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2587results about "Electrode and associated part arrangements" patented technology

Method for treating a target volume with a particle beam and device implementing same

The invention concerns a method for treating a target volume with a particle beam, in particular a proton beam, which consists in generating said particle beam using an accelerator and in producing from said beam a narrow spot directed towards the target volume, characterized in that said spot sweeping speed and the particle beam intensity are simultaneously varied.
Owner:ION BEAM APPL

Device and method for regulating intensity of beam extracted from a particle accelerator

The invention concerns a device (10) for regulating the intensity of a beam extracted from a particle accelerator, such as a cyclotron, used for example for protontherapy, said particles being generated from an ion source. The invention is characterized in that it comprises at least: a comparator (90) determining a difference ε between a digital signal IR representing the intensity of the beam measured at the output of the accelerator and a setpoint value IC of the beam intensity: a Smith predictor (80) which determines on the basis of the difference ε, a correct value of the intensity of the beam IP; an inverted correspondence table (40) supplying, on the basis of the corrected value of the intensity of the beam IP, a setpoint value IA for supply arc current from the ion source (20).
Owner:ION BEAM APPL

Semiconductor processing system and methods using capacitively coupled plasma

ActiveUS20130082197A1Conducive to environmental controlPrecise control of etchRadiation/particle handlingElectrode and associated part arrangementsCapacitanceSemiconductor
Substrate processing systems are described that have a capacitively coupled plasma (CCP) unit positioned inside a process chamber. The CCP unit may include a plasma excitation region formed between a first electrode and a second electrode. The first electrode may include a first plurality of openings to permit a first gas to enter the plasma excitation region, and the second electrode may include a second plurality of openings to permit an activated gas to exit the plasma excitation region. The system may further include a gas inlet for supplying the first gas to the first electrode of the CCP unit, and a pedestal that is operable to support a substrate. The pedestal is positioned below a gas reaction region into which the activated gas travels from the CCP unit.
Owner:APPLIED MATERIALS INC

Inspection system by charged particle beam and method of manufacturing devices using the system

InactiveUS20020028399A1Efficiently and accurately inspecting objectAccurately inspect an objectMaterial analysis using wave/particle radiationElectrode and associated part arrangementsBeam sourceSecondary electrons
An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.
Owner:EBARA CORP +1

Charged particle therapy system, range modulation wheel device, and method of installing range modulation wheel device

The invention provides a charged particle therapy system capable of increasing the number of patients treated. An irradiation filed forming apparatus for irradiating a charged particle beam extracted from a charged particle beam generator to an irradiation target includes an RMW device. The RMW device comprises a housing and an RMW disposed within the housing. A rotary shaft of the RMW is rotatably mounted to the housing. The RMW device is detachably installed in an RMW holding member provided in a casing of the irradiation filed forming apparatus. The housing can be placed in contact with the RMW holding member, and hence positioning of the rotary shaft of the RMW to a predetermined position can be performed in a short time. This contributes to cutting a time required for treatment per patient and increasing the number of patients treated.
Owner:HITACHI LTD

Physiological parameter detector

InactiveUS20090095926A1Improving electromagnetic noise immunityImprove electromagnetic immunityRadiation/particle handlingElectrode and associated part arrangementsOptical radiationElectromagnetic interference
A pulse oximetry sensor has an emitter adapted to transmit optical radiation into a tissue site and a ceramic detector adapted to receive optical radiation from the emitter after tissue site absorption. The detector is surrounded by shielding material to reduce undesirable electromagnetic interference.
Owner:JPMORGAN CHASE BANK NA

Particle therapy system

A particle therapy system is provided which can simply and quickly correct a beam orbit. In a particle therapy system provided with an irradiation facility comprising a first beam transport system for receiving a beam and transporting the beam to the patient side, and an irradiation nozzle for forming an irradiation field of the beam, the particle therapy system comprises first beam position monitors for detecting a position upstream of the irradiation nozzle at which the beam passes, second beam position monitors for detecting a position downstream of the irradiation nozzle at which the charged-particle beam passes, and first and second steering magnets. Correction bending amounts for causing the beam to be coincident with a predetermined orbit after the correction are determined in accordance with detected results from the first and second beam position monitors, and first and second steering magnets are excited under control so that the determined correction bending amounts are obtained.
Owner:HITACHI LTD

