Patents
Literature
Hiro is an intelligent assistant for R&D personnel, combined with Patent DNA, to facilitate innovative research.
Hiro

1777 results about "Colloidal silica" patented technology

Colloidal silicas are suspensions of fine amorphous, nonporous, and typically spherical silica particles in a liquid phase.

Composition containing carbon nanotubes having coating thereof and process for producing them

The object of the present invention is to provide a carbon nanotube composition that does not impair the characteristics of the carbon nanotubes itself, allows the carbon nanotubes to be dispersed or solubilized in a solvent, does not cause separation or aggregation of the carbon nanotubes even during long-term storage, has superior electrical conductivity, film formability and moldability, can be easily coated or covered onto a base material, and the resulting coated film has superior moisture resistance, weather resistance and hardness; a composite having a coated film composed thereof; and, their production methods. In order to achieve this object, the present invention provides a carbon nanotube composition that contains a conducting polymer (a) or heterocyclic compound trimer (i), a solvent (b) and carbon nanotubes (c), and may additionally contain a high molecular weight compound (d), a basic compound (e), a surfactant (f), a silane coupling agent (g) and colloidal silica (h) as necessary; a composite having a coated film composed of the composition; and, their production methods.
Owner:MITSUBISHI CHEM CORP

Photocatalyst-carrying structure and photocatalyst coating material

The present invention provides a photocatalyst-carrying structure which has a structure, wherein an adhesive layer is provided in between a photocatalyst layer and a substrate, the adhesive layer is composed of silicon-modified resin, polysiloxane-containing resin or colloidal silica-containing resin, and for forming the photocatalyst layer a composition comprising a metal oxide gel or a metal hydroxide gel and a photocatalyst is used. Further, the present invention also provides a photocatalyst coating agent for producing a photocatalyst-carrying structure which contains silicon compound, at least one metal oxide sol or metal hydroxide sol, and at least one photocatalyst powder or sol.
Owner:NIPPON SODA CO LTD

Methods for prevention of surface adsorption of biological materials to capillary walls in microchannels

Methods for reducing surface adsorption of biological materials to the walls of microfluidic conduits in microscale devices are provided. In an example of the methods, one or more colloidal-size particles, such as colloidal silica particles, are flowed in a fluid within the microfluidic conduit in the presence of one or more adherent biological materials (such as one or more proteins, cells, carbohydrates, nucleic acids, lipids and the like) to adsorb to the materials and prevent them from binding to the capillary walls of the microfluidic conduit. Other adsorption inhibition agents such as detergents and nonaqueous solvents can be used alone or in combination with colloidal particles to reduce surface adsorption in microfluidic conduits.
Owner:CAPLIPER LIFE SCI INC

Increased thermal conductivity monolithic zeolite structures

A monolith comprises a zeolite, a thermally conductive carbon, and a binder. The zeolite is included in the form of beads, pellets, powders and mixtures thereof. The thermally conductive carbon can be carbon nano-fibers, diamond or graphite which provide thermal conductivities in excess of about 100 W / m·K to more than 1,000 W / m·K. A method of preparing a zeolite monolith includes the steps of mixing a zeolite dispersion in an aqueous colloidal silica binder with a dispersion of carbon nano-fibers in water followed by dehydration and curing of the binder is given.
Owner:UT BATTELLE LLC

Method of making solar cell/module with porous silica antireflective coating

InactiveUS20070074757A1Improved anti-reflection (AR) coatingReduce reflectionCoatingsPhotovoltaic energy generationColloidal silicaAnti-reflective coating
A solar cell includes an improved anti-reflection (AR) coating provided on an incident glass substrate. In certain example embodiments, the AR coating includes a layer comprising porous silica. The porous nature of the silica inclusive layer permits the refractive index (n) of the silica inclusive layer to be reduced, thereby decreasing reflection and permitting more radiation to make its way to the active layer(s) of the solar cell. In certain example embodiments, a coating solution may be formed by mixing a colloidal silica solution and a polymeric silica solution, then applying the coating solution to a substrate and curing the same in order to form an AR coating.
Owner:GUARDIAN GLASS LLC

Coating composition forming wear-resistant coat and article covered with the coat

