263results about "Non-surface-active detergent compositions" patented technology

The present invention relates to the use of guanidine and / or at least one guanidine salt for stabilizing aqueous products, such as cosmetics and washing and cleaning products, against microbial attack.

A cleansing wet wipe in which a base paper sheet is impregnated with a chemical liquid. The chemical liquid contains at least iodopropynyl butylcarbamate, polyamino-propyl biguanide, benzalkonium chloride, and cetylpyridinium chloride; and the content value for the iodopropynyl butylcarbamate in the chemical liquid is 0.005-0.02 mass % inclusive. The chemical liquid is adjusted to be acidic.

Biologically active cleaning element for the continuous cleaning of drain and siphon areas, characterized in that the cleaning element consists of a biodegradable polymeric carrier material and is intended for temporary placement in the drain area.

The present invention provides a hexafluoropropene dimer-containing composition as a novel mixture. Disclosed is a composition which contains hexafluoropropene dimers represented by C6F12, wherein: at least one of the hexafluoropropene dimers represented by C6F12 is a compound represented by formula (I); and the abundance ratio E / (E + Z) of the E-form among the E-form and the Z-form of the compound is more than 0.5.

This application provides azeotropic and near-azeotropic compositions of Z-1,1,1,4,4,4-hexafluorobut-2-ene (Z-HFO-1336mzz) and a second component selected from the group consisting of n-butane and isobutane. The inventive compositions are useful as aerosol propellants, refrigerants, cleaning agents, expansion agents for thermoplastic and thermoset foams, solvents, heat transfer media, power cycle working fluids, polymerization media, particulate removal fluids, carrier fluids, buffing abrasive agents, and displacement drying agents.

To find a formulation for a liquid detergent containing a protease that can improve storage stability of the protease and has appearance stability.SOLUTION: The liquid detergent composition of the present invention comprises (A) a protease and (B) dihydroxyethylglycine or a salt thereof.SELECTED DRAWING: None

Provided is a lipase mutant with alleviated inhibition of activity against a dispersed substrate in the presence of a surfactant. The lipase mutant consists of an amino acid sequence having an identity of at least 75% with the amino acid sequence of SEQ ID NO: 2, 4, 6, or 8 and has a predetermined amino acid residue at a predetermined position numbered according to SEQ ID NO: 2.

This disclosure provides a method for preparing sulfidated alkylphenol salt products to achieve a high sulfidation ratio of sulfidated alkylphenol salt to unsulfidated alkylphenol salt / phenol in the context of neutralization and optional over-alkaliening additives. The sulfidated alkylphenol salt products are obtained by sulfidating alkylphenols with a sulfur chloride blend comprising about 40% to about 75% by weight of sulfur dichloride.

The presently claimed invention relates to a process for preparing a UV filter concentrate which is liquid. The UV filter concentrate comprises at least one oil soluble organic UV filter UV1 which is liquid at room temperature, and at least two different oil soluble organic UV filters UV2 and UV3 which are crystalline at room temperature. The UV filter concentrate is processed into a sunscreen composition or cosmetic composition or homecare composition.

The present invention relates to an engine combustion chamber cleaning fluid composition and a cleaning method using the same, and more particularly, the engine combustion chamber cleaning fluid composition of the present invention has excellent storage stability and can effectively remove carbon deposition foreign matter inside an engine cylinder. According to the engine combustion chamber cleaning method, cleaning is carried out under the condition that the engine is not decomposed, and carbon deposition foreign matter in an engine air cylinder can be effectively removed.

A means capable of sufficiently removing residues remaining on the surface of a polished object is to be provided. The present invention relates to a surface treatment composition, containing a component (A) and a component (B) and having pH of 8.0 or more:component (A): a polymer having a constituent unit having a quaternary nitrogen-containing onium salt or a constituent unit of a structure (X) below,component (B): a buffer represented by a formula: R—COO—NH4+.

A laundry detergent composition containing a graft copolymer and a hydrophobic benefit agent.

There are provided a processing solution containing an alkali compound, water, and a corrosion inhibitor, in which the amount of dissolved oxygen one week after the preparation of the processing solution is 0.2 mg / L or more and 1.5 mg / L or less, and the corrosion inhibitor is at least one selected from the group consisting of N,N-diethylhydroxylamine, 1-thioglycerol, 1-amino-4-methylpiperazine, carbohydrazide, methylethylketoxime, erythorbic acid, and salts thereof, a method for manufacturing the processing solution, and a method for processing a substrate and a method for manufacturing a semiconductor device using the processing solution.

A composition may be or include detergents, cleaning agents, and cosmetic agents and include an emulsifier and biodegradable microcapsules. The biodegradable microcapsules may include a core material and a shell where the shell consists of at least one barrier layer and a stability layer. The barrier layer may surround the core material. The stability layer may include at least one biopolymer and be arranged on the outer surface of the barrier layer(s).

