31 results about "Solution composition" patented technology

The invention relates to the technical field of etching liquid, in particular to a copper metal etching liquid composition. Comprising the following components in percentage by weight: 5-10% of hydrogen peroxide, 0.1-0.3% of a first fluorine source, 1-5% of first inorganic acid, 1-5% of alkali, 0.01-0.8% of a first metal corrosion inhibitor and the balance of deionized water; and the auxiliary agent comprises 2-8% of a second fluorine source, 10-55% of second inorganic acid, 0.1-2% of a second metal corrosion inhibitor and the balance of deionized water. The etching liquid is excellent in etching effect, CD-loss reaches 0.6-0.8 [mu] m, the slope angle reaches 40-50 degrees, the highest copper load reaches 20000 ppm, and meanwhile the problem that when copper is high, due to the fact that the nitric acid concentration is too high, metal etching is abnormal is solved.

The invention relates to the technical field of analytical chemistry, in particular to a high performance liquid chromatography detection method of a ridecevir intermediate GS-441524, which comprises the following steps: preparing a sample: taking a GS-441524 test sample, dissolving and diluting with a mixed solution composed of dimethyl sulfoxide and a phosphoric acid solution to prepare a test sample solution; the volume fraction of phosphoric acid in the phosphoric acid solution is 0.05-0.1%, and the volume ratio of dimethyl sulfoxide to the phosphoric acid solution is (30: 70)-(60: 40). According to the application, the ridecevir intermediate GS-441524 is dissolved and diluted through the mixed solution composed of the dimethyl sulfoxide and the phosphoric acid solution, and due to the high solubility of the dimethyl sulfoxide to the ridecevir intermediate GS-441524 and the high boiling point of the dimethyl sulfoxide, the ridecevir intermediate GS-441524 with relatively high concentration can also be subjected to high performance liquid chromatography.

The invention provides a solution composition for testing the grafting rate of maleic anhydride, and belongs to the field of high polymer material detection. The solution composition for testing the maleic anhydride grafting rate is prepared from the following components in parts by weight: 80 to 90 parts of a main solvent, 5 to 10 parts of an auxiliary solvent, 3 to 5 parts of a surfactant, 2 to 5 parts of a solubilizer, 0.05 to 0.15 part of a disentangling agent and 0 to 0.15 part of water. The method comprehensively solves the four key problems of high-temperature volatilization / low-temperature precipitation, entanglement embedding, low titration efficiency and free anhydride interference in the traditional method which influence the test accuracy of the maleic anhydride grafting rate.

The invention discloses a tissue slice in-situ hybridization pretreatment liquid and a use method, the tissue slice in-situ hybridization pretreatment liquid is characterized in that the tissue slice in-situ hybridization pretreatment liquid is composed of a compound component A solution and a surfactant component B solution, the compound component A solution and the surfactant component B solution have a proper octanol / water partition coefficient and can effectively remove endogenous fluorescent substances, and a solvent is a hydrophilic solvent; wherein the component A is one or a combination of more of bis (hexamethylene) triamine, dodecyl pyridine chloride, cyclohexylamine, isophorone diamine, N-benzylamino ethanol, N, N, N, N-tetramethyl-1, 6-hexamethylenediamine and 1, 3-bis (aminomethyl) cyclohexane; and the component B is one or a combination of more of triton X-100, tween-20, lauryl sodium sulfate and sodium dodecyl benzene sulfonate. The method is used when the FFPE slice is subjected to fluorescence in-situ hybridization or immunofluorescence experiments, autofluorescence can be reduced in a rapid removal mode, the pretreatment effect is remarkably improved, and the hybridization efficiency of samples difficult to hybridize is improved.

The present invention relates to an etching solution composition for a silver (Ag)-containing metal film, which contains (A) nitric acid, (B) an organic acid containing a plurality of carboxyl groups, (C) an organic acid containing one carboxyl group, (D) a bisulfate, (E) a nitrate, (F) an aliphatic sulfonic acid, (G) an aromatic sulfonic acid, and (H) water, and which has a concave-convex residue control index (J) of 0.5-1.2, and a method for forming a metal pattern using the same. Thus, no silver (Ag) residue is left in the recessed portion of the etched pattern, and the recrystallization of the solid content of the etching liquid composition can be prevented.

