182 results about "Plasma reaction" patented technology

The waste gas treatment method comprises the following steps: according to the concentration of target gas collected by a first collector and the concentrations of methane and hydrogen collected by a second collector, adjusting the concentrations of methane and air to a first target concentration, the first target concentration is matched with the concentration of the target gas; according to the concentration, collected by the fourth collector, of the target gas, whether the concentration meets a preset condition or not is judged, and the input air concentration is regulated and controlled according to the preset condition. The concentration of the nitrogen oxide is matched by dynamically adjusting the concentration of the methane and the air, and an efficient reaction system for reducing the nitrogen oxide by the methane can be constructed in a plasma reaction zone under the condition of no adsorbent, catalyst or reducing agent. Methane and nitric oxide are enabled to fully react in a plasma environment, and reduction removal of the nitric oxide is directly realized.

The invention discloses a plasma forming apparatus and a plasma source system. The plasma forming device comprises a radio frequency power supply module, an impedance matching module, an acquisition control module and at least two distribution modules, the output end of the radio frequency power supply module is electrically connected with the input end of the impedance matching module; the input end of each distribution module is electrically connected with the output end of the impedance matching module; the distribution modules are positioned on one side of an insulating window in the plasma reaction chamber and are sequentially arranged along a first direction; the distribution module is used for coupling the radio frequency energy output by the radio frequency power supply module to a corresponding area of the plasma reaction chamber; and the acquisition control module is used for respectively acquiring the current signal in each distribution module, and independently adjusting the output power of the corresponding distribution module based on the acquired current signal of each distribution module. The plasma forming device and the plasma source system provided by the invention are low in cost, simple in impedance debugging and applicable to a large-area and high-uniformity plasma coating process.

The invention discloses a low-temperature plasma reaction device and a reaction method thereof, and relates to the technical field of fluidized bed reactors, the low-temperature plasma reaction device comprises an outer shell, the bottom of the outer shell is provided with a gas inlet, the top of the outer shell is provided with a gas outlet, the side wall of the outer shell is provided with a feed port and a control device, and the outer shell is internally provided with a gas distributor; the gas distributor is provided with a plurality of gas distribution holes, the discharge end of the feed port is located above the gas distributor, catalysts can be stacked on the upper surface of the gas distributor, the gas distributor is provided with a rotating motor, the output end of the rotating motor is connected with a cleaning brush, and the rotating motor is used for driving the cleaning brush to rotate. The cleaning brush can clean the upper surface of the gas distributor, a plasma generating device is further installed in the outer shell, and the rotating motor and the plasma generating device are both electrically connected with the control device. The cleaning brush is arranged, and the rotating motor drives the cleaning brush to rotate, so that agglomerated particles can be fully stirred, and the agglomeration problem is reduced.

The invention relates to the technical field of plasma application, and discloses a plasma composition control method, which comprises the following steps of: setting the range of a current change rate and adjusting the change rate of a power supply output current; designing a control algorithm based on a dynamic response model between the current change rate and the plasma reaction; a feedback control system is configured based on the plasma state monitored in real time; in the judgment process, when blockage is carried out, the plasma state is adjusted by detecting various process parameters, and the current change rate and the various process parameters are optimized according to the detection result in the adjustment process. By introducing the current change rate, namely the current acceleration, as a key control parameter, regulation and control of the plasma particle density and charge distribution by the current are realized, a plasma composition regulation effect which is more efficient and more controllable compared with traditional constant current or constant voltage control is obtained, and the precision and consistency of material treatment are improved.