Provided are: a method for producing a semiconductor substrate using a cleaning fluid excellent in terms of the property of cleaning peripheral portions of substrates and waste-liquid stability; a method for forming a resist underlayer film; and the cleaning fluid. This method for producing a semiconductor substrate comprises: a step in which a composition for resist underlayer film formation is applied directly or indirectly to a substrate; a step in which peripheral portions of the substrate are cleaned with a cleaning fluid; and a step in which after the cleaning step, a resist pattern is formed directly on or indirectly over the resist underlayer film formed in the application step. The composition for resist underlayer film formation includes a metal compound and a solvent, and the cleaning fluid includes an organic acid.

This invention relates to the field of semiconductor process chamber cleaning technology, specifically to a semiconductor process chamber cleaning gas composition based on HFO-1447fz, a remote plasma cleaning method, and a closed-loop control method. The main cleaning gas is HFO-1447fz (CAS134190-34-8), accounting for 30% to 70% of the total molar fraction of the composition; the co-gas is selected from one or two of CF3I and C2F5I, accounting for 5% to 25% of the total molar fraction of the composition; the auxiliary regulating gas is selected from one or more of He, Ne, and Kr, accounting for 15% to 55% of the total molar fraction of the composition; the content of fluorine-containing unsaturated impurity compounds containing C=C or C≡C bonds in the cleaning gas composition is ≤0.08 mol. This invention uses HFO-1447fz as the main cleaning gas, combined with CF3I, C2F5I synergistic gases and rare gases for auxiliary regulation, to form a highly efficient cleaning system. The special molecular structure of HFO-1447fz can generate highly active fluorine radicals after plasma activation, which, together with the catalytic effect of iodine radicals, improves the removal rate of silicon-based dielectric deposits.

This disclosure describes a composition which can provide real-time feedback during medical device cleaning or reprocessing. The composition can be used to monitor the amount of biological material cleaned from medical devices and to determine when cleaning is complete. The disclosure also relates to a method of cleaning, or assessing the cleanliness of, a medical device such as an endoscope. Cleanliness can be assessed by contacting the medical device with the composition, shining an excitation light on the composition, and measuring intensity of resulting fluorescence over time.

A method for decontaminating fouled equipment including deposits includes (a) introducing a water-containing cleaning stream comprising a carrier fluid and a solvent into the equipment. In addition, the method includes (b) introducing a stream comprising nitrogen into the equipment after (a).

The presently claimed invention relates to an alkaline composition for cleaning a substrate comprising i) copper or copper alloy and ii) cobalt or cobalt alloy, the composition comprising: a) at least one pH adjustor selected from diglycolamine, 4,4-diethoxy-N,N-dimethyl-1-butanamine, 3-dimethylaminopropan-1-ol, dimethylaminoethoxyethanol, N,N-dimethylisopropanolamine, ethylethanolamine, N-methyldiethanolamine, 2-(2-(methylamino)ethoxy)ethanol, 3-(methylamino)propane-1,2-diol, 2-[2-[2-(2-methoxy- ethoxy)ethoxy]ethoxy]ethylamine, 2-[2-(2-aminoethoxy)-ethoxy]-ethanol, N-butyldiethanolamine, diisopropanolamine, N-methyldiisopropanolamine, monoethanolamine, 3-dimethylamino-1,2-propandiol, 2- amino-1-butanol, 2-(2-(2-(2-aminoethoxy)ethoxy)ethoxy)ethanol, prolinol, 1-methyl-2-pyrrolidinemethanol, 1-methyl-2-pyrrolidinemethanol, 1-methyl-3-pyrrolidinol, 2-amino-2-methyl-1-propanol, N,N-dimethylethanolamine, butylethanolamine, diethylethanolamine, 3-methoxypropylamine, 4-(2-hydroxyethyl)morpholine, 4-(dimethylamino)cyclohexanol, 2-amino-2-methyl-1, 3-propanediol, or diisopropylamine; b) at least one complexing agent selected from C2 to C12 hydrocarbon having at least two sulfonic acid or carboxylic acid groups; c) at least one polymeric dispersing agent having a weight average molecular weight ≥ 1000 g / mol; and d) a solvent comprising water.

Role of a cleaning textile for cleaning printing cylinders of a printing system, wherein the cleaning textile is impregnated with a cleaning agent composition, the cleaning agent composition comprising an organic solvent and a cellulose solubilizer, wherein the organic solvent is a propylene glycol oligomer, which is di(propylene glycol)propyl ether, and wherein the roller (12) is inserted into a removable sealing bag (15) which is designed to seal the roller (12) of cleaning textile (13) in order to prevent the cleaning agent composition from evaporating before use, wherein the sealing bag (15) is tubular and is made of a multilayer plastic film.

