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46928 results about "Pre treatment" patented technology

The purpose of the pre-treatment is to remove most of the non-soluble solids physically in order to reduce the pollutant loads and to protect all the subsequent steps in the treatment plant. Providing a reliable, high-quality supply of treated water is critical to many processes.

Post-thaw survival of chryopreserved biological material by hydrostatic pressure challenge

The present invention relates to a method for improving post-thaw survival of cryopreserved biological material comprising applying hydrostatic pressure to said biological material; keeping the said biological material at the hydrostatic pressure for a predetermined time period; releasing the hydrostatic pressure; and freezing the said biological material using any protocol applicable thereto. The invention also relates to the use of a pressurizing device for the pretreatment of a biological material that is to be cryopreserved, as well as to a pressurizing device for the pretreatment of a biological material that is to be cryopreserved, said device comprising a pressure chamber for receiving biological material, means to produce said pressure, and means to maintain said pressure in said chamber.
Owner:APPL CELL TECH KORLATOLT FELELOSSEGU TARSASAG

Treatment processes for a batch ALD reactor

Embodiments of the invention provide treatment processes to reduce substrate contamination during a fabrication process within a vapor deposition chamber. A treatment process may be conducted before, during or after a vapor deposition process, such as an atomic layer deposition (ALD) process. In one example of an ALD process, a process cycle, containing an intermediate treatment step and a predetermined number of ALD cycles, is repeated until the deposited material has a desired thickness. The chamber and substrates may be exposed to an inert gas, an oxidizing gas, a nitriding gas, a reducing gas or plasmas thereof during the treatment processes. In some examples, the treatment gas contains ozone, water, ammonia, nitrogen, argon or hydrogen. In one example, a process for depositing a hafnium oxide material within a batch process chamber includes a pretreatment step, an intermediate step during an ALD process and a post-treatment step.
Owner:APPLIED MATERIALS INC

Selective cobalt deposition on copper surfaces

Embodiments of the invention provide processes to selectively form a cobalt layer on a copper surface over exposed dielectric surfaces. In one embodiment, a method for capping a copper surface on a substrate is provided which includes positioning a substrate within a processing chamber, wherein the substrate contains a contaminated copper surface and a dielectric surface, exposing the contaminated copper surface to a reducing agent while forming a copper surface during a pre-treatment process, exposing the substrate to a cobalt precursor gas to selectively form a cobalt capping layer over the copper surface while leaving exposed the dielectric surface during a vapor deposition process, and depositing a dielectric barrier layer over the cobalt capping layer and the dielectric surface. In another embodiment, a deposition-treatment cycle includes performing the vapor deposition process and subsequently a post-treatment process, which deposition-treatment cycle may be repeated to form multiple cobalt capping layers.
Owner:APPLIED MATERIALS INC

Method and apparatus for automated pre-treatment and processing of biological samples

A method and apparatus for continuous workflow processing of biological samples. In one embodiment, the appratus includes a probe for dispensing one or more reagents from one or more reagent containers onto one or more biological sample carriers. The method and apparatus includes processing each biological sample according to a respective sequence of protocol steps which may be ordered by a scheduler protocol. The method and apparatus also includes network capability for connectivity with additional equipment for receiving or transmitting pertinent data via the network.
Owner:AGILENT TECH INC

Water treatment process for membranes

InactiveUS6416668B1Effective and safe and reliable to produceCapital and operating costMembranesUltrafiltrationZeta potentialFiltration
This invention discloses a cost-effective process for separating contaminants and a wide-range of fouling material from surface water, ground water and from industrial effluents. Having undergone effective pre-treatment, the water can be purified further by using high-surface area spirally wound micro-filtration (MF), ultra-filtration (UF), nano-filtration (NF) or reverse osmosis (RO) membranes. High-quality potable water free from pathogen and other contaminants is thus produced at low-cost from the pre-treated surface water and ground-water. Conversely, pre-treated industrial effluents are further purified at a relatively low-cost using NF or RO membranes, thus producing water suitable for recycle or surface discharge. The process of this invention uses cationic inorganic and/or polymeric flocculants to coagulate and flocculate the water-borne colloidal matter (e.g. clays, iron hydroxides, naturally occurring matter (NOM's), etc.), followed by filtration using a multi-media filter, charge neutralization and reversal and final filtration using a 5-micron cartridge filter. These pre-treatment steps provides a good quality water having a low Silt Density Index and a significant negative zeta potential, thereby ensuring against irreversible chemical fouling of the spirally-wound membranes.
Owner:AL SAMADI RIAD A

Atomic layer deposition of iii-v compounds to form v-nand devices

A method for forming a V-NAND device is disclosed. Specifically, the method involves deposition of at least one of semiconductive material, conductive material, or dielectric material to form a channel for the V-NAND device. In addition, the method may involve a pretreatment step where ALD, CVD, or other cyclical deposition processes may be used to improve adhesion of the material in the channel.
Owner:ASM IP HLDG BV

Electroless deposition processes and compositions for forming interconnects

In one embodiment, a method for depositing a material on a substrate is provided which includes positioning a substrate containing a contact within a process chamber, exposing the substrate to at least one pretreatment step and depositing a fill the contact vias by an electroless deposition process. The pretreatment step contains multiple processes for exposing the substrate to a wet-clean solution, a hydrogen fluoride solution, a tungstate solution, a palladium activation solution, an acidic rinse solution, a complexing agent solution or combinations thereof. Generally, the HARC via contains a tungsten oxide surface and the shallow contact via may contain a tungsten silicide surface. In some example, the substrate is pretreated such that both vias are filled at substantially the same time by a nickel-containing material through an electroless deposition process.
Owner:APPLIED MATERIALS INC

