302 results about "Aluminium oxide" patented technology

The invention discloses a method of preparing aluminum oxide-silicon carbide compound porous ceramic by aluminum-silicon industrial waste residues. The primary raw materials comprise industrial waste residues, carbon powder, a pore forming substance and an adhesive. The aluminum oxide-silicon carbide compound porous ceramic is prepared by the following steps of mixing, drying, forming and sintering to obtain a final product. Treatment and high additional value utilization of the industrial waste residues are achieved. The prepared porous ceramic is remarkable in performance, and can be applied to the fields of filtration, sound isolation, heat isolation, fire fighting and the like. The method is simple in process flow and convenient for industrialized promotion; and the cost is good to control and the method has extreme economical value.

The invention discloses a preparation method and application of high-toughness anti-aging zirconia ceramic, and relates to the technical field of ceramic materials.The preparation method comprises the following steps that nano monoclinic zirconia with the D50 being 20-50 nm and the mass fraction being 99.7-99.8 wt%, aluminum oxide with the D50 being 200-400 nm and the mass fraction being 0.2-0.3 wt% and a dispersing agent are taken, and the dispersing agent accounts for 1-1.5 wt% of the total mass of powder; the preparation method comprises the following steps: by taking a high-purity aluminum oxide grinding ball as a grinding medium, stirring and grinding for 2-4 hours at the rotating speed of 700-1000r / min, and then grinding for 1-2 hours at the sanding rotating speed of 1500-2000r / min to obtain mixed slurry; nano monoclinic zirconia is adopted as a raw material, aluminum oxide and a dispersing agent are added for co-grinding, Y2O3 is deposited on the surface of ATZ composite powder in a magnetron sputtering mode, and a Y2O3 deposition layer can inhibit conversion from t-zirconia to m-zirconia, so that the anti-aging performance of the zirconia ceramic is improved, and the service life of the zirconia ceramic is prolonged. And the nano monoclinic zirconium oxide is directly mixed and ground with the aluminum oxide, so that the zirconium oxide raw material is more easily subjected to stress-induced phase change, and the toughness performance of the zirconium oxide ceramic is improved.

The invention belongs to the technical field of refractory materials for hydrogen metallurgy, and discloses a high-strength heat-insulating castable for hydrogen metallurgy as well as a preparation method and application of the high-strength heat-insulating castable. The invention discloses a high-strength heat-insulating castable which comprises the following raw materials in percentage by mass: 15-25% of modified aluminum oxide hollow spheres with the particle size of 5-3mm, 7-13% of modified aluminum oxide hollow spheres with the particle size of 3-2mm, 2-4% of modified aluminum oxide hollow spheres with the particle size of 2-1mm, 7-11% of modified perlite with the particle size of 3-0.074 mm, 18-28% of quartz powder, 4-6% of silicon dioxide powder, 25-35% of pure calcium aluminate cement and 0.5-2% of yttrium oxide powder. A water reducing agent accounting for 0.05-0.15% of the total mass of the raw materials, a pore forming agent accounting for 0.03-0.07% of the total mass of the raw materials and water accounting for 17-21% of the total mass of the raw materials are added. The castable disclosed by the invention has the comprehensive properties of high strength, low heat conductivity, high volume stability and excellent H2 / CO erosion resistance, and meets the comprehensive harsh requirements of hydrogen metallurgy application scenarios.

The invention discloses a high-bending-resistance and low-dielectric-loss LTCC substrate preparation method and an LTCC substrate, and the method comprises the steps: mixing inorganic powder, an organic system and a solvent through ball milling, dissolving and stirring, and preparing a green ceramic chip through a tape casting technology; carrying out lamination, warm isostatic pressing, cutting, glue discharging and sintering on the green ceramic chip to obtain the LTCC substrate; the inorganic powder comprises sodium borosilicate glass, aluminum oxide and mullite whiskers. According to the invention, the sodium borosilicate glass is used as a glass phase, the mullite whisker and the alumina powder are used as ceramic phases, and the excellent mechanical properties and extremely low dielectric loss of the mullite whisker are utilized to modify the sodium borosilicate glass-alumina composite material. The problems that an existing sodium borosilicate glass-aluminum oxide LTCC composite material is low in bending strength and high in dielectric loss are solved.

