417results about "Non-surface-active detergent compositions" patented technology

A laundry scenting composition is provided, including water; a solid carrier; a crosslinked cellulose ether containing 0.1 to 0.6 wt %, based on weight of the crosslinked cellulose ether, of polyether groups; and a scent additive; wherein the laundry scenting composition is a solid.

The present invention relates to the use of guanidine and / or at least one guanidine salt for stabilizing aqueous products, such as cosmetics and washing and cleaning products, against microbial attack.

To provide lipase with improved wash performance, reduced odor-generation and / or improved storage stability / longer shelf life / increased thermostability.SOLUTION: The present invention relates to variants of a parent lipase which has lipase activity and comprises one or more substitutions corresponding to G23S, D27N, A40I, F51I,L, E56R, D57N, V60E,K, K98I, N101D, R118F, G163S, T231R, N233R, Y220F, T244E, and P256T using SEQ ID NO: 2 for numbering. The present invention also relates to compositions or microcapsule compositions comprising a lipase variant of the invention and to liquid products comprising a microcapsule composition of the invention as well as the use of the microcapsule composition for stabilizing lipase variants of the invention.SELECTED DRAWING: None

Novel cleaning compositions and methods for providing cleaning to industrial equipment.

A composition for selectively removing an oxide compound of Co and Cu and an etch residue in the presence of one or more of Co, Cu, W, Ru and Mo is described, use of the composition for selectively removing oxide compounds of Co and Cu and etching residues in the presence of one or more of Co, Cu, W, Ru and Mo in a method for manufacturing a semiconductor device, and a method for manufacturing a semiconductor device, the method includes the step of selectively removing an oxide compound of Co and Cu and an etch residue in the presence of one or more of Co, Cu, W, Ru, and Mo.

A cleansing wet wipe in which a base paper sheet is impregnated with a chemical liquid. The chemical liquid contains at least iodopropynyl butylcarbamate, polyamino-propyl biguanide, benzalkonium chloride, and cetylpyridinium chloride; and the content value for the iodopropynyl butylcarbamate in the chemical liquid is 0.005-0.02 mass % inclusive. The chemical liquid is adjusted to be acidic.

An object of the present invention is to provide a treatment liquid for patterning a resist film and a pattern forming method, each of which can simultaneously suppress the occurrence of pattern collapse in a resist L / S pattern and the occurrence of omission failure in a resist C / H pattern.The treatment liquid of the present invention is a treatment liquid for patterning a resist film, which is used for subjecting a resist film obtained from an actinic ray-sensitive or radiation-sensitive resin composition to at least one of development or washing, and contains an organic solvent, in which the treatment liquid contains a first organic solvent having an SP value of 16.3 MPa1 / 2 or less and a second organic solvent having an SP value of 17.1 MPa1 / 2 or more.

Biologically active cleaning element for the continuous cleaning of drain and siphon areas, characterized in that the cleaning element consists of a biodegradable polymeric carrier material and is intended for temporary placement in the drain area.

A formulation delivery system for use with an outdoor cleaning device is provided. The formulation delivery system has a composition containing chlorine, wherein the composition is in the form of a solid chemical component, and the outdoor cleaning device is a spray bar that houses the composition. The chlorine is selected from the group consisting of calcium hypochlorite, 1,3,5-triazine-2,4,6(1H,3H,5H)-trione, 1,3-dichloro-sodium salt, dihydrate (dichloroisocyanuric acid), 1,3,5-trichloro-1,3,5-triazinane-2,4,6-trione (trichloroisocyanuric acid), chloramine-T hydrate, and combinations thereof. A spray bar is also provided that has a refill cartridge for housing the composition in solid form.

The invention relates to detergent and cleaning agent, in particular liquid detergent and cleaning agent, particularly preferably liquid textile detergent, comprising: a) at least one protease, preferably in an amount of 0.0001 to 1 wt.% in relation to the total weight of the detergent and cleaning agent; b) at least one peptide (peptidic inhibitor), preferably with a 0.5, 1.0, 1.5, 2.0, 2.5, 3.0, 3.5, 4.0, 4.5, 5.0, 10, 15, 18, 20, 25, 27 or 30 times molar excess in relation to the molarity of the protease used, particularly preferably a 15, 18, 20, 25 or 27 times molar excess, wherein the peptide preferably has a length from 50 to 200, particularly preferably 55 to 190, further preferably 60 to 180 of amino acid residues; and c) at least one detergent and cleaning agent constituent, preferably in an amount of 0.01 to 99.9 wt.% in relation to the total weight of the detergent and cleaning agent. The invention likewise relates to the corresponding washing and cleaning methods, the use of the agent described herein, and the use of a peptidic inhibitor for improving the stability of a protease in detergent or cleaning agent.

