line pattern to the directional beam may concurrently deposit material on sidewall surfaces of the line pattern and etch surfaces of the line pattern with a normal component parallel to the longitudinal direction. The line pattern may have localized defects. The deposited material may mitigate pinch defects in the line pattern. The etched surfaces may mitigate bridge defects in the line pattern. A controller may be configured to cause the substrate to be processed according to the method. The controller may be included in a system further including a beam source and a substrate positioner.

The invention provides a cyclotron electrostatic deflection plate beam loss heat source reconstruction method, and relates to the technical field of particle accelerator thermal analysis and multi-physics field coupling calculation, and the method comprises the steps: 1, configuring beam dynamics simulation parameters, multi-particle tracking is carried out under a three-dimensional field graph containing a central area electromagnetic field, a harmonic coil magnetic field and an electrostatic deflection electric field, and a particle loss list is generated; step 2, transferring the particle loss list into a beam source file of a Monte Carlo radiation transport program, configuring Monte Carlo parameters including a deflection plate material, a boundary, a particle type and an energy spectrum, executing particle transport simulation, and obtaining a three-dimensional energy deposition matrix on an electrostatic deflection plate element; according to the method, high-resolution heat source reconstruction is realized, the peak temperature rise calculation error of the deflection plate can be reduced, a temperature field solving result can be fed back to optimize the particle source, and a reliable basis is provided for thermal structure design and cooling optimization of the electrostatic deflection plate.

The invention discloses a density distribution device capable of stably generating special plasmas and an adjusting method, and can efficiently and stably provide a special gas channel of which the front part gas slowly rises and the rear edge outlet is provided with a steep density gradient falling edge. The invention relates to a gas medium channel with special plasma density structure distribution, which is used for a high-brightness laser plasma wake wave field acceleration to generate an ultrafast electron beam source and an application field of the ultrafast electron beam source. The device effectively overcomes the defects of uncontrollability, insufficient precision, short service life, complicated operation and the like in the process of producing gas channels by traditional capillary tubes, open gas pools and the like and preparing special structure density distribution such as steep falling edges, and has the advantages of simplicity in operation, convenience, high efficiency, high-precision adjustment, stable and controllable gas density distribution, electromagnetic interference resistance, durability and the like; and wide application of a high-brightness ultrafast electron beam source generated by a repetition-frequency laser tail wave field in frontier research fields such as ultrafast electron diffraction and ultrafast diagnosis is further promoted.

A method of processing a substrate includes providing a substrate with a line pattern including lines extending in a longitudinal direction and exposing the line pattern to a directional beam. The directional beam has an azimuthal component substantially parallel to the longitudinal direction. Exposing the line pattern to the directional beam may concurrently deposit material on sidewall surfaces of the line pattern and etch surfaces of the line pattern with a normal component parallel to the longitudinal direction. The line pattern may have localized defects. The deposited material may mitigate pinch defects in the line pattern. The etched surfaces may mitigate bridge defects in the line pattern. A controller may be configured to cause the substrate to be processed according to the method. The controller may be included in a system further including a beam source and a substrate positioner.

A system for determining information associated with synthesizing a solid mixture can include a processor and a memory. The memory can store a solid mixture sample assessment module, an electromagnetic beam source control module, and a radiation-impinged sample assessment module. The solid mixture sample assessment module can determine a set of positions on interfaces between grains in an initial sample of the solid mixture. The set can have maximal diversity of classifications of the interfaces in the initial sample. The electromagnetic beam source control module can cause electromagnetic beams to impinge the positions to produce an impinged sample. A characteristic of a first electromagnetic beam, which impinges a first position, can be different from the characteristic of a second electromagnetic beam, which impinges a second position. The radiation-impinged sample assessment module can analyze the positions on the impinged sample to determine the information associated with synthesizing the solid mixture.

The invention relates to a device and a method for manufacturing an optical fiber bundle (2), the device comprising a clamp device (3) for accommodating and holding a plurality of optical fibers (20), a pressing device (4) for providing a force to the clamp device (3), a pressing accommodation (40) arranged on the pressing device (4) for accommodating the clamp device (3) and for pressing the plurality of optical fibers (20) arranged in the clamp device (3), and at least one beam source (5) with a light path (50) directed to an area in or adjacent to the clamp device (3) in order to interconnect, in particular to fuse, the plurality of optical fibers (20) accommodated in the clamp device (3).

