527 results about "Onium" patented technology

Intercalated layered materials prepared by reacting the layered material with a coupling agent and co-intercalating an onium ion and an oligomer or polymer between the planar layers of a swellable layered material, such as a phyllosilicate, preferably a smectite clay. The spacing of adjacent layers of the layered materials is expanded at least about 3 Å, preferably at least about 5 Å, usually preferably to a d-spacing of about 15-20 Å, e.g., 18 Å with the onium ion spacing/compatibilizing agent. The intercalation of the oligomer or polymer then increases the spacing of adjacent layers an additional at least 3 Å, e.g., to at least about 20 Å, preferably about 25 Å to about 30 Å, generally about 28 Å, and provides a nanocomposite having increased tensile strength, flexibility, and ductility (less brittle).

There is disclosed a resist composition that remarkably improves the resolution of photolithography using a high energy beam such as ArF excimer laser light as a light source, and exhibits excellent resistance to surface roughness and side lobe under use of a halftone phase shift mask; and a patterning process using the resist composition. The positive resist composition at least comprises (A) a resin component comprising a repeating unit represented by the following general formula (1); (B) a photoacid generator generating sulfonic acid represented by the following general formula (2) upon exposure to a high energy beam; and (C) an onium salt where a cation is sulfonium represented by the following general formula (3), or ammonium represented by the following general formula (4); and an anion is represented by any one of the following general formulae (5) to (7).

Sulfonate salts have the formula: CF₃—CH(OCOR)—CF₂SO₃⁻M⁺ wherein R is C₁-C₂₀ alkyl or C₆-C₁₄ aryl, and M⁺ is a lithium, sodium, potassium, ammonium or tetramethylammonium ion. Onium salts, oximesulfonates and sulfonyloxyimides and other compounds derived from these sulfonate salts are effective photoacid generators in chemically amplified resist compositions.

The present invention is directed to a powdered coating composition which includes a carboxyl terminated polyester, epoxy compounds and an onium catalyst or beta-hydroxyalkylamide which provide coatings with outstanding properties when cured at low temperature.

Sulfonate salts have the formula: R¹COOCH₂CH₂CF₂CF₂SO₃⁻M⁺ wherein R¹ is alkyl, aryl or hetero-aryl, M⁺ is a Li, Na, K, ammonium or tetramethylammonium ion. Onium salts, oxime sulfonates and sulfonyloxyimides derived from these salts are effective photoacid generators in chemically amplified resist compositions.

The invention concerns novel ionic compounds with low melting point whereof the onium type cation having at least a heteroatom such as N, O, S or P bearing the positive charge and whereof the anion includes, wholly or partially, at least an ion imidide such as (FX¹O)N⁻(OX²F) wherein X¹ and X² are identical or different and comprise SO or PF, and their use as solvent in electrochemical devices. Said composition comprises a salt wherein the anionic charge is delocalised, and can be used, inter alia, as electrolyte.

An electronic circuit device comprising at least one substrate having a photoimageable covercoat, comprising at least 95 weight percent of at least one epoxy-modified aromatic vinyl-conjugated diene block copolymer and a catalyst comprising an onium salt selected from a triarylsulfonium salt and a diaryliodonium salt, wherein the covercoat is formed by solvent coating or extrusion and then heat laminated onto at least a portion of the substrate.

A compound represented by the following formula (1) is provided:

wherein R₁ represents a hydrogen atom, a trifluoromethyl group, an alkyl group, or an alkoxy group; and A represents a group represented by the following formula (2) or formula (3):

wherein R₂, R₃, R₄, R₅ and R₆ each independently represent a substituted or unsubstituted alkyl group, a substituted or unsubstituted allyl group, a substituted or unsubstituted perfluoroalkyl group, a substituted or unsubstituted benzyl group, or a substituted or unsubstituted aryl group; and two or more of R₂, R₃ and R₄ may be linked to each other to form a saturated or unsaturated carbon ring or a saturated or unsaturated heterocyclic ring.

The chemically amplified resist composition comprising a polymer compound which is produced from the compound of formula 1 according to the present invention provides a chemically amplified resist sensitive to far-ultraviolet radiation, which is represented by KrF excimer laser or ArF excimer laser.

