146 results about "Tetramethylammonium hydroxide" patented technology

The invention relates to the technical field of fabric waterproofing agents, in particular to a polyurethane modified organic silicon fluoride-free waterproofing agent and a preparation method thereof. The polyurethane modified organic silicon fluoride-free waterproof agent is prepared from the following raw materials in parts by mass: 5 to 15 parts of hexamethylene diisocyanate, 5 to 15 parts of butyl acrylate, 1 to 5 parts of methyl methacrylate, 40 to 60 parts of octamethylcyclotetrasiloxane, 10 to 30 parts of alpha, omega-dihydroxy polydimethylsiloxane and 5 to 10 parts of gamma-aminopropyl methyl diethoxy silane. The invention relates to a silane coupling agent, which is prepared from the following raw materials in parts by weight: 1 to 5 parts of glycidyl ether oxypropyl trimethoxy silane, 0.1 to 1 part of tetramethylammonium hydroxide, 0.1 to 1 part of triethylamine, 2 to 5 parts of tetraethoxysilane, 0.2 to 0.75 part of ammonia, 0.1 to 1 part of silane coupling agent KH-570, 0.01 to 0.1 part of dibutyltin dilaurate, 1 to 5 parts of epsilon-caprolactam, 1 to 2 parts of emulsifier and 0.1 to 1 part of initiator. The fabric treated by the method has good softness and excellent hydrophobic effect.

The invention discloses an alkaline medium-coarsening micro-etching solution as well as a preparation method and a micro-etching method thereof, and relates to the technical field of printed circuit board production. The alkaline medium-coarsening micro-etching liquid is prepared from the following components in mass concentration: 5-30 g / L of ammonium chloride, 0.5-2 g / L of tetramethylammonium hydroxide, 5-15 g / L of ammonia water, 2-10% of a catalyst, 0.1-1% of a wetting agent, 0.2-2% of an accelerator, 0.3-1.5% of a stabilizer, 0.5-5% of a color difference regulator and the balance of deionized water. The invention provides an alkaline medium-coarsening micro-etching solution and a preparation method and a micro-etching method thereof, which can solve the problem of color change of a board surface after micro-etching of a circuit board and overcome the defect that a sulfuric acid hydrogen peroxide micro-etching system is easily polluted by chloride ions, and can effectively improve the problem that hydrogen peroxide is easily decomposed by replacing sulfuric acid hydrogen peroxide with an alkaline substance. And the micro-etching rate is stable.

The invention discloses a preparation method of stable spray granulation silicon nitride slurry and granulation powder, and belongs to the technical field of ceramic materials. According to the invention, absolute ethyl alcohol is adopted as a solvent, so that the problem that silicon nitride slurry is easy to hydrolyze is solved, and the temperature during spray granulation is reduced. On the basis that a dispersing agent is added into slurry, tetramethylammonium hydroxide is added into the slurry, the Zeta potential value of the slurry is increased, the slurry is made to be in an alkaline environment, dissociation of Si-OH groups is promoted, more negative charges are carried on the surface of silicon nitride, meanwhile, zwitterions released by the tetramethylammonium hydroxide form a double-electron layer around silicon nitride particles, and therefore the conductivity of the silicon nitride particles is improved. The dispersity of the particles in the slurry is improved. The silicon nitride powder is more uniformly distributed in a medium such as a binder due to the improvement of the dispersibility, and the silicon nitride slurry with low viscosity, good dispersibility, good stability and good fluidity can be prepared. The slurry can be more symmetrically gathered and formed in the spray granulation process, and the sphericity degree and apparent density of granulation powder are improved.

The invention discloses a UV photocuring adhesive, a preparation method thereof and an application of the UV photocuring adhesive in the electronic field, and relates to the field of adhesives. The preparation method comprises the following steps: when the UV photocuring adhesive is prepared, carrying out a reaction on dihydroxyl modified 9, 10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide, p-phenylene diisocyanate, polyethylene glycol and 2-ethyl-4-methylimidazole, so as to obtain imidazole-terminated isocyanate, and carrying out a reaction on the imidazole-terminated isocyanate and the 9, 10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide, so as to obtain the UV photocuring adhesive. The modified lignin, butanediamine and N, N '-methylene bisacrylamide are subjected to a reaction, and a double-bond reactant is prepared; the preparation method comprises the following steps: reacting epoxy-terminated siloxane with octamethylcyclotetrasiloxane, tetramethyltetravinyl cyclotetrasiloxane and tetramethylammonium hydroxide to obtain modified siloxane, and finally, uniformly mixing imidazole-terminated isocyanate, a double-bond reactant, modified polysiloxane and benzoin butyl ether to obtain the polyurethane adhesive. The UV light-cured adhesive prepared by the invention has good adhesive property, anti-aging property and flame retardant property.