The invention discloses a 10 MeV-level high-brightness ultrafast electron beam source based on quasi-linear laser wake field acceleration and a generation device thereof. Miniaturized repetition frequency ten-megawatt-level femtosecond laser interacts with a gas target capable of generating special gas flow distribution; based on a new quasi-linear laser wake field electron acceleration mechanism, the generation of a 10 MeV-level high-brightness high-performance ultrafast electron beam source can be accelerated. The device effectively solves the problem that it is difficult to accelerate generation of ultrafast electron beams with low energy dispersion, low emittance, high flow intensity, femtosecond pulse width, high brightness and high performance in a sub-ten-megawatt femtosecond laser driving wake field. Therefore, the method is expected to be widely applied to advanced fields such as ultrafast electron diffraction imaging and pumping detection, laser wake field and plasma diagnosis and measurement, high-energy particle acceleration, novel ultrafast coherent radiation source generation and the like.

A mask exposure system includes a chamber, a stage configured to receive a mask, one or more mask temperature sensors, a beam source configured to irradiate an electron beam on the mask, a deflector configured to adjust a position at which the electron beam is irradiated on the mask by deflecting the electron beam based on a voltage level applied to the deflector, in the chamber, a chamber temperature sensor configured to measure an internal temperature of the chamber, and a controller configured to control a direction of deflection and a degree of deflection of the electron beam the deflector. The controller is configured to correct the voltage level applied to the deflector based on a difference between the temperature of the mask and the chamber.

To provide an electron gun device for vapor deposition that suppresses deterioration of film formation quality. [Solution] The electron gun device for vapor deposition disclosed herein comprises an apparatus main body equipped with an electron beam source and installed to the side of a crucible that is open at the top and contains an evaporation material to be vapor-deposited on a coating member, and a pair of pole pieces that guide the electron beam emitted from the apparatus main body to a target area set in the crucible, wherein the pair of pole pieces include a base end installed on the apparatus main body, a tip end disposed above the crucible and behind the target area as seen from the apparatus main body, a first connecting portion extending from the base end toward the tip end, and a second connecting portion connecting the end of the first connecting portion to the tip end and extending in a second direction that intersects with a first direction along a straight line connecting the apparatus main body and the target area, wherein the length of the second connecting portion in the first direction is longer than the length of the tip end in the first direction.

The invention relates to a machining device (10) and a method for machining a workpiece (20), in particular a workpiece equipped with cutting edges, by means of a high-energy machining beam (30) comprising: a machining device (40), a holder (50) and a base (60), wherein the holder (50) is arranged on the base (60) and the machining device (40) is mounted on the holder (50) so as to be pivotable and / or rotatable about a pivot axis (70);the processing device (40) comprising: a processing beam source (80) for generating and / or coupling the processing beam (30) into the processing device (10), a deflection device (90) by means of which the processing beam (30) can be deflected at different angles, and a beam path (100) of the processing beam (30) which runs between the processing beam source (80) and the deflection device (90), wherein the entire beam path (100) between the processing beam source (80) and the deflection device (90) is designed such that it moves with the processing device (10) when the processing device (10) is pivoted and / or rotated, and the distance and orientation of the entire beam path (100) between the processing beam source (80) and the deflection device (90) with respect to the pivot axis (70) remains constant.

The utility model relates to a kind of detector components, including detector, diaphragm and adjusting mechanism.Detector is used to detect signal electron beam, diaphragm is located in the side of detector receiving signal electron beam, the center is provided with through-hole, adjusting mechanism can adjust the area of through-hole and / or the distance between diaphragm and detector.In addition, the utility model also discloses an electron-optical system, including electron beam source, beam separator and detector component.Electron beam source emits main electron beam to sample along main optical axis, and generates signal electron beam on sample surface;Beam separator is coaxially arranged with main optical axis, located between electron beam source and sample, for deflecting signal electron beam.Through adjusting the area of diaphragm through-hole and the distance between diaphragm and detector, the signal electron beam detection of different diffusion angle can be realized, meet the accurate detection demand of different aspect ratio characteristics, applicable to the characterization of complex topography sample.

The invention relates to a beam-generating assembly (38) for a device for producing a component layer from at least one powder layer. The beam-generating assembly (38) comprises a beam source unit (42) for generating an electron beam (40). Additionally, the beam-generating assembly (38) comprises a first focusing unit (50) and a second focusing unit (56). A focusing lens (58) of the second focusing unit (56) is arranged downstream of the first focusing unit (50) along a beam direction (R). In addition, the beam-generating assembly (38) comprises an aperture unit (64) having an aperture (66), which is arranged downstream of the first focusing unit (50) along the beam direction (R). The beam-generating assembly (38) also comprises a deflection unit (62) for moving and / or positioning the electron beam (40) on the component layer. The invention additionally relates to the use of an aperture unit (64) having an aperture (66) in a beam-generating assembly (38) for a device for producing a component layer.

