The invention relates to an intensive anodic oxidation process to prepare porous anodic alumina film. An aluminum sheet is as an anode; a platinum sheet as a cathode; argon as shielded gas; mixed solution of perchloric acid with absolute alcohol as electrochemical polishing compound for the aluminum sheet; mixed solution of oxalic acid, absolute alcohol and deionized water as electrolyte; and mixed solution of phosphoric acid, chromic acid and deionized water as alumina film corrodent. Through aluminum sheet annealing, purging, electrochemical polishing, mild anodic oxidation, corrosion on aluminum sheet oxide film, intensive anodic oxidation and stripping oxide film, and finally, pale yellow, high purity and ordered porous-structured nanometer-leveled alumina film is achieved; The alumina film pore is in circular shape sized in 30 to 35nm, pore distance in 80 to100nm and pore depth in 162.4 micrometers; growth rate of the alumina film is 54 micrometers/h, which is 27 times higher than 2 micrometers/h of growth rate of anodic oxidation aluminum film prepared through mild anodic oxidation process.