852 results about "Colloidal silica" patented technology

The invention discloses a wear-resistant tensile power cable and a preparation method thereof, and relates to the technical field of power cables, the wear-resistant tensile power cable comprises a wire core, the interior of the wire core is a stranded wire structure formed by stranding a plurality of copper wires, the exterior of the wire core is coated with a crosslinked polyethylene insulating tube, and a centering assembly is fixedly installed on the outer surface of the wire core. According to the wear-resistant tensile power cable and the preparation method thereof, the hemp rope is filled in the special-shaped pipe for centering and stabilizing the whole structure, the silica gel coating is filled in the special-shaped pipe, an inner layer centering structure is formed after the coating is shaped, and the cable particles easy to flow are filled between the inner side surface of the special-shaped pipe and the special-shaped pipe. The cable particles improve the overall stability of the cable, and at the same time, when the outer layer protection structure is broken by tensile force, the inner layer centering structure is not damaged by tensile force, thereby solving the problem that the tight fixed connection between the outer layer protection structure and the inner layer centering structure of the cable easily causes the overall cable to be broken by tensile force and causes serious accidents.

The present invention provides a colloidal silica in which the average secondary particle diameter of silica particles is small, and the dispersion stability of silica particles can be maintained over a long period even under strongly acidic conditions of pH 3. The present invention also provides a method for producing the colloidal silica.　The present invention provides a colloidal silica containing silica particles, wherein the colloidal silica is characterized in that: the silica particles have an average secondary particle diameter of 20 nm or less as measured by a dynamic light scattering; the zeta potential measured under conditions of pH 3 is -20 mV or less; and the surface of the silica particles is modified with a sulfonic acid group.

The present invention provides a colloidal silica having few fine particles. Also provided is a method for producing a colloidal silica.

The utility model relates to the technical field of optical glass manufacturing, in particular to a film coating device for optical glass manufacturing, which comprises a film coating box, a tool assembly is arranged in the film coating box, the tool assembly comprises a tool table, a placing groove is arranged on the top surface of the tool table, a plurality of silica gel suckers are arranged on the inner bottom surface of the placing groove, and the silica gel suckers are arranged in the placing groove. Optical glass is adsorbed and placed on the tops of the silica gel suction cups, a top cover is arranged on the top face of the tool table and located on the periphery of the containing groove, a water collecting groove is formed in the circumferential face of an inner cavity of the top cover, a fixing plate is arranged on the lower side of the tool table, and a supporting rotating sleeve is fixedly arranged on one side of the fixing plate; and a rotating shaft is vertically arranged on the end face of the supporting rotating sleeve, the rotating shaft is vertically arranged on one side of the film coating box, and a functional mechanism used for cleaning and film coating is arranged on the other side, opposite to the supporting rotating sleeve, of the fixing plate. According to the utility model, the coating cannot be deposited on the surface of the optical glass, and the uniformity of a coating film of the optical glass is improved.

Even when used for polishing a semiconductor wafer provided with a silicon nitride film, there is provided sulfonic acid-modified colloidal silica capable of forming a highly flat polished surface at high speed. Sulfonic acid-modified colloidal silica, wherein the sulfur content of the silica particles is 700 mass ppm or more and less than 3000 mass ppm per 1 g of the silica particles, the sulfur content in the solvent is 250 mass ppm or less per 1 g of the solvent, and the content of coarse particles having a particle size of 0.2 μm or more contained in the silica particles is 10,000,000 particles / mL or less when the silica particle concentration is 1 mass%.