The invention provides a high-frequency high-low-voltage composite pulse plasma power supply device, which adopts a composite pulse control mode of high-voltage ignition and low-voltage holding current, and comprises a high-voltage direct-current circuit for providing voltage for enabling a plasma reactor to react; the first all-solid-state switch is used for outputting the high-voltage direct-current circuit in a pulse form to form high-voltage and high-frequency pulse electricity; the first one-way conduction circuit is used for conducting the high-voltage and high-frequency pulse electricity in a one-way mode and blocking current injection of the low-voltage side at the same time; the low-voltage direct-current circuit is used for providing voltage for maintaining arc in the plasma reactor for a period of time; the second all-solid-state switch is used for outputting the low-voltage direct-current circuit in a pulse form to form low-voltage high-frequency pulse electricity; the second one-way conduction circuit is used for conducting the low-voltage high-frequency pulse electricity in a one-way manner and blocking the current injection of the high-voltage side at the same time; and the plasma reactor is used for performing plasma reaction through high-voltage high-frequency pulse electric ignition and low-voltage high-frequency pulse electric maintenance arc state.

According to the plasma high-efficiency water purification system and method suitable for factory-like circulating aquaculture, a water purification unit with a plasma secondary reaction technology as a core is constructed, and a low-energy-consumption cold plasma generator is used for pre-activating gas and introducing the gas into a water body in a micro-nano bubble form; further, an underwater SDBD cold plasma generator is utilized to secondarily excite the activated bubbles to obtain underwater micro-plasmas, and short-life ROS (reactive oxygen species) mainly comprising. OH is efficiently generated through a gas-liquid interface micro-discharge effect, so that pathogenic microorganisms and harmful components such as ammonia nitrogen and nitrite in aquaculture sea and fresh water are quickly and efficiently purified; an electrochemical reaction technology and an internal circulation technology are utilized to construct a plasma by-product elimination unit, the electrochemical reaction technology enables the biotoxicity of a water body to be rapidly reduced to a safe level, and the internal circulation technology avoids the problem of plasma reaction tail gas pollution.

Provided herein are methods and compositions for the treatment of ALS using chlorite or a pharmaceutical composition comprising sodium chlorite, for a target ALS patient population. Also provided herein are methods for identifying a target ALS patient population likely to be responsive to treatment with chlorite or a pharmaceutical composition comprising sodium chlorite, the methods including identifying ALS patients with elevated plasma C-reactive protein (CRP) levels and / or patients age 40-65, sporadic ALS pathology, or combinations thereof.

The invention discloses an intelligent treatment system for multi-stage microwave catalytic degradation of VOCs, and relates to the technical field of concrete crack detection, and the intelligent treatment system comprises the following specific steps: (1) waste pretreatment, (2) concerted catalytic degradation, and (3) tail gas monitoring and emission. According to the intelligent treatment system for multi-stage microwave catalytic degradation of VOCs, during waste gas pretreatment, waste gas is adjusted to the optimal reaction temperature and humidity, and subsequent waste gas reaction is facilitated; during synergistic catalytic degradation, synergistic treatment of plasma reaction and multi-stage microwave catalytic reaction is adopted, the reaction effect and degradation efficiency of waste gas are improved, complex VOCs waste gas is subjected to classified treatment through multi-stage labor division, a microwave catalytic reactor is divided into a first-stage treatment section, a middle treatment section and a tail-stage treatment section, and the treatment efficiency is improved. Meanwhile, the middle treatment section is further divided into a low-temperature chamber, a medium-high-temperature chamber and a high-temperature chamber, and the problem that complex VOCs are not thoroughly degraded through traditional single-section catalysis is conveniently solved through multi-stage catalytic degradation of the multiple treatment sections.

The invention discloses a polymer proppant suitable for supercritical CO2 fracturing, a preparation method comprises the following steps: S1, modifying an inorganic monomer by using a coupling agent to obtain a modified inorganic monomer; s2, taking an organic monomer A, an organic monomer B and a modified inorganic monomer as raw materials, and preparing polymer microspheres through an emulsion polymerization method; the organic monomer A is one of methyl methacrylate, methyl acrylate or styrene; the organic monomer B is vinylidene fluoride or trifluoroethylene; and S3, putting the polymer microspheres prepared in the step S2 into a plasma reaction cavity, filling CF4 gas to carry out plasma reaction, carrying out fluorination treatment on the surfaces of the polymer microspheres, finally cooling to room temperature, and carrying out vacuum drying to obtain the polymer proppant. The polymer proppant is suitable for supercritical CO2 fracturing, through PVDF copolymerization, inorganic monomer filling and fluorination modification, the swelling resistance of the polymer is effectively enhanced, and the swelling effect induced by supercritical CO2 is resisted.