The present invention provides a vehicle lighting device wherein the lens arrangement includes an enhanced high-beam functional zone and at least two glare-free high-beam zones. By designing different projection angles for different zones of the lens arrangement, the light projected by several zones can partially overlap, and the combined light spot is therefore relatively uniform. In addition, the two adjacent glare-free high-beam sources are interconnected in the adjacent glare-free high-beam source groups, thereby shortening the wiring on the circuit board arrangement and allowing both light sources to be controlled simultaneously. By adding the low-beam auxiliary lighting function in each zone of the lens arrangement, i.e.,Adding the low beam auxiliary lighting light source groups to the circuit board assembly and adding the low beam auxiliary lighting reflector surface groups to the reflector shell assembly solves the problem of dark areas appearing in the lighting pattern when the vehicle's low beam function is activated but the high beam function is not. This effectively resolves not only the problem of insufficient central light intensity in the vehicle's high beam mode but also optimizes the lighting uniformity in low beam mode, thus improving the overall lighting performance of the vehicle's lighting.

An additive manufacturing system may include an additive manufacturing machine and a control system. The additive manufacturing machine may include one or more irradiation devices respectively including a beam source configured to emit an energy beam, an optical assembly that has one or more optical elements configured to focus the energy beam emitted by the beam source, a beam source sensor configured to determine a beam source sensor value from a source measurement beam representative of the energy beam prior to the energy beam passing through one or more optical elements of the optical assembly, and an optics sensor configured to determine an optics sensor value from an optics measurement beam representative of the energy beam downstream from the one or more optical elements of the optical assembly.

The invention belongs to the technical field of MBE molecular beam epitaxy equipment, and particularly relates to a position adjusting mechanism for a vacuum inner crucible of a high-temperature beam source furnace. One end of a shell is hermetically connected with a source furnace cavity through a flange, and a driving screw rod is rotatably mounted in the other end of the shell; one end of the driving screw is connected with the coupler, the other end of the driving screw is in threaded connection with one end of the connecting rod in the shell, the other end of the connecting rod penetrates out of the shell and the flange and then is connected with one end of the control fork, and the other end of the control fork is located in the source furnace cavity and abuts against the source furnace crucible; a corrugated pipe is arranged in the shell, one end of the corrugated pipe is fixedly connected to the flange, the other end of the corrugated pipe is connected with a connecting rod, the connecting rod is fixedly connected with one end of a pointer screw, and the other end of the pointer screw extends out of the shell. The position of the crucible is adjusted outside vacuum, smooth operation of a valve control mechanism is guaranteed, the source furnace can be prevented from being disassembled and adjusted on site by a client, and the accurate requirement for controlling the concentricity of a driving structure in the using process of the source furnace can be effectively met.

The utility model discloses an electron beam radiotherapy beam needle comprising a transmission body, a first channel used for transmitting electron beams is arranged in the transmission body, one end portion of the first channel is an incident end portion, and the other end portion of the first channel is an emergent end portion; and the scatterer is arranged at the emergent end part of the first channel so as to block the electron beam, and the scatterer scatters the electron beam towards the direction of the region where the scatterer is located. The electron beam radiotherapy beam needle can concentrate electron beam energy near the area where the scatterer is located. The utility model discloses a radiotherapy device, which comprises the electron beam radiotherapy beam needle and a beam source, the beam source is used for providing electron beams, and the beam source is arranged at the incident end part of a transmission body. The radiation therapy device adopts the electron beam radiation therapy beam needle, and the radiation therapy device can realize radiation therapy with relatively concentrated electron beam energy.

An atmospheric distortion compensator for a free space optical beam comprising: a disc that is rotationally balanced about a center point and that comprises a phase-modifying structure; an optical beam source configured to generate a free space optical beam that propagates through the disc and then through turbulence in open air to a point in space where reducing scintillation is desired, wherein the point in space is separated from the disc only by the open air; and a rotator mechanically coupled to the disc's center point and configured to spin the disc about an axis parallel to the free space optical beam, wherein the disc, when spinning, is configured to control a property of the free space optical beam thereby reducing scintillation effects as experienced at the point in space, which effects are caused by propagation of the free space optical beam through the open air.

