The invention relates to the technical field of preparation of low-temperature
plasma surface modified silicon micro-
powder, in particular to a preparation method and application of low-temperature
plasma surface modified silicon micro-
powder, and the preparation method comprises the following steps: S1, taking original
silicon micro-
powder, adding
ethanol-deionized water mixed liquor, adding a
silane coupling agent, tetrabutyl
titanate and KH-560, performing temperature-controlled stirring, and then performing centrifugal
drying to obtain silicon micro-powder; pre-treated silica powder is obtained; s2, putting the pretreated silica powder into a
plasma reaction cavity, introducing
argon-
oxygen-
ethylene mixed gas, spraying a
dopamine-
graphene quantum dot-
chitosan composite liquid, and treating to obtain preliminarily modified silica powder; and S3, adding N, N-
dimethylformamide into the preliminarily modified silica powder, adding
isocyanate-terminated polyether, hydroxy
acrylic resin and
maleic anhydride, stirring at a controlled temperature, dropwise adding a catalyst, filtering, washing and
drying to obtain the modified silica powder. The method has the advantages of high modification efficiency, low
energy consumption, strong stability of the modified layer, capability of customizing the function of the silica powder,
adaptation to different resin matrixes, improvement of the performance of the
composite material, environment-friendly and controllable process and convenience in industrial production.