The invention discloses sanitary ceramic repairing glaze and a ceramic glaze surface defect repairing process. The repairing glaze comprises ground glaze and self-cleaning snowflake cover glaze, the ground glaze is prepared from 18 to 23 parts of frit, 3 to 8 parts of calcined kaolin, 25 to 30 parts of quartz, 23 to 28 parts of albite, 2 to 5 parts of wollastonite, 9 to 14 parts of calcite, 0.8 to 1.2 parts of calcined zinc oxide, 8 to 12 parts of zirconium silicate, 1 to 3 parts of barium carbonate and 0.8 to 1.2 parts of aluminum oxide; the self-cleaning snowflake cover glaze is prepared from 28 to 33 parts of frit, 12 to 16 parts of calcined kaolin, 2 to 6 parts of calcined zinc oxide, 7 to 12 parts of calcite, 3 to 8 parts of wollastonite, 16 to 22 parts of albite, 0.5 to 1.5 parts of calcined talc, 15 to 20 parts of quartz, 1 to 4 parts of barium carbonate and 0.5 to 13 parts of aluminum oxide. According to the formula of the ground glaze and the self-cleaning snowflake cover glaze, the initial melting temperature of the glaze is reduced by adding a fluxing agent and reducing high-temperature raw materials, the high-temperature chemical reaction time is shortened, and the formula can adapt to a fast firing curve of a refiring kiln.

Glass-based substrates have a depletion layer extending from a first major surface to a first depth from 300 nanometers to 10.0 micrometers. The depletion layer is depleted in one or more alkali metal oxide, alkaline earth metal oxide, alumina, or combinations thereof relative to a bulk. In aspects, the glass-based substrates can exhibit a porosity less than or equal to 1.0% for the first major surface and / or a cross-section perpendicular to the first major surface. In aspects, the glass-based substrates can exhibit one or more of a total reflectance from 0.1% to 2.0%, a total transmittance from 94% to 100%, a scattering from 0.1% to 5.0%, or a combination thereof. Methods of treating a glass-based substrate includes contacting the glass-based substrate with treatment solution maintained at 80°C to 180°C for from 1 hour to 168 hours to form the depletion layer.

The invention discloses a method for composite etching of an electroplating gold plating layer, which comprises the following steps of: manufacturing a photoetching pattern on the front surface of gallium arsenide epitaxy, then evaporating a metal contact layer, depositing a SiNx protective mask layer, performing Mesa mesa etching on the gallium arsenide epitaxy, exposing a high-aluminum layer on the side surface of an epitaxial material, and forming an aluminum oxide limiting layer by adopting a wet oxidation process; a second SiNx protective mask layer continues to be deposited, and the metal contact layer is exposed through dry etching; forming a seed gold layer by adopting magnetron sputtering TiW / Au metal, and forming a photoresist mask with a target electrode pattern on the seed gold layer; electroplating thick gold on the photoresist mask pattern; the photoresist mask layer is removed after completion; the method of combining dry etching and wet etching is adopted to remove the gold plating layer in the non-electroplating area, so that the lateral corrosion of the metal layer is obviously reduced, the high-precision and high-fidelity electrode pattern transfer is realized, the lateral corrosion of the metal layer is reduced, and the passivation protection effect of the device is improved.

This disclosure relates to a lens assembly. The lens assembly includes a lens barrel, a plurality of lenses disposed along an optical axis within the lens barrel, and spacers disposed between the plurality of lenses. The spacers include a plurality of grains and a plurality of pores. The plurality of grains include at least one selected from alumina (Al₂O₃), titanium dioxide (TiO₂), silicon dioxide (SiO₂), and zirconium oxide (ZrO₂).

The invention relates to a sterilizable barrier layer laminate (10) comprising a polypropylene (PP) outer layer (20) which has barrier properties, a reverse printing (30) to which a primer layer (40) has been applied, and a PP inner layer (60) situated opposite the PP outer layer, wherein a primer layer is located on the reverse printing and a PP connecting layer (50) is extruded in between the primer layer and the PP inner layer, and wherein the PP outer layer is an outermost layer of a multilayer barrier film (21) which, from the outside in, i.e. as seen from the PP outer layer in the direction toward the PP inner layer, comprises the following layers: at least one functional skin layer (22), an aluminum oxide layer (25) and a top coating layer (23). The invention also alternatively relates to a sterilizable barrier layer laminate comprising: an outer PP layer (20'), a reverse printing and a PP inner layer situated opposite the outer PP layer (20'), wherein between the outer PP layer, in particular the reverse printing, and the PP inner layer there is a multilayer barrier film which, from the outside in, i.e. as viewed from the outer PP layer in the direction toward the PP inner layer, comprises the following layers: a PP outer layer, at least one functional skin layer, an aluminum oxide layer and a top coating layer, wherein the multilayer film is connected on one side to the reverse printing and on the other side to the PP inner layer by means of an adhesive layer (80). The invention further relates to a method for producing the laminate and to the use of same.

