Provided is a forming device and method making it possible to obtain a low-temperature polysilicon film in which the size of
crystal grains fluctuates minimally, and is uniform. A
mask has
laser-light-blocking areas and
laser-light-transmission areas arranged in the form of a grid such that the light-blocking areas and transmission areas are not adjacent to one another.
Laser light is directed by the microlenses through the masks to planned channel-area-formation areas. The
laser light transmitted by the transmission areas is directed onto an a-Si:H film, annealing and polycrystallzing the irradiated parts thereof. The
mask is then removed, and when the entire planned channel-area-formation area is irradiated with
laser light, the already-polycrystallized area, having a higher
melting point, does not melt, while the area in an amorphous state melts and solidifies, leading to polycrystallization. The grain size of the polysilicon film obtained is regulated by the light-blocking areas and transmission areas and is thus controlled to a predetermined range.