The invention provides a method for preparing high-purity flaky alumina based on a hydrolysis method, and belongs to the field of high-purity flaky alumina powder. The method comprises the steps that metal aluminum scraps are pretreated; the method comprises the following steps: putting metal aluminum scraps, an alkaline organic matter catalyst and a morphology control agent into water, and carrying out a hydrolysis reaction at a set temperature for a set time to obtain a reaction mixed solution; carrying out solid-liquid separation, washing and drying on the reaction mixed solution to obtain flaky aluminum hydroxide; and roasting the flaky aluminum hydroxide to remove crystal water so as to obtain high-purity flaky aluminum oxide, wherein the alkaline organic matter catalyst comprises at least one of the following components: tetraethylammonium hydroxide, tetramethylammonium hydroxide, tetrapropylammonium hydroxide and tetrabutylammonium hydroxide; the morphology control agent comprises at least one of ammonium bifluoride and ammonium fluoride. The preparation method disclosed by the invention is simple in process flow, free of an impurity removal process, mild in reaction condition, short in reaction time and free of environmental pollution, and the product is regular in shape and high in purity.

The preparation method is characterized by comprising the following steps: adding D3F and D4 into a polymerization reaction kettle together for dehydration, introducing vinyl by adopting a self-made cross-linking comonomer, adding a vinyl double-end-capping agent for end capping, adding tetramethylammonium hydroxide and an accelerant DMSO (Dimethylsulfoxide), and carrying out polymerization reaction at 120 DEG C for 1-2 hours in a normal-pressure nitrogen environment, so as to obtain the high-molecular-weight fluorosilicone copolymerized raw rubber. And raising the temperature to inactivate the catalyst, and removing the low temperature to obtain the fluorosilicone copolymerized raw rubber. According to the invention, D3F and dimethyl siloxane ring body are copolymerized, so that the cost is saved, vinyl-containing trifluoropropyl siloxane ring body is prepared, vinyl can be effectively connected into the fluorosilicone polymer, the distribution uniformity of vinyl in the main chain of the fluorosilicone polymer is improved, the vulcanization performance is improved, the chain back-bite phenomenon in the polymerization process can be effectively inhibited by adding the accelerant, and the service life of the fluorosilicone polymer is prolonged. The tetramethylammonium hydroxide catalyst is adopted, so that the neutralization step is omitted, polymerization and low molecule removal by heating are carried out in one reaction kettle, the operation is simple, and production and popularization are easier.

The invention discloses a special CMP (Chemical Mechanical Polishing) solution for a silicon carbide wafer. The special CMP solution consists of the following components: 5-12% of alpha-spherical nano aluminum oxide; 1-5% of a complexing agent, preferably citric acid; 0.1%-1.0% of a composite inhibitor; 0.5-3% of an oxidizing agent which is ammonium persulfate; 0.05%-0.5% of a dispersion stabilizer; the pH regulator is tetramethylammonium hydroxide and is used for regulating the pH of the polishing solution to 8-11; and the balance of deionized water or ultrapure water. The preparation method of the polishing solution comprises the following steps: S1, adding the alpha-spherical nano aluminum oxide into polyether polyol and ultrapure water, and carrying out ultrasonic dispersion; s2, adding a complexing agent, a composite inhibitor and an oxidizing agent, and magnetically stirring; s3, adjusting the pH (Potential of Hydrogen) to 8 to 11 by using a tetramethylammonium hydroxide solution; and S4, after standing at room temperature, filtering through a filter membrane to obtain the CMP polishing solution. The silicon carbide CMP polishing solution provided by the invention combines alpha-spherical nano aluminum oxide and an ammonium persulfate / PEG 6000 / composite inhibitor synergistic system, can ensure high material removal rate and low defect density, and has excellent dispersion stability and metal residue control ability.