This invention discloses a method for combining CNC high-precision high-temperature resistant insulating substrate engraving with tin-copper alloy printed circuit 3D printing, belonging to the field of high-power circuit carrier manufacturing technology. The invention uses 99.7% alumina ceramic or silicon nitride ceramic as the insulating substrate, achieving high-precision structural forming of ±0.005-0.025mm through CNC layer engraving. Sandblasting, roughening, sensitization, activation, and pre-plating surface modification enhance interfacial adhesion. CuSn10 tin bronze is used as the printing material, and the circuit is formed by SLM or FDM 3D printing at a sintering temperature of 850-900℃, achieving a forming density ≥98.71%. Through stepped heating sintering and high-temperature resistant inorganic adhesive curing, the ceramic substrate and tin-copper alloy circuit are integrated. The circuit carrier obtained by this invention has a long-term temperature resistance of ≥1600℃, a volume resistivity of ≥10¹⁴Ω·cm, a current carrying capacity of 15.6A for 3mm lines, and an adhesion strength retention rate of ≥95% after 1000 thermal cycles. The temperature rise is 15~20℃ lower than that of traditional PCBs. It is suitable for high-load, high-current scenarios such as industrial power supplies and new energy power control. It is compatible with processes and has complete industrial support, and has significant technical and economic feasibility.

The mullite high-temperature hot patching material is prepared by mixing the electro-fused mullite, the bimodal alumina micro powder, the additive modified powder, the electro-fused mullite, the fast sintering agent, the clay, the coagulant and the sintering aid, carrying out hot-state patching construction operation by adopting an injection machine or a spray gun, and carrying out fast reaction and sintering in a hot state to obtain a compact refractory material. The refractoriness of the generated refractory material is greater than or equal to 1750 DEG C, the load softening point is greater than or equal to 1700 DEG C, and the refractory material can bear 1700 DEG C high-temperature

This invention discloses a black-based blue-spotted glaze with an earthworm-like pattern and its preparation method. The glaze consists of a body, a black base glaze, and a blue-spotted glaze from the inside out. The raw materials for the black base glaze are: feldspar, calcite, calcium borate, dolomite, talc, barium carbonate, quartz, bentonite, zirconium silicate, rutile, cobalt oxide, manganese oxide, and iron oxide. The raw materials for the blue-spotted glaze are: feldspar, limestone, alumina, talc, barium sulfate, Datong clay, zinc oxide, quartz, and titanium dioxide. The preparation method includes: 1. Wet ball milling the black base glaze raw materials to obtain a black base glaze slurry; 2. Wet ball milling the blue-spotted glaze raw materials to obtain a blue-spotted glaze slurry; 3. Bisque firing the body; 4. Applying the black base glaze slurry to the body and drying it; 5. Applying the blue-spotted glaze slurry to the body and drying it; 6. Oxidation firing and reduction firing of the body, followed by natural cooling to obtain the black-based blue-spotted glaze. The raw material formula of this invention is reasonable and environmentally friendly, which can improve the mechanical properties of the glaze; the preparation method is simple and the yield is high.

The application discloses a laser light source packaging method based on silicon nitride ceramics and relates to the technical field of laser light source packaging.The laser light source packaging method is composed of silicon nitride ceramics, a laser chip, silver powder resin glue, aluminum oxide, epoxy resin and N-methyl pyrrolidone raw materials.The light source packaging steps are as follows: firstly, the position of the center point of the laser in the laser cavity of the silicon nitride ceramics is measured by using a screw micrometer; the laser light source packaging method based on silicon nitride ceramics measures the position of the center point of the silicon nitride ceramic circuit plate by using a screw micrometer, marks the position by using silver powder resin glue, and stabilizes the light spot line by using laser light source projection technology, so that the laser pad plate of the silicon nitride ceramics is aligned and packaged with the envelope frame, the laser light cannot be offset, the quality of the laser light source packaging based on silicon nitride ceramics is high, the packaging effect is good, cost is saved, and the market use is widened.