Silica gel cloth roller coating and calendaring processing equipment comprises a silica gel roller coating device, a silica gel calendaring device, a cooling and flattening device and a silica gel cloth rolling device which are sequentially arranged, the cooling and flattening device comprises a rack and a cooling and flattening mechanism, a cooling water tank is arranged in the rack, the cooling and flattening mechanism is arranged on a horizontal mounting frame above the rack, and the silica gel cloth rolling device is arranged above the cooling water tank. The cooling and flattening mechanism comprises a positioning seat, a horizontal base plate and a cooling roller, the positioning seat is fixed on the horizontal mounting frame, the horizontal base plate is arranged below the positioning seat, the cooling roller is arranged below the horizontal base plate through a cooling roller mounting seat, a cooling water flowing channel is arranged in the cooling roller, a roller shaft of the cooling roller is provided with a water pipe connector, and the water pipe connector is connected with the water pipe connector. The water pipe connector is connected with a cold water conveying pipe, the cold water conveying pipe is respectively connected with a cooling water tank and a conveying pump to form a cooling water circulation pipeline, and the cooling water circulation pipeline is provided with the conveying pump. The device is convenient to adjust, safe, reliable and good in product quality.

The invention discloses grinding equipment for ceramic vase production and processing and a grinding process thereof, and particularly relates to the technical field of vase production grinding, the grinding equipment comprises a base, a self-adaptive grinding assembly is arranged on the base, the self-adaptive grinding assembly comprises a supporting plate arranged at the top of the base, and the middle of the supporting plate is rotationally connected with a supporting disc; and a plurality of guide pipes are inserted into the top of the supporting disc. A limiting abutting plate can abut against the outer side of a vase, meanwhile, an abutting ball limits the vase, then the vase is fixed, the phenomenon that the vase falls off when a micro motor drives a supporting table to drive the vase to rotate is avoided, the vase can be placed in a grinding cavity, and a colloidal silica body can be tightly attached to the vase through the radian of the vase easily; and the polishing efficiency and effect are ensured, the polishing agent stored in the storage box is conveyed to the position between the vase and the colloidal silica through the flow guide holes, and the polishing efficiency is improved.

The invention relates to the technical field of high-voltage busbars, and discloses a high-voltage busbar which comprises a core wire bar, a composite layer, a pressure-resistant layer and a wear-resistant layer are sequentially arranged on the outer side of the core wire bar, the composite layer is arranged on the outer side of the core wire bar in a plastic coating mode and used for improving insulation, high temperature resistance and flame retardance of the busbar, the pressure-resistant layer is fixed between the composite layer and the wear-resistant layer, and the wear-resistant layer is fixed between the composite layer and the wear-resistant layer. The core wire bar is used for improving the compression strength of the busbar and is one of a copper bar and an aluminum bar; the composite layer is made of a mixed material of ceramic silica gel and mica powder; the pressure-resistant layer is made of a PI material or a mica paper material; and the wear-resistant layer is made of a TPU material. According to the high-voltage busbar, the outer side of the core wire bar is coated with the composite layer, the pressure-resistant layer and the wear-resistant layer, so that the requirements of high voltage, insulation, pressure resistance, wear resistance and the like of the busbar are met, it is guaranteed that the busbar is safely used on a high-voltage line on an automobile, the use process is stable, the service life is long, the production process is easy to operate, the material cost and the process cost are low, and the production cost is low. And the actual busbar batch production requirement is met.

A composition is provided that includes a graphene dispersion, a silicone microemulsion, a reactive siloxane emulsion, and water as a majority by weight of the composition. A process for imparting a durable shine to a vehicle surface is also provided. The composition is applied to the vehicle surface. The water is allowed to evaporate from the composition to form a coating imparting a durable shine to the vehicle surface. A coating is obtained after evaporation. The coating includes a silicone film formed by the evaporation of water from a silicone microemulsion and the cross-linking of a siloxane from an emulsion. Graphene particles are embedded in the silicone film. The coating has a thickness of between having a thickness of between 5 and 10,000 nanometers and a hardness of between 3 and 7 GPa.

