366results about How to "Improve flatness" patented technology

This display module prevents the leakage current generated between a first electrode layer and a second electrode layer that constitute a pixel via an organic light emitting layer and obtains uniform luminance. An interlayer insulation layer ILI is provided between an edge of a first electrode layer AD and an organic light emitting layer OLE that constitute the pixel and the distance between the edge and a second electrode layer CD is secured sufficiently. Further, the interlayer insulation layer ILI is coated with a resin material having fluidity and flatness is improved as a whole. An aperture that accommodates the organic light emitting layer OLE is formed in this interlayer insulation layer ILI and the coated organic light emitting layer OLE is formed in uniform thickness and through a necessary and sufficient spread.

A cutting insert for a milling machining adapted to be mounted on a milling cutter to carry out cutting operation and having primary and secondary cutting edges provided at sides of a rectangular body, each primary cutting edge having a curved line tangential to the adjacent secondary cutting edge, to reduce the cutting force and improve flatness of the side surface of a machined workpiece. The cutting insert includes an upper face, a bottom face and a plurality of side faces connecting the upper face and the bottom face. The primary cutting edge has chip breakers for guiding chip flow, primary cutting edge land faces and primary cutting edge clearance faces. The primary cutting edges enable a bottom surface and a side surface of a machined workpiece to have a right angle therebetween.

The invention discloses a mask film plate and a manufacturing method thereof. The mask film plate is used for evaporating a display substrate, and comprises a pattern part and a stress buffer part, wherein the pattern part corresponds to a display area of the display substrate; the stress buffer part corresponds to at least one part of a non-display area of the display substrate; multiple first grooves are formed in one side of the stress buffer part; multiple second grooves are formed in the other side of the stress buffer part; and first projections of the first grooves on the plane where the mask film plate is located do not intersect with second projections of the second grooves on the plane where the mask film plate is located. The quality of the mask film plate in the evaporating process is guaranteed, so that the effect of improving the AMOLED product quality is achieved.

In a P-channel power MIS field effect transistor formed on a silicon surface having substantially a (110) plane, a gate insulation film is used which provides a gate-to-source breakdown voltage of 10 V or more, and planarizes the silicon surface, or contains Kr, Ar, or Xe.

The invention relates to the technical field of display, in particular to a support structure and a display device. The support structure is arranged at one side of a flexible display panel, and at least comprises a first bendable region; a bending axial line corresponding to the first bendable region extends in the first direction; the first bendable region is provided with a plurality of first main bending regions and a plurality of first deformation compensation regions; the first main bending regions and the first deformation compensation regions are alternately distributed in the first direction; each first main bending region comprises a plurality of first main strip-shaped holes in array distribution; the first main strip-shaped holes extend in the first direction; each first deformation compensation region comprises a plurality of groups of first hollow patterns in array distribution; each group of first hollow patterns are formed by combining a plurality of hollow holes; and at least two hollow holes in the plurality of hollow holes have different shapes or different extending directions. Through such a design, the structure stability of the support structure is ensured; and the anti-impact and bending-resistant performance of the flexible display panel is enhanced.

A wafer surface of a semiconductor wafer to be used as a device active region is mirror-polished, and an outer peripheral portion of the mirror-polished wafer surface is further polished, thereby forming an edge roll-off region between the device active region of the wafer surface and a beveled portion formed at the wafer edge. The edge roll-off region has a specific roll-off shape corresponding to an edge roll-off of the oxide film to be formed in a device fabrication process. Thus, a semiconductor wafer can be provided in which reduction in the thickness of an oxide film on the outer peripheral portion of the wafer in a CMP process can be prevented while maintaining high flatness of the wafer surface.

To provide a substrate for mounting a light-emitting device, which is provided with a silver reflection layer having a high reflectance and being less susceptible to deterioration of the reflectance due to corrosion and which has an improved light extraction efficiency.

A substrate for mounting a light-emitting element 1, which comprises a substrate main body 2, a silver reflection layer 6 composed mainly of silver or a silver alloy, formed on the substrate main body 2, and a protective layer formed so as to cover the entire surface of the silver reflection layer 6, wherein the protective layer 7 contains an alumina filler and further contains a glass constituting the protective layer 7, having silver ions diffused therein. The concentration of silver ions contained in the glass of the protective layer 7 is at least 0.5 mass % and at most 5.0 mass %.

