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14 results about "Onium" patented technology

An onium (plural: onia) is a bound state of a particle and its antiparticle. They are usually named by adding the suffix -onium to the name of the constituting particle except for muonium which, despite its name, is not a bound muon–antimuon onium, but an electron–antimuon bound state, and whose name was assigned by IUPAC. A muon–antimuon onium is called true muonium.

Onium salt, chemically amplified positive-type resist composition, and method for forming a resist pattern

The present invention provides an onium salt capable of generating an acid with moderate acid strength and low diffusion, a chemically amplified positive-type resist composition containing the same, and a method for forming a resist pattern using the resist composition. [Solution] An onium salt represented by the following formula (A). TIFF2026090779000330.tif29102
Owner:SHIN ETSU CHEMICAL CO LTD

Dispersion

The present invention aims to provide a dispersion liquid comprising fine fibrous cellulose dispersed in an organic solvent, which has high thixotropy. [Solution] The present invention relates to a dispersion containing fibrous cellulose with a fiber width of 1000 nm or less and an organic solvent, wherein the fibrous cellulose has anionic groups, the content of anionic groups is 0.50 mmol / g or more, the fibrous cellulose has an organo-onium ion as a counterion to the anionic groups, and the B-type viscosity measured by measurement method (A) is 50 Pa·s or more.
Owner:OJI HLDG CORP

Radiation-sensitive composition, resist pattern forming method, radiation-sensitive acid generator, and compound

Provided is a radiation-sensitive composition which comprises a polymer (P) including a structural unit having an acid-dissociable group, and which satisfies at least one of a first requirement and a second requirement. First requirement: The radiation-sensitive composition further contains a compound represented by formula (1). Second requirement: The polymer (P) further includes a structural unit derived from an onium salt compound represented by formula (1). In formula (1), RA represents a halogen atom, -NO2, -OH, -SH, -COOH, or a group represented by formula (i). RB represents -CN, a hydrogen atom, a halogen atom, -NO2, -OH, -SH, -COOH, or a group represented by formula (i). Z+ represents a radiation-sensitive onium cation.
Owner:JSR CORPORATION

Antistatic agent and adhesive composition

PendingCN122459426APolymer scienceOnium
The present invention provides an antistatic agent comprising an onium salt represented by formula (1), an adhesive composition containing the antistatic agent, and an antistatic resin, which have excellent resin compatibility and antistatic properties. (In the formula, R1 represents a hydrocarbon group having 1 to 4 carbons, which represents either of a linear and branched chain. R2 represents a hydrocarbon group having 6 to 12 carbons, which represents either of a linear and branched chain.)
Owner:THE JAPAN CARLIT CO LTD

Actinic ray–sensitive or radiation-sensitive resin composition, resist film, pattern formation method, and electronic device manufacturing method

PCT designated stageWO2026150773A1Actinic RaysOnium
Provided are: an actinic ray-sensitive or radiation-sensitive resin composition containing an onium salt compound (I) that includes an organic anion and a cation having a specific structure, an onium salt compound (II) that includes an onium cation and an anion having a specific structure, an acid-decomposable resin, and a solvent; and a resist film, a pattern formation method, and an electronic device manufacturing method that use the actinic ray-sensitive or radiation-sensitive resin composition.
Owner:FUJIFILM CORP

Onium salt, chemically amplified positive resist composition, and resist pattern forming method

PendingCN122071451AOrganic chemistryPhotomechanical exposure apparatusAcid strengthOnium
The invention relates to an onium salt, a chemically amplified positive resist composition and a resist pattern forming method. The invention provides an onium salt capable of generating an acid with moderate acid strength and small diffusion, a chemically amplified positive resist composition containing the onium salt, and a resist pattern forming method using the resist composition. An onium salt represented by formula (A).
Owner:SHIN ETSU CHEMICAL CO LTD

2-pyridinone-based persistent chemiluminescent molecules, methods of making and using the same

PendingCN122277593Aavoid attenuationAvoid emission blue shift issuesPeroxynitriteDisease
This invention provides a 2-pyridinone-based afterglow chemiluminescent molecule, its preparation method, and its application. The Chinese name of the afterglow chemiluminescent molecule is (…). E )-2-(2-(6-((4-boronic acid benzyl)oxy)-7-fluoro-2,3-dihydro-1 H -oxanthracene-4-yl)vinyl)-3,3-dimethyl-1-(4-(3-methyl-2-oxopyridine-1-(2-yl)- ... H )-butyl)-3 H -Indole-1-onium. This invention also provides a method for preparing this afterglow chemiluminescent molecule. After being embedded in Pluronic F127 to form nanoparticles, the molecule exhibits excellent afterglow luminescence performance upon activation with oxynitrite in PBS buffer. This invention overcomes the challenges of irreversible substrate consumption, blue shift of emission, and low energy transfer efficiency in traditional organic afterglow systems by using 2-pyridone as a stable, non-consumable substrate and covalently linking it to the luminescent unit, providing a powerful new platform for precise molecular sensing and further disease diagnosis.
Owner:SHANXI UNIV