A composition for the colorimetric quantification of corrosion inhibiting compounds in an industrial fluid, including an analytic reagent composition comprised of a non-aqueous transition metal-ligand solution mixed with a corrosion inhibitor containing fluid, where the combination produces a color change that quantifies the amount of the corrosion inhibitor in the fluid.

The present disclosure relates to a liquid composition, an adjuvant composition, and a concentrate solute composition. The liquid composition comprises an organic solute, a water- immiscible solvent, an aliphatic water-insoluble alcohol, and optionally water. The adjuvant composition comprises a water-immiscible solvent and an aliphatic water-insoluble alcohol. The concentrate solution composition comprises an organic solute, a water-immiscible solvent, and an aliphatic water-insoluble alcohol. The present disclosure relates to a method for suppressing volatility of organic solutes from their aqueous solutions.

The present disclosure relates to a liquid composition, an adjuvant composition, and a concentrate solute composition. The liquid composition comprises an organic solute, a water-immiscible solvent, an aliphatic water-insoluble alcohol, and optionally water. The adjuvant composition comprises a water-immiscible solvent and an aliphatic water-insoluble alcohol. The concentrate solution composition comprises an organic solute, a water-immiscible solvent, and an aliphatic water-insoluble alcohol. The present disclosure relates to a method for suppressing volatility of organic solutes from their aqueous solutions.

The present invention relates to a solution composition capable of improving the corrosion resistance and blackening resistance of a steel sheet, a steel sheet surface-treated using the same, and a method for producing the steel sheet.

The application discloses a method for improving surface quality and fracture toughness of flexible glass, and belongs to the technical field of glass preparation. The method comprises the following steps: (a) cleaning and drying a flexible glass substrate; (b) immersing the flexible glass treated in step (a) into a mixed solvent composed of a hydrofluoric acid solution, a sulfuric acid solution, a hydrochloric acid solution and an oxalic acid solution, and performing acid etching treatment at 15-60 DEG C, then taking out and washing with pure water, drying, and then performing heat preservation treatment; (c) placing the flexible glass treated in step (b) into a preheated strengthening solution to perform ion exchange strengthening treatment, and then cooling to room temperature to obtain finished flexible glass. The method can effectively improve the fracture toughness of the flexible glass.

The present application relates to etching liquid technical field, specifically to a kind of small key size deviation copper etching liquid composition, by mass percentage, including the following components: hydrogen peroxide, ammonium hydrogen fluoride, 2-mercapto-1,3,4-thiadiazole, imidazole, citric acid, malic acid, ammonium sulfate, triethylene glycol, the rest is deionized water.The mass ratio of 2-mercapto-1,3,4-thiadiazole and imidazole is controlled between 1-2 in the present application, and a complementary adsorption layer is formed, wherein imidazole provides basic corrosion inhibition by covering quickly, 2-mercapto-1,3,4-thiadiazole enhances inhibition by strong bonding, and dynamic protection is achieved by the synergistic effect of the two, which can control the rate, improve uniformity and obtain a bright surface;At the same time, strong inhibition side etching, accurate control of etching morphology, especially anisotropy, to obtain steep sidewall and smooth surface;It can meet the etching demand of small CD bias.

To provide an etchant composition and a method for manufacturing a display device using the same.SOLUTION: The etchant composition includes 8 wt.% to 15 wt.% of an inorganic acid compound, 2.5 wt.% to 8 wt.% of a sulfonic acid compound, 6 wt.% to 14 wt.% of a sulfate compound, 40 wt.% to 55 wt.% of an organic acid compound, 0.01 wt.% to 0.06 wt.% of a metal or a metal salt, and the balance of water.SELECTED DRAWING: Figure 6

The invention discloses a high-solid low-viscosity acrylic pressure-sensitive adhesive and a preparation method thereof.The high-solid low-viscosity acrylic pressure-sensitive adhesive is composed of an acrylic polymer, an initiator, a solvent and a 10% tackifying resin methanol solution. The preparation method comprises the following steps: adding monomers butyl acrylate, methyl acrylate, 2-ethylhexyl acrylate, acrylamide and pentaerythritol triacrylate as well as solvents methanol, toluene and ethyl acetate, heating to 67 DEG C, starting reflux, adding an initiator, reacting for 1 hour after initiation, subsequently supplementing the initiator every 2 hours, supplementing for 3 times, cooling to 50 DEG C, adding a 10% tackifying resin methanol solution, stirring for 30 minutes, and then adding an initiator after reaction for 2 hours. According to the highly low-viscosity acrylic acid pressure-sensitive adhesive and the preparation method thereof, the problem of compatibility between a high-methanol-content system and tackifying resin is solved from the molecular level, and the finally prepared pressure-sensitive adhesive is kept clear and transparent at the normal temperature and the low-temperature environment of-10 DEG C.