According to a method of redistributing a functional element of the present invention, an insulating resin layer is supplied onto a functional element wafer such as an LSI. A portion to be a via hole on an electrode pad of the functional element is filled with a sacrificial layer. The top of the sacrificial layer filled in the via hole is exposed from the insulating layer by grinding or polishing. Therefore, it is possible to prevent breakage of a brittle material such as a low-k material in the functional element, which would be caused by transmission of shearing stress when a conventional pillar or a conventional gold projecting electrode is used. The reliability, the yield, and the level of flatness can be improved by forming an interconnection conductive layer after the flattening process of grinding or polishing. Accordingly, a fine conductive interconnection can be formed.

The construction method of large size cement concrete road slab includes connecting formwork without crack in the joints, using blended concrete material with fiber, water reducing agent or swelling agent, completing spreading, vibrating and other steps at 5-38 deg.c within 60-120 min after the concrete material is discharged from the stirrer, spreading in wind speed less than 2 m/s and relative humidity higher than 60 %, adopting twice vibrating, face work for 3-4 times, twice crack cutting, and spraying film and adding protecting layer for curing after surface grain treatment. The said construction method can ensure the road quality, reduce side cracks between slabs, reduce the damage of road slabs caused by foreign matter and water, lower the road maintaining cost and prolong the service life of road.

This method for treating a surface of a SiC substrate includes a first removal step in which a modified layer produced by subjecting the substrate (70) to mechanical polishing or chemical-mechanical polishing is removed by heating the substrate (70) under Si vapor pressure. A second removal step in which macro-step bunching occurred in an epitaxial layer (71) is removed by heating the substrate (70) under Si vapor pressure may also be performed. Since the etching rate can be varied, etching rate in the first removal step is high, so that the modified layer can be removed in a short time. Meanwhile, etching rate in the second removal step is comparatively low, so that excessive removal of the epitaxial layer (71) can be prevented.

Provided is a three-dimensional modeling apparatus including a stage, a constraining body, a supply nozzle, an irradiation unit, and a movement mechanism. The constraining body includes a surface including a linear region along a first direction, and is opposed to the stage so that the linear region is the closest to the stage. The supply nozzle supplies a material curable by energy of an energy ray into a slit region between the stage and the linear region. The irradiation unit irradiates the supplied material with the energy ray through the constraining body. The movement mechanism moves the stage relative to the constraining body along a second direction for forming a cured layer of the material for one layer, and moves the constraining body and the stage relative to each other along a stacking direction for stacking the cured layers.

The embodiments of the invention described enable improved planarity of substrates, which is crucial for patterning and device yield improvement. Chemical-mechanical polishing (CMP) is used to remove film to planarize the substrate before the final thickness is reached or before all removal film is polished. The substrate is then measured for its topography and film thickness. The topography and thickness data are used by the gas cluster ion beam (GCIB) etch tool to determine how much film to remove on a particular location. GCIB etch enables removal of final layer to meet the requirements of substrate uniformity and thickness target. The mechanisms enable improved planarity to meet the requirement of advanced processing technologies.

A polishing apparatus includes a slurry supply arm arranged on a polish pad for a polishing target and extending from a center of the polish pad into a radius direction; a plurality of nozzles attached to the slurry supply arm to supply the slurry from the plurality of nozzles; and a plurality of pumps, each of which supplies the slurry to one of the plurality of nozzles. A control unit controls each of the plurality of pumps independently.

A method for creating an apodization mask is disclosed. According to the method, a grid is created for the pattern. The grid includes a number of elements. Each element is processed to determine whether the element is to be made transmissive based on a predetermined local optical density and a random value. The predetermined local optical density and the random value are associated with the element. The random value is generated on a random basis. Each element is further processed to determine whether the position of the element is to be shifted. The positional shift is determined on a random basis. The grid with the processed elements is then used to make an apodization mask. The apodization mask may be used in an optical instrument, such as, an interferometer.

