170 results about "Onium" patented technology

To provide an onium salt for use in a chemically amplified resist composition, featuring superior solvent solubility, high sensitivity, high contrast, and superior lithographic performance such as exposure tolerance and line width roughness in photolithography with high energy rays, chemically amplified resist composition including the onium salt as a photoacid generator, and a patterning method using the chemically amplified resist composition.SOLUTION: The present invention provides an onium salt represented by the formula (1).SELECTED DRAWING: None

The invention relates to the technical field of nuclear waste treatment, in particular to a cucurbituril-based supramolecular organic framework material as well as a preparation method and application thereof. A construction unit of the supramolecular organic framework material is constructed by taking cucurbit [8] uril (CB8) as a subject and terephthalyl viologen ligand 1, 1 ''-(1, 4-phenylene) bis ([4, 4 '-bipyridyl]-1-onium) salt (PBV. 2X) as an object through the bonding effect of the subject and the object; in the molecular structure of the supramolecular organic framework material, the construction units are staggered and stacked in parallel in the space, and NO3 <-> is located at the gap of the adjacent CB8. The supramolecular organic framework material disclosed by the invention has high structural stability and cationic framework characteristics, and a rigid framework and a pyridine conjugated system of CB8 endow the material with excellent chemical / irradiation stability, so that the material shows ultrahigh removal rate on ReO4 <-> / TcO4 <-> in extreme environments (strong acid, strong alkali and high irradiation).

To provide a chemically amplified negative resist composition having improved resolution in pattern formation and giving a resist pattern with good LER and pattern fidelity, and to provide a method for forming a resist pattern.SOLUTION: (A) a photoacid generator comprising an anion having the formula (A1) and a cation having a specific structure, and (B) a base polymer comprising a recurring unit having a specific structure with a phenolic hydroxyl group on a side chain.SELECTED DRAWING: None

To provide an onium salt used in a chemically amplified resist composition.SOLUTION: The onium salt comprises an anion represented by the following formula (1A) and a cation represented by the following formula (1B).SELECTED DRAWING: None

An onium salt consisting of a sulfonic acid anion having an aromatic sulfonic acid structure substituted with an aromatic ring-containing hydrocarbyl group and a triarylsulfonium cation containing iodine and fluorine generates an acid with limited diffusion. A chemically amplified positive resist composition comprising the onium salt as an acid generator and a polymer adapted to be decomposed under the action of acid to increase its solubility in alkaline developer is processed by lithography to form a pattern of rectangular profile.

An onium salt consisting of a sulfonic acid anion having an aromatic sulfonic acid structure substituted with an aromatic ring-containing hydrocarbyl group and a triarylsulfonium cation containing iodine and fluorine generates an acid having a moderate acidity and limited diffusion. A chemically amplified negative resist composition comprising the onium salt as an acid generator and a polymer is processed by lithography to form a pattern with reduced LER or a dot pattern of rectangular profile.

To provide an onium salt for use in a chemically amplified resist composition that exhibits high solvent solubility, high sensitivity, and high contrast in photolithography using high-energy radiation, while also offering superior lithography properties such as exposure latitude (EL) and line width roughness (LWR); a chemically amplified resist composition comprising the onium salt as a photoacid generator; and a pattern forming process using the chemically amplified resist composition.SOLUTION: The present invention provides an onium salt represented by formula (1).SELECTED DRAWING: None

To provide an onium salt used for a chemically amplified resist composition excellent in solvent solubility, having high sensitivity and high contrast, and excellent in lithography performance such as LWR, CDU, MEF, EL and DOF in photolithography using high energy rays, a chemically amplified resist composition containing the onium salt, and a pattern forming method using the chemically amplified resist composition.SOLUTION: An onium salt having the formula (1): SELECTED DRAWING: None

The invention relates to an onium salt, a chemically amplified resist composition and a pattern forming method. The present invention addresses the problem of providing: a photolithographic film which has excellent solvent solubility, high sensitivity, and excellent photolithographic properties in optical lithography using high-energy rays; the present invention relates to an onium salt for use in a chemically amplified resist composition which has excellent photolithographic properties such as LWR, CDU, MEF, EL, and DOF, while having a high contrast, a chemically amplified resist composition containing the onium salt, and a method for forming a pattern using the chemically amplified resist composition. The onium salt is represented by the following formula (1).