The present invention provides a hexafluoropropene dimer-containing composition as a novel mixture. Disclosed is a composition which contains hexafluoropropene dimers represented by C6F12, wherein: at least one of the hexafluoropropene dimers represented by C6F12 is a compound represented by formula (I); and the abundance ratio E / (E + Z) of the E-form among the E-form and the Z-form of the compound is more than 0.5.

Provided is an alkaline cleaning agent that does not tend to affect screen plates, and permitting easy removal of electroconductive paste adhered to the screen plate. One embodiment relates to a cleaning agent composition for electroconductive paste, the cleaning agent composition containing a compound (component (A)) represented by formula (1) and an aliphatic alcohol (component (B)) having 2-6 (inclusive) carbon atoms and a molecular weight of 40-120 (inclusive). The pH of the cleaning agent composition is 11.0 or more and less than 14.0. Relative to the total mass of the cleaning agent composition, the content of the component (A) is 0.1-5 mass% (inclusive) and the content of the component (B) is 5-40 mass% (inclusive).         R1-O-(C2H4O)a-H ...     Formula (1) (In formula (1), R1 represents a C6-18 branched alkyl group and a, which is the average number of added mol of C2H4O groups, is a number 2-10 (inclusive).)

This application provides azeotropic and near-azeotropic compositions of Z-1,1,1,4,4,4-hexafluorobut-2-ene (Z-HFO-1336mzz) and a second component selected from the group consisting of n-butane and isobutane. The inventive compositions are useful as aerosol propellants, refrigerants, cleaning agents, expansion agents for thermoplastic and thermoset foams, solvents, heat transfer media, power cycle working fluids, polymerization media, particulate removal fluids, carrier fluids, buffing abrasive agents, and displacement drying agents.

To find a formulation for a liquid detergent containing a protease that can improve storage stability of the protease and has appearance stability.SOLUTION: The liquid detergent composition of the present invention comprises (A) a protease and (B) dihydroxyethylglycine or a salt thereof.SELECTED DRAWING: None

Provided is a lipase mutant with alleviated inhibition of activity against a dispersed substrate in the presence of a surfactant. The lipase mutant consists of an amino acid sequence having an identity of at least 75% with the amino acid sequence of SEQ ID NO: 2, 4, 6, or 8 and has a predetermined amino acid residue at a predetermined position numbered according to SEQ ID NO: 2.

This disclosure provides a method for preparing sulfidated alkylphenol salt products to achieve a high sulfidation ratio of sulfidated alkylphenol salt to unsulfidated alkylphenol salt / phenol in the context of neutralization and optional over-alkaliening additives. The sulfidated alkylphenol salt products are obtained by sulfidating alkylphenols with a sulfur chloride blend comprising about 40% to about 75% by weight of sulfur dichloride.

The presently claimed invention relates to a process for preparing a UV filter concentrate which is liquid. The UV filter concentrate comprises at least one oil soluble organic UV filter UV1 which is liquid at room temperature, and at least two different oil soluble organic UV filters UV2 and UV3 which are crystalline at room temperature. The UV filter concentrate is processed into a sunscreen composition or cosmetic composition or homecare composition.

An object of the present invention is to provide a photoresist stripping composition which exhibits high stripping performance even for a cured resist, prevents corrosion of substrate-forming metals, such as Cu and Al, that come in contact with a liquid, and can prevent excessive oxidation of a metal such as Cu during a stripping process. The object was achieved by a photoresist stripping composition, the composition containing a quaternary ammonium hydroxide (A), diethylene glycol monoethyl ether (B), glycerin (C), and water (D), wherein a content of (A) is 0.5 to 5 mass % with respect to a total mass of the composition, a content of (B) is 50 to 95 mass % with respect to the total mass of the composition, a content of (C) is 0.5 to 20 mass % with respect to the total mass of the composition, and a content of (D) is less than 20 mass % with respect to the total mass of the composition.

The present invention relates to an engine combustion chamber cleaning fluid composition and a cleaning method using the same, and more particularly, the engine combustion chamber cleaning fluid composition of the present invention has excellent storage stability and can effectively remove carbon deposition foreign matter inside an engine cylinder. According to the engine combustion chamber cleaning method, cleaning is carried out under the condition that the engine is not decomposed, and carbon deposition foreign matter in an engine air cylinder can be effectively removed.

