A low dielectric constant film produced from silicon compounds comprising silicon-carbon bonds

Abstract

A method and apparatus for depositing a low dielectric constant film by reaction of an organo silane compound and an oxidizing gas. The oxidized organo silane film has excellent barrier properties for use as a liner or cap layer adjacent other dielectric layers. The oxidized organo silane film can also be used as an etch stop or an intermetal dielectric layer for fabricating dual damascene structures. The oxidized organo silane films also provide excellent adhesion between different dielectric layers. A preferred oxidized organo silane film is produced by reaction of methyl silane, CH3SiH3, and N2O.

Description

BACKGROUND OF THE DISCLOSURE[0001] 1. Field of the Invention[0002] The present invention relates to the fabrication of integrated circuits. More particularly, the invention relates to a process and apparatus for depositing dielectric layers on a semiconductor substrate.[0003] 2. Background of the Invention[0004] One of the primary steps in the fabrication of modem semiconductor devices is the formation of metal and dielectric films on a semiconductor substrate by chemical reaction of gases. Such deposition processes are referred to as chemical vapor deposition or CVD. Conventional thermal CVD processes supply reactive gases to the substrate surface where heat-induced chemical reactions take place to produce a desired film. The high temperatures at which some thermal CVD processes operate can damage device structures having layers previously formed thereon. A preferred method of depositing metal and dielectric films at relatively low temperatures is plasma-enhanced CVD (PECVD) techni...

AI Technical Summary

Problems solved by technology

The high temperatures at which some thermal CVD processes operate can damage device structures having layers previously formed thereon.

However, these materials present new problems for integrated circuit manufacturing processes.

Conventional liner layers, such as SiN, have higher dielectric constants, and the combination of low k dielectric layers with high k dielectric liner layers may result in little or no improvement in the overall stack dielectric constant and capacitive coupling.

The benefit of some low k dielectric materials is further compromised by low oxide content which makes the material inadequate as an etch stop layer.

This may lead to cross talk and / or resistance-capacitance (RC) delay which degrades the overall performance of the device.

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