The present application relates to a compound of formula A-X-B, where (i) A-X-B form an ionic compound Ai Xi Bi where Ai and Bi are each individually an organic onium cation; and Xi is anion of the formula Q-R₅₀₀—SO₃⁻ or (ii) A-X-B form a non-ionic compound Ac-Xc-Bc, where Ai, Bi, Q, R₅₀₀, Ac, Bc, and Xc are defined herein. The compounds are useful as photoactive materials.

Methods of isolating nucleic acids from samples of cellular material are disclosed which use solid phase binding materials and which avoid the use of a lysis solution. The use of the solid phase binding materials unexpectedly allow the nucleic acid content of cells to be freed and captured directly and in one step. The new methods represent a significant simplification over existing methods. Preferred solid phase materials for use with the methods and compositions of the invention comprise a quaternary onium nucleic acid binding portion.

An onium salt compound having a cation moiety of the following formula (1) is disclosed.

wherein A represents I or S, m is 1 or 2, n is 0 or 1, x is 1-10, and Ar1 and Ar2 are (substituted) aromatic hydrocarbon group, and P represents —O—SO₂R, —O—S(O)R, or —SO₂R, wherein R represents a hydrogen atom, a (substituted) alkyl group, or a (substituted) alicyclic hydrocarbon group. The onium salt compound is suitable as a photoacid generator for photoresists of a positive-tone radiation-sensitive resin composition. The positive-tone radiation-sensitive resin composition containing this compound is useful as a chemically-amplified photoresist exhibiting high resolution at high sensitivity, responsive to various radiations, and having outstanding storage stability.

A negative-working photosensitive composition comprises (a) an alkali-soluble resin, (b) a compound which causes a crosslinking reaction by an acid, (c) a compound which generates an acid by heating, and (d) a photothermal converting agent, wherein the compound (c) which generates an acid by heating described above is an onium salt of an acidic dye having a sulfonic group in a molecule. A negative-working photosensitive planographic printing plate is provided with a photosensitive layer comprising the negative-working photosensitive composition, on a surface of a support.

A lithographic printing plate precursor is disclosed, comprising a support having provided thereon a photosensitive layer containing at least (A) an infrared ray absorbing agent, (B) an onium salt, (C) a radically polymerizable compound, (D) a binder polymer and (E) an organic dye or the precursor thereof capable of undergoing change in color tone upon exposure.

The present invention relates to a cyan dye mixture, an ink composition containing the mixture and a method of ink-jet recording with the ink composition. The print obtained by the method is characterized by discoloring or fading little even when allowed to stand in a well ventilated shade or in an ozone gas. The cyan dye mixture comprises compounds which are obtained by chlorosulfonating, as a starting material, copper phthalocyanine or a sulfonated copper phthalocyanine and then aminating the chlorosulfonation product with an aminating agent used in an amount of at least 2.5 mol per mol of the starting material, and which are represented by the following formula (1):

wherein M represents a proton, alkali metal ion, alkaline earth metal ion, onium ion of an organic amine, or ammonium ion; m is an integer of 1 to 4; and n is an integer of 0 to 3; provided that m+n is an integer of 1 to 4.

Fluorine-free photoacid generators and photoresist compositions containing fluorine-free photoacid generators are enabled as alternatives to PFOS/PFAS photoacid generator-containing photoresists. The photoacid generators are characterized by the presence of a fluorine-free aromatic sulfonate anionic component having one or more electron withdrawing groups. The photoacid generators preferably contain a fluorine-free onium cationic component, more preferably a sulfonium cationic component. The photoresist compositions preferably contain an acid sensitive imaging polymer having a lactone functionality. The compositions are especially useful for forming material patterns using 193 nm (ArF) imaging radiation.

Imidazolium salts are the immediate precursors to N-heterocyclic carbenes (NHC) yet a simple, general synthetic route to a wide variety of imidazolium salts is not yet available. Such a straightforward route is described for two specific members of this family of ligand precursor: 1,3-Bis(2,4,6-trimethylphenyl)imidazolium chloride (IMes.HCl) and 1,3-Bis(2,6-diispropylphenyl)imidazolium chloride (IPr.HCl). The procedure appears general and similar protocols can be used to isolate various imidazolium salts.