The application relates to the fields of material science and electronic heat dissipation technology, and discloses a high-thermal-conductivity low-interface-thermal-resistance heat dissipation powder and a preparation method thereof, which comprises the following steps: S1, mixing a base material and a reinforcing material, and then dissolving the mixture in a dissolving solution to form an initial suspension; S2, adding a functional additive to the initial suspension, and forming a functional initial material with a three-dimensional network structure through a sol-gel method; S3, depositing an interface modifier on the surface of the functional initial material to form a dense interface modification layer, and preparing a composite material; S4, calcining the composite material at high temperature in an inert atmosphere to obtain a heat dissipation material; and S5, cooling, grinding and screening the heat dissipation material to obtain the heat dissipation powder. The high-thermal-conductivity low-interface-thermal-resistance heat dissipation powder and the preparation method thereof have the advantages that through micro-nano double-scale structure design, micron alumina skeletons and nano reinforcing materials are embedded, and interface modification technology and functional additives are synergized, so that the heat dissipation powder has the advantages of high thermal conductivity, low interface thermal resistance, solution of traditional material agglomeration and heat conduction deficiency, and mechanical and thermal conductivity performance.

The invention relates to a high-frequency thin film magnetic bead and a preparation method and application thereof. The preparation method comprises the steps that a Fe source, a Si source, a B source, a Cu source, a Nb source and a Ga source are smelted into a first alloy ingot according to a formula, then the first alloy ingot and a C source are smelted to prepare a second alloy ingot, the second alloy ingot is prepared into an amorphous alloy strip, and an iron-based nanocrystalline alloy is obtained through magnetic field heat treatment; the method comprises the following steps: mixing an iron-based nanocrystalline alloy and aluminum oxide to form a magnetic mixture, placing the magnetic mixture in a mold provided with a surrounding wire, carrying out pressure forming to obtain a thin-film-shaped magnetic blank, and sintering the thin-film-shaped magnetic blank in an inert gas environment to obtain a magnetic bead blank; and mixing an insulating material with graphite, forming a coating layer on the surface of the magnetic bead blank to obtain a magnetic bead body, and arranging an electrode electrically connected with the surrounding wire on the magnetic bead body to obtain the high-frequency thin-film magnetic bead. According to the invention, the material and the structure of the magnetic bead are optimally designed, so that the high-frequency thin-film magnetic bead with better magnetic performance and smaller volume can be obtained.

The invention discloses a full-wave-band high-reflectivity metal composite film structure and a preparation method thereof, and relates to the technical field of semiconductor light-emitting elements. The metal composite film structure is applied to a light-emitting element, light enters from one side of an adhesion layer of the metal composite film structure, and the metal composite film structure at least comprises the adhesion layer with the thickness ranging from 0.5 nm to 2.5 nm; the composite reflecting layer is arranged on the adhesion layer, and the composite reflecting layer is of a stacked structure of a silver layer and an aluminum layer, or is a silver-aluminum alloy layer. The invention further discloses a preparation method of the structure, a vacuum electron beam evaporation process is adopted, when the composite reflecting layer is deposited, the evaporation rate is controlled to be 1-15 angstroms per second, and cavity heating at the temperature of 40-70 DEG C is supplemented. The invention preferably also comprises a double-layer protection structure consisting of atomic layer deposited aluminum oxide and chemical vapor deposited silicon dioxide. According to the invention, the problems of low reflectivity, narrow wave band, contradiction between adhesive force and reflectivity, high-cost sputtering process damage and the like of a traditional reflector are solved, and the advantages of full-wave band high reflectivity, high adhesive force, high reliability, low cost and low damage preparation are realized.

The application discloses a preparation method of an alumina copper-clad plate with reduced black spots, and belongs to the field of advanced ceramic preparation. The alumina copper-clad plate is obtained through a direct copper-cladding sintering method and black spot removal. The black spot proportion of the alumina copper-clad plate is less than 1%, and the bending strength reduction proportion is 0, so that the product yield is greatly improved, and the overall manufacturing cost is reduced.

This invention provides a magnetron sputtering method for preparing a highly bonded alumina / silicon nitride / metal composite thin film, belonging to the field of thin film material preparation technology. The magnetron sputtering method includes the following steps: Step 1, pretreating an alumina substrate to obtain a pretreated alumina substrate; Step 2, using a silicon target as the target material, preparing a silicon nitride layer on the surface of the pretreated alumina substrate by magnetron sputtering; Step 3, after forming the silicon nitride layer on the surface of the alumina substrate, directly switching the power supply to DC sputtering to prepare the metal layer: using a metal element as the target material, preparing the metal layer on the surface of the silicon nitride layer by DC sputtering. The method provided by this invention achieves strong interfacial bonding between the silicon nitride layer and the alumina substrate, and between the metal layer and the silicon nitride layer, improving the stability of the thin film structure and meeting the application requirements of high-performance devices.