The invention relates to a manufacturing technique for forming ultrawhite patterned glass, relating to the glass forming manufacturing technique field. The manufacturing technique comprises mixing, forming, annealing and detection cutting. The manufacturing technique is as follows: deferrization is performed on selected compositions; and raw materials after deferrization are mixed by weight portion: 59 to 64 portions of silica sand, 0.5 to 2.5 portions of aluminum hydroxide, 17 to 22 portions of sodium carbonate, 0.2 to 1 portion of anhydrous sodium sulfate, 0.3 to 2 portions of sodium nitrate, 13 to 18 portions of calcium carbonate and 0 to 0.5 portion of antimony trioxide. Under the condition of forming, the temperature of a rolling operation part is between 900 and 1100 DEG C, the rolling speed is between 145 and 220 meters per hour; the annealing temperature is between 60 and 590 DEG C, and the annealing time is between 0.1 and 0.3 hour. By application of the technique, the glass with high transmittance, low iron content, ideal flatness and good impact resistant effect is produced.

The invention relates to a frequency response characteristic calibration method and a device of a waveform generator. The method comprises the steps of obtaining an ideal output amplitude of frequency response at a designated frequency point and an actual output amplitude of frequency response at the current moment of the waveform generator to be calibrated, calculating a frequency response error at the current moment of the designated frequency point, and determining that calibration data provided to the designated frequency point is a sum of the frequency response error of the current moment and a frequency response error of a previous moment if the frequency response error of the current moment is less than or equal to a preset threshold. Since the calibration data of the waveform generator is obtained by a successive approximation calibration manner, an error between the actual output amplitude after calibration and the ideal amplitude is within a preset threshold scope, the calibration accuracy is improved, and further, the flatness of a frequency response characteristic amplitude of the waveform generator is improved.

The invention relates to a tool cathode and a method for improving electrolysis milling machining bottom face flatness, and belongs to the field of electrolysis milling composite machining. The side wall of the tool cathode is provided with an electric conduction abrasive particle layer and an insulting abrasive particle layer, and insulation of a bottom face is achieved. In the working process, abottom insulating layer reduces electric current density of a bottom face central area, the side wall insulting abrasive particle layer can reduce the electric current density of a bottom face edge area, the problem that the bottom face electric current density difference is large in the electrolysis milling machining process is solved, and the electrolysis milling machining bottom face flatnessis further improved.

The invention belongs to the technical field of metallurgy, in particular to a direct thermal treatment process technology after rolling a steel plate. The invention provides the direct thermal treatment process technology after rolling the steel plate, which can overcome the deficiencies of the prior art. The process technology comprises the steps of heating the steel plate on an outlet roller way of a rolling machine for quenching mainly, using a steel plate electromagnetic induction heating device arranged on the outlet roller way between a medium and heavy plate finish rolling machine and a post-rolling controlled cooling device which is a direct quenching and accelerated cooling device for heating and soaking the steel plate passing through the steel plate electromagnetic induction heating device according to the process requirements, and improving the flatness and the plate shape of the steel plate through a straightening roller matched with the electromagnetic induction heating device. The steel plate electromagnetic induction heating device with the straightening roller is arranged on the roller way between the medium and heavy plate finish rolling machine and the cooling device. The process technology can realize the one-line quenching thermal treatment process of the steel plates with various specifications. The process technology is applicable to new construction and transformation projects of medium and heavy plate plants. The process way and the devices have important popularization value.

The invention relates to a preparation process of a double-surface flat glass steel plate for laboratory test. The preparation process is characterized in that glass-fiber cloth is laid on the upper surface of a glass working platform surface; a holed pressing plate is placed on the glass-fiber cloth; a flow guiding net is put on the area with small holes; a glue filling base is put on the flow guiding net, a breathable felt is laid and covers on the glass-fiber cloth; a winding pipe is put on the glass working platform surface and is covered by the breathable felt; one end of the winding pipe is connected with an exhaust pipe, and a vacuum film is laid and covers the winding pipe, the breathable felt, the glass-fiber cloth, the holed pressing plate, the flow guiding net and the glue filling base; the edge of the vacuum film is sealed by using a sealing rubber strip and is fixed on the glass working platform surface; one end of the exhaust pipe is connected with the winding pipe, the other end of the exhaust pipe is connected with a resin collector which is connected with a vacuum pump by the exhaust pipe. Compared with the prior art, the preparation process has the advantages that the flatness of a reinforced plastic plate product is improved and the influence of the demolding cloth on the reinforced plastic plate is avoided.