System for the Delivery of Proton Therapy

A process for an intensity-modulated proton therapy of a predetermined volume within an object includes discretising the predetermined volume into a number of iso-energy layers each corresponding to a determined energy of the proton beam. A final target dose distribution is determined for each iso-energy layer. The final target dose distribution or at least a predetermined part of this final target dose distribution is applied by parallel beam scanning by controlling the respective beam sweepers, thereby scanning one iso-energy layer after the other using an intensity-modulated proton beam while scanning a predetermined iso-energy layer.
Owner:PAUL SCHERRER INSTITUT

Device for varying the energy of a particle beam extracted from an accelerator

A device for varying the energy of a particle beam extracted from a fixed-energy particle accelerator includes a block of energy degrading material positioned in the path of the particle beam. The block of energy degrading material is preferably in the form of a ring arranged on a wheel. The ring is of a staircase configuration, having discrete steps defining a thickness between parallel entry and exit faces. According to one aspect of the invention, the block is configured so that the particle beam energy variation reaches a maximum at the edges of each step. This upper limit is also the lower limit of the next step. Thus, continuous energy variation is possible despite the fact that the thickness of the block varies in discrete steps.
Owner:ION BEAM APPL

Rotating irradiation apparatus

A rotating irradiation apparatus includes a rotating gantry 3 including a front ring 19 and a rear ring 20 and is provided with a beam delivery device 11 and an irradiation device 4. The beam delivery device 11 delivers an ion beam used for particle radiotherapy. Radial support devices 61A and 61B support the front ring 19 and radial support devices 61A and 61B support the rear ring 20. Each radial support device includes a linear guide 41, an upper support structure disposed above the linear guide 41, and a lower support structure disposed below the linear guide 41. The upper support structure is movably mounted on the lower support structure and is movable in the direction of the rotational axis of the rotating gantry 3.
Owner:HITACHI LTD

Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays

An EUV photon source includes a plasma chamber filled with a gas mixture, multiple electrodes within the plasma chamber defining a plasma region and a central axis, a power supply circuit connected to the electrodes for delivering a main pulse to the electrodes for energizing the plasma around the central axis to produce an EUV beam output along the central axis, and a preionizer for ionizing the gas mixture in preparing to form a dense plasma around the central axis upon application of the main pulse from the power supply circuit to the electrodes. The EUV source preferably includes an ionizing unit and precipitator for collecting contaminant particulates from the output beam path. A set of baffles may be disposed along the beam path outside of the pinch region to diffuse gaseous and contaminant particulate flow emanating from the pinch region and to absorb or reflect acoustic waves emanating from the pinch region away from the pinch region. A clipping aperture, preferably formed of ceramic and / or Al2O3, for at least partially defining an acceptance angle of the EUV beam. The power supply circuit may generates the main pulse and a relatively low energy prepulse for homogenizing the preionized plasma prior to the main pulse. A multi-layer EUV mirror is preferably disposed opposite a beam output side of the pinch region for reflecting radiation along the central axis for output along the beam path of the EUV beam. The EUV mirror preferably has a curved contour for substantially collimating or focusing the reflected radiation. In particular, the EUV mirror may preferably have a hyperbolic contour.
Owner:USHIO DENKI KK

Particle beam irradiation system

It is an object of the present invention to provide a charged particle beam extraction method and particle beam irradiation system that make it possible to exercise intensity control over an extracted ion beam while a simple device configuration is employed. To accomplish the above object, there is provided a particle beam irradiation system comprising: a synchrotron for accelerating and extracting an charged particle beam; an irradiation apparatus for extracting the charged particle beam that is extracted from the synchrotron; first beam intensity modulation means for controlling the beam intensity of the charged particle beam extracted from the synchrotron during an extraction control period of an operation cycle of the synchrotron; and second beam intensity modulation means for controlling the beam intensity during each of a plurality of irradiation periods contained in the extraction control period of the operation cycle.
Owner:HITACHI LTD

