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882 results about "Light absorbance" patented technology

Absorbance is a measure of the amount of light with a specified wavelength that a given material prevents from passing through it. Absorbance does not necessarily measure the amount of light that the material absorbs. For example, absorbance would also include light that is dispersed by the sample material.

Device and method for measuring square wave modulated photoelectric volume pulse wave

The invention discloses a device and a method for measuring square wave modulated photoelectric volume pulse wave. A microprocessor outputs square waves which have different frequencies and form a double ratio relationship; the square waves drive at least two light-emitting diodes; the light from the light-emitting diodes are received by a photosensitive device after passing through tested finger; the photosensitive device converts the light into a voltage signal; the voltage signal is converted into a predefined amplitude value voltage signal by a current/voltage conversion amplifier; an analogue-to-digital converter converts the predefined amplitude value voltage signal into a digital signal; the microprocessor processes the digital signal to obtain photoelectric volume pulse wave and valley value and peak value thereof, and gets spectrum value by the valley value and the peak value. The measurement method comprises the following steps of: separating the digital signal to obtain the photoelectric volume pulse wave and removing interference of background light by the microprocessor; getting the valley value and the peak value according to the photoelectric volume pulse wave; and calculating the valley value and the peak value to obtain light absorbance difference, and obtaining the spectrum value by the light absorbance difference. The accurate measurement, simple circuit and low cost are realized.
Owner:TIANJIN UNIV

Synthetic method and application of visible-light responding carbon nitride/iron sesquioxide nano composite

The invention discloses a synthetic method and application of a visible-light responding carbon nitride/iron sesquioxide nano composite, belongs to the fields of composite preparation technologies and photocatalysis and aims to solve the problems that a conventional carbon nitride material is small in specific surface area, high in photon-generated electron-hole recombination rate, low in solar energy utilization ratio and the like. The composite is prepared by taking melamine and iron nitrate as raw materials and methanol as a solvent and adopting the chemical reaction method and the heat treating process. Compared with carbon nitride, the prepared carbon nitride/iron sesquioxide nano composite has a wider light absorption range (expanded from the ultraviolet region to the visible region), greatly improves the solar energy utilization ratio, meanwhile, has a larger specific surface area, is low in photon-generated electron-hole recombination rate, and can effectively degrade Rhodamin B under visible light. The advantages that the preparation technology is simple, the raw material cost is low, mass production is available, and the obtained composite is large in specific surface area, high in solar energy utilization ratio, excellent in catalytic performance, and good in application prospect are achieved.
Owner:ZHEJIANG SCI-TECH UNIV

Manufacturing method of fingerprint acquisition optical fiber panel

The invention discloses a manufacturing method of fingerprint acquisition optical fiber panel. The method comprises the steps of: inserting a core glass rod into a sheath glass tube for combination, and drawing the combination into a single optical fiber wire; drawing stray light absorption glass into a stray light absorption wire; arranging the single optical fiber wires into a cavity of a bar die, and inserting stray light absorption wires into the single optical fiber wires so as to form a composite bar; carrying out drawing to form a composite optical fiber; arranging the composite optical fibers once again into the bar die to form a secondary composite wire bar, and carrying out drawing to form an optical fiber panel blank bar; and rising the temperature of the optical fiber panel blank bar from a room temperature to about 600 DEG C for about 6 hours, maintaining the temperature for about 6 hours, then decreasing the temperature to about 30 DEG C for about 60 hours, then carrying out cutting to form the panel, and finally carrying out forming machining and fine machining. According to the invention, the material cost is low, the arranging and melting press processes are not needed, the production technology is simplified, the machining period is shortened, a large number of melting press dies, melting press furnaces and melting press equipment are not needed, the cost is substantially lowered, and the market competition demand of a fingerprint identification system is met.
Owner:GUANGZHOU HONSUN OPTOELECTRONICS