A glass includes silica, alumina, boria, and yttria. The glass may have high fracture toughness, often greater than 1 MPa·m1 / 2, as well as high Vickers hardness, on the order of 800 kgf / mm2 or greater. Furthermore, Applicants find that, due to surprisingly large high-temperature coefficient of thermal expansion (e.g., over 35 ppm / °C at about 875°C) and high elastic modulus (e.g., >120 GPa) the glass may be particularly suitable for thermal tempering, which may strengthen a corresponding article comprising the glass.

The application discloses a preparation method of a bismuth vanadate / alumina foam ceramic composite photocatalytic material, and comprises the following steps: S1, washing a substrate material, and then pretreating the substrate material to obtain a pretreated substrate; S2, mixing water, ethanol and ethylene glycol to obtain a mixed solution A for standby; S3, dissolving soluble vanadium salt, soluble bismuth salt and a doped element in the mixed solution A, and continuously stirring until the soluble vanadium salt, the soluble bismuth salt and the doped element are dissolved to obtain a mixed solution B; S4, repeatedly immersing the pretreated substrate in the mixed solution B, and sufficiently drying the pretreated substrate after the immersion to obtain an immersed substrate material; and S5, sintering the immersed substrate material in a sintering device, and then taking out the immersed substrate material after the immersed substrate material is naturally cooled to room temperature to obtain the bismuth vanadate / alumina foam ceramic composite photocatalytic material. The process flow of the application is simple, raw materials used are simple and easy to obtain, the operation difficulty of a preparation process is moderate, controllability is good, synthesis conditions are easy to control, and the application has strong operability and practicability.

A silicon-phase change material hetero-integrated waveguide structure includes a silicon flat plate layer and a phase change material deposited on the silicon flat plate layer. A non-volatile waveguide phase shifter includes a base layer, a hetero-integrated waveguide structure and a silicon waveguide mode spot conversion structure fixed on the base layer, two ends of the hetero-integrated waveguide structure are symmetrically connected to the silicon waveguide mode spot conversion structure; the silicon waveguide mode spot conversion structure includes two silicon waveguides with narrow-to-wide and an ridge waveguide with wide-to-narrow arranged in axial symmetry; an aluminum oxide film is covered on the phase change material, a single-layer graphene is on the aluminum oxide film, and a metal layer is on the single-layer graphene, the metal layer includes two metal electrodes. The single-layer graphene forms ohmic contact with the metal electrodes, current passes through the graphene to generate heat, the heat is conducted through the aluminum oxide film below the single-layer graphene to provide heat required for phase change of the low-loss phase change material. The phase shifter has the advantages of compact structure, low insertion loss, small driving voltage, low phase change power consumption, non-volatile phase adjustment, etc. and can be used as a core optical path regulation device in an integrated optoelectronic chip.

The invention discloses flaky alumina and a preparation method thereof, the flaky alumina is in a square sheet shape and has a single crystal structure, the grain size of the flaky alumina is 300-1300 nm, and the grain thickness is less than or equal to 150 nm. The preparation method comprises the following steps: placing roasted SB powder and a quaternary ammonium base solution in a pressure container in a solid-liquid two-phase separation manner, carrying out a gas-solid reaction under certain heat treatment conditions, and drying and roasting the reacted solid powder to obtain the flaky aluminum oxide. The flaky aluminum oxide is regular in structure and flat and smooth in surface, can be used as a polishing material, a coating, a catalysis material and an adsorption material, and is simple in preparation process, easy in raw material obtaining and easy in industrial production.

The invention discloses a space anti-radiation glass cover sheet and a preparation method thereof, the glass cover sheet comprises the following raw materials by mass: 50-70 parts of silica, 5-15 parts of sodium oxide, 5-10 parts of lithium oxide, 5-10 parts of diboron trioxide, 3-10 parts of lead oxide, 2-6 parts of cerium oxide, 0.5-6 parts of potassium oxide, and 2-5 parts of alumina. According to the invention, PbO and CeO2 are added into the preparation raw materials, so that the radiation resistance of the glass cover plate is enhanced.