The invention discloses a polycrystalline silicon reduction efficient vapor deposition reaction system and method, and relates to the technical field of polycrystalline silicon preparation, the polycrystalline silicon reduction efficient vapor deposition reaction system comprises a plasma reaction chamber, the inlet end of the plasma reaction chamber is communicated with a mixed gas pipeline, and the plasma reaction chamber is used for receiving SiHCl3 and H2 mixed gas so as to generate plasma-state mixed gas from the SiHCl3 and H2 mixed gas; the plasma accelerator is communicated with the outlet end of the plasma reaction chamber and is used for accelerating the plasma-state mixed gas and maintaining the activity of the plasma-state mixed gas; the reduction furnace is connected with the outlet end of the plasma accelerator, a plurality of silicon rods are arranged in the reduction furnace, and the reduction furnace is used for receiving the plasma-state mixed gas and carrying out vapor deposition reaction; the microwave emission head assembly is mounted on the reduction furnace and is used for providing high-energy electromagnetic waves into the reduction furnace; and the bias voltage source and the heating assembly are connected with the silicon rod. According to the polycrystalline silicon reduction high-efficiency vapor deposition reaction system, the technical problems of low production efficiency and high production energy consumption cost of polycrystalline silicon preparation are solved.

The application provides a plasma device and a gas reforming method for improving gas conversion performance, the tail ends of three quartz tubes are communicated with each other, an outer electrode is attached to the outside of each quartz tube, the three outer electrodes are connected with each other through metal wires, an inner electrode is arranged in each quartz tube, an air outlet is arranged on the first quartz tube, a first air inlet and a second air inlet are arranged on the second quartz tube and the third quartz tube respectively, the first inner electrode is connected with high voltage, and the second inner electrode and the third inner electrode are grounded. The application utilizes dielectric barrier discharge plasma technology to form a two-section compact plasma reaction system, uses two-section discharge, makes the reaction gas change from a ground state molecule to an excited state molecule in the left and right end discharge areas, and makes the reaction gas in different energy levels, so that the gas reforming reaction is more likely to occur, the energy consumption is reduced, and these steps are integrated in the same reaction, the device volume is reduced, and the reaction conversion performance is improved.

The invention discloses a denitration, desulfurization and noise elimination integrated purification system for a ship. The system comprises a cylindrical shell, and the interior of the cylindrical shell is divided into two cavities, namely a first expansion cavity and a second expansion cavity, by a perforated plate and a perforated pipe which are fixed to the cylindrical shell; the perforated pipe serves as an inner electrode, the cylindrical shell serves as a grounding electrode, an annular space among the perforated plate, the perforated pipe and the aluminum oxide ceramic serves as a discharge area, and the first expansion cavity and the second expansion cavity serve as an absorbent premixing and primary silencing unit and a plasma reaction and secondary silencing unit respectively. And a chemical absorption unit and a waste liquid collection unit are arranged at the downstream of the plasma reaction and secondary silencing unit in the tail gas flowing direction. According to the system, the two stages of expansion cavities and the tubular electrodes installed on the perforated plate form a composite noise elimination structure, and remarkable noise reduction is achieved. The device has the outstanding advantages of being compact in structure, light in weight, free of catalyst dependence, efficient in working in a wide temperature range and the like, and has a good reduction effect on harmful gas in low-temperature flue gas of a ship engine.