Mask plate and manufacturing method thereof

The present invention discloses a mask plate, which comprises a mask plate body, wherein a light transmission region of the mask plate body has a light transmission film prepared from a photoresist, and light absorbance of the light transmission film is gradually increased from the center line to the direction of non-light transmission regions on both sides. According to the present invention, light absorbance of a light transmission film is gradually increased from the center line to the direction of non-light transmission regions on both sides so as to reduce a diffraction effect of the light in the light transmission region toward the direction of the non-light transmission region, the light absorbance of the light transmission film from the center line to the direction of the non-light transmission regions on both sides is a gradual change process, and light on the center region of the light transmission region diffracts toward positions on both sides of the light transmission region, such that intensity of the whole light transmission region light emitting on the photoresist on the surface of the substrate is uniform, widths of both sides of the photoresist remaining on the substrate can be well controlled during exposure development, uniformity of both side edges of the photoresist is good, burrs are less, and control accuracy of line width of the obtained structure is increased. The present invention further provides a preparation method for the mask plate.
Owner:HEFEI BOE OPTOELECTRONICS TECH +1

Large-capacity preparation flow cell with optical fiber interface

The present invention provides a large-capacity preparation flow cell with an optical fiber interface, which comprises a flow cell body, a flange connector, a plurality of adjusting rods, a quartz light column, a light column sealing gasket, a light column sealing pressure plate, a light column adjusting piece, a flat convex lens holder, a flat convex lens, a flat convex lens gasket, an optical fiber adapter, a standard optical fiber connector, an adjusting rod sealing gasket, an adjusting rod sealing pressure plate and a plurality of cell nuts. A detection area is formed between the opposite adjusting rods on the left side and the right side, and the end face of the standard optical fiber connector is arranged at the focal point of the flat convex lens, so that parallel light can be transmitted into the detection area. The present invention has the advantages that the optical path of the large-capacity preparation flow cell can be adjusted conveniently according to the difference of the concentration and light absorbance of materials to be tested, so that the detected values fall into the detection range of a detector. In addition, the flow cell can be arranged away from the detector due to the optical fiber interface, so as to facilitate explosion-proof applications.
Owner:北京清博华科技有限公司

Graphene-based ultra-black extinction coating and preparation method thereof

ActiveCN111393988AIncreased Stray Light Elimination PerformanceImproved Stray Light Elimination PerformanceRadiation-absorbing paintsEpoxy resin coatingsMicron scaleBlack paint
The invention discloses a preparation method and an implementation method of a graphene-based ultra-black extinction coating with excellent visible light absorptivity and infrared absorptivity. The problems that existing black paint is high in substrate selectivity, poor in adhesive force, poor in aging resistance, not ideal in visible-infrared light absorption effect and the like are solved. Graphene is introduced, and the types and dosages of a binder and a cross-linking agent are adjusted, so that the matrix resin shrinks to form nano-scale and micron-scale holes during cross-linking and curing, an excellent light trapping structure can be formed on the outer surface of the coating under the condition that the strength of the matrix is not influenced, the reflectivity is further reduced, and the light absorption performance of the coating is optimized. The extinction coating prepared by the method is simple in coating process, wide in substrate selectivity, high in production efficiency, good in weather resistance and excellent in adhesion properties. The absorption rate of the coating in the wavelength range of 400-2300nm is 98.0%-98.5%, and the coating is suitable for opticalcomponents, baffles, lens hoods, lens cone inner walls, darkrooms and other systems and parts needing stray light elimination.
Owner:XIAN JUNSHENG NEW MATERIAL TECH

Display device and method for manufacturing display device

The invention realtes to a display device and a manufacturing method thereof. The manufacturing method equipped with an organic electroluminescent element in which collective removal of organic layers formed on an auxiliary wiring in high precision is possible, and by this, yield improvement and productivity improvement can be achieved, and provide the display device obtained by this. The lower part electrode 4 is pattern-formed at respective pixels a on a substrate 2. An auxiliary wiring N with a constitution that is provided with a light-absorbing layer 9 composed of a conductive material having a higher light absorbance than that of the lower part electrode 4 is formed between respective pixels a. An organic layer 5 is formed in a state covering the lower part electrode on the substrate at which the lower electrode and the auxiliary wiring N have been formed. Laser beam is converted into heat at the light absorbing layer exposed to the lower part of the organic layer by irradiation of the laser beam from the organic layer side, and the organic layer part on the upper part of the light absorbing layer is selectively removed. The organic layer is made to be pinched between the lower part electrode, and on the light absorbing layer part where the organic layer has been removed, the upper part electrode 6 connected to the auxiliary wiring N is formed on the substrate.
Owner:SONY CORP
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