To provide an onium salt used for a chemically amplified resist composition excellent in solvent solubility, having high sensitivity and high contrast and excellent in lithography performance such as LWR, CDU, MEF, EL and DOF in photolithography using high energy rays, a chemically amplified resist composition containing the onium salt as a photoacid generator, and a pattern forming method using the chemically amplified resist composition.SOLUTION: An onium salt having the formula (1): SELECTED DRAWING: None

The present invention provides an onium salt capable of generating an acid with moderate acid strength and low diffusion, a chemically amplified positive-type resist composition containing the same, and a method for forming a resist pattern using the resist composition. [Solution] An onium salt represented by the following formula (A). TIFF2026090779000330.tif29102

This invention provides an antistatic agent that complies with PFAS regulations, exhibiting excellent resin compatibility and exhibiting sufficient antistatic performance with only a small amount of additive. [Solution] An antistatic agent comprising one or more onium salts selected from formulas (1) and (2). TIFF2026058576000010.tif23169 TIFF2026058576000011.tif25168 (In the formula, R1 to R4 are alkyl groups that may be the same or different, X represents an alkyl chain or a heteroatom-containing alkyl chain, and Y is a bisfluorosulfonyliimide or bisoxalatoborate anion.)

A resist composition in which a polymer compound having a constitutional unit derived from a compound represented by General Formula (a0-m) is used as a base resin. In the formula, W represents a polymerizable group-containing group; RAr1 and RAr2 represent an aromatic group; R01 and R02 represent an iodinated alkyl group, an iodine atom, or a hydrogen atom; L11 to L15 represent a linking group; q represents 0 or 1; when q represents 0, R02 represents an iodinated alkyl group or an iodine atom, and j2 represents an integer of 1 to 5; when q represents 1, the number of iodine atoms in R01 and R02 is 1 or more; and k1 and k2 represent 0 or 1; when q represents 0, k2 represents 1; when q represents 1, k1+k2 is 1; and Mm+ represents an m-valent onium cation.

The invention relates to an onium salt, a chemically amplified resist composition and a resist pattern forming method. The present invention provides an onium salt represented by formula (A).

This radiation-sensitive composition comprises: a polymer (A) which contains a structural unit having an acid-dissociable group; and a first onium salt represented by formula (1), and satisfies at least one among a first requirement and a second requirement, wherein at least one selected from the group consisting of a structural unit derived from a radiation-sensitive onium salt in the polymer (A) contained in said composition, the first onium salt, and a second onium salt contains an iodonium cation. X1 is a carboxy group or –COO-. c among a X1s in the formula are –COO-. R2 is a substituent different from a carboxy group and –COO-. First requirement: The polymer (A) further contains a structural unit derived from a radiation-sensitive onium salt. Second requirement: The second onium salt, which is a non-polymer and is a radiation-sensitive onium salt different from the first onium salt, is further contained.

Provided are: a radiation-sensitive composition that can exhibit sensitivity, LWR, and a process window at sufficient levels, during formation of a resist pattern; a pattern forming method; an onium salt compound; and a polymer. The radiation-sensitive composition comprises: a polymer containing a structural unit (I) derived from an onium salt compound represented by formula (1); and a solvent. (In the formula, W is a cyclic structure configured together with two carbon atoms. The bond between carbon atoms, represented by the formula below, represents a single bond or a double bond.　A is a group represented by any of formula (A-1) to formula (A-7). (In the formulae, RA1 and RA2 are each a monovalent organic group having 1-20 carbon atoms). R1 is a monovalent organic group having 1-20 carbon atoms, a cyano group, a nitro group, a carboxy group, a hydroxy group, an amino group, a halogen atom, or a thiol group. Z+ is a monovalent radiation-sensitive onium cation. However, RA1, RA2, R1 or Z+ contains a polymerizable group).

