2223 results about "Silane compounds" patented technology

A method and apparatus for depositing a low dielectric constant film by reaction of an organo silane compound and an oxidizing gas. The oxidized organo silane film has excellent barrier properties for use as a liner or cap layer adjacent other dielectric layers. The oxidized organo silane film can also be used as an etch stop or an intermetal dielectric layer for fabricating dual damascene structures. The oxidized organo silane films also provide excellent adhesion between different dielectric layers. A preferred oxidized organo silane film is produced by reaction of methyl silane, CH3SiH3, and N2O.

A composition and method of preparation, to provide silane compounds that are free of chlorine. The compounds are hexakis(monohydrocarbylamino)disilanes with general formula (I) ((R)HN)3—Si—Si—(NH(R))3  (I) wherein each R independently represents a C1 to C4 hydrocarbyl. These disilanes may be synthesized by reacting hexachlorodisilane in organic solvent with at least 6-fold moles of the monohydrocarbylamine RNH2 (wherein R is a C1 to C4 hydrocarbyl). Such compounds have excellent film-forming characteristics at low temperatures. These films, particularly in the case of silicon nitride and silicon oxynitride, also have excellent handling characteristics.

Silane compounds as a constituent material of luminescent device are described, which are represented by formula (1), luminescent device materials which comprise said compounds and luminescent devices which comprise said materials to acquire high luminous efficiency and high durability:wherein R1 represents an alkyl group, an aryl group, a heteroaryl group or an alkynyl group, and each of Ar11, Ar12 and Ar13 represents a heteroaryl group.

There is provided a process for producing a modified diene polymer rubber comprising the steps of: (1) polymerizing a conjugated diene monomer or a combination thereof with an aromatic vinyl monomer in a hydrocarbon solvent, in the presence of an alkali metal catalyst, to form an alkali metal end-carrying active polymer, and (2) reacting the alkali metal end-carrying active polymer with a silane compound defined by a specific formula.

In one embodiment, a method for depositing a layer containing silicon nitride on a substrate surface is provided which includes positioning a substrate in a process chamber, maintaining the substrate at a predetermined temperature, and exposing the substrate surface to an alkylaminosilane compound and at least one ammonia-free reactant. In another embodiment, a method for depositing a silicon nitride material on a substrate is provided which includes positioning a substrate in a process chamber, maintaining the substrate at a predetermined temperature, and exposing the substrate surface to bis(tertiarybutylamino)silane and a reagent, such as hydrogen, silane and / or disilane.

The invention relates to a method of producing a stable substantially aqueous silanized colloidal silica dispersion having a silica content of at least about 20 wt %, comprising mixing at least one silane compound and colloidal silica particles, wherein the weight ratio of silane to silica is from about 0.003 to about 0.2. The invention also relates to a dispersion obtainable by the method, and to a stable substantially aqueous silanized colloidal silica dispersion having a silica content of at least about 20 wt %, wherein the weight ratio of silane to silica is from about 0.003 to about 0.2. The invention further concerns the use of the dispersion for coatings applications and as an additive.

The present invention provides a COF flexible printed wiring board whose insulating layer is not melt-adhered to a heating tool, to thereby enhance reliability and productivity of a semiconductor chip mounting line, and also provides a method of producing the COF flexible printed wiring board. The COF flexible printed wiring board contains an insulating layer, a wiring pattern, on which a semiconductor chip being mounted, formed of a conductor layer provided on at least one side of the insulating layer and a releasing layer, wherein the releasing layer is formed from a releasing agent containing at least one species selected from a silane compound and silica sol and is provided on a surface of the insulating layer, which is opposite to the mounting side of the semiconductor chip.

A coating composition forming a abrasion resistant coating comprising (A) an ultraviolet-curable silicone prepared by chemically modifying particulate colloidal silica with a specific silane compound, (B) a monomer mixture comprising a (meth)acrylate having a specific isocyanate skeleton and a urethane poly(meth)acrylate having an alicyclic skeleton, and (C) a photo-polymerization initiator. By using a urethane poly(meth)acrylate having an alicyclic skeleton as part of the component (B) and the component (A) having an enhanced reactivity of chemical modification, the compatibility of the component (A) with the component (B) is improved to give a cured coating with excellent wear resistance, weather resistance and durability.