The invention discloses a high position stereo shelf warehouse super-flat terrace construction technology comprising the following steps: 1, preparation work: setting up support templates and adjustable separate guide rails; 2, casting concrete in sectional warehouses, erecting a vibration beam on the separate guide rail, and using the vibration beam to vibrate and flatten the concrete; 3, manually leveling the surface of the concrete; 4, spraying hardener on the concrete surface after initial set of the concrete so as to form a hardened layer; 5, extracting mud, polishing and shinning the hardened layer until the flatness and levelness of the hardened layer surface complies with a preset precision requirement. The high position stereo shelf warehouse super-flat terrace construction technology can make the terrace with high flatness, levelness, and abradability, so the high position multilayer shelf can be stably mounted, logistic devices can be stably used, and the terrace can remain flat and smooth when the shelf and device are under fullload state.

This invention discloses an organic photoelectron component with protective layer, including a substrate and an organic photoelectron component, further including a protective layer consisting of n combined layers, wherein n is the integer and is not smaller than 1 and not greater than 100. The combined layer is composed of three modes: an organic material layer/hydrophilic material layer/organic material layer or an organic material layer/hydrophilic material layer or hydrophilic material layer/ organic material layer. The position relationship of the combined layers in the protective layer includes: setting at one position or multiple positions of the upper layer, the lower layer, the periphery of the organic photoelectron component; setting between the substrate and the organic photoelectron component or at one side of the substrate. The component is capable of conquering the shortness existed in the current technology and has novel structure; the flatness of the substrate surface is improved. The bonding property of the protective layer solves the problem of connection degree between components and effectively prevents the water and oxygen entering into the inner part of the component.

This invention relates to paper production online screen-printing device with a printing device between the paper device and the receiving device. The output end of paper device and the input end of the printing device are set with input guide hub between. The output end of the printing device and the input end of the receiving device are set with output guide hub between. The input guide hub locates its one hub on the output end of the paper device and the other hub on the input end of the printing end. The output guide hub locates its one hub on the output end of the screen-printing device and the other hub on the input end of the receiving device.

A manufacturing method of an MIM capacitor comprises the following steps: providing a semiconductor substrate; forming a first metal layer on the semiconductor substrate; forming a second metal layer on the first metal layer, and leveling the second metal layer; forming a dielectric layer on the second metal layer; forming a third metal layer on the dielectric layer; and patterning the third metal layer, the dielectric layer, the second metal layer and the first metal layer to form the MIM capacitor with a first metal layer pattern and a second metal layer pattern as a lower polar plate, a third metal layer pattern as an upper polar plate and a dielectric layer pattern as a dielectric medium. The invention also provides an MIM capacitor, as well as a semiconductor device and a manufacturing method thereof. The invention can improve the flatness of the lower polar plate of the MIM capacitor.

The invention relates to a high-quality textile dyeing mechanism, which includes a frame, a transmission roller rotatably mounted on the frame, a spraying and dyeing assembly fixedly arranged above the transmission roller, and a rotatively mounted frame located on both sides of the transmission roller The cloth guide roller and the driving assembly that drives the transmission roller to carry out gray cloth transmission also include a smear assembly that is located on one side of the transmission roller and moves along its outer circumference. The first connecting rod connected to the driving assembly, the second connecting rod connected to the other end of the first connecting rod in rotation, the third connecting rod connected to the second connecting rod at one end and installed on the second connecting rod The smearing roller at the other end of the three connecting rods; the greige cloth is pre-dyed, dyed and polished, and then reciprocated on the conveying roller by the smearing roller to achieve wrinkle removal, color fixation and uniform dyeing of the greige cloth. The technical problems of uneven dyeing and easy fading in the background technology.