The invention discloses a developing solution composition for an integrated circuit, and belongs to the field of wet electronic chemicals. The composition is prepared from the following components in percentage by mass: 1.0 to 5.0 percent of inorganic base, 1.0 to 3.0 percent of developing accelerant, 0.1 to 1.0 percent of penetrating agent, 0.1 to 2.0 percent of nonionic Gemini surfactant and the balance of water, wherein the sum of the mass percent is 100 percent. According to the developing solution composition, the specific non-ionic Gemini surfactant is used, so that the obtained developing solution composition has excellent developing performance, photoresist with slight difference exposure can be effectively developed within the same developing time, edge residues are avoided, the photoresist can be ensured to be completely dissolved in the developing solution and cannot be adhered to a substrate again, and the developing solution composition has good developing performance. The product yield can be improved, and the environment-friendly water-based cleaning agent has the characteristics of excellent wettability, low irritation, easiness in rinsing, easiness in degradation and the like, is environment-friendly, and meets the environment-friendly requirement.

A method for producing a semiconductor treatment liquid used for treating a resin having an ether bond, the method comprising:heating a phosphoric acid-containing solution to 100° C. or higher and 400° C. or lower to produce a heated solution;cooling the heated solution to 5° C. or higher and 95° C. or lower to produce a cooled solution; andmixing the cooled solution with at least one selected from the group consisting of an aqueous hydrogen peroxide solution and an aqueous nitric acid solution.

The invention provides a cryopreservation liquid composition, a cell cryopreservation method and a cell culture method. The cryopreservation liquid composition comprises a first cryopreservation liquid and a second cryopreservation liquid which are stored independently, the first cryopreservation liquid comprises 40%-80% (v / v) of a basic component, 1%-20% (m / v) of an energy substance and 1%-20% (v / v) of a protective component; the second cryopreservation liquid comprises 40%-80% (v / v) of basic components, 1%-20% (m / v) of energy substances, 1%-20% (v / v) of protective components and 5%-10% (v / v) of dimethyl sulfoxide. Therefore, during cryopreservation, the cells are in contact with a DMSO-free friendly environment at normal temperature for most of time, and are only in short contact with high-concentration DMSO in the final step and are immediately cryopreserved, so that the poisoning time of DMSO is greatly shortened. And the final DMSO concentration is reduced by 50%, and the cell recovery viability is higher, so that the toxicity of the DMSO is remarkably reduced.

The application provides a method and device for polishing the surface of reaction sintered silicon carbide, and the method comprises a polishing process, wherein the silicon carbide ceramic product to be polished is polished for 30-40 min at room temperature and under the condition of pH=2-3 by using abrasive particles and a polishing liquid; the polishing liquid is a Fenton auxiliary polishing liquid, the Fenton auxiliary polishing liquid is composed of an A solution and a B solution, the A solution is a 10-12wt% hydrogen peroxide solution, the B solution is composed of an acidic silica sol, diamond, ferrous chloride and water, and the viscosity of the B solution is 500-1000 cSt. By using the Fenton auxiliary polishing liquid and the special device, the reaction sintered silicon carbide ceramic product can be polished, and very good polishing effect can be obtained, the silicon carbide ceramic product has high smoothness and low surface roughness, and the mechanical strength and wear resistance of the surface of the silicon carbide ceramic product can be improved.

The invention discloses an LCMS / MS (Liquid Chromatography Mass Spectrometry / Mass Spectrometry) analysis and detection method for collinear residual impurities of mycophenolate mofetil capsules, and the LCMS / MS is adopted to analyze and detect a test sample in the step S1: chromatographic condition parameters are as follows: a chromatographic column with octadecylsilane chemically bonded silica as a filler is selected, the specification of the chromatographic column is 150mm * 4.6 mm, 2.7 mu m, and the column size is 1mm. A mobile phase is composed of an ammonium formate aqueous solution and an organic solvent mixed solution, and gradient elution is set according to the volume fraction; the flow velocity is 0.25 ml / min-0. 35 ml / min, the temperature of a chromatographic column is 38-42 DEG C, the temperature of a sample introduction disc is 5-10 DEG C, the sample introduction volume is 15-25 microliters, and mass spectrum condition parameters are as follows: an ion source is an electrospray ionization source, and the mode is a positive ion mode; and analyzing and detecting by adopting an external standard method. The method can effectively detect collinear residual impurities, and has the advantages of good sensitivity, high accuracy, high precision and good durability.