The invention relates to a method of producing an aqueous dispersion comprising mixing at least one silane compound and colloidal silica particles to form silanized colloidal silica particles, mixing said silanized colloidal silica particles with an organic binder to form the dispersion. The invention also relates to a dispersion obtainable by the method, and the use thereof.

A main object of the invention is to provide a filler sheet for a solar cell module which is excellent in various properties such as strength, endurance, weatherability, heat resistance, water resistance, light resistance, wind pressure resistance, hailstorm resistance, and vacuum laminating suitability, and has very good thermal melting / bonding property without being affected by production conditions and others, and which makes it possible to produce a solar cell module, suitable for various use purposes, stably at low costs; and a solar cell module using the same. In order to attain the object, the invention provides, as a filler sheet for solar cell element, a filler sheet made of a resin film produced by a resin composition comprising a copolymer of an α-olefin and an ethylenic unsaturated silane compound, or a modified or condensed body thereof, and one or more selected from the group consisting of a light resisting agent, an ultraviolet absorbent and a thermal stabilizer; and a filler sheet made of a resin film produced by a resin composition comprising a maleic anhydride modified polyolefin.

The invention provides a graphene / polysiloxane composite coating material and a preparation method thereof. The method comprises the following steps: modifying the graphene surface with active groups by a chemical modification technique to obtain modified graphene, mixing the modified graphene with a silane compound, a dispersion medium, a non-essential comonomer and a non-essential accelerator, and carrying out hydrolytic condensation or hydrolytic condensation-free radical polymerization to generate a graphene / polysiloxane composite resin in situ; and mixing the resin with a non-essential blend resin, a non-essential curing agent, a non-essential solvent, a non-essential pigment and filler and a non-essential aid, and carrying out physical blending, amino epoxy addition reaction, Michael addition reaction and the like to form a film, thereby obtaining the graphene / polysiloxane composite coating material. The uniformly dispersed graphene lamellae and polysiloxane have strong interface effects, also have the gas / liquid barrier and heat shielding effects, and endow the coating with excellent corrosion resistance, flame retardancy and the like, thereby greatly enhancing the mechanical properties, corrosion resistance, scratch resistance, wear resistance and the like of the coating.

A method of manufacturing a device comprising individual thin films including a silicon film, a gate insulating film, a conductive film for a gate electrode, an interlayer insulating film, and a conductive film for an electrode and wiring, comprising: a step of applying a liquid material to form an applied film; and a heat treatment and / or a light irradiating treatment of making the applied film into the silicon film, wherein, as the liquid material, a high-order silane composition comprising a high-order silence formed by photopolymerization by irradiating a silane compound solution having a photopolymerization property with UV rays is used.

Disclosed is a photo-curable composition comprising the following components (A) to (C): (A) hydrolyzable silane compound represented by the general formula (1) or a hydrolyzate thereof: (R1)pSi(X)4-p (1) wherein R1 is a non-hydrolyzable organic group having 1 to 12 carbon atoms, X is a hydrolyzable group, and p is an integer of 0 to 3; (B) photo acid generator; and (C) dehydrating agent. By such constitution, it is possible to provide a photo-curable composition which has a rapid photo-curable rate, is excellent in characteristics such as storage stability, heat resistance, weather-ability, scratch resistance and the like, and is applicable to base materials having low heat resistance such as plastics, as well as a cured product obtained therefrom.

A silicone-modified fluoropolymer is formed by first dissolving a fluoropolymer in an organic solvent, the fluoropolymer having at least one monomer of vinylidene fluoride coupled to a hexafluoropropylene monomer unit, and subsequently reacting the mixture with an amino silane coupling agent to form an aminosilane-modified fluoropolymer. The aminosilane fluoropolymer is subsequently heated and partially condensed with an oligomer of a silane compound including alkoxy silane. The resultant composition is suitable for use as a low refractive index layer in an antireflection coating on an optical substrate.

