The presently claimed invention relates to an alkaline composition for cleaning a substrate comprising i)
copper or
copper alloy and ii)
cobalt or
cobalt alloy, the composition comprising: a) at least one pH adjustor selected from diglycolamine, 4,4-diethoxy-N,N-dimethyl-1-butanamine, 3-dimethylaminopropan-1-ol, dimethylaminoethoxyethanol, N,N-dimethylisopropanolamine, ethylethanolamine, N-methyldiethanolamine, 2-(2-(methylamino)ethoxy)
ethanol, 3-(methylamino)
propane-1,2-
diol, 2-[2-[2-(2-methoxy- ethoxy)ethoxy]ethoxy]
ethylamine, 2-[2-(2-aminoethoxy)-ethoxy]-
ethanol, N-butyldiethanolamine,
diisopropanolamine, N-methyldiisopropanolamine, monoethanolamine, 3-dimethylamino-1,2-propandiol, 2- amino-1-
butanol, 2-(2-(2-(2-aminoethoxy)ethoxy)ethoxy)
ethanol,
prolinol, 1-methyl-2-pyrrolidinemethanol, 1-methyl-2-pyrrolidinemethanol, 1-methyl-3-pyrrolidinol, 2-amino-2-methyl-1-
propanol, N,N-
dimethylethanolamine, butylethanolamine,
diethylethanolamine, 3-methoxypropylamine, 4-(2-hydroxyethyl)
morpholine, 4-(dimethylamino)
cyclohexanol, 2-amino-2-methyl-1, 3-
propanediol, or
diisopropylamine; b) at least one complexing agent selected from C2 to C12
hydrocarbon having at least two
sulfonic acid or
carboxylic acid groups; c) at least one polymeric dispersing agent having a weight average molecular weight ≥ 1000 g / mol; and d) a
solvent comprising water.