A solution containing lipid bilayer membrane particles is filtered by passing it in the planar direction of a filter membrane in the presence of a nonionic surfactant at a concentration of 0.02-0.08% (w / v).

The present invention relates to a solution composition capable of improving the pitting corrosion resistance and blackening resistance of a steel sheet, a steel sheet surface-treated using the same, and a method for producing the steel sheet.

Compositions, methods, and kits for stable Trypan Blue solutions are provided. In one example, a method includes: cooling a solution of Trypan Blue; and filtering the cooled solution. In another example, a method includes: mixing a water-soluble polymer with a Trypan Blue solution. The method may further include adding one or more ingredients such as an aqueous buffer, an osmolyte, an acid, a base, a buffer, a cell culture medium, water, or combinations thereof.

This invention relates to a polymyxin inhalation liquid formulation and its preparation method, comprising 0.1-5% (w / v) polymyxin B sulfate, 0.05-1% (w / v) stabilizer, 0.1-0.9% (w / v) osmolarity regulator, pH adjuster, and solvent; the pH of the liquid formulation is 3.0-6.0; the solvent is selected from purified water and water for injection; the polymyxin inhalation solution provided by this invention has a simple composition, a pH of 3.0-6.0, and is osmotonic, which can reduce bronchospasm and cough caused by polymyxin inhalation solution. Safety evaluation has verified that it has good safety, providing a new option for clinical application.

The present invention provides a removal method for removing a metal compound or a semimetal compound. This removal method includes a step for removing a metal compound or a semi-metal compound using a solution composition containing a solvent (B) containing a compound (B1) represented by general formula (b-1). [In formula (b-1), R1 represents an alkyl group having 1-10 carbon atoms.]

The invention relates to a coating composition, especially to a coating composition intended for thermal insulation of hot metals, which contains an aqueous solution of silicate and which consists of the first layer containing 35 to 71 volume percent of hollow glass spheres, 26 to 62 volume percent of an aqueous solution of potassium silicate, 1 to 3 volume percent of an adhesive additive, and 0.1 volume percent of a water glass stabilizer, and of at least one second layer containing 71 to 84.6 volume percent of hollow glass spheres, 9 to 22.6 volume percent of an aqueous solution of potassium silicate, 02 to 0.3 volume percent of an adhesive additive, 0,1 volume percent of a water glass stabilizer, 2 to 3 volume percent of cut glass fibres, and 1.7 to 3 volume percent of a styrene-acrylate dispersion. Method of application of the coating composition, especially method of application of the coating composition which consists of at least one layer containing an aqueous solution of silicate according to which, as the first step, the first layer containing 35 to 71 volume percent of hollow glass spheres, 26 to 62 volume percent of an aqueous solution of potassium silicate, 1 to 3 volume percent of an adhesive additive, and 0.1 volume percent of a water glass stabilizer is applied and then the second layer containing 71 to 84.6 volume percent of hollow glass spheres, 9 to 22,6 volume percent of an aqueous solution of potassium silicate, 0.2 to 0.3 volume percent of an adhesive additive, 0.1 volume percent of a water glass stabilizer, 2 to 3 volume percent of cut glass fibres, and 1.7 to 3 volume percent of a styrene-acrylate dispersion ís applied onto the first layer.

The application discloses a preparation method of a cleaning solution composition after IC copper process CMP, wherein the cleaning solution composition comprises: a surfactant, a wetting agent, an organic phosphine chelating agent, an organic amine chelating agent, a quaternary ammonium lye, an organic solvent, a defoaming agent, a pH regulator, and the rest is water; the quaternary ammonium lye is a THEMAH-containing composition directly prepared by the following method, which comprises: taking one or more of methylamine, methyl ethanolamine and methyl diethanolamine as one of raw materials, and reacting with ethylene oxide without a catalyst silica, and the reaction temperature is 20-100 DEG C. The application further discloses a preparation method of the quaternary ammonium lye. The application utilizes the characteristics of reaction self-heat release, is easier to control temperature, is convenient to operate, has lower energy consumption, has less by-products such as ethylene glycol in the product without using a catalyst such as silica, and can reduce the risk of ethylene oxide accumulation. The obtained quaternary ammonium lye containing THEMAH has component content ratios which can directly meet commonly recognized cleaning solution specifications.