The purpose of the present invention is to provide: a radiation-sensitive composition which is capable of forming a resist film that can exhibit sensitivity, LWR, DOF, EL, PED, CDU, and pattern circularity at a sufficient level; and a pattern forming method. Another purpose of the present invention is to provide a radiation-sensitive acid generator that can be applied to the radiation-sensitive composition. The radiation-sensitive composition contains a solvent (E) and a polymer (A) containing a structural unit (I) having an acid-dissociable group, and at least the radiation-sensitive composition contains a radiation-sensitive acid generator (B) containing a partial structure represented by formula (a), or the polymer (A) contains a structural unit (VII) containing a partial structure represented by formula (a). (In formula (a), R1 represents a hydrogen atom, a nitro group, a hydroxyl group, a cyano group, a carboxyl group, a thiol group, or a monovalent fluorine-free organic group; under the condition that a plurality of R1 exist, the plurality of R1 are the same or different; r2 and R3 are each independently a hydrogen atom, a nitro group, a hydroxyl group, a cyano group, a carboxyl group, a thiol group, a halogen atom, or a monovalent organic group, or a C3-20 divalent alicyclic group in which R2 and R3 are bonded to each other and together with a carbon atom to which R2 and R3 are bonded; when a plurality of R2 and R3 are present, the plurality of R2 and R3 are the same or different; l is-C (= O) O-,-C (= O) NR5-or-OC (= O) O-; R5 is a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms; a bond on the R41 side; r41 is a divalent organic group having a cyclic structure and having a heteroatom; m is an integer of 1-5; n is an integer of 0-4; the bond is a bond with the other part in the corresponding polymer (A) or radiation-sensitive acid generator (B); and M + represents a monovalent onium cation).

The invention provides a radiation-sensitive composition and a pattern forming method. The radiation-sensitive composition can fully exert sensitivity or pattern rectangularity, pattern circularity, exposure latitude, focal depth, development defect inhibition, LWR and CDU when forming a resist pattern, and has good storage stability. A radiation-sensitive composition comprising: an onium salt compound represented by formula (1); a polymer; and a solvent. (In formula (1), Rf represents a halogen atom or a cyano group. And n represents an integer of 0-4. When n is 2 or more, the plurality of Rf are the same as or different from each other. R1 represents a monovalent organic group having 1-20 carbon atoms, a hydrogen atom, a halogen atom, a cyano group, or an alkyl fluoride group, said monovalent organic group being bonded to the carbon atom to which R1 is bonded via-COO-,-OCO-,-SO2-,-S-,-CO-,-O-CO-O-,-CONR '-, or-NR' CO-. R'each independently represents a hydrogen atom or a monovalent hydrocarbon group having 1-10 carbon atoms; and R1 represents a carbon atom to which R1 is bonded. In the formula, when n is 0, R1 is a halogen atom or a cyano group. And R2 is a hydroxyl group, a nitro group, an amino group, a carboxyl group or a monovalent organic group with 1-20 carbon atoms. And m represents an integer of 0-4. When m is 2 or more, the plurality of R2 may be the same as or different from each other. And n + m represents an integer of 0-4. Ar is a monovalent organic group having an aromatic ring having a ring member number of 5-40. And X is methylene,-O-,-CO-or-SO2-. Wherein, when X is a methylene group, the aromatic ring of Ar is directly bonded to S + in the formula, and R1 does not include a polymerizable group. And each of R41, R42, R43, R44, R45 and R48 independently represents a hydrogen atom, a hydroxyl group, a halogen atom or a monovalent organic group having 1-20 carbon atoms. And R46 and R47 each independently represent a hydrogen atom, a hydroxyl group, a halogen atom, or a monovalent organic group having 1-20 carbon atoms, or each represents a ring structure having 3-10 ring members in which R46 and R47 are bonded to each other and are configured together with the two carbon atoms to which these are bonded.) (In the formula, R46 and R47 each independently represent a hydrogen atom, a hydroxyl group, a halogen atom, or a monovalent organic group having 1-20 carbon atoms.

