The invention relates to the technical field of
metal electrodes, and discloses a
metal electrode, a preparation method and an optoelectronic device. The invention discloses a preparation method of a
metal electrode. The preparation method comprises the following steps: S1, preparing a
mask layer on a substrate of which the surface is covered with a transparent conductive film; s2, performing
laser grooving on the surface of the
mask layer to
expose the metal seed layer; s3, a metal conducting layer is prepared on the metal seed layer through
electroplating, and a metal
electrode is obtained; wherein the substrate is selected from one of glass, a flexible material,
ceramic, metal, a
wafer and
mica. The preparation method of the metal electrode provided by the invention is short in process, simple to operate, wide in
mask layer selection range, strong in electrode adhesion, high in electrode
processing precision, high in designability, simple in
electroplating mode, strong in
electroplating liquid adaptability, low in cost and high in production efficiency, and the
corrosion resistance of the transparent conductive film can be improved.