The invention relates to a ceramic aerogel with a multi-scale heterostructure and a preparation method thereof, and the preparation method comprises the following steps: dipping carbon fibers in a reduced graphene oxide aqueous solution, and drying to obtain a Cf / RGO composite material; the preparation method comprises the following steps: by taking methyltriethoxysilane and dimethyldimethoxysilane as silicon sources, deionized water as a hydrolytic agent and tetramethylammonium hydroxide as a catalyst, mixing to obtain siloxane gel, and drying to obtain siloxane dry aerogel; and placing the Cf / RGO stacked layer by layer on the siloxane dry aerogel, carrying out high-temperature gas phase siliconizing to obtain a SiC / C composite fiber material, and carrying out air atmosphere heat treatment to obtain the layered hollow fiber skeleton based SiC-coated SiO2 nanowire aerogel. The aerogel disclosed by the invention has the characteristics of light weight, high temperature resistance, strong mechanical property and the like, collaborative optimization of mechanical-thermal-electromagnetic properties is realized, and a new thought is provided for cross-scale design of stealth materials under a high-temperature multi-physical field coupling condition.

The invention provides a chemical composition for removing etching residues, which comprises organic ammonium, a corrosion inhibitor, an organic solvent, an inhibitor, hydroxylamine and deionized water, the organic ammonium is selected from one or more of choline hydroxide, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutyl ammonium hydroxide, tributyl methylammonium hydroxide, benzyl trimethyl ammonium hydroxide, ethyl trimethyl ammonium hydroxide, diethyl dimethyl ammonium hydroxide and tris (2-ethoxyl) methylammonium hydroxide, and the organic ammonium is selected from one or more of choline hydroxide, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutyl ammonium hydroxide, tributyl methylammonium hydroxide, benzyl trimethyl ammonium hydroxide, ethyl trimethyl ammonium hydroxide, diethyl dimethyl ammonium hydroxide and tris (2-ethoxyl) methylammonium hydroxide; the inhibitor is selected from one or more of fructose, galactose, lactose, maltose, glucose, ascorbic acid, hydroxylamine sulfate and ethanol hydrazine. Compared with the prior art, the chemical composition for removing the etching residues can effectively remove the residues after plasma etching, meanwhile, etching of AlCu, TiN / Ti and silicon oxide is avoided, an operation window is large, and the chemical composition has good application prospects in the semiconductor etching process.

The invention discloses a method for reducing by-product N-methylaniline in RT base condensation liquid. According to the method, potassium hydroxide modified activated carbon is added in condensation reaction. The potassium hydroxide modified activated carbon greatly reduces the generation of a by-product N-methylaniline in a condensation reaction, reduces the absorption of carbon dioxide in air by system materials, slows down the increase of tetramethyl carbonate, prolongs the catalytic life of tetramethyl ammonium hydroxide, saves the cost of raw materials, and has a good application prospect.

The present application provides a method for preparing a Micro-LED device. The method improves the problem of sidewall damage caused by the use of dry etching to prepare Micro-LED grain structures. It is proposed to use a combination of tetramethylammonium hydroxide chemical corrosion and sidewall passivation to repair the sidewalls, which can completely etch the amorphous area of the Micro-LED sidewalls along the longitudinal direction, and has less destructive effect on the Micro-LED structure along the transverse direction. The sidewall lattice of the sample after etching is complete and the sidewalls are vertical. After the Micro-LED grains are formed, an optical evaluation method combining laser confocal microscopy and photoluminescence spectroscopy is used to evaluate their early performance. After packaging, the electrical performance of the Micro-LED device is tested, and the electrical performance test results are compared with the early luminescence performance evaluation. The present application can effectively process the Micro-LED sidewall damage layer, verticalize the Micro-LED sidewalls, and solve the problem of inconsistent areas of the upper and lower regions of the quantum well caused by the tilt of the sidewalls after dry etching.

The invention relates to the technical field of degumming agents, and discloses a preparation process of a degumming agent for a solar photovoltaic silicon wafer. The degumming agent comprises the following components in percentage by weight: 2-8% of tetramethylammonium hydroxide, 3-6% of organic alcohol amine, 0.5-1.5% of alkyl glycoside, 0.2-0.8% of a chelating agent, 0.5-3% of a functional additive and the balance of deionized water, the chelating agent is sodium gluconate; the functional additive comprises a sodium silicate corrosion inhibitor, a thickening agent and a penetrating agent; the preparation method comprises the following steps: S1, adding trimethylamine and epoxy chloropropane into tetrahydrofuran, carrying out stirring reaction at 60-65 DEG C for 8-15 hours, and removing a solvent to obtain a cationized intermediate; s2, adding the cationized intermediate into water, adding sodium carboxymethyl cellulose, uniformly stirring, heating and pressurizing to 120-130 DEG C, stirring and reacting for 8-12 hours, and removing the solvent to obtain the modified sodium carboxymethyl cellulose.