The application discloses honeycomb ceramic and a preparation method thereof. A composite additive is added into mixed ceramic raw materials, and the weight ratio of the mixed ceramic raw materials to the composite additive is (30-50):(50-70). The composite additive comprises 30-54 parts of flaky alumina, 2-10 parts of nano-zinc oxide and 1-5 parts of metal molybdenum particles. The honeycomb ceramic is prepared through ball milling, kneading, refining, extrusion forming, drying and sintering. The application replaces bauxite with flaky alumina, adds beneficial additives, i.e. nano-zinc oxide and metal molybdenum particles, and uses the original extrusion forming equipment to realize the layered structure of the flaky alumina, thereby building a shell-like pearl layer structure with the layered alumina as a "brick", the metal molybdenum particles as "mud" and the zinc-aluminum spinel particles as "protrusions".

The invention relates to a method for producing a refractory block. A method of manufacturing a refractory block comprising more than 80% zirconia, based on the weight of oxides, the method comprises the following steps: a) melting a feed comprising more than 50% by weight of zircon under reducing conditions in order to reduce the zircon and obtain a molten material, b) applying oxidation conditions to the molten material, the oxidation conditions being obtained by the combined action of an intermediate length arc that does not produce reduction and stirring that facilitates reoxidation, c) casting the molten material, d) cooling until the molten material at least partially solidifies into a block, the block weight being greater than 10 kg, e) optionally subjecting the block to a heat treatment, the feed comprising alumina particles on the one hand and sodium and / or boron source particles on the other hand, the method parameters being such that the block obtained in step d) has greater than 2.5% SiO2 and greater than 0.2% Na2O.

This invention discloses a black pigment for ceramic substrates, its preparation method, and its application, belonging to the field of ceramic substrate technology. The black pigment comprises the following raw materials in molar mass parts: 1-3 parts V₂O₅, 3-5 parts Al₂O₃, 1-3 parts Sm₂O₃, 0.5-4 parts Y₂O₃, 0.5-4 parts Cr₂O₃, and 0.5-4 parts Fe₂O₃. The black pigment is prepared by a solid-state method. The black pigment provided by this invention is cobalt-free, low in cost, and contains low levels of heavy metals, resulting in lower harm to human health during actual production. Black ceramics with this pigment exhibit good color rendering and color stability at high temperatures of 1000℃-1600℃. Furthermore, the electrical properties of black ceramics with this pigment, such as volume resistivity, meet the requirements for encapsulation ceramics. The black pigment of this invention can be widely used in the preparation of various black ceramics, such as alumina, zirconium oxide, and aluminum nitride encapsulation ceramics.

The invention is directed to a method for forming aluminium oxide on a substrate, said method comprising providing the substrate into a reaction chamber and performing at least one atomic layer deposition cycle, each cycle comprising the sequential steps (6;8) of exposing the substrate to a trimethylaluminium precursor into the reaction chamber and exposing the substrate to an oxidant into the reaction chamber. The method further comprises a step (4) of exposing the substrate to a diethylzinc precursor before or simultaneously to the step (6) or at least one of the steps (6) of exposing the substrate to the trimethylaluminum precursor.

The invention relates to a free-flow electrophoresis cell for purifying and / or separating an initial solution containing a product to be purified and / or separated, comprising - at least one plate X between two adjacent plates Y: X being an electrophoresis plate made of inert material, Y being a sealed plate made of sapphire or alumina Al2O3 containing 99% α-Al2O3, - an electrophoresis chamber comprising s sub-units Ui, s representing an integer from 2 to 5 and i being an integer varying from 1 to s, - a cooling circuit, characterized in that the electrophoresis chamber comprises: - intermediate channels connecting the two successive sub-units.

To provide an amorphous silica-alumina capable of controlling a hydrocracking reaction of a long-chain paraffin to primary cracking with high efficiency and exhibiting high catalytic activity when containing an active metal element, and to provide a method for producing the same.SOLUTION: The amorphous silica-alumina has a ratio of the pore volume of pores having a diameter of 0-2 nm to the pore volume of pores having a diameter of 0-10 nm of ≥60% and a specific surface area of ≥280m2 / g.SELECTED DRAWING: None

A barrier-type paper (18) with a non-barrier paper (16) uses suitable laminating adhesives (26) to form a food packaging material (10). More specifically, a preferred embodiment of the invention is directed to a metallized or aluminum oxide (21) coated paper sheet (20) laminated to a bleached paper sheet (16) while avoiding optics of a shiny metal material being present by at least one of employing a non-shiny metal for the metallized layer (21), coating or printing one or more layers upon the metallized layer (21), and sandwiching the metallized layer (21) in a laminate structure such that the metallized layer (21) is configured to be visually hidden so as to not be optically detectable in a paper recycle line.