Radiation sensitive resin composition and pattern formation method

A radiation-sensitive resin composition includes: a radiation-sensitive onium salt (A) represented by formula (1); a radiation-sensitive onium salt (B) different from the radiation-sensitive onium salt (A) and represented by formula (2); a resin including a structural unit which includes an acid-dissociable group; and a solvent. Rp1 is a substituted or unsubstituted (np+1)-valent hydrocarbon group having 1 to 20 carbon atoms, or a group including a divalent heteroatom-containing structure between adjacent two carbon atoms of a substituted or unsubstituted (np+1)-valent hydrocarbon group having 1 to 20 carbon atoms, np is an integer of 1 to 5, and X1+ is a monovalent radiation-sensitive onium cation. Rp2 is a substituted or unsubstituted monovalent hydrocarbon group having 1 to 20 carbon atoms, and X2+ is a monovalent radiation-sensitive onium cation. At least one of X1+ and X2+ is a cation including a fluorine atom.
Owner:JSR CORPORATION

Onium salt, chemically amplified positive resist composition and resist pattern forming process

An onium salt in which an aromatic ring having a sulfo group bonded thereto and another aromatic ring structure containing a bulky substituent group are linked via a sulfonamide bond generates an aromatic sulfonic acid with adequate acidity and controlled diffusion. A chemically amplified positive resist composition comprising the onium salt has a high resolution and forms a pattern of rectangular profile with reduced LER.
Owner:SHIN ETSU CHEMICAL CO LTD

Crystal material based on viologen cadmium complex, preparation method and application thereof

ActiveCN117384191BGood water solubilitypromote crystallizationMethyl groupOnium
The application discloses a crystal material based on a cadmium-viologen complex, a preparation method and application of the crystal material. II (Btybipy)Cl4; wherein Btybipy is a double 1-(thienyl)-3-methyl-4,4'-bipyridyl-1-onium. II The application is connected with a cadmium-viologen complex with chlorine as a counter anion to form a zero-dimensional crystal material. (Btybipy)Cl4 is a zero-dimensional structure, and has the advantages of simple synthesis method and convenient purification; the viologen compound is used as a nitrogen-containing ligand, the viologen ligand has good water solubility, is beneficial to crystallization of the crystal material, and improves a synthesis yield; the synthesized crystal material is sensitive to light and a solvent, can occur a photochromic phenomenon, and can be applied as an ion sensing material.
Owner:BOHAI UNIV

Synthesis of a catalyst for the selective reduction of NOx comprising IZM-10 AEI zeolite and at least one transition metal

PendingCN122374255Agood choiceImproved ignition temperaturePtru catalystIon exchange
This invention relates to a catalyst for the selective reduction of NOx, said catalyst being based on IZM-10 AEI zeolite and at least one transition metal, and a method for its preparation, said method comprising at least mixing the following substances in an aqueous medium: FAU-type zeolite, whose SiO2... 2(FAU) / Al2O 3(FAU) The process involves: ii) a molar ratio of 10 to 60 (inclusive) and less than 0.005% by mass of sodium in cationic form, a nitrogen-containing organic compound R (wherein R is (6R,10S)-6,10-dimethyl-5-aza-onium spiro[4,5]decane in hydroxide form), and optionally sodium hydroxide, until a homogeneous precursor gel is obtained; iii) a hydrothermal treatment step; iii) a step of at least one ion exchange with a solution containing at least one substance capable of releasing a transition metal; and iv) a heat treatment step by drying and calcination.
Owner:IFP ENERGIES NOUVELLES

Onium salt and photoacid generator

Provided is an onium salt functioning as a photoacid generator. The photoacid generator can provide a chemically amplifiable photoresist composition when it is combined with a resin component whose solubility in alkali is increased by the action of an acid generated by active energy ray irradiation such as Light or electron beam irradiation. The present invention relates to an onium salt represented by the formula (1), containing an anion structure with a proportion of a facial isomer in a total of the facial isomer and a meridional isomer being 15.0% by weight or lower.[(R2)n+1-E]+[(R1)3(F)3P]−  (1)
Owner:SAN APRO LTD

Process for the synthesis of izm-10 aei zeolite with very high purity in the presence of a nitrogen-containing organic structuring agent

PendingCN122374256AProtonationSimple Organic Compounds
This invention relates to a method for preparing AEI-based IZM-10 zeolite, the method comprising at least mixing the following substances in an aqueous medium: FAU-based zeolite, whose SiO2... 2(FAU) / Al2O 3(FAU) The precursor gel obtained at the end of step i) is then subjected to hydrothermal treatment, comprising a molar ratio of 10 to 60 (inclusive of endpoints) and less than 0.005% by mass of sodium in cationic form, a nitrogen-containing organic compound R, wherein R is (6R,10S)-6,10-dimethyl-5-aza-onium spiro[4.5]decane in hydroxide form, and optionally sodium hydroxide. The invention also relates to AEI-based zeolites having a SiO2 / Al2O3 molar ratio of 10 to 60 (inclusive of endpoints) and a purity greater than or equal to 98% by weight, preferably greater than or equal to 99% by weight, wherein the zeolite is in a partially or fully protonated form and is obtained by the method described.
Owner:IFP ENERGIES NOUVELLES

Photoresist compositions and pattern formation methods

PendingUS20260186411A1ArylPolymer science
A photoresist composition including a first component; a second component; and a solvent, wherein the first component comprises a non-polymeric onium salt acid generator, and a cation of the non-polymeric onium salt generator comprises an acid labile group, wherein the second component comprises a hydroxyaryl group, and the second component does not comprise an acid labile group, and wherein the photoresist composition does not comprise a polymer that comprises an acid labile group.
Owner:DUPONT ELECTRONIC MATERIALS INT LLC