The invention discloses a method for preparing phycomycete aerobic granular sludge, belongs to the technical field of environmental engineering, and particularly relates to a method for preparing the phycomycete aerobic granular sludge by inoculating chlorella onto a mud-water mixture and carrying out granulation treatment. In the granulation treatment, semiconductor industrial wastewater is adopted for culture, and the content of tetramethylammonium hydroxide in the semiconductor industrial wastewater is 100-300 ppm. A sludge-water mixture is from aerobic sludge in an aerobic tank of a semiconductor industrial wastewater biochemical treatment unit, the aerobic sludge and chlorella are cultured by adopting semiconductor process wastewater, phycomycete aerobic granular sludge can be separated as required, and sewage treatment can be continued.

This invention discloses a dyeing method for a PET aluminized film, which exhibits high color fastness and good steam resistance. The dyeing method for a PET aluminized film includes the following steps: Step (1), etching the PET aluminized film using tetramethylammonium hydroxide; Step (2), dyeing the PET aluminized film obtained in step (1) using an acidic medium dye; Step (3), fixing the color of the PET aluminized film obtained in step (2) using a color-fixing agent; Step (4), surface treating the PET aluminized film obtained in step (3) using a coating agent, followed by drying.

This invention relates to the field of spray system technology, and more particularly to an alkaline spray system for the production of ethyl chloroformate, comprising the following steps: S1, adding tetramethylammonium hydroxide to water, heating to room temperature, stirring until completely dissolved, adding modified sodium metasilicate, disodium ethylenediaminetetraacetate, and sodium lignosulfonate, controlling the temperature and stirring, filtering to obtain an alkaline solution; S2, turning on the power to the control system, ensuring the control system operates normally, setting the operating parameters of the spray system, starting the alkaline solution pump, drawing the alkaline solution from the storage tank, conveying it through pipelines to the spray heads, adjusting the pump's output flow rate, and starting intermittent, uniform spraying of the alkaline solution. The waste liquid after spraying flows through pipelines into a sedimentation tank for post-treatment. The alkaline spray system of this invention can significantly improve the purification efficiency of acidic gases, heavy metal ions, and organic pollutants in waste gas.

The present invention specifically relates to a method for preparing a S-rich porous zinc-based MOF flexible film. This method coordinates tetrazole with carboxyl groups and zinc ions via a hydrothermal method, using pyrazine as a template and tetramethylammonium hydroxide as a pH regulator. This yields a new S-rich porous zinc-based metal-organic framework material with special pores containing negative electrons. This material is further blended with a lithium salt and a polymer to produce a metal-organic framework composite polymer viscous liquid, which is then applied to a glass plate and allowed to stand to yield a S-rich porous zinc-based MOF flexible film. The present invention has the advantage of effectively enhancing the electrochemical and thermal stability of lithium batteries. The assembled lithium iron phosphate (LFP) battery exhibits low electrochemical impedance characteristics, with a specific capacity of 140 mAh g at a current of 0.1 C. ‑1 The capacity retention rate is close to 100%, showing excellent cycle stability and good rate performance at different current densities.

The invention relates to a [BMIM] Cl (at) MCM-41 catalyst and a method for synthesizing methyl trichlorosilane, the preparation method of the catalyst comprises the following steps: a) preparing an MCM-41 mesoporous molecular sieve by adopting a hydrothermal synthesis method, the specific method for preparing the MCM-41 mesoporous molecular sieve is as follows: taking cetyltrimethylammonium bromide (CTAB) as a template agent, taking tetraethyl orthosilicate (TEOS) as a silicon source, and adopting a hydrothermal synthesis method for preparing the MCM-41 mesoporous molecular sieve; the preparation method comprises the following steps of: mixing and stirring the MCM-41 molecular sieve serving as a raw material and tetramethylammonium hydroxide (TMAOH) serving as an alkali solution to form gel, dealcoholizing, crystallizing, washing, drying and calcining to obtain the MCM-41 mesoporous molecular sieve. The [BMIM] Cl (at) MCM-41 is used as the catalyst for synthesizing methyl trichlorosilane by a Grignard reagent method, the mesoporous structure of the MCM-41 improves the diffusion efficiency of reactants, and the structure is matched with the molecular size of the ionic liquid to form a uniformly dispersed active center and shorten the contact path of the reactants.