The invention discloses a system for hydrogen production and carbon production through methane cracking synergistically enhanced by plasma. The system comprises a gas source, a cracking reaction bin and a plasma torch, a double-layer stainless steel sleeve catalytic carrier is arranged in the cracking reaction bin, the double-layer stainless steel sleeve catalytic carrier comprises an inner-layer sleeve and an outer-layer sleeve, through holes with the aperture of 5-10 microns are distributed in the inner-layer sleeve, and through holes with the aperture of 20-50 microns are distributed in the outer-layer sleeve; the inner wall of the inner-layer sleeve is coated with a catalytic coating; the gas source provides and conveys methane gas into the cracking reaction bin; and the direct-current plasma torch conveys high-temperature plasma into the double-layer stainless steel sleeve catalytic carrier. A double-layer porous stainless steel sleeve is constructed in a plasma reaction cracking bin to serve as a catalytic carrier to load a catalytic coating, and a deep coupling structure of plasma cracking and catalytic cracking is constructed; and efficient conversion of methane and synchronous preparation of a high-added-value carbon material and high-purity hydrogen energy are realized.

The present invention discloses a distributed multi-channel plasma water treatment device for recycling discharged gas, which sequentially includes a sewage tank, a plurality of plasma water treatment units arranged side by side, and a water collection tank; the plasma water treatment unit further includes a uniform water inlet, a uniform water outlet, and a movable door; the plasma reaction cylinder is a coaxial sleeve structure of an inner tube and an outer tube, and a conductive liquid is sealed in its inner tube as a low-voltage electrode, and a metal layer or mesh is sleeved on the outer side of the outer tube as a high-voltage electrode; the cavity between the inner and outer tubes serves as a low-temperature plasma discharge area; the plasma reaction cylinder is an integrated structure of quartz or corundum ceramic medium; the liquid channel between the inner and outer cylinders extends spirally downward; it also includes a high-voltage power supply module and a power management module; the high-voltage power supply module realizes distributed power supply to a plurality of plasma water treatment units through the power management module. The present invention can achieve plasma treatment according to factors such as the water quality and flow rate of wastewater.

The invention relates to a dielectric barrier discharge-sliding arc coupled plasma reaction device and application thereof, and belongs to the technical field of plasma chemistry and efficient utilization of methane resources. The reaction device comprises a tubular reaction cavity, a high-voltage electrode arranged in the reaction cavity and a grounding electrode arranged on the outer side of the reaction cavity, and a dielectric barrier discharge structure is formed between the high-voltage electrode and the grounding electrode through the wall of the reaction cavity; at least two bent electrode parts which are arranged at intervals are arranged at the lower end of the high-voltage electrode, and gliding arc discharge is formed under the flowing action of reaction gas, so that dielectric barrier discharge and gliding arc discharge are simultaneously generated in the same reaction cavity. Through the coupling discharge mode, the synergistic effect of the high-energy density plasma and the large-volume uniform plasma is realized, and the activation efficiency and the reaction regulation and control capability of low-carbon alkane molecules can be effectively improved. The device is simple in structure and stable in operation, can be cooperatively used with a catalyst, and is used for plasma catalytic conversion and related reaction processes.

The present invention provides an MPCVD device and its application, relating to the technical field of microwave plasma. The device comprises a coaxial line, an amplifying coaxial line, a first tapered impedance matcher, a second tapered impedance matcher, a plasma reaction chamber, a base, and a coaxial inner conductor suspended therein. The amplifying coaxial line converts the TEM mode in the coaxial line into a stable TEM mode in the amplifying coaxial line. The first tapered impedance matcher converts the TEM mode in the amplifying coaxial line into a TM01 mode within the cavity of the first tapered impedance matcher. The cavity of the plasma reaction chamber can amplify and maintain the TM01 mode and generate the TM02 mode, forming a mixed mode and enlarging the plasma generation area. The present invention solves the problems of a small microwave plasma area, low energy utilization, and small diamond production size, achieving simple operation, wide applicability, and the effect of producing more uniform and larger-area diamond films.