The invention relates to the technical field of silica gel belt surface coating, in particular to coating equipment for polyester film silica gel belt production, which comprises a machine body, a driving device, an unwinding roller, a winding roller, a guide roller, a compression roller, a coating roller, a storage box, a comma scraper and a driving motor, an adjusting rod arranged on an output shaft of a driving motor synchronously rotates anticlockwise, an arc-shaped plate at the upper end of the adjusting rod rotates, and the arc-shaped plate pushes the lower side of a sliding plate, so that the sliding plate slides upwards in a sliding groove, the sliding plate drives an adjusting roller to move upwards in the process, and in the upward moving process of the adjusting roller, the adjusting roller is driven to move upwards; the silica gel sheet located on the lower side of the adjusting roller synchronously moves upwards, so that the gap between the silica gel sheet and the rubber belt is enlarged, then after the gap between the comma scraper and the coating roller is enlarged, the gap between the lower side of the silica gel sheet and the rubber belt is synchronously enlarged, and the rubber belt can smooth coatings with different thicknesses; and the coating effect on the silica gel sheet is further improved.

The invention discloses a visual tactile sensing system and method based on visual-magnetic fusion, and the method comprises the steps: isolating an external light source through a surface coating, reconstructing the surface texture of a sensed object, and obtaining the texture deformation information; the texture deformation information of the surface coating is received based on a camera, image information is obtained, force measurement is carried out through mark points arranged between the surface coating and the transparent silica gel, and standard force is obtained; magnetic field intensity change information caused when the postures of the marking points change is collected through a Hall sensor; based on the image information, the standard force and the magnetic field intensity change information, force measurement of the sensed object is achieved, and a force measurement result is obtained. The method provided by the invention can measure the high-precision multi-dimensional displacement of the mark point, has faster response or frequency, and realizes the functions of high-precision force measurement, high response and proximity sense of the visual tactile sensor.

Silicone roofing materials are provided. A roofing material comprises at least one of a plurality of particles, a silicone coating, a substrate, an adhesive layer, a release liner, or any combination thereof. The substrate is located between the silicone coating and the adhesive layer. The adhesive layer is located between the substrate and the release liner. The release liner covers at least a portion of the adhesive layer. The plurality of particles covers at least a portion of a surface of the silicone coating. Each of the plurality of particles has a surface. When the roofing material is installed on a roofing substrate, at least a portion of the surface of the plurality of particles is exposed to an environment. Related systems and related methods are also provided.

A polishing liquid which reduces the occurrence of erosion and scratches on a surface to be polished of an object to be polished having a cobalt-containing film after polishing in a case where the polishing liquid is applied to CMP of the object to be polished is provided. In addition, a chemical mechanical polishing method using the above-mentioned polishing liquid is provided. The polishing liquid is a polishing liquid used for chemical mechanical polishing of an object to be polished having a cobalt-containing film. The polishing liquid includes colloidal silica, an organic acid, a specific nitrogen-containing aromatic heterocyclic compound and hydrogen peroxide, and has a pH of 8.5 to 12.

The invention discloses a silica gel film quality detection method and system based on image processing, and relates to the field of image data processing.The method comprises the steps that image combination features are extracted from silica gel film images collected in advance; screening out features related to the selected defect type from the image combination features to obtain classic features of the silica gel film; mapping the classic characteristics of the silica gel film to obtain quantum state characteristics of the silica gel film; training a quantum support vector machine according to the quantum state features of the silica gel film to obtain a silica gel film quality detection classification model; performing defect classification on a to-be-detected silica gel film image by utilizing the silica gel film quality detection classification model; and converting the defect classification result of the to-be-detected silica gel film image into an interpretable quality detection report. The classic features related to the surface defects of the silica gel film are selected, so that the classification accuracy of the model is improved, the interpretability of the model is enhanced, and a user can conveniently understand the model and judge the trust model.

To provide an aqueous ink composition capable of achieving both excellent discharge stability and storage stability over a long period of time even in an inkjet printhead having a nozzle having a stepped part having a smaller diameter toward the ink discharge direction.SOLUTION: There is provided an aqueous ink composition discharged from a nozzle having a stepped part having a smaller diameter toward the ink discharge direction, which comprises a pigment, a colloidal silica, more than 0.5 mass% of 1,2-hexanediol based on the total amount of the aqueous ink composition as a first solvent and 0.1 mass% or more and less than 4.0 mass% of an alcohol having a Hansen solubility parameter polarity term of 9 or less and a hydrogen bonding term of 17 or less based on the total amount of the aqueous ink composition as a second solvent.SELECTED DRAWING: Figure 1