The invention provides a TMAH solution for removing a polycrystalline silicon layer, a preparation method and application of the TMAH solution and a back contact cell, and relates to the technical field of photovoltaic cells. The TMAH solution is prepared from the following components in parts by weight: 20 to 250 parts of tetramethylammonium hydroxide, 0.0005 to 6 parts of a main oxidant, 0.001 to 4 parts of an auxiliary oxidant, 3 to 5 parts of a main complexing agent, 2 to 3 parts of an auxiliary complexing agent, 0.001 to 0.5 part of a surfactant and 800 to 1200 parts of water. According to the invention, when the TMAH solution composed of a specific formula is used for corroding the N region, the bottom tunneling oxide layer is reserved, only the surface P-type polycrystalline silicon layer is removed, and side pits are reduced, so that side residues in subsequent procedures are reduced, side corrosion pits are reduced, subsequent residues are reduced, electric leakage is reduced, the yield is improved, and the conversion efficiency of a battery piece is improved.

The application provides a method for preparing methyl phenyl silicone oil by one-pot method, comprising: S100, carrying out hydrolysis reaction of phenyl dialkoxysilane selected from methyl phenyl dimethoxysilane and diphenyl dimethoxysilane and a chain extender selected from dimethyl cyclosiloxane and alpha, omega-dihydroxypolydimethylsiloxane in the presence of water and a first catalyst at a temperature of 40-90 DEG C, and carrying out first low boiling point removal treatment; S200, adding a second catalyst and reacting at 70-160 DEG C; S300, carrying out second low boiling point removal treatment to obtain methyl phenyl silicone oil; wherein the first catalyst and the second catalyst are each independently selected from tetramethyl ammonium hydroxide silanol salt and potassium hydroxide silanol salt; and the method further comprises: adding an end-capping agent before the hydrolysis reaction in step S100 or before adding the second catalyst in step S200.

The invention relates to the technical field of industrial solid waste resource utilization, in particular to a red mud activation method and a preparation method and application of a red mud-based cementing material. Aiming at the technical problems of low activity, serious scumming, high energy consumption and the like of the existing red mud cementing material, efficient activation of the red mud is realized through a three-stage transition activation mechanism. The cementing material is prepared by taking 80-85 parts of activated red mud powder and 15-20 parts of semi-hydrated phosphogypsum powder as main raw materials, and matching 50-60 parts of machine-made sand, 0.01-0.02 part of a water reducing agent, 2-4 parts of a composite alkali activator and 40-50 parts of water. Wherein the activated red mud powder is obtained through drying, ball milling, screening and medium-temperature thermal activation treatment at the temperature of 400-450 DEG C, and the semi-hydrated phosphogypsum powder is obtained through drying, ball milling, screening and drying treatment at the temperature of 150-200 DEG C. The composite alkali activator is composed of 50 wt% of tetramethylammonium hydroxide and 50 wt% of water glass with the modulus of 2.0. The activity of the red mud is improved from 40-50% to 90-100%, the 28-day compressive strength reaches 45-49 MPa, the scumming area is smaller than 0.1%, and an innovative solution is provided for bulk resource utilization of the red mud.

A method for treating wastewater containing methanol, in which methanol is subjected to anaerobic treatment, is characterized in that organic nitrogen having 2-4 carbon atoms (excluding amino acids) is added. The organic nitrogen is at least one of tetramethylammonium hydroxide, trimethylamine and dimethylamine.

The invention relates to the technical field of silicon wafer polishing, in particular to a high-speed and low-defect silicon medium polishing liquid which comprises grinding particles, an alkaline compound, a surface protective agent and water. The content of the grinding particles is 4-10 wt%, the content of the alkaline compound is 0.05-1.5 wt%, the content of the surface protective agent is 0.1-3 wt%, and the balance is water; the alkali compound is at least one of tetramethylammonium hydroxide, piperazine, 1-(2-aminoethyl) piperazine, 1, 4-bis (3-aminopropyl) piperazine, 1, 4-bis (2-hydroxyethyl) piperazine, 1, 8-diazabicyclo (5, 4, 0) undec-7-ene, 4-aminopiperidine, monoethanolamine, 3-amino-1-propanol, n-propylamine, isopropylamine, diglycolamine, isopropanolamine, ethylenediamine, choline hydroxide and ammonia water. By adding the organic base with a special molecular structure and adjusting the concentration ratio of the organic base to the surface protecting agent, the high removal rate can be effectively achieved under the high dilution ratio, and the good surface quality without polishing marks / fog, with few particle defects and low roughness is obtained.