The invention relates to a curtain wall dry hanging multidirection adjusting pendant and a construction method of the curtain wall dry hanging multidirection adjusting pendant. The curtain wall dry hanging multidirection adjusting pendant is characterized in that in the process of construction, a machine threaded hole (1) is formed in the vertical face of an L-shaped corner connecting part (A) and is connected with an installation hole site (2) arranged on a curtain wall panel (C) through a machine screw spike (3), and a groove (4) which can be adjusted in a left-right mode is formed in the transverse plane of the L-shaped corner connecting part (A). After the transverse plane of the L-shaped corner connecting part (A) is flush with and attached to the transverse plane of an L-shaped corner connecting piece (B), a cross shape is formed by the groove (4) which can be adjusted in the left-right mode in the transverse plane of the L-shaped corner connecting part (A) and a groove (5) which can be adjusted in a front-back mode in the transverse plane of the L-shaped corner connecting part (B), and the groove (4) and the groove (5) are connected tightly through a screw spike (6). Installation and adjustment are easy, and a large amount of labor cost is reduced. Due to the fact that the pedant has the function of multidirection adjustment, the tolerance level for precision demands when a curtain wall is installed is improved, the flatness of the curtain wall is greatly improved, the structure is simple, firm and practical, and therefore a large amount of dragon frame rolled steel is saved; the safety performance indicators of installation nodes of each structure can be detected, calculated and controlled in advance.

The invention provides a method for removing surface compressive stress of toughened glass through chemical ion exchange. The toughened glass is put into a mixed solution of potassium nitrate and sodium nitrate after preheating. K+ with a large ionic radius in the glass is replaced with Na+ with a small ionic radius in the solution through an ion exchange method. The concentration of the Na+ in the solution is maintained in 140000 ppm or above. According to the method for removing the surface compressive stress of the toughened glass through the chemical ion exchange, firstly, surface compressive stress removing is conducted on the toughened glass with the sand blasting effect, and then follow-up process treatment is conducted, so that product bending caused by the stress difference of the toughened glass can be avoided, the using rate of products is increased, and the high-flatness and high-quality toughened glass smooth surface is obtained.

A Ni film is deposited over the entire surface of a substrate including a silicon gate. Then, the silicon gate is partially removed by, for example, CMP, thereby leaving a Ni layer having a flat upper surface and a uniform thickness directly on the silicon gate. Subsequently, silicidation is performed, thereby forming a gate electrode having a uniform silicide phase.

The invention discloses a high-efficiency mechanical laying device for massive turf, which comprises a car body and a traveling crawler; a traveling crawler is provided under the car body; a roller is arranged on the left side of the car body; a turf box is provided on the car body , the turf box is provided with a bearing plate; the turf box is located above the bearing plate and is provided with a separation plate; above the separation plate is provided with a first conveyor belt, and the right side of the first conveyor belt is provided with a second conveyor belt; The side is provided with a guide plate. The present invention is provided with a rolling roller and a compacting roller, the rolling rollers level the paved site, and the compacting rollers compact the paved turf, which improves the flatness of the paving and ensures the quality of the paving; the present invention provides There are separation plates, first conveyor belts, second conveyor belts and guide plates to efficiently lay the turf, which improves the laying efficiency and saves the cost of manual laying; the invention is equipped with a fertilizer irrigation device, which can fertilize the laid turf in time to improve the turf. survival rate.

The present invention provides a method for producing a silicon carbide substrate for forming a semiconductor layer by inclining the surface orientation of a major surface (1) of a substrate by 0.03 to 1 DEG from the (0001) plane and performing hydrogen gas etching at 1250 DEG C to 1700 DEG C. Also disclosed is an SiC substrate, which has only a few spiral pits and is excellent in surface flatness.

The invention provides an asphalt modifying additive containing carbon black obtained from thermal cracking of a waste tire. The carbon black obtained from thermal cracking of the waste tire is taken as a main raw material of the asphalt modifying additive, polyethylene, SBS (styrene-butadiene-styrene), maleic anhydride, styrene butadiene rubber, rubber oil and triethylenetetramine in a certain proportion are added sequentially and uniformly stirred, the asphalt modifying additive containing the carbon black obtained from thermal cracking of the waste tire is formed, the asphalt modifying additive containing carbon black obtained from thermal cracking of the waste tire and matrix asphalt are preheated respectively and mixed, the mixture is sheared and stirred for a certain period of time at a certain temperature, and modified asphalt applicable to road surfacing is generated.