A coating composition forming a abrasion resistant coating comprising (A) an ultraviolet-curable silicone prepared by chemically modifying particulate colloidal silica with a specific silane compound, (B) a monomer mixture comprising a (meth)acrylate having a specific isocyanate skeleton and a urethane poly(meth)acrylate having an alicyclic skeleton, and (C) a photo-polymerization initiator. By using a urethane poly(meth)acrylate having an alicyclic skeleton as part of the component (B) and the component (A) having an enhanced reactivity of chemical modification, the compatibility of the component (A) with the component (B) is improved to give a cured coating with excellent wear resistance, weather resistance and durability.
Owner:MITSUBISHI RAYON CO LTD

Aqueous dispersion

The invention relates to a method of producing an aqueous dispersion comprising mixing at least one silane compound and colloidal silica particles to form silanized colloidal silica particles, mixing said silanized colloidal silica particles with an organic binder to form the dispersion. The invention also relates to a dispersion obtainable by the method, and the use thereof.
Owner:AKZO NOBEL CHEM INT BV

CMP slurry for metallic film, polishing method and method of manufacturing semiconductor device

A CMP slurry for metallic film is provided, which includes water, 0.01 to 0.3 wt %, based on a total quantity of the slurry, of polyvinylpyrrolidone having a weight average molecular weight of not less than 20,000, an oxidizing agent, a protective film-forming agent containing a first complexing agent for forming a water-insoluble complex and a second complexing agent for forming a water-soluble complex, and colloidal silica having a primary particle diameter ranging from 5 to 50 nm.
Owner:KIOXIA CORP

Composition and method for polishing a sapphire surface

An improved composition and method for polishing a sapphire surface is disclosed. The method comprises abrading a sapphire surface, such as a C-plane or R-plane surface of a sapphire wafer, with a polishing slurry comprising an abrasive amount of an inorganic abrasive material such as colloidal silica suspended in an aqueous medium having a salt compound dissolved therein. The aqueous medium has a basic pH and includes the salt compound in an amount sufficient to enhance the sapphire removal rate relative to the rate achievable under the same polishing conditions using a the same inorganic abrasive in the absence of the salt compound.
Owner:CABOT MICROELECTRONICS CORP

Glass fibers and mats having improved surface structures in gypsum boards

A gypsum board having roughened surface glass fiber reinforcement. The roughened surface of glass fiber is created by incorporating nano or micro particles of colloidal silica or clay or other inorganic particles in a silane based sizing composition. The sizing coating is partially or completely cured and incorporated in gypsum wet mix either as additions of chopped fibers or as placement of roughened surface glass fiber mats at selected locations within a cast gypsum sheet. The roughened surface of glass fiber with nano or micro particles compliantly bonded with silane polymer transfers load from gypsum to glass fibers providing improved strength and flexure resistance of gypsum boards.
Owner:JOHNS MANVILLE INT INC

Coating film for building material

A building material and a method for coating a substrate for the building material with a coating film having a variety of functions relating to an environment such as mildew resistance, deodorization, antibacterial activity and air purification in addition to the anti-staining effect by having an excellent hydrophilicity. The method for coating the substrate for a building material comprises the steps of; coating a coating material comprising a hydrophilic polymer and a photocatalyst on the substrate, and drying the coating material to form a coating film containing the photocatalyst, wherein the hydrophilic polymer is at least one selected from the group consisting of methyl silicate, liquid glass, colloidal silica, poly(meth)acrylate, and polytetrafluoroethylene graft-polymerized with sulfonic acid, and the photocatalyst is at least one selected from the group consisting of titanium oxide coated with zeolite, titanium oxide coated silica and titanium oxide coated with apatite.
Owner:NICHIHA CORP

Polishing composition and polishing method

A polishing composition includes silicon dioxide, an alkaline compound, an anionic surfactant, and water. The silicon dioxide is, for example, colloidal silica, fumed silica, or precipitated silica. The alkaline compound is, for example, potassium hydroxide, sodium hydroxide, ammonia, tetramethylammonium hydroxide, piperazine anhydride, or piperazine hexahydrate. The anionic surfactant is at least one selected from a sulfonic acid surfactant, a carboxylic acid surfactant, and a sulfuric acid ester surfactant. The polishing composition can be suitably used in applications for polishing a silicon wafer.
Owner:FUJIMI INCORPORATED
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products