Particle beam irradiation system

A particle beam irradiation system capable of ensuring a more uniform dose distribution at an irradiation object even when a certain time is required from output of a beam extraction stop signal to the time when extraction of a charged particle beam from an accelerator is actually stopped. The particle beam irradiation system comprises a synchrotron, an irradiation device including scanning magnets and outputting an ion beam extracted from the synchrotron, and a control unit. The control unit stops the output of the ion beam from the irradiation device in accordance with the beam extraction stop signal, controls the scanning magnets to change an exposure position in a state in which the output of the ion beam is stopped, and after the change of the exposure position, starts the output of the ion beam from the irradiation device again. The control unit further outputs a next beam extraction stop signal when an increment of dose integrated from the time of a preceding beam extraction stop signal as a start point reaches a setting dose stored in advance.
Owner:HITACHI LTD

Particle beam irradiation apparatus and particle beam irradiation method

To ensure irradiation accuracy and safety, even when an irradiation device employing a different irradiation method is used, disclosed is herein a charged particle beam irradiation apparatus that irradiates an irradiation target with charged particle beams includes:a charged particle beam generator for generating the charged particle beams; a passive scattering irradiation device and a scanning irradiation device, both for irradiating the irradiation target with the charged particle beams; a beam transport system for transporting the charged particles beam extracted from the charged particle beam generator, to selected one of the two irradiation devices; and a central controller that modifies operating parameters on the charged particle beam generator, according to the irradiation method adopted for the selected irradiation device.
Owner:HITACHI LTD

Tiled electronic display structure

A tiled display device is formed from display tiles having picture element (pixel) positions defined up to the edge of the tiles. Each pixel position has an organic light-emitting diode (OLED) active area which occupies approximately 25 percent of the pixel area. Each tile includes a memory which stores display data, and pixel driving circuitry which controls the scanning and illumination of the pixels on the tile. The pixel driving circuitry is located on the back side of the tile and connections to pixel electrodes on the front side of the tile are made by vias which pass through portions of selected ones of the pixel areas which are not occupied by the active pixel material. The tiles are to formed in two parts, an electronics section and a display section. Each of these parts includes connecting pads which cover several pixel positions. Each connecting pad makes an electrical connection to only one row electrode or column electrode. The connecting pads on the display section are electrically connected and physically joined to corresponding connecting pads on the electronics section to form a complete tile. Each tile has a glass substrate on the front of the tile. Black matrix lines are formed on the front of the glass substrate and the tiles are joined by mullions which have the same appearance as the black-matrix lines. Alternatively, the black matrix lines may be formed on the inside surface of an optical integrating plate and the tiles may be affixed to the integrating plate such that the edges of the joined tiles are covered by the black-matrix lines. A cathodoluminescent tile structure is formed from individual tiles that have multiple phosphor areas, a single emissive cathode and horizontal and vertical electrostatic deflecting grids which deflect the electron beam produced by the single cathode onto multiple ones of the phosphor areas.
Owner:MEC MANAGEMENT LLC +1

Particle beam irradiation equipment and particle beam irradiation method

Particle beam irradiation equipment and a method of adjusting irradiation nozzle, which can ensure a long range and high dose uniformity at any field size are provided. The particle beam irradiation equipment comprises charged particle beam generation equipment and an irradiation nozzle for irradiating a charged particle beam extracted from the charged particle beam generation equipment to an irradiation target. The irradiation nozzle comprises a first scatterer device including a first scatterer for spreading out the charged particle beam into a Gaussian-like distribution, and multiple stages of second scatterer devices including second scatterers for producing a uniform intensity distribution of the charged particle beam having been spread out into a Gaussian-like distribution by the first scatterer. For forming irradiation fields having sizes different from each other, the second scatterer devices are disposed downstream of the first scatterer device in the direction of travel of the charged particle beam at the spacing depending on the difference in the field size.
Owner:HITACHI LTD