The invention provides a preparation method and application of a modified EP-POSS film, and relates to the field of molecular material synthesis. Comprising the following steps: dissolving KH560 in xylene to obtain a mixed solution 1; isopropanol and a tetramethylammonium hydroxide aqueous solution are mixed and stirred, and a mixed solution 2 is obtained; dropwise adding the mixed solution 1 into the mixed solution 2, stirring, refluxing, distilling, washing, drying and grinding one by one to obtain EP-POSS white powder; the preparation method comprises the following steps: activating a base material, dropwise adding EP-POSS onto the base material, finally preparing a fluorinated silane-toluene solution, and grafting fluorinated silane onto the surface of EP-POSS through a vapor deposition method to obtain the modified EP-POSS film. The contact angle of the prepared modified EP-POSS film is far larger than that of a common EP-POSS material, and the modified EP-POSS film has excellent hydrophobicity, light transmittance and thermal stability. In addition, the invention further provides application of the modified EP-POSS film to the photovoltaic module, the output power of the photovoltaic module can be remarkably improved, and the influence of long-time sunshine and dust covering on the output power of the photovoltaic module is reduced.

The invention relates to a chemical mechanical polishing solution for removing a polyimide film. The polishing solution comprises a grinding material, organic alkali, polyethylene glycol and water, the grinding material is aluminum oxide, and the particle size of the grinding material is 200-300 nm; the organic base is tetramethylammonium hydroxide. And the polishing pad is damping cloth during polishing. The hydroxyl free radicals promote the hydrolysis reaction of the surface of the polyimide film, and meanwhile, the polyimide film is rapidly removed through the interaction of the hard aluminum oxide abrasive and the soft damping cloth polishing pad on the polyimide film. According to the method, the surface quality of the polished polyimide film is improved, meanwhile, the removal rate is high, and the polyimide film with the smooth surface is efficiently prepared.

The application discloses a preparation method of a water-based developing solution, the water-based developing solution and application thereof, and belongs to the technical field of developing solutions. The preparation method comprises the following steps: a first amount of sulfuric acid is mixed with a second amount of isopropyl alcohol to obtain an isopropyl alcohol solution; tetramethylammonium chloride is mixed with the isopropyl alcohol solution according to a first preset proportion, a third amount of sulfuric acid is added, and the precipitate is filtered and dried to obtain white crystalline solid tetramethylammonium sulfate; the solid tetramethylammonium sulfate is dissolved in water, a suspension of barium hydroxide is added to the water, the reaction mixture is filtered, a tetramethylammonium hydroxide solution is obtained and purified; and the purified tetramethylammonium hydroxide solution is mixed with water according to a second preset proportion, and stirring is performed to obtain the water-based developing solution. The application aims to provide a water-based developing solution to solve the problem that the conventional developing solution in the form of an organic solvent is inconvenient to use in a chip developing process.

The present application relates to wastewater treatment technical field, specifically to a kind of wastewater treatment equipment and process for tetramethylammonium hydroxide production, including the treatment pool with gas main in pool, the top of gas main is equipped with aerator;Aerator includes base pipe, the top of base pipe is equipped with the rectifier plate that is hollow inside and is communicated with base pipe, both board surfaces of rectifier plate are equipped with rectifier hole communicated with the cavity inside rectifier plate;The top of base pipe is also covered with the aeration membrane cover that simultaneously covers rectifier plate entirely, aeration membrane cover and base pipe form aeration chamber communicated with rectifier hole on rectifier plate, the surface of aeration membrane cover is equipped with aeration hole communicated with aeration chamber;Rectifier plate is supported up from inside aeration membrane cover aeration membrane cover, and aeration membrane cover is divided into upper aeration zone and lower aeration zone, when gas is sprayed through aeration hole at lower aeration zone, it will float up, and it will drive aeration membrane cover vibration to carry out the blockage cleaning of aeration hole, and it will move to the upper aeration zone above to carry out aeration compensation.