The present invention relates to a treatment planning system, an automatic overlap inspection method, and a treatment plan formulation method. The treatment planning system includes an image processing module, a data processing module, an overlap detection module, and a treatment plan generation module. The image processing module creates an irradiated body model including several voxel grids based on medical image data. The data processing module acquires a beam source model and determines the position parameters of the beam source model and the irradiated body model. The overlap detection module selects a reference object from several voxel grids, determines whether the reference object overlaps with the beam source model based on the positional relationship between the reference object and the beam source model, and adjusts the position parameters until the reference object no longer overlaps with the beam source model. The treatment plan generation module generates a treatment plan based on the adjusted position parameters. The present invention not only automatically determines whether a collimator overlaps with patient tissue and can inspect whether a collision between the collimator and patient tissue will occur during setup according to the treatment policy, but can also modify the radiotherapy plan more quickly and automatically generate a corresponding treatment plan.

Laser device (1) for processing dental hard material, comprising a first ultrashort pulsed laser beam source (2) for providing a processing laser beam (20) configured to apply the processing laser beam (20) to a predetermined processing area of ​​dental hard material, a second laser beam source (3) for providing a pilot laser beam (30) configured to induce fluorescence of pathogenic bacteria which marks the processing area, and an application device (4) for applying an absorber material (6) to a processing area of ​​dental hard material, wherein the first laser beam source (2) is configured such that the absorption of the processing laser beam (20) raises the absorber material (6) to a higher energy state.

An electron beam microscope comprises an electron beam source 3, a magnetic objective lens 23 with poles 35, 37, a scintillator 61 with bore diameter D, a first electrode 80, a second electrode 97, and a potential supply device 11 for these elements. The bore diameter D of the scintillator is smaller than the bore diameter of the second electrode 97. Furthermore, |E(z) / r(z)| ≤ L for all points z on an axis of symmetry 29 from a region [z1, z2] near the scintillator. Here, E(z) is the field strength of the electric field at point z, r(z) is the radius of curvature of an equipotential line 91 of the electric field at point z, and L is equal to 3.0 kV / mm. 2 .

An electron beam microscope 1 comprises an electron beam source 3 for generating an electron beam 9, a specimen holder 21, a magnetic objective lens 23, and a first electron detector 41. The electron detector 41 includes a scintillator assembly 60 with a scintillator body 61 arranged along an axis of symmetry 29 between an edge of a magnetic coil 31 of the objective lens 23 (assigned to the electron beam source 3) and a specimen plane 25, such that electrons 45 generated at a specimen 19 strike the scintillator body 61. The scintillator body 61 is formed from a scintillator material that emits light 65 upon contact with the incident electrons 45. The electron detector 41 further includes a light detector 63 for detecting light 65 generated by the scintillator body 61. The light detector 63 is arranged along the axis of symmetry 29 between the scintillator body 61 and the object plane 25.

A method of processing a transparent workpiece, comprising: directing a laser beam output by a beam source onto a phase-adjusting device such that the laser beam downstream of the phase-adjusting device is an Airy beam; and directing the Airy beam onto a surface of the transparent workpiece. The Airy beam forms an Airy beam focal region in the transparent workpiece, the Airy beam of the Airy beam focal region having a maximum intensity of 100 TW / cm 2 or less, the Airy beam of the Airy beam focal region inducing an absorption in the transparent workpiece, the induced absorption generating a bend defect in the transparent workpiece.

The invention relates to the technical field of carrying devices, in particular to an air cushion carrying platform for installation, operation and maintenance of a fusion device beam source. According to the technical scheme, the device comprises a platform body, an air cushion system, an air supply system and a control system; the platform body is used for bearing and fixing beam source equipment; the air cushion system comprises a plurality of supporting units, the supporting units are evenly distributed at the bottom of the platform body, and the interior of each supporting unit is divided into a plurality of independent air bag cavities. By adopting a multi-cavity independent air cushion structure and a distributed independent closed-loop control system, the rapid and accurate compensation of local air pressure loss when the carrying platform crosses rugged road surfaces such as gullies is realized, and the anti-interference capability and the operation stability are remarkably improved; the road surface self-adaption and intelligent leveling functions are achieved, and the adaptability and safety in the complex environment are enhanced; lossless carrying of precision equipment such as a fusion beam source is ensured, and meanwhile the flexibility of omni-directional movement is taken into consideration.

To provide a crucible cover, a vapor deposition source assembly, and a crucible covering system for solving a cross contamination between crucibles of a vapor deposition material.SOLUTION: A cover configuration is configured by at least two components for covering a crucible inside an electron beam source assembly. A cover 120 has a cover body 122 and a cover insertion part 150 that is separated from the cover body and carried by the cover body in a case where the cover body is lifted or lowered. This configuration allows lowering the cover insertion part until the cover insertion part stands still over the crucible. If the cover insertion part contacts the crucible, the cover body can be lowered a little more because the cover insertion part can partially be separated from the cover body, enabling the cover insertion part to contact the body that surrounds the crucible and is cooled by water while an insertion piece to the crucible contacts the crucible well.SELECTED DRAWING: Figure 3

Disclosed herein is a system for non-destructive classification of specimens. The system includes an e-beam source, an X-ray measurement module, and a computational module. The e-beam source is configured to project e-beams on a specimen at one or more e-beam landing energies, so as to penetrate the specimen and induce emission of X-rays. The X-ray measurement module is configured to measure the emitted X-rays. The computational module is configured to process the measurement data to obtain an energy signature of at least one target substance included in the specimen and classify the inspected specimen based on the obtained energy signature and one or more reference energy signatures pertaining to one or more reference specimens, respectively.