Method and apparatus for generating electron beams

Various embodiments of the present invention relate to a plasma electron source apparatus. The apparatus comprises a cathode discharge chamber in which a plasma is generated, an exit hole provided in said cathode discharge chamber from which electrons from the plasma are extracted by an accelerating field provided between said cathode discharge chamber and an anode, at least one plasma confinement device, and a switching mechanism for switching the at least one plasma confinement device between a first value allowing for electron extraction from the plasma and a second value prohibiting electron extraction from the plasma. Associated methods are also provided.
Owner:ARCAM AB

Device and method for regulating intensity of beam extracted from a particle accelerator

The invention concerns a device (10) for regulating the intensity of a beam extracted from a particle accelerator, such as a cyclotron, used for example for protontherapy, said particles being generated from an ion source. The invention is characterised in that it comprises at least: a comparator (90) determining a difference epsilon between a digital signal IR representing the intensity of the beam measured at the output of the accelerator and a setpoint value IC of the beam intensity: a Smith predictor (80) which determines on the basis of the difference epsilon, a corrected value of the intensity of the beam IP; an inverted correspondence table (40) supplying, on the basis of the corrected value of the intensity of the beam IP a setpoint value IA for supplying arc current from the ion source (20).
Owner:ION BEAM APPL

Shaped biocompatible radiation shield and method for making same

A radiation applicator system is structured to be mounted to a radiation source for providing a predefined dose of radiation for treating a localized area or volume, such as the tissue surrounding the site of an excised tumor. The applicator system includes an applicator and an adapter. The adapter is formed for fixedly securing the applicator to a radiation source, such as a radiosurgery system which produces a predefined radiation dose profile with respect to a predefined location along the radiation producing probe. The applicator includes a shank and an applicator head, wherein the head is located at a distal end of the applicator shank. A proximate end of the applicator shank couples to the adapter. A distal end of the shank includes the applicator head, which is adapted for engaging and / or supporting the area or volume to be treated with a predefined does of radiation. The applicator can include a low energy radiation filter inside of the applicator head to reduce undesirable low energy radiation emissions. A biocompatible radiation shield may be coupled to the outer surface of the applicator head to block radiation emitted from a portion of the radiation probe, in order to shield an adjacent location or vital organ from any undesired radiation exposure. A plurality of applicators having applicator heads and radiation shields of different sizes and shapes can be provided to accommodate treatment sites of various sizes and shapes.
Owner:CARL ZEISS STIFTUNG DOING BUSINESS CARL ZEISS

Field emitter based electron source with minimized beam emittance growth

A system and method for limiting emittance growth in an electron beam is disclosed. The system includes an emitter element configured to generate an electron beam and an extraction electrode positioned adjacent to the emitter element to extract the electron beam out therefrom, the extraction electrode including an opening therethrough. The system also includes a meshed grid disposed in the opening of the extraction electrode to enhance intensity and uniformity of an electric field at a surface of the emitter element and an emittance compensation electrode (ECE) positioned adjacent to the meshed grid on the side of the meshed grid opposite that of the emitter element and configured to control emittance growth of the electron beam.
Owner:GENERAL ELECTRIC CO

Charged particle irradiation system

ActiveUS7838855B2Improving the accuracy in irradiation position of a charged particle beamReduce the possibilityElectrode and associated part arrangementsMaterial analysis by optical meansExcitation currentParticle physics
A charged particle irradiation system that positions the beam at a target position to avoid irradiation of normal tissue includes an acceleration system 6 for extracting a charged particle beam, scanning magnets 24 and 25, and charged particle beam position monitors 26 and 27. On the basis of signals received from the charged particle beam position monitors 26 and 27, the control unit 70 calculates a beam position at a target position and then controls the scanning magnets 24 and 25 so that the charged particle beam is moved to a desired irradiation position at the target position. The control unit 70 corrects the value of an excitation current applied to each of the scanning magnets 24 and 25 on a specified cycle basis on the basis of information about the position and the angle of the charged particle beam.
Owner:HITACHI LTD

