Anodized aluminum alloy material having both durability and low polluting property

an aluminum alloy and durability technology, applied in the field of aluminum alloy materials, can solve the problems of hard anodic oxide film prone to cracking, hard anodic oxide film is harder, and the properties are still unsatisfactory, so as to improve the plasma resistance, the effect of low pollution and high hardness

Inactive Publication Date: 2009-02-26
KOBE STEEL LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0010]The present invention has been made in view of the foregoing problems and it is therefore an object of the present invention to provide an anodized aluminum alloy having a high hardness, durability and low polluting property.
[0012]The anodized aluminum alloy material has a high hardness, durability and low polluting property.
[0013]In the anodized aluminum alloy material in the first aspect of the present invention, the hardness of the part having the lowest hardness of the anodic oxide film is Hv 365 or above, which leads to improvement of plasma resistance.
[0014]The aluminum alloy forming the anodized aluminum alloy material has a Mg content between 0.1 and 2.0%, a Si content between 0.1 and 2.0%, a Mn content between 0.1 and 2.0%, and an Fe, a Cr and a Cu content of 0.03% or below and contains Al and unavoidable impurities as other components, the anodized aluminum alloy material is coated with the anodic oxide film, parts of the anodic oxide film at different positions with respect to the thickness of the anodic oxide film have different hardnesses, respectively, and the difference in Vickers hardness between a part having the highest hardness and the part having the lowest hardness of the anodic oxide film is Hv 5 or above. Therefore, the anodized aluminum alloy material has a high hardness, durability and low polluting property.

Problems solved by technology

However, those properties are still unsatisfactory and further improvement of those properties is desired.
Although the plasma resistance may be improved simply by coating an aluminum or an aluminum alloy material with a hard anodic oxide film, the hard anodic oxide film is liable to crack.
However, such an anodic oxide film is harder, and the crack resistance and durability of such an anodic oxide film are worse.

Method used

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Examples

Experimental program
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examples

[0047]Examples of the present invention will be described. Examples described herein do not place any limit to the present invention and changes that may be made therein without departing from foregoing and the following gist are within the technical scope of the present invention.

[0048]Aluminum alloy ingots of 220 mm in width, 250 mm in length and 100 mm in thickness having the compositions of examples of the present invention, namely, Samples Nos. 1, 2,4 and 5, and comparative examples, namely, samples Nos. 3 and 6 to 14 shown in Table 1 were formed by casting and were cooled at a cooling rate in the range of 10 to 15 ° C. / s. The aluminum alloy ingots were cut and ground to obtain aluminum alloy slabs of 220 mm in width, 150 mm in length and 60 mm in thickness. The aluminum alloy slabs were processed by a soaking process at 540° C. for 4 h. The soaked aluminum alloy slabs of 60 mm in thickness were subjected to a hot rolling process to obtain aluminum alloy plates of 6 mm in thick...

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Abstract

An anodized aluminum alloy material is formed of an aluminum alloy having a Mg content between 0.1 and 2.0% by mass, a Si content between 0.1 and 2.0% by mass, a Mn content between 0.1 and 2.0% by mass, and an Fe, a Cr and a Cu content of 0.03% by mass or below and containing Al and unavoidable impurities as other components, and is coated with an anodic oxide film. Parts of the anodic oxide film at different positions with respect to thickness of the anodic oxide film have different hardnesses, respectively, and the difference in Vickers hardness between a part having the highest hardness and a part having the lowest hardness is Hv 5 or above.

Description

BACKGROUND OF THE INVENTION[0001]1. Field of the Invention[0002]The present invention relates to an aluminum alloy material and, more particularly, to an anodized aluminum alloy material intended for forming members of the vacuum chambers of apparatuses for manufacturing semiconductor devices and liquid crystal devices, such as CVD systems, PVD systems, ion-implanting systems, sputtering systems and dry etching systems, and those placed in the vacuum chambers.[0003]2. Description of the Related Art[0004]Reactive gases, etching gases, and corrosive gases containing halogen as a cleaning gas are supplied into the vacuum chambers of apparatuses for manufacturing semiconductor devices and liquid crystal devices, such as CVD systems, PVD systems, ion-implanting systems, sputtering systems and dry etching systems. Therefore, the vacuum chambers are required to have corrosion resistance to corrosive gases (hereinafter, referred to as “corrosive gas resistance”). Since a halogen plasma is o...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): C25D11/02
CPCC22C21/00C22C21/02C22C21/08C25D11/04C22F1/043C22F1/047C22F1/05C22F1/04
Inventor WADA, KOJIHISAMOTO, JUN
Owner KOBE STEEL LTD
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