The invention relates to a hydrometallurgical process for the treatment and recycling of spent fuel salt from a molten chloride nuclear reactor, comprising at least the steps of: a) precipitation of chloride ions present in the spent fuel salt by: - ​​dissolving the spent fuel salt in an aqueous solution of nitric acid comprising a nitrate of a metal M; or - dissolving the spent fuel salt in an aqueous solution of nitric acid and adding the nitrate of metal M to the resulting solution; thereby obtaining a two-phase medium consisting of a precipitate of chloride of metal M and an aqueous nitric phase comprising the metals of the spent fuel salt in the form of nitrates; b) separation of the precipitate of chloride of metal M from the aqueous nitric phase; c) dissociation of the precipitate of chloride of metal M obtained in step b) into chlorine and metal M, with recovery of the chlorine;d) selective recovery of at least one of the actinides present in the aqueous nitric phase obtained in step b) by implementing at least one liquid-liquid extraction-deextraction process; ete) use of the dichlorine recovered in step c) and of said at least one actinide recovered in step d) to produce a new fuel salt for a molten chloride nuclear reactor.;

The application relates to the technical field of analytical chemistry, in particular to a high-performance liquid chromatography detection method for remdesivir intermediate GS-441524, which comprises sample preparation and high-performance liquid chromatography detection, wherein the sample preparation is as follows: taking a GS-441524 test sample, dissolving and diluting the test sample in a mixed solution composed of dimethyl sulfoxide and a phosphoric acid solution to prepare a test sample solution; the volume fraction of phosphoric acid in the phosphoric acid solution is 0.05-0.1%, and the volume ratio of the dimethyl sulfoxide to the phosphoric acid solution is 30:70-60:40. The remdesivir intermediate GS-441524 is dissolved and diluted in the mixed solution composed of dimethyl sulfoxide / phosphoric acid solution, and due to the high solubility of dimethyl sulfoxide to the remdesivir intermediate GS-441524 and the high boiling point of dimethyl sulfoxide, the high-performance liquid chromatography can be carried out on the remdesivir intermediate GS-441524 with a higher concentration.

The application discloses a color filter developing solution composition for flexible OLED and a preparation method thereof, and belongs to the field of wet electronic chemicals. The developing solution composition is prepared from inorganic alkali, alkylcyclohexylphenyl polyoxyethylene ether, castor oil polyoxyethylene ether, a cosolvent, and the rest is high-purity water. The special non-nonionic surfactant is used to produce a synergistic effect. The developing solution system has excellent stability under high alkali concentration, can meet the color filter process requirements of the flexible OLED, is easy to clean, cannot cause yield fluctuation due to residues, can effectively reduce production and transportation costs, and can prolong the storage period of the material inventory of customers.

The present application relates to etching liquid technical field, specifically to a kind of small key size deviation copper etching liquid composition, by mass percentage, including the following components: hydrogen peroxide, ammonium hydrogen fluoride, 2-mercapto-1,3,4-thiadiazole, imidazole, citric acid, malic acid, ammonium sulfate, triethylene glycol, the rest is deionized water.The mass ratio of 2-mercapto-1,3,4-thiadiazole and imidazole is controlled between 1-2 in the present application, and a complementary adsorption layer is formed, wherein imidazole provides basic corrosion inhibition by covering quickly, 2-mercapto-1,3,4-thiadiazole enhances inhibition by strong bonding, and dynamic protection is achieved by the synergistic effect of the two, which can control the rate, improve uniformity and obtain a bright surface;At the same time, strong inhibition side etching, accurate control of etching morphology, especially anisotropy, to obtain steep sidewall and smooth surface;It can meet the etching demand of small CD bias.

The invention provides a sterilization and disinfection liquid composition which comprises sodium silicate, sodium benzoate, sodium acetate, sodium persulfate, sodium chloride and sodium metaphosphate, the composition is simple in raw material composition and low in cost, and the obtained composition is extremely high in stability, not easy to decompose, easy to store and transport and extremely high in economic value.