This invention provides a method for preparing graphene quantum dots based on thermal coal and a plasma reaction system, belonging to the field of graphene quantum dot preparation technology. The method includes the following steps: using thermal coal as raw material, it undergoes electrochemical oxidation and KOH ball milling sequentially to obtain pretreated coal; the pretreated coal is introduced into an axial magnetic rotating microwave plasma reactor for segmented temperature-controlled dissociation and recombination reactions; during the reaction, a porous alumina template is used for confined growth, and after the reaction, liquid nitrogen quenching is employed to obtain graphene quantum dots. This invention uses thermal coal to replace high-purity graphite as the carbon source, reducing raw material costs by more than 99%; the pretreatment process, through the synergistic effect of electrochemical oxidation and KOH ball milling, eliminates the need for strong acids and alkalis throughout, completely avoiding the pollution problems of large amounts of acidic and heavy metal-containing wastewater and waste gas generated by the traditional Hummers method, thus aligning with the concepts of green chemistry and sustainable development.

The application provides a double sandwich cup type dielectric barrier discharge fuel plasma gasification research device, three quartz cups with different sizes are nested and combined, a double layer cavity is formed at the bottom of the quartz cup, air in the upper layer cavity is extracted to form a vacuum layer, heat transfer in the heating area to the dielectric layer and the sealing area of the upper quartz cup is blocked, the quartz dielectric is prevented from being broken down under high temperature conditions, and air leakage caused by melting of the sealing structure under high temperature conditions is avoided. The lower layer cavity is used for placing a solid sample to carry out high temperature plasma reaction, reaction kinetics is obtained by detecting tail gas of the reaction, the thickness of the reaction cavity is controlled through the sealing pad, and the dead volume of the reaction is reduced. The circular protrusion in the grounding heating block binds the electric arc generated by the discharge electrode, and the discharge phenomenon at the edge of the discharge electrode is avoided. The integrated design reduces the complexity of installation of the experimental instrument, is easy to operate, and realizes the research on the plasma gas-solid reaction mechanism under the dielectric barrier discharge under high temperature conditions.

The utility model relates to heating platform structure technical field especially relates to a kind of heating platform structure for vacuum cavity.Its technical scheme includes vacuum cavity and with the lower cavity component of vacuum cavity moulding, the lower cavity component includes lower cavity plate and heating plate component, vacuum joint and at least one group of collar joint are fixedly installed on lower cavity plate, oil passage is equipped in the heating plate component, temperature measuring thermocouple component is fixedly installed on lower cavity component, and the temperature measuring thermocouple component real-time monitoring heating plate component's temperature.The utility model improves the temperature of reaction cavity to suitable range, makes the active particle movement speed of oxygen plasma accelerate, and the chemical reaction rate of photoresist is significantly improved, realizes the uniform distribution of cavity temperature, and promotes to ensure the plasma reaction consistency of each area of workpiece surface.

The invention relates to the field of food safety detection, in particular to a preparation method of a carbon cloth electrode for detecting chlorpromazine. Comprising the following steps: performing surface cleaning and drying on carbon cloth to obtain pretreated carbon cloth; the pretreated carbon cloth is put into a plasma cleaning machine for activating treatment, and activated carbon cloth is obtained; cutting the activated carbon cloth, and packaging the cut carbon cloth to obtain the carbon cloth electrode for detecting chlorpromazine. According to the preparation method, the raw material cost is low, only oxygen is needed as the raw material in the plasma reaction process, other reactants do not need to be added, activation of the carbon cloth can be achieved, the electrochemical detection performance of the carbon cloth is improved, the technology is simple, the requirement for equipment is not high, the preparation cost can be effectively reduced, the production efficiency is improved, and batch manufacturing is facilitated.

