The invention discloses a developing
solution composition for an
integrated circuit, and belongs to the field of wet electronic chemicals. The composition is prepared from the following components in percentage by
mass: 1.0 to 5.0 percent of inorganic base, 1.0 to 3.0 percent of developing
accelerant, 0.1 to 1.0 percent of penetrating agent, 0.1 to 2.0 percent of nonionic Gemini surfactant and the balance of water, wherein the sum of the
mass percent is 100 percent. According to the developing
solution composition, the specific non-ionic Gemini surfactant is used, so that the obtained developing
solution composition has excellent developing performance,
photoresist with slight difference
exposure can be effectively developed within the same developing time, edge residues are avoided, the
photoresist can be ensured to be completely dissolved in the developing solution and cannot be adhered to a substrate again, and the developing solution composition has good developing performance. The product yield can be improved, and the environment-friendly water-based
cleaning agent has the characteristics of excellent wettability, low
irritation, easiness in rinsing, easiness in degradation and the like, is environment-friendly, and meets the environment-friendly requirement.