A resin that includes a repeating unit shown by the following formula (10) has an excellent performance as a radiation sensitive acid generator, and exhibits only a small adverse effect on the environment and a human body.

wherein R¹ represents a hydrogen atom or the like, M⁺ represents a specific cation, and n is an integer from 1 to 5.

The present invention provides an initiator system including an infrared-absorbing compound that exhibits an electronic transition band in the near-infrared region, an initiator, and a metallocene compound. Upon exposure to infrared radiation, the initiator system is capable of producing radicals sufficient to initiate a photopolymerization reaction. Suitable infrared-absorbing compounds include indocyanine dyes, for example. Trihalomethyl triazine compounds and onium compounds are suitable initiators. Suitable metallocene compounds include ferrocenes and titanocenes. The present invention also provides an infrared-sensitive composition including an ethylenically unsaturated polymerizable component, an infrared-absorbing compound that exhibits an electronic transition band in the near-infrared region, an initiator, and a metallocene compound. The infrared-sensitive composition provides improved photospeed and sensitivity in some embodiments. A printing plate precursor including an infrared-sensitive coating is also provided. The printing plate precursor exhibits enhanced shelf life in some embodiments. A method of making a printing plate precursor and a method for making a printable lithographic printing plate are further provided by the invention.

A thermoplastic resin composition comprising: (A) 100 parts by weight of a noncrystalline thermoplastic resin component (component A); (B) 0.1 to 50 parts by weight of a layered silicate (component B) which satisfies the following (i) to (iii): (i) it has a cation exchange capacity of 50 to 200 milliequivalents/100 g, and at least 40% of the cation exchange capacity being exchanged with an organic onium ion, (ii) 60% or more of the layered silicate particles have a thickness of 100 nm or less in the resin composition, and (iii) the interlayer spacing of the layered silicate (component B) in the resin composition is smaller than the interlayer spacing of the layered silicate alone by 0.5 nm or more; and (C) 0 to 50 parts by weight of a compound (component C) having affinity for the noncrystalline thermoplastic resin component as the component A and a hydrophilic component; and molded articles thereof. According to the present invention, a noncrystalline thermoplastic resin composition having excellent stiffness, surface appearance and heat stability, especially a polycarbonate resin composition and molded articles thereof are obtained.

Solid phase materials for binding nucleic acids and methods of their use are disclosed. The materials feature a cleavable linker portion which can be cleaved to release bound nucleic acids. The solid phase materials comprise a solid support portion comprising a matrix selected from silica, glass, insoluble synthetic polymers, and insoluble polysaccharides to which is attached a nucleic acid binding portion for attracting and binding nucleic acids, the nucleic acid binding portion (NAB) being linked by a cleavable linker portion to the solid support portion. Preferred nucleic acid binding portions comprise a ternary or quaternary onium group. The materials can be in the form of microparticles, fibers, beads, membranes, test tubes or microwells and can further comprise a magnetic core portion. Methods of binding nucleic acids using the cleavable solid supports are disclosed as are their use in methods of isolating or purifying nucleic acids.

There is provided a resist underlayer film forming composition for lithography for forming a resist underlayer film capable of being used as a hard mask or a bottom anti-reflective coating, or a resist underlayer film causing no intermixing with a resist and having a dry etching rate higher than that of the resist. A film forming composition comprising a silane compound having an onium group, wherein the silane compound having an onium group is a hydrolyzable organosilane having, in a molecule thereof, an onium group, a hydrolysis product thereof, or a hydrolysis-condensation product thereof. The composition uses as a resist underlayer film forming composition for lithography. A composition comprising a silane compound having an onium group, and a silane compound having no onium group, wherein the silane compound having an onium group exists in the whole silane compound at a ratio of less than 1% by mol, for example 0.01 to 0.95% by mol. The hydrolyzable organosilane may be a compound of Formula: R¹_aR²_bSi(R³)_4-(a+b). A resist underlayer film obtained by applying the composition as claimed in any one of claims 1 to 14 onto a semiconductor substrate and by baking the composition.