The invention discloses a method for preparing a brick sculpture by using manganese slag and the prepared brick sculpture, and the method comprises the following steps: respectively fusing and uniformly stirring a first brick sculpture raw material and a second brick sculpture raw material which take cement as a base material, and then introducing the first brick sculpture raw material into a silica gel mold with a gypsum outer mold; the first brick carving raw material is added until the first brick carving raw material completely covers the carving part of the brick carving and is 1.0-2.5 cm higher than the carving part of the brick carving, then the second brick carving raw material is poured into the silica gel mold until the second brick carving raw material reaches the design position of the silica gel mold, redundant bubbles are discharged, after the first brick carving raw material and the second brick carving raw material in the silica gel mold are naturally dried, demolding is conducted, and the brick carving prepared from the manganese slag is obtained, the first brick carving raw material and the second brick carving raw material are both added with modified electrolytic manganese residues as aggregates. The invention provides a new direction for innocent treatment and resource utilization of the electrolytic manganese residues.

To provide colloidal silica in a single nano-size or a small particle size close to the single nano-size, in which its agglomeration does not substantially occur, and a method of producing the same.SOLUTION: The colloidal silica is characterized by being surface modified, having a BET diameter of not larger than 12 nm, and being not substantially agglomerated. The method of producing the colloidal silica is characterized by including a raw material preparation step of supplying easily decomposable organo-silicate to a reaction liquid including a hydrolysis catalyst consisting of an organic amine to make the organo-silicate react with the reaction liquid, to prepare raw material colloidal silica having a BET diameter of not larger than 12 mn, a concentration adjustment step of adjusting the solid content concentration of the raw material colloidal silica to not greater than 13 mass% and adjusting the concentration of the alcohol formed in the raw material preparation step to 1 to 25 mass%, a modification step of modifying the raw material colloidal silica of which concentration has been adjusted, and a concentration step of concentrating the content of residual organic solvent in the colloidal silica which has been modified, to be not greater than 1 mass%.SELECTED DRAWING: Figure 1

The invention discloses an unmanned aerial vehicle with a soft robot arm of a bionic octopus tentacle structure. The unmanned aerial vehicle comprises an unmanned aerial vehicle body, a mechanical arm installed at the bottom of the unmanned aerial vehicle body and the soft robot arm connected to the bottom of the mechanical arm. The soft robot arm is composed of a finger base and a plurality of octopus-tentacle-imitating colloidal silica bodies, and the octopus-tentacle-imitating colloidal silica bodies can be bent and deformed under air pressure driving and are used for flexibly grabbing a target object. Honeycomb-shaped micro-channels distributed in the axial direction are arranged in the silica gel body, and octopus-imitating suction cup microstructures are formed on the inner surfaces of the tentacles and comprise axial grooves and nanometer barbs which are used for enhancing friction force and grabbing stability. Pressure sensor arrays are integrated on the inner surface and the outer surface of the tentacle, contact pressure can be sensed in real time, and self-adaptive adjustment of grabbing force is achieved in combination with target form and texture information. The unmanned aerial vehicle device has the characteristics of high flexibility, high grabbing precision, high adaptive capacity and the like, and is particularly suitable for an ecological specimen collection task or agricultural product collection in a complex environment.

The present invention relates to: a slurry composition for final polishing of a silicon wafer, which reduces haze and the number of defects in the surface of an object to be polished and has excellent performance; and a final polishing method using same, the slurry composition comprising 1-20 wt % of colloidal silica as abrasive particles, 0.03-0.5 wt % of a surfactant, 0.1-10 wt % of a pH adjuster, 0.02-2 wt % of a water-soluble thickener, 0.05-0.2 wt % of a chelating agent, and 0.1-1 wt % of an organic base.