This application relates to the field of plasma reaction devices and discloses a multi-chamber plasma experimental system based on unified electrode spacing adjustment. The system includes a first plastic plate, with uniformly distributed reaction vessels fixedly connected to the top of the first plastic plate. Telescopic vessels are slidably connected to the inner diameter of each reaction vessel, and second plastic plates are fixedly connected to the top of each telescopic vessel. A sample inlet is fixedly connected to the bottom of each reaction vessel, penetrating the first plastic plate. The system also includes a reaction control system comprising an inlet control module, a sample inlet control module, and a metal plate distance control module. The distance between the second and first plastic plates is adjusted via the metal plate distance control module, thereby adjusting the position of the metal plates and thus the discharge spacing. Real-time control of various reaction conditions in each reaction vessel allows for simultaneous degradation experiments of the same pollutant under different conditions, facilitating control experiments.

An apparatus, system, and method for generating a targeted electromagnetic pulse is presented. The apparatus includes a plasma generation apparatus including a housing element, a plasma reaction chamber, multiple electrode rings, and a power supply. The plasma reaction chamber is defined by an inner surface of the housing element and is configured to generate an electromagnetic field. Multiple electrode rings are disposed within the plasma reaction chamber to form an arc path. The power supply is coupled to the outer surface of the housing element to produce an electromagnetic pulse. The power supply includes primary coils, a secondary coil wound about the primary coils, and a coil core. A catalyst injection collar is coupled to the plasma generation apparatus and configured to direct a catalyst material into the plasma reaction chamber to amplify the electromagnetic pulse.

The invention belongs to the technical field of plasma electrochemistry, and discloses a plasma discharge system, application thereof and a synthesis method of a temperature sensitive substance. According to the plasma discharge system provided by the invention, the ion exchange membrane is introduced into the plasma reactor and is cooperatively matched with the temperature control part to control the plasma reaction solution and the reaction temperature, so that the reaction temperature in the synthesis process of the temperature-sensitive substance is effectively controlled; the method has the advantages that the utilization efficiency of active species in plasma electrochemical reaction is improved, and the decomposition, isomerization or side reaction of temperature-sensitive substances is reduced, so that the synthesis efficiency of the temperature-sensitive substances is obviously improved, and the method has wide application prospects in synthesis of temperature-sensitive substances such as ammonia gas and hydrogen peroxide.

A method for manufacturing a primary preform for optical fibers via an internal plasma chemical vapor deposition (PCVD) process in a hollow silica substrate tube having a supply side and a discharge side includes depositing doped or non-doped silica layers on the inner surface of the hollow substrate tube by supplying glass-forming gasses to the interior of the hollow substrate tube via the supply side thereof, and by creating a plasma reaction zone in the interior of the hollow substrate tube via microwave radiation having a microwave power, wherein the microwave power is decreased during the depositing.

The invention relates to the technical field of solid waste resource utilization, in particular to a waste wind power blade high-temperature plasma recovery system and device based on AI closed-loop control, and the system comprises a raw material pretreatment module which is used for receiving waste wind power blades and carrying out crushing and drying treatment on the waste wind power blades to obtain pretreated materials; the high-temperature plasma cracking module is connected with the raw material pretreatment module and is used for receiving the pretreated material and cracking the pretreated material into combustible gas and solid residues; comprising a high-temperature plasma reaction chamber, a plasma generating device, a feeding device, a reaction chamber monitoring sensor group and an AI control unit, the gas-solid separation and condensation module is connected with an outlet of the high-temperature plasma cracking module, receives the combustible gas and the solid residues, performs gas-solid separation on the combustible gas and the solid residues, and condenses and recovers the combustible gas; and the tail gas purification module is connected with a gas outlet of the gas-solid separation and condensation module.