Tiled electronic display structure

A tiled display device is formed from display tiles having picture element (pixel) positions defined up to the edge of the tiles. Each tile includes a memory which stores display data, and pixel driving circuitry which controls the scanning and illumination of the pixels on the tile. The tiles are formed in two parts, an electronics section and a display section. Each of these parts includes connecting pads which cover several pixel positions. Each connecting pad makes an electrical connection to only one row electrode or column electrode. The connecting pads on the display section are electrically connected and physically joined to corresponding connecting pads on the electronics section to form a complete tile.
Owner:MEC MANAGEMENT LLC +1

Carbon nanotube particulates, compositions and use thereof

A method for making carbon nanotube particulates involves providing a catalyst comprising catalytic metals, such as iron and molybdenum or metals from Group VIB or Group VIIIB elements, on a support material, such as magnesia, and contacting the catalyst with a gaseous carbon-containing feedstock, such as methane, at a sufficient temperature and for a sufficient contact time to make small-diameter carbon nanotubes having one or more walls and outer wall diameters of less than about 3 nm. Removal of the support material from the carbon nanotubes yields particulates of enmeshed carbon nanotubes that retain an approximate three-dimensional shape and size of the particulate support that was removed. The carbon nanotube particulates can comprise ropes of carbon nanotubes. The carbon nanotube particulates disperse well in polymers and show high conductivity in polymers at low loadings. As electrical emitters, the carbon nanotube particulates exhibit very low “turn on” emission field.
Owner:UNIDYM

Ion radiation therapy system with variable beam resolution

An ion radiation therapy machine provides a steerable beam for treating a tumor within the patient where the exposure spot of the beam is controlled in width and / or length to effect a flexible trade-off between treatment speed, accuracy, and uniformity.
Owner:WISCONSIN ALUMNI RES FOUND

Phosphor based illumination system having a plurality of light guides and a display using same

An illumination system including a light source, light guides coupled to the light source, each including an input surface and an output surface, emissive material positioned to receive light from at least one light guide, and a first interference reflector positioned between the emissive material and the output surfaces of the light guides is disclosed. The light source emits light having a first optical characteristic. The emissive material emits light having a second optical characteristic when illuminated with light having the first optical characteristic. The first interference reflector substantially transmits light having the first optical characteristic and substantially reflects light having the second optical characteristic.
Owner:3M INNOVATIVE PROPERTIES CO

Particle beam irradiation system

A particle beam irradiation system which can increase an availability factor. An ion beam extracted from one proton beam linac is bent at 90 degrees by a switching magnet and is introduced to RI production equipment through a beam line. In the RI production equipment, a RI is produced using the introduced ion beam. An ion beam extracted from the other proton beam linac is bent at 90 degrees by the switching magnet and is introduced to a synchrotron through a beam line. The ion beam extracted from the synchrotron is irradiated to a patient from irradiation equipment. If one proton beam linac comes into an abnormal state, the one proton beam linac is stopped in operation and checked. During the check, the ion beam extracted from the other proton beam linac is selectively introduced to the RI production equipment and the synchrotron by the switching magnet.
Owner:HITACHI LTD

Particle beam irradiation system

It is an object of the present invention to provide a charged particle beam extraction method and particle beam irradiation system that make it possible to exercise intensity control over an extracted ion beam while a simple device configuration is employed. To accomplish the above object, there is provided a particle beam irradiation system comprising: a synchrotron for accelerating and extracting an charged particle beam; an irradiation apparatus for extracting the charged particle beam that is extracted from the synchrotron; first beam intensity modulation means for controlling the beam intensity of the charged particle beam extracted from the synchrotron during an extraction control period of an operation cycle of the synchrotron; and second beam intensity modulation means for controlling the beam intensity during each of a plurality of irradiation periods contained in the extraction control period of the operation cycle.
Owner:HITACHI LTD

Method of modulating laser-accelerated protons for radiation therapy

Methods of optimizing a laser-accelerated proton radiation dose to a targeted region are disclosed. Disclosed methods include providing a plurality of modulated polyenergetic proton beamlets and irradiating the targeted region with the plurality of modulated beamlets.
Owner:INST FOR CANCER RES
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