The invention relates to an onium salt, a photoacid generator, a chemically amplified resist composition and a pattern forming method. The present invention is an onium salt represented by general formula (A). Thereby, provided is an onium salt used in a chemically amplified resist composition having excellent lithography performance such as high sensitivity, CDU, MEEF, and LWR in optical lithography using high-energy rays. In the formula, m1 is an integer of 1-4. And m2 is 1 or 2. R1 represents an electron-withdrawing group such as a hydrogen atom, a hydrocarbon group, or a cyano group; lA and LB each represents a single bond, a carbonyl group, an ether bond, an ester bond, an amide bond, a sulfonate bond, a sulfonamide bond, a carbonate bond, a urethane bond, or a hydrocarbylene group. W1 is a hydrocarbylene group containing an alicyclic structure, and a carbon atom forming the alicyclic structure has two atomic bonds. And W2 is a hydrocarbon group containing an alicyclic structure. Z + is an onium cation.

The invention discloses a preparation method and application of a polysulfide compound Poly (S-[VIM-Br]) / ATP (adenosine triphosphate). The preparation method comprises the following steps: by taking industrial by-products sulfur (S8) and 1-vinyl-3-brominated imidazole onium salt (VIM-Br) as raw materials, synthesizing a multi-sulfur polymer through an anti-sulfuration reaction, and then carrying out ball-milling compounding on the multi-sulfur polymer and acidified attapulgite (ATP). The compound shows high-selectivity adsorption on precious metal Au (III) / Ag (I), the adsorption rates on Ag (I) and Au (III) in complex systems such as gold ore waste residues and waste water are as high as 99% and 93% or above, and the adsorption rate on Au (III) is kept at 76.02% after three times of circulation. The cost is reduced by using cheap raw materials and a room-temperature process; aTP modification significantly improves selectivity and stability in a complex environment; the adsorption process is accompanied by precious metal reduction (Au (III)-Au (0)), and resource recovery is facilitated.

Provided are: an actinic ray-sensitive or radiation-sensitive resin composition containing a resin in which the polarity increases by the action of an acid, and an onium salt having a specific structure; a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern formation method using the actinic ray-sensitive or radiation-sensitive resin composition; and an electronic device manufacturing method.

To provide a chemically amplified positive resist composition containing an onium salt capable of generating an acid with small diffusion, and to provide a resist pattern forming method using the resist composition.SOLUTION: A chemically amplified positive resist composition comprising (A) a photoacid generator comprising an anion having the formula (A1) and a cation having a specific structure, and (B) a base polymer comprising a polymer comprising a recurring unit having a phenolic hydroxyl group on a side chain and adapted to be decomposed under the action of acid to increase its solubility in alkaline developer.SELECTED DRAWING: None

This invention provides a chemically amplified resist composition that exhibits excellent LWR and resolution in far-ultraviolet lithography and EUV lithography, and can suppress resist pattern deformation, an onium salt used therein, and a pattern formation method using the resist composition. [Solution] An onium salt represented by the following formula (1). TIFF2026062943000253.tif35136

The present invention provides: a radiation-sensitive composition which is capable of exhibiting sensitivity, CDU, overexposure CDU, and underexposure CDU at levels equal to or higher than conventional levels when forming a pattern; and a pattern forming method. This radiation-sensitive composition contains a first polymer and a solvent, wherein the first polymer comprises a structural unit (I) that has an acid dissociable group, a structural unit (II) that has an organic acid anion and an onium cation and comprises an acid-generating structure which generates an acid upon exposure to light, and a partial structure (a) that is represented by formula (a). (In formula (a), Z represents a hydrogen atom, a halogen atom, a nitro group, or a monovalent organic group having 1-20 carbon atoms, and * is an atomic bond with another structure of the polymer.)