Electroless deposition process on a silicide contact

Embodiments as described herein provide methods for depositing a material on a substrate during electroless deposition processes, as well as compositions of the electroless deposition solutions. In one embodiment, the substrate contains a contact aperture having an exposed silicon contact surface. In another embodiment, the substrate contains a contact aperture having an exposed silicide contact surface. The apertures are filled with a metal contact material by exposing the substrate to an electroless deposition process. The metal contact material may contain a cobalt material, a nickel material, or alloys thereof. Prior to filling the apertures, the substrate may be exposed to a variety of pretreatment processes, such as preclean processes and activations processes. A preclean process may remove organic residues, native oxides, and other contaminants during a wet clean process or a plasma etch process. Embodiments of the process also provide the deposition of additional layers, such as a capping layer.
Owner:APPLIED MATERIALS INC

Enhanced X-ray imaging system and method

Techniques are provided for generating three-dimensional images, such as may be used in mammography. In accordance with these techniques, projection images of an object of interest are acquired from different locations, such as by moving an X-ray source along an arbitrary imaging trajectory between emissions or by individually activating different X-ray sources located at different locations relative to the object of interest. The projection images may be reconstructed to generate a three-dimensional dataset representative of the object from which one or more volumes may be selected for visualization and display. Additional processing steps may occur throughout the image chain, such as for pre-processing the projection images or post-processing the three-dimensional dataset.
Owner:GENERAL ELECTRIC CO

Precision surface treatments using dense fluids and a plasma

The present invention is a method, process and apparatus for selective cleaning, drying, and modifying substrate surfaces and depositing thin films thereon using a dense phase gas solvent and admixtures within a first created supercritical fluid antisolvent. Dense fluids are used in combination with sub-atmospheric, atmospheric and super-atmospheric plasma adjuncts (cold and thermal plasmas) to enhance substrate surface cleaning, modification, precision drying and deposition processes herein. Moreover, conventional wet cleaning agents such as hydrofluoric acid and ammonium fluoride may be used with the present invention to perform substrate pre-treatments prior to precision drying and cleaning treatments described herein. Finally, dense fluid such as solid phase carbon dioxide and argon may be used as a follow-on treatment or in combination with plasmas to further treat a substrate surface.
Owner:JACKSON DAVID P

Photostimulation method and apparatus in combination with glucose determination

A method and apparatus using photo-stimulation to treat or pretreat a sample site prior to analyte concentration determination is presented. More particularly, photo-stimulation at or near at least one sample site is used to enhance perfusion of the sample site leading to reduced errors associated with sampling. Increased perfusion of the sample site leads to increased volume percentages of the target analyte and / or allows the blood or tissue constituent concentrations to more accurately and / or precisely track corresponding sample constituents in more well perfused body compartments or sites such as arteries, veins, or fingertips. In one embodiment, analysis of the photo-stimulated site is used in conjunction with glucose analyzers to determine the analyte concentration with greater ease, accuracy, or precision and may allow determination of the analyte concentration of another non-sampled body part or compartment.
Owner:GLENN PATENT GROUP

Image guided radiosurgery method and apparatus using registration of 2D radiographic images with digitally reconstructed radiographs of 3D scan data

An image-guided radiosurgery method and system are presented that use 2D / 3D image registration to keep the radiosurgical beams properly focused onto a treatment target. A pre-treatment 3D scan of the target is generated at or near treatment planning time. A set of 2D DRRs are generated, based on the pre-treatment 3D scan. At least one 2D x-ray image of the target is generated in near real time during treatment. The DRRs are registered with the x-ray images, by computing a set of 3D transformation parameters that represent the change in target position between the 3D scan and the x-ray images. The relative position of the radiosurgical beams and the target is continuously adjusted in near real time in accordance with the 3D transformation parameters. A hierarchical and iterative 2D / 3D registration algorithm is used, in which the transformation parameters that are in-plane with respect to the image plane of the x-ray images are computed separately from the out-of-plane transformation parameters.
Owner:ACCURAY

System and method for pre-processing waveforms

A technique is provided for processing a physiological signal. The technique includes performing one or more multi-resolution decompositions on a physiological signal and one or more morphological operations on some or all of the respective decomposition components. In one embodiment, the technique is implemented as iteratively wavelet transformations where morphological operations, such as erosions and dilations, are applied to modify some or all of the respective wavelet coefficients. The modified wavelet coefficients may then be reconstructed to generate a clean version of the physiological signal from which some or all of the noise and / or artifacts have been removed.
Owner:TYCO HEALTHCARE GRP LP

Identification method and identification system using identification method

The invention provides an identification method, which performs identification by using an electrocardio (ECG) signal. The method comprises the following steps of: (a) ECG signal collection; (b) ECG signal pre-treatment, wherein the collected ECG signal is filtered; (c) characteristic extraction, wherein the characteristics of the ECG signal are extracted to build an identification characteristic vectors and the built identification characteristic vectors comprise analysis characteristics, presentative characteristics, transformation-domain characteristics and fusion characteristics; (d) identification process, wherein the identification characteristic vectors of a person to be identified is compared with the identification characteristic vectors which are pre-stored in an ECG characteristic template base; and (e) result output. The invention also provides an identification system using the identification method.
Owner:SCI RES TRAINING CENT FOR CHINESE ASTRONAUTS
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