A method for analysing a specimen in a microscope is provided. The method comprises: acquiring a series of compound image frames using an electron detector, a first X-ray detector, and a second X-ray detector, wherein the first X-ray detector is positioned between the specimen and an electron beam source from which a focused electron beam emerges towards the specimen, and is provided with a filter member interposed between the first X-ray detector and the specimen and adapted to reduce the incidence of electrons on the first X-ray detector, wherein the second X-ray detector is provided with a deflector arrangement configured to reduce the incidence of electrons on the second X-ray detector, and wherein acquiring a compound image frame comprises: causing the focused electron beam to traverse a region of the specimen; monitoring a set of resulting electrons emitted from a plurality of locations within the region of the specimen, using the electron detector, so as to obtain a first image frame, the first image frame comprising a plurality of pixels corresponding to, and having values derived from the monitored electrons emitted from, the plurality of locations; monitoring first and second sets of resulting X-rays emitted from the plurality of locations using the first X-ray detector and the second X-ray detector respectively, so as to obtain one or more second image frames, each comprising a plurality of pixels corresponding to the plurality of locations and having values derived, in accordance with a first criterion, from monitored X rays characteristic of a respective chemical element and emitted from the plurality of locations, wherein the set of electrons and the first and second sets of X-rays are emitted from the specimen substantially simultaneously; and combining the first image frame and the one or more second image frames so as to produce the compound image frame, such that the compound image frame provides data derived from monitored electrons and X-rays emitted from the plurality of locations within the region, and displaying the series of compound image frames on a visual display, wherein the visual display is updated to show each compound image frame in sequence. A system for analysing a specimen in a microscope is also provided.

An electron beam imaging system includes an electron beam source for generating a primary beam, an optical system for directing and focusing the primary beam onto a sample, and a charge detector for collecting interaction products. The charge detector includes: a current detection electrode configured to be connected to current measurement circuitry; a low atomic mass region comprising a low atomic mass material; and a high atomic mass region comprising a high atomic mass material. The high atomic mass material has a higher atomic mass than the low atomic mass material. The electron beam imaging system is configured such that during use, the low atomic mass region is closer to the sample than the high atomic mass region to reduce the second generation interaction product yield at the charge detector.

A transmission electron microscope is provided for imaging a sample. The microscope has a stage to hold a sample and an electron beam column to direct an electron beam onto a field of view on the sample. The electron beam column includes an electron beam source to generate an electron beam, and electron beam optics to converge the electron beam onto a field of view on the sample. The microscope also has a beam scanner to scan the electron beam across multiple fields of view on the sample. The microscope additionally has a detector to detect radiation emanating from the sample to generate an image. A controller is provided to analyze the detected radiation to generate an image of the sample.

A near-eye optical display apparatus includes an optical waveguide, an image beam source, and an electrically controlled liquid crystal cell. The image beam source is disposed on one side of a first light incident surface to provide an image beam. After being transmitted through the optical waveguide, the image beam exits from the light-exit surface. The liquid crystal cell is disposed on one side of a second light incident surface, and has a first sight region and a second sight region disposed in a first direction. When a driving voltage is supplied to the liquid crystal cell, the percentage of an average transmittance of the second sight region for an ambient beam and an average transmittance of the first sight region for the ambient beam is less than or equal to 50%. The display contrast of the near-eye optical display apparatus proposed by the invention is not easily affected by the external environment.

Aspects of the present disclosure relate to efficiently trapping ions for QIP systems. A system may include an ablation laser beam source and an ion trapping structure including: an enclosure with an orifice, a source material that is arranged in the enclosure and receives an ablation laser pulse to provide a plume of atoms. A system may include at least one LED that is arranged in the enclosure and onto which at least a portion of the plume of atoms is deposited, wherein the at least one LED is configured to emit light that desorbs at least one deposited atom through the orifice. A system may include an ion trap with a gap through which the at least one deposited atom desorbed travels from the orifice, and a laser beam source configured to generate a laser beam towards the at least one deposited atom creating a trapped ion.