The invention relates to the technical field of electronic device packaging, in particular to a power diode packaging method which comprises the following steps: S1, pretreating silica gel into a fluid state and adjusting the dynamic viscosity value of the silica gel to a preset range; s2, adding fluid protection glue into the coating system for dispensing, and performing thinning operation and leveling operation by using a scraper to form a flexible packaging layer; s3, judging whether the flexible packaging layer has defects or not and the specific types of the defects, repairing the defects and adjusting operation parameters of a coating system to obtain a gluing assembly; s4, the gluing assembly is placed in a curing chamber to be heated and cured, and a packaged product is obtained; and S5, performing rib cutting forming on the packaged product to obtain the packaged power diode. According to the packaging method of the flexible packaging layer, the overall thickness of the power diode is controlled to be below 0.8 mm, meanwhile, mechanical stress in the plastic packaging process is avoided, and the packaging defect rate is reduced.

To provide colloidal silica with few fine particles.SOLUTION: Provided is a method for producing colloidal silica.SELECTED DRAWING: None

An aqueous based chemical mechanical polishing composition for polishing a semiconductor substrate includes an abrasive having bimodal distributed colloidal silica particles which include elongated colloidal silica particles, polyvinyl alcohol 80% hydrolyzed to less than or equal to 90% hydrolyzed, an electrolyte and a pH greater than 7, and a method of polishing the semiconductor substrate to planarize the substrate. The aqueous based chemical mechanical polishing composition and method inhibits polishing pad groove clogging during chemical mechanical polishing of the semiconductor substrates.

The invention discloses a bubble discharging device for a silica gel coating composite material, and relates to the technical field of bubble discharging of coating materials, the bubble discharging device comprises a tank body, a transparent observation window is arranged on one side of the tank body, a discharging pipe is connected to the lower portion of one side of the tank body in a penetrating mode, and an adding pipe is connected to one side of the top of the tank body in a penetrating mode; a through groove is formed in the center of the top of the tank body in a penetrating mode, the premixing tank is arranged above the tank body, two sets of supporting legs are symmetrically installed at the bottom of the premixing tank, the bottom ends of the supporting legs are fixedly connected with the tank body, and a feeding pipe is connected to the upper portion of one side of the premixing tank in a penetrating mode; according to the defoaming device for the silica gel coating material, when the silica gel coating material is defoamed, the coating material and the defoaming agent can be pre-tested, the applicability of the defoaming agent can be judged by observing whether mixing or layering is generated after the coating material and the defoaming agent are premixed, and if the defoaming agent is not applicable, the tested defoaming agent can be quickly discharged.

The present invention relates generally to methods of producing, using, and storing stable aqueously dispersed superhydrophobic compositions made from these compositions to provide superhydrophobic treatments on a range of porous, semi-porous, and non-porous target materials and surfaces as well as combinations of these materials and surfaces. More particularly, the present invention provides stably dispersed waterborne superhydrophobic compositions comprising colloidal silica or hydrophobically-modified silicon dioxide (i.e., silica) and one or more additional agents and / or compounds. When the compositions of the present invention are applied (e.g., via spray deposition, immersion, liquid application, and the like) to a suitable target material and / or surface the target is imparted with a durable (super)hydrophobic coating.

The invention discloses an anti-static silica gel protective film double-sided gluing device and a gluing process thereof, and relates to the technical field of silica gel protective film gluing, the anti-static silica gel protective film double-sided gluing device comprises a PLC control cabinet, and the rear surface of the PLC control cabinet is provided with a double-sided coating assembly and a guide assembly. When the coating device is used, the coating motor is started to drive the connecting shaft and the micro concave roller to rotate. The precision requirement of the micro concave roller is high, and glue can be accurately transferred. When the two micro-concave rollers rotate, glue can be filled into grooves in the surfaces of the micro-concave rollers, redundant glue is scraped off through the glue scraping plate, and then the glue is evenly coated on the two faces of the protective film at a time. And drying treatment is conducted through the first drying box and the second drying box, so that the anti-static glue is solidified, and finally winding is conducted through the winding mechanism. Under the action of the double-sided coating assembly, double micro-concave rollers are used for coating, and a multi-layer drying oven structure is used for coating and rolling, so that the double-sided adhesive tape coating efficiency is improved, a product is formed at one time, and the loss of a base material is reduced.