A composition comprising the condensation product of a least one fluorochemical polyether silane compound having a polyfluoropolyether segment and at least two hydrolysable silane groups per molecule, with one or more non-fluorinated compounds having at least two hydrolysable groups per molecule, and the reaction product thereof, is disclosed. The composition provides durable water, oil and stain repellency to a substrate.

A method of forming a silica-based film includes: applying a composition for forming an insulating film for a semiconductor device, which is cured by using heat and ultraviolet radiation, to a substrate to form a coating; heating the coating; and applying heat and ultraviolet radiation to the coating to effect a curing treatment. The composition includes: a hydrolysis-condensation product produced by hydrolysis and condensation of at least one silane compound selected from the group consisting of compounds shown by the following general formula (A), and at least one silane compound selected from the group consisting of compounds shown by the following general formula (B) and compounds shown by the following general formula (C); and an organic solvent,

The invention relates to the technical field of lithium ion batteries, particularly relates to electrolyte and a lithium ion battery comprising the same. The electrolyte disclosed by the invention comprises lithium salt, an organic solvent and an additive A, wherein the additive A comprises silane compounds containing cyano groups and dinitrile compounds containing ether bonds; the additive A can be used for improving the rate capability and low-temperature discharge performance of the battery under a high voltage, thereby improving the service life of the lithium ion battery. The electrolyte disclosed by the invention further comprises an additive B which is one or more of ether compounds, nitrile compounds, cyclic ester compounds containing S=O double bonds, cyclic carbonate compounds containing C-C unsaturated bonds and compounds containing imido groups. The lithium ion battery comprising the electrolyte can achieve the objective of high voltage and the highest normal working voltage can be improved to 4.4V-5.0V; in addition, the cycle performance of the lithium ion battery is excellent and the capacity retention ratios during charging and discharging can be both high.

A method of forming an organic silica-based film, including: applying a composition for forming an insulating film for a semiconductor device, which is cured by using heat and ultraviolet radiation, to a substrate to form a coating; heating the coating; and applying heat and ultraviolet radiation to the coating to effect a curing treatment, wherein the composition includes organic silica sol having a carbon content of 11.8 to 16.7 mol %, and an organic solvent, the organic silica sol being a hydrolysis-condensation product produced by hydrolysis and condensation of a silane compound selected from compounds shown by the general formulae (1): R1Si(OR2)3, (2): Si(OR3)4, (3): (R4)2Si(OR5)2, and (4): R6b(R7O)3-bSi—(R10)d—Si(OR8)3-cR9c.

A method and apparatus for depositing a low dielectric constant film by reaction of an organo silane compound and an oxidizing gas. The oxidized organo silane film has excellent barrier properties for use as a liner or cap layer adjacent other dielectric layers. The oxidized organo silane film can also be used as an etch stop or an intermetal dielectric layer for fabricating dual damascene structures. The oxidized organo silane films also provide excellent adhesion between different dielectric layers. A preferred oxidized organo silane film is produced by reaction of methyl silane, CH3SiH3, and N2O.

A composition for film formation capable of forming a silica-based coating film having low water absorption and dielectric constant of 2.1 or lower and useful as an interlayer insulating film material in semiconductor devices, etc. The composition contains: (A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing at least one silane compound selected from the group consisting of compounds represented by formula (1), compounds represented by formula (2), and compounds represented by formula (3) in the presence of a basic catalyst and water, <paragraph lvl="0"><in-line-formula>RaSi(OR1)4-a (1) < / in-line-formula>wherein R represents a hydrogen atom, a fluorine atom, or a monovalent organic group, R1 represents a monovalent organic group, and a is an integer of 1 or 2, <paragraph lvl="0"><in-line-formula>Si(OR2)4 (2) < / in-line-formula>wherein R2 represents a monovalent organic group, <paragraph lvl="0"><in-line-formula>R3b(R4O)3-bSi-(R7)d-Si(OR5)3-cR6c (3) < / in-line-formula>wherein R3 to R6 may be the same or different and each represents a monovalent organic group, b and c may be the same or different and each is a number of 0 to 2, R7 represents an oxygen atom, a phenylene group, or a group represented by -(CH2)n-, wherein n is an integer of 1 to 6, and d is 0 or 1; (B) a compound compatible with or dispersible in ingredient (A) and having a boiling point or decomposition temperature of from 250 to 450° C.; and (C) an organic solvent.