The present invention provides a plasma-resistant composite laminate comprising a substrate, a first adhesion layer and a first plasma-resistant layer. The substrate has an upper surface, and the first adhesion layer is disposed between the upper surface of the substrate and the first plasma-resistant layer. An arithmetic average roughness (Ra) of the upper surface of the substrate is from 2 μm to 10 μm, a porosity of the first adhesion layer is from 0.05% to 10%, a porosity of the first plasma-resistant layer is from 0.03% to 6%, and a ratio of the porosity of the first adhesion layer relative to the porosity of the first plasma-resistant layer ranges from 1.6 to 333.33. The plasma-resistant composite laminate described has good performance on adhesion, thereby reducing the incidence of peeling during plasma treatment, and thus prolonging the lifetime of plasma reaction chamber.

The invention discloses a method for degrading a short-chain perfluorinated compound through bio-based amino acid surfactant enhanced low-temperature plasma. In order to solve the problem that the degradation efficiency is limited due to the fact that short-chain perfluorinated compounds (PFAS) are weak in interfacial activity and difficult to enrich, the surfactant composed of a bio-based hydrophobic alkyl chain and an amino acid cation head group is directionally designed and constructed, and the surfactant has the interfacial tropism and the specific electrostatic pairing capacity for the short-chain PFAS. After the agent is added into a water body, the agent can spontaneously form an interface response type self-assembly layer, short-chain PFAS is captured from a bulk phase and migrated to a gas-liquid interface through electrostatic interaction, and accurate enrichment of pollutants in a plasma reaction area is achieved. According to the method, the effective contact probability of the short-chain PFAS and hydration electrons is remarkably improved, the interface mass transfer limitation in the low-temperature plasma treatment process is broken through, and the degradation and defluorination efficiency of the short-chain PFAS is greatly improved on the premise that secondary pollution is not introduced.

The utility model belongs to the technical field of impedance matchers, and particularly relates to a high-voltage ignition starter of a plasma reaction cavity and an impedance matcher. The ignition starting device is applied to a plasma reaction cavity and comprises a control module, a driving module, an ignition module and a matching module, the control module is used for controlling the ignition module, and when the ignition module is started, an ignition voltage is provided for the plasma reaction cavity through a power frequency power source; and meanwhile, the control module controls the driving module to drive the matching module to provide impedance matching signals for the plasma cavity, so that the ignition starting device provided by the utility model can realize rapid starting of the plasma reaction cavity, and provides the impedance matching signals after ignition starting.

The invention provides a plasma cleaning system for a machining cutter, which comprises a machining chamber, a rotary base station, a side wall heating module, a gas supply module, an inductance coil assembly and a control module. A vertical electric field is built to be combined with a rotary base to achieve tool surface all-directional cleaning; by arranging the inductance coil assemblies symmetrically arranged at the top and the bottom, the magnetic field space distribution is effectively controlled, and the cleaning uniformity is improved; the side wall heating module is used for increasing the temperature of the cavity so as to accelerate pollutant desorption; the gas supply module accurately adjusts the ratio of hydrogen to argon through a mass flow controller, and dynamic adjustment of the hydrogen volume fraction is realized by combining with the mixed gas automatic balance control module, so that the plasma reaction activity and the discharge stability are maintained under different temperature and pressure conditions.

Disclosed are a central gas intake and gas uniformizing structure and a plasma etching machine. The central gas intake and gas uniformizing structure comprises a central gas intake disc and a central gas uniformizing disc. The central gas inlet disc and the central gas uniformizing disc define a central gas injection passage and a plurality of edge gas injection passages, and the plurality of edge gas injection passages are arranged around the central gas injection passage. The central gas intake and gas uniformizing structure in the present invention comprises the central gas injection passage and the plurality of edge gas injection passages. Process gas for a central region can be introduced via the central gas injection passage, and process gas for an edge region can be introduced via the plurality of edge gas injection passages. Compared with the existing technology, the invention improves the uniformity of gas intake into a plasma reaction chamber, and improves the uniformity of the etching rate of the plasma etching machine.