Provided are an aqueous inorganic coating agent capable of forming a coating film having excellent adhesion to a substrate, and a coating method using this aqueous inorganic coating agent. The aqueous inorganic coating agent includes alkaline colloidal silica, at least one of a sodium phosphate compound and a potassium phosphate compound, boric acid, and an inorganic abrasive.

The invention belongs to the field of PCBs (printed circuit boards), and provides a PCB material with high heat dissipation performance and a preparation method thereof.The PCB material adopts a multi-layer composite structure design and comprises a circuit board layer, a heat conduction insulating layer, a metal bottom layer, a silica gel-based heat conduction glue layer, a heat dissipation layer and heat dissipation fins, wherein the heat conduction insulating layer is a polyimide composite material in which hexagonal boron nitride nanosheets are oriented in parallel, and the heat dissipation layer is formed by coating an aluminum nitride reinforced aluminum-based composite material with a titanium nitride transition layer and is integrally die-cast with the heat dissipation fins. Through key technologies such as surface modified boron nitride nanosheet suction filtration orientation, polyamide acid dipping curing, heat dissipation assembly preparation through a coating-in-situ nitriding-die casting process and overall hot pressing assembly, the excellent heat conduction performance of the heat conduction insulating layer in the plane direction is achieved; the problems of low heat dissipation efficiency, poor device reliability and the like caused by insufficient heat-conducting property and insulating property of a traditional PCB material are solved, and the material has wide application value.

This invention proposes a micro / nano-scale imprinting FPC solder resist layer forming device, relating to the field of circuit board solder resist layer forming technology. It includes a forming base with a limiting base mounted on it. An imprinting head is positioned directly above the limiting base and driven by a servo electric cylinder. The limiting base has a groove, within which a rigid base is installed. A vacuum adsorption assembly is mounted inside the forming base, and a forming placement cavity is located inside the rigid base. From top to bottom, a PI thin film layer, a silicone layer, and a carbon fiber heating film layer are sequentially arranged at the bottom of the forming placement cavity. Micro / nano patterns are etched on the imprinting head, and a PDMS elastic layer is located at the lower end of the imprinting head. This invention, through the cooperation of the PI thin film layer, silicone layer, carbon fiber heating film layer, and microporous array, can adsorb, flatten, and preheat the FPC substrate before imprinting, fundamentally compensating for the deformation of the flexible substrate and providing a stable and flat reference plane for high-precision imprinting.

An object of the present invention is to provide an antiviral aerosol composition that has high stability and can be aerosol-applied without causing nozzle clogging or the like, the antiviral aerosol composition being capable of forming a coating film whose copper-doped silica exhibits excellent antiviral properties and which is firmly retained on the surface of an article; a coating film formed from the antiviral aerosol composition; and an article comprising the coating film. The antiviral aerosol composition of the present invention as a means for resolution comprises (1) a copper-doped silica, (2) a vinylpyrrolidone unit-containing polymer, (3) an alcohol-based solvent or a mixed solvent of an alcohol-based solvent and water, and (4) a propellant. The coating film of the present invention is formed from the antiviral aerosol composition of the present invention. The article of the present invention comprises the coating film of the present invention.

Provided is a coated article comprising a resinous base, a primer layer disposed on the resinous base, a hardcoat layer disposed on the primer layer, and an optically modified layer formed on a surface-layer portion of the hardcoat layer, wherein the primer layer is a cured coating film formed from a primer composition comprising (A) a vinyl-based (co)polymer and (B) inorganic particles having a given median diameter, the vinyl-based (co)polymer (A) including (A-1) a vinyl-based (co)polymer having an alkoxysilyl group and the primer layer having a thickness of 1-20 µm, and the hardcoat layer is a cured coating film formed from a silicone composition comprising (a) a silicone resin, (b) colloidal silica, and (c) an ultraviolet absorber, the hardcoat layer having a thickness of 1-15 µm.