The invention provides a method of polishing a substrate, which method comprises the steps of (i) providing a polishing composition, (ii) providing a substrate comprising at least one metal layer, and (iii) abrading at least a portion of the metal layer with the polishing composition to polish the substrate. The polishing composition comprises an abrasive and a liquid carrier, wherein the abrasive comprises metal oxide particles having a surface with a silane compound adhered to a portion thereof and a polymer adhered to the silane compound and wherein the polymer is selected from the group consisting of water-soluble polymers and water-emulsifiable polymers. The invention also provides a polishing composition as described above, wherein the total amount of abrasive particles present in the polishing composition is no greater than about 20% by weight of the polishing composition, and the metal oxide particles do not comprise zirconia.

A method for producing a quantum dot silicate thin film for light emitting devices. The quantum dot silicate thin film is produced by introducing a silane compound having a functional group capable of interacting with a quantum dot and at least one reactive group for a sol-gel process into the surface of the quantum dot or a matrix material for dispersing the quantum dot, thereby exhibiting excellent mechanical and thermal stability.

Aromatic silane compounds containing at least an aromatic ring bound directly to the silicon atom, wherein the aromatic ring has at least one substituent located in the ortho position selected from C1-10 hydrocarbon groups, are useful as electron donors in olefin polymerization catalysts for the production of polyolefins having a stereoblock content of from about 7 to about 25%.

A positive electrode material that can form a positive electrode mixture containing composition with reduced changes over time and high productivity, a manufacturing method thereof, a non-aqueous rechargeable battery less likely to swell and having a high storage characteristic during storage at high temperatures, and a positive electrode that can form the battery are provided. The object is solved by providing a positive electrode material having a coating layer of an organic silane compound on a surface of a positive electrode active material made of a lithium nickel composite oxide represented by the general compositional formula (1): Li1+xMO2 where −0.5≦x≦0.5, M represents a group of at least two elements including at least one of Mn and Co and Ni, and 20≦a≦100 and 50≦a+b+c≦100 when the ratios (mol %) of Ni, Mn, and Co in the elements forming M are a, b, and c, respectively.

The present invention relates to a catalyst for polymerization or copolymerization of an olefin. The catalyst is produced by first reacting a mixture of a magnesium compound and an aluminum compound with an ester compound which has at least one hydroxy group and a silane compound which has at least one alkoxy group, and next reacting with a titanium compound. The catalyst may be used in the polymerization or copolymerization of ethylene and propylene. The catalyst is believed to have the following formula:where, R1~R3=hydrocarbon group, X1~X2=halogen atoms, ExED=silane compounds comprising an alkoxy group, ED=an ester compound having at least one hydroxy group and a hydrogen of the hydroxy group is removed, and 0<a+b+c<=1; 0<=j<=2, 0<=k<=3, 0<=1<=1; 0<=m<=4; 0<=n<=4; 0<=m+n<=4; and a, b, c, l, m, and n are all positive numbers.

The invention relates compositions containing at least one silane-grafted polyolefin, and in particular, to compositions containing at least one silane-grafted ethylene / α-olefin polymer, which has a melt viscosity less than 50,000 cP, and adhesives containing the same. In one embodiment, the at least one silane-grafted ethylene / α-olefin polymer is formed from an ethylene / α-olefin polymer that has a molecular weight distribution from 1 to 3.5. The invention also relates to the preparation of the silane-grafted polymers, by reacting, for example, an ethylene / α-olefin polymer with at least one silane compound and at least one initiator.

Polishing compositions comprising at least one soluble silane compound and at least one abrasive that are useful for polishing substrate surface features.