A radiation-sensitive composition contains: (A) a polymer including a structural unit (U) represented by the following formula (1); and (B) a radiation-sensitive acid-generator formed of an onium cation having at least one group Rf1 selected from the group consisting of a fluoroalkyl group and a fluoro group (excepting a fluoro group in the fluoroalkyl group) and an organic anion having an iodine atom. In formula (1), R1 represents a hydrogen atom, a methyl group, or the like. X1 represents a single bond, an ether bond, an ester bond, or the like. Ar1 represents a cyclic group bound to X1 via an aromatic ring. A hydroxy group or group —ORY is bound to an atom adjacent to the atom bound to X1, among the atoms forming the aromatic group in Ar1. RY represents an acid-releasable group.

Provided are: an actinic ray-sensitive or radiation-sensitive resin composition containing a resin in which the polarity increases by the action of an acid, and an onium salt having a specific structure; a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern formation method using the actinic ray-sensitive or radiation-sensitive resin composition; and an electronic device manufacturing method.

The invention relates to an onium salt, a chemically amplified resist composition and a pattern forming method. The present invention addresses the problem of providing: an onium salt which is used in a chemically amplified resist composition that, in optical lithography using high-energy rays, has high sensitivity regardless of the positive type or the negative type, has excellent resolution, improves lithography performance such as EL, LWR, CDU, and DOF, and is capable of suppressing collapse of a resist pattern; a chemically amplified resist composition; and a pattern forming method. The onium salt is represented by the following formula (1). In the formula, Xq-is an anion. However, an acid (XqH) having Xq-as the conjugated base has a boiling point of less than 165 DEG C and a molecular weight of 150 or less.

The present invention aims to provide a dispersion liquid comprising fine fibrous cellulose dispersed in an organic solvent, which has high thixotropy. [Solution] The present invention relates to a dispersion containing fibrous cellulose with a fiber width of 1000 nm or less and an organic solvent, wherein the fibrous cellulose has anionic groups, the content of anionic groups is 0.50 mmol / g or more, the fibrous cellulose has an organo-onium ion as a counterion to the anionic groups, and the B-type viscosity measured by measurement method (A) is 50 Pa·s or more.

The invention belongs to the technical field of fluorescent probes, and particularly relates to a preparation method and property research of a dual-response fluorescent probe for detecting polarity and peroxynitrite. The preparation method of the fluorescent probe is simple, the product yield is high, and the fluorescent probe is suitable for large-scale popularization and application. The present invention relates to a method for preparing a probe (Z)-4-(1-cyano-2-(6-(4-(diphenylamino) phenyl)-4-phenyl-4H-dithieno [3, 2-b: 2 ', 3'-d] pyrrol-2-yl) vinyl)-1-(4-(4, 4, 5, 5-tetramethyl-1, 3, 2-dioxaborolan-2-yl) benzyl) pyridine-1-onium bromide (DTBP). When excitation is carried out at 600 nanometers, the fluorescence intensity is gradually enhanced along with the reduction of the polarity of the solution; in a solvent of PBS and acetone in equal proportion, when excitation is carried out at 470 nanometers, the probe reacts with ONOO to generate strong fluorescence. Along with the increase of the ONOO concentration, the fluorescence intensity is gradually enhanced. The probe can specifically detect ONOO, and has a good linear relationship. The probe also has relatively strong fluorescence response to polarity, and the fluorescence emission intensity is gradually increased along with the reduction of the polarity.

An onium-salt-type monomer is represented by the formula (a), where “n1” is 0 or 1, “n2” is 1 to 4, “n3” is 0 to 2, “n4” is 0 or 1, “n5” is 0 to 4, and “n6” is 0 to 2; RA is a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group; RAL is an acid-labile group; R1 is a halogen atom, a nitro group, a cyano group; R2 is a halogen atom other than a fluorine atom, a nitro group, a cyano group; RF is a fluorine atom, a fluorinated saturated hydrocarbyl group, a fluorinated saturated hydrocarbyloxy group, or a fluorinated saturated hydrocarbylthio group having 1 to 6 carbon atoms; LA and LB are each a single bond, an ester bond; XL is a single bond or a hydrocarbylene group; and Z+ is an onium cation.