Provided is a mutant protease having improved cleaning performance against protein stains in a high-concentration detergent liquid. A mutant protease consisting of the amino acid sequence of SEQ ID NO: 1 or an amino acid sequence having an identity of at least 90% with SEQ ID NO: 1 and comprising at least one selected from the group consisting of the following amino acid residues (a) to (g): (a) Arg or Lys at a position corresponding to position 191 of SEQ ID NO: 1; (b) Arg or Lys at a position corresponding to position 17 of SEQ ID NO: 1; (c) Ala or Phe at a position corresponding to position 141 of SEQ ID NO: 1; (d) Arg or Lys at a position corresponding to position 243 of SEQ ID NO: 1; (e) Arg or Lys at a position corresponding to position 300 of SEQ ID NO: 1; (f) Arg or Lys at a position corresponding to position 302 of SEQ ID NO: 1; and (g) Arg or Lys at a position corresponding to position 311 of SEQ ID NO: 1.

A means capable of sufficiently removing residues remaining on the surface of a polished object is to be provided. The present invention relates to a surface treatment composition, containing a component (A) and a component (B) and having pH of 8.0 or more:component (A): a polymer having a constituent unit having a quaternary nitrogen-containing onium salt or a constituent unit of a structure (X) below,component (B): a buffer represented by a formula: R—COO—NH4+.

A laundry detergent composition containing a graft copolymer and a hydrophobic benefit agent.

There are provided a processing solution containing an alkali compound, water, and a corrosion inhibitor, in which the amount of dissolved oxygen one week after the preparation of the processing solution is 0.2 mg / L or more and 1.5 mg / L or less, and the corrosion inhibitor is at least one selected from the group consisting of N,N-diethylhydroxylamine, 1-thioglycerol, 1-amino-4-methylpiperazine, carbohydrazide, methylethylketoxime, erythorbic acid, and salts thereof, a method for manufacturing the processing solution, and a method for processing a substrate and a method for manufacturing a semiconductor device using the processing solution.

A composition may be or include detergents, cleaning agents, and cosmetic agents and include an emulsifier and biodegradable microcapsules. The biodegradable microcapsules may include a core material and a shell where the shell consists of at least one barrier layer and a stability layer. The barrier layer may surround the core material. The stability layer may include at least one biopolymer and be arranged on the outer surface of the barrier layer(s).

Provided are: a method for producing a semiconductor substrate using a cleaning fluid excellent in terms of the property of cleaning peripheral portions of substrates and waste-liquid stability; a method for forming a resist underlayer film; and the cleaning fluid. This method for producing a semiconductor substrate comprises: a step in which a composition for resist underlayer film formation is applied directly or indirectly to a substrate; a step in which peripheral portions of the substrate are cleaned with a cleaning fluid; and a step in which after the cleaning step, a resist pattern is formed directly on or indirectly over the resist underlayer film formed in the application step. The composition for resist underlayer film formation includes a metal compound and a solvent, and the cleaning fluid includes an organic acid.

This invention relates to the field of semiconductor process chamber cleaning technology, specifically to a semiconductor process chamber cleaning gas composition based on HFO-1447fz, a remote plasma cleaning method, and a closed-loop control method. The main cleaning gas is HFO-1447fz (CAS134190-34-8), accounting for 30% to 70% of the total molar fraction of the composition; the co-gas is selected from one or two of CF3I and C2F5I, accounting for 5% to 25% of the total molar fraction of the composition; the auxiliary regulating gas is selected from one or more of He, Ne, and Kr, accounting for 15% to 55% of the total molar fraction of the composition; the content of fluorine-containing unsaturated impurity compounds containing C=C or C≡C bonds in the cleaning gas composition is ≤0.08 mol. This invention uses HFO-1447fz as the main cleaning gas, combined with CF3I, C2F5I synergistic gases and rare gases for auxiliary regulation, to form a highly efficient cleaning system. The special molecular structure of HFO-1447fz can generate highly active fluorine radicals after plasma activation, which, together with the catalytic effect of iodine radicals, improves the removal rate of silicon-based dielectric deposits.

This disclosure describes a composition which can provide real-time feedback during medical device cleaning or reprocessing. The composition can be used to monitor the amount of biological material cleaned from medical devices and to determine when cleaning is complete. The disclosure also relates to a method of cleaning, or assessing the cleanliness of, a medical device such as an endoscope. Cleanliness can be assessed by contacting the medical device with the composition, shining an excitation light on the composition, and measuring intensity of resulting fluorescence over time.

The present invention comprises methods and compositions comprising a microalgae consortium. A composition comprises at least one genera of microalgae flocculated by Paenibacillus polymyxa strain, Strain 2, deposited under the Budapest Treaty as ATCC Accession No. PTA-12841. Methods of treating the soil comprise adding a composition of the present invention to soil.

A method for decontaminating fouled equipment including deposits includes (a) introducing a water-containing cleaning stream comprising a carrier fluid and a solvent into the equipment. In addition, the method includes (b) introducing a stream comprising nitrogen into the equipment after (a).