The invention belongs to the technical field of photovoltaic module recovery, and particularly relates to a method for recovering silver from an out-of-service photovoltaic module. The method comprises the following steps: 1) disassembling a retired photovoltaic module, removing an aluminum frame and a junction box, and cutting the retired photovoltaic module into blocks by using an angle grinder; (2) putting the assembly into a muffle furnace, calcining at 500 DEG C for 1.5-2 hours, and removing the EVA adhesive film and the back plate to obtain toughened glass, a welding strip and a battery piece; 3) performing ultrasonic cleaning on the battery piece by using deionized water, airing the battery piece, placing the battery piece in a liner of a hydrothermal kettle, adding a tetramethylammonium hydroxide aqueous solution, and performing heating reaction at 80-100 DEG C for 0.8-1.2 hours to enable the silver grid line to be stripped from the surface of a silicon wafer; and 4) separating the silver grid line from the silicon wafer, respectively washing with absolute ethyl alcohol, and drying to obtain the silver grid line and the silicon wafer. According to the method, the low-concentration tetramethylammonium hydroxide aqueous solution is adopted, the silver grid line can be stripped and the aluminum electrode can be leached at the same time through heating at a relatively low temperature, and the residual silicon wafer is relatively complete.

Wet etch formulations and techniques for selectively removing a metallic hard-mask layer and post plasma etch residue / polymer addressing both the back end and front end of the line semiconductor processing applications are disclosed. In some embodiments, titanium (Ti) or titanium nitride (TiN) hard-mask layer and post-plasma etch residue / polymer is removed. These formulations can selectively remove metallic hard-masks comprising Ti and / or TiN while exhibiting near infinite compatibility towards exposed and underlying materials such as inner layer dielectric, insulating materials, oxides, and other metals. Three key applications are disclosed: Ti / TiN hard-mask and post plasma etch residue / polymer are removed while Cu, W, or Al are exposed to the wet etch formulation. The wet etch cleaning solution comprises fluorine-based components such as ammonium fluoride and hydrofluoric acid, organic bases such as tetramethylammonium hydroxide, inorganic bases and salts such as potassium hydroxide and potassium fluoride, hydrogen peroxide, hydrogen peroxide stabilizers, and a mixture of organic corrosion inhibitors.

The application discloses a method for reducing by-product azobenzene in RT-PCR condensation liquid, and the method comprises the following steps: inputting tetramethylammonium hydroxide, aniline, nitrobenzene and polyethylene imine type activated carbon into the condensation reaction; catalyzing the condensation reaction of aniline and nitrobenzene by the tetramethylammonium hydroxide to obtain a condensation liquid; separating the polyethylene imine type activated carbon and the condensation liquid; using the polyethylene imine type activated carbon for the condensation reaction; and preparing RT-PCR by catalyzing hydrogenation of the condensation liquid. The application greatly reduces the generation of by-product azobenzene in the condensation reaction by using the polyethylene imine type activated carbon, improves the selectivity of the condensation reaction, simultaneously reduces the absorption of carbon dioxide in the air by the system material, slows down the increase of tetramethyl carbonate, prolongs the catalytic life of the tetramethylammonium hydroxide, saves the raw material cost, and has a good application prospect.

The application belongs to the technical field of water treatment, and particularly relates to a phosphorus-containing modified magnetic chitosan microsphere, a preparation method thereof and application of the phosphorus-containing modified magnetic chitosan microsphere in treatment of chromium-containing underground water. Compared with the prior art, the phosphorus-containing modified magnetic chitosan microsphere provided by the application takes magnetic nanoparticles as a core, can be quickly separated from a reaction system by relying on external magnetic force of a system, and forms hydrogen bonds through hydroxyl groups of the magnetic nanoparticles and amino groups and hydroxyl groups of a chitosan molecular chain, so that stability and dispersibility of the magnetic nanoparticles are improved. Furthermore, a tetramethylammonium hydroxide solution is used as a crosslinking agent, so that a phosphorus-containing cationic group in the tetramethylammonium hydroxide is grafted on the chitosan molecule, thereby greatly enhancing adsorption performance of the chitosan on anionic heavy metal pollutants such as Cr(VI), and having long-term stability in remediation of Cr(VI)-contaminated underground water.