To provide a composition that exerts little effect on resin materials when in contact and exhibits superior solubility for lubricating oils.SOLUTION: The composition of the present invention comprises 1-chloro-2,3,3-trifluoropropene and 1-(trifluoromethyl)-2,2,2-trifluoroethyl methyl ether, wherein the content of 1-chloro-2,3,3-trifluoropropene is 40-80 mass% based on the total mass of 1-chloro-2,3,3-trifluoropropene and 1-(trifluoromethyl)-2,2,2-trifluoroethyl methyl ether.SELECTED DRAWING: None

The present invention relates to a method (100) for cleaning a generator (200) of a wind turbine (1), wherein the wind turbine (1) comprises a tower (12), a nacelle (207) rotatably mounted to the tower (12), a wind turbine rotor (217) with at least one rotor blade, the wind turbine rotor (217) being rotatably mounted to the nacelle (207) around an essentially horizontal rotational axis (218), and an electric generator (200) drivable by the rotor (217), wherein the generator (200) comprises a fixed housing (203) and a rotating housing (215), a generator rotor (213) having magnetic elements (214), a stator (201) having windings (202), and a cooling device (211) attached to an opening (204) of the fixed housing (203). The method comprises the steps: locking (101) the wind turbine rotor (217), shutting off (103) the generator (200); removing the cooling device (211) such that the opening (204) is accessible for maintenance purposes; inserting (105) a cleaning agent into the opening (204) such that the cleaning agent gets at least partially in effective contact with a winding (202) and / or with a magnetic element (214); at least partially removing (107) the cleaning agent from the generator (200); mounting the cooling device (211) to the opening (204); and releasing (109) the wind turbine rotor (217), wherein the cleaning agent is or comprises a grease remover, and wherein the grease remover is a non-waters-soluble and is a fluid liquid such that the generator (200) of the wind turbine can be partially flushed with the grease remover, has a density larger than 0.6 g / cm3 and lower than 0.85 g / cm3, has kinematic viscosity larger than 1.3 mm2 / s and lower than 2.5 mm2 / s, and comprises N-Paraffins and hydrocarbons.

To provide a method for cleaning less in influence to a copper-based piping and high in removal effect of slime dirt and soft dirt, in aqueous piping cleaning including a copper-based piping.SOLUTION: A method for cleaning piping in water systems, including copper-based piping, using a cleaning agent containing azole compounds and hydrogen peroxide, wherein the hydrogen peroxide concentration in the water system is set to 0.3% or higher. This allows for high cleaning performance while minimizing the corrosive impact on copper-based materials such as pipes and heat exchangers. Furthermore, by applying a film treatment to the inner surfaces of the piping with azole compounds before cleaning, the corrosion protection effect can be further enhanced.SELECTED DRAWING: None

Suggested is a fragrance composition comprising or consisting of (a) neral; (b) geranial; (c) decanal; (d) dodecanal; (e) citronellal; and optionally (f) at least one solvent particularly as replacement for orange oil.

Proposed is a perfume composition comprising or consisting of (a) nerolaldehyde; (b) geranial; (c) capraldehyde; (d) dodecanal; (e) citronellal; and optionally (f) at least one solvent, in particular as an orange oil substitute.

The invention relates to washing and cleaning agents, in particular, liquid washing and cleaning agents, and particularly preferably liquid textile washing agents, comprising a) at least one protease, preferably in an amount of 0.0001 to 1 wt. %, relative to the total weight of the washing and cleaning agent, b) at least one peptide (peptidic inhibitor), preferably in a 0.5-, 1.0-, 1.5-, 2.0-, 2.5-, 3.0-, 3.5-, 4.0-, 4.5-, 5.0-, 10-, 15-, 18-, 20-, 25-, 27-, or 30-fold molar excess relative to the molarity of the protease used, preferably in a 15-, 18-, 20-, 25-, or 27-fold molar excess, the peptide preferably having a length of 50 to 200, preferably 55 to 190, and more preferably 60 to 180, amino acid functional groups, and c) at least one washing and cleaning agent ingredient, preferably in an amount of 0.01 to 99.9 wt. %, relative to the total weight of the washing and cleaning agent. Also included in the invention are the corresponding washing and cleaning processes, the use of the agents described herein, and the use of a peptidic inhibitor to improve the stability of a protease in washing or cleaning agents.

Described herein is the use of a composition comprising one or more organic nitrogen compounds for cleaning the surface of a semiconductor substrate, wherein said surface comprises a binary metallic material comprising nickel and aluminium, and a respective composition. Moreover, described is herein a process for the manufacture of a semiconductor device involving said composition comprising one or more organic nitrogen compounds.

The present invention relates to a cleaning solution composition for an engine combustion chamber and a cleaning method using the same, and more specifically, the cleaning solution composition for an engine combustion chamber according to the present invention has excellent storage stability and can effectively remove carbon deposits fixed inside a cylinder of an engine, and the cleaning method for an engine combustion chamber according to the present invention does not disassemble an engine and can effectively remove carbon deposits fixed inside a cylinder of an engine by performing cleaning.

It is an object of the invention to provide a treatment liquid that, when used as a developer or a rinsing liquid for a metal resist film, exhibits a high ability to suppress the occurrence of pattern defects and also exhibits a high pattern resolution. The treatment liquid of the invention is a treatment liquid containing propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether, and acetic acid. The content of propylene glycol monomethyl ether acetate is 60% by mass or more based on the total mass of the treatment liquid, and the content of propylene glycol monomethyl ether is 0.00010 to 0.1% by mass based on the total mass of the treatment liquid. The content of acetic acid is 1.0% by mass or more and less than 40.0% by mass based on the total mass of the treatment liquid.