71 results about "Solution composition" patented technology

The present disclosure is directed to a processing solution composition comprising a metal salt, an acid, a solvent, and a non-metal reductant. The present disclosure is also directed to a method of impregnating a porous material by covering or coating the porous material with a processing solution comprising a metal salt, an acid, a solvent, and a non-metal reductant.

The invention relates to the technical field of etching liquid, in particular to a copper metal etching liquid composition. Comprising the following components in percentage by weight: 5-10% of hydrogen peroxide, 0.1-0.3% of a first fluorine source, 1-5% of first inorganic acid, 1-5% of alkali, 0.01-0.8% of a first metal corrosion inhibitor and the balance of deionized water; and the auxiliary agent comprises 2-8% of a second fluorine source, 10-55% of second inorganic acid, 0.1-2% of a second metal corrosion inhibitor and the balance of deionized water. The etching liquid is excellent in etching effect, CD-loss reaches 0.6-0.8 [mu] m, the slope angle reaches 40-50 degrees, the highest copper load reaches 20000 ppm, and meanwhile the problem that when copper is high, due to the fact that the nitric acid concentration is too high, metal etching is abnormal is solved.

The invention relates to the technical field of etching solutions, in particular to a Cu-MTD alloy etching solution composition and application thereof. The composition comprises a main agent and an auxiliary agent, and the main agent comprises the following components in percentage by weight: 12-20% of hydrogen peroxide, 6-15% of first organic acid, 0.001-0.08% of a first pH regulator, 2-8% of organic alkali and the balance of deionized water; and the auxiliary agent comprises 20-55% of second organic acid, 2-10% of inorganic acid, 0.05-0.5% of a second pH regulator, 10-30% of an alkaline compound and the balance of deionized water. According to the etching solution, the main agent and the auxiliary agent are compounded, the taper angle of a Cu layer can be larger than 42 degrees, and the service life cycle can reach that the Cu concentration is larger than or equal to 10000 ppm.

The invention relates to the technical field of analytical chemistry, in particular to a high performance liquid chromatography detection method of a ridecevir intermediate GS-441524, which comprises the following steps: preparing a sample: taking a GS-441524 test sample, dissolving and diluting with a mixed solution composed of dimethyl sulfoxide and a phosphoric acid solution to prepare a test sample solution; the volume fraction of phosphoric acid in the phosphoric acid solution is 0.05-0.1%, and the volume ratio of dimethyl sulfoxide to the phosphoric acid solution is (30: 70)-(60: 40). According to the application, the ridecevir intermediate GS-441524 is dissolved and diluted through the mixed solution composed of the dimethyl sulfoxide and the phosphoric acid solution, and due to the high solubility of the dimethyl sulfoxide to the ridecevir intermediate GS-441524 and the high boiling point of the dimethyl sulfoxide, the ridecevir intermediate GS-441524 with relatively high concentration can also be subjected to high performance liquid chromatography.

The present application relates to the technical field of gypsum preparation, and provides a method for adjusting the preparation process of gypsum. The method includes: collecting the particle size characteristics and acidic characteristics of gypsum particle raw materials; preparing a coating solution, and collecting solution attribute information and solution composition information; establishing a twin model according to the particle size characteristics, acidic characteristics, solution attribute information and solution composition information; connecting the twin model with an optimization model, and the optimization model is embedded with a prediction network; performing optimization according to the prediction network to obtain optimization parameters that meet preset effects; controlling a coating device to perform coating adjustment on the gypsum particle raw materials with the optimization parameters. The present application solves the technical problem that in the process of generating gypsum from citric acid gypsum, due to characteristics such as many impurities and small crystal grains, it is difficult to precisely control the sustained-release effect of the coating layer, realizes the harmless treatment of citric acid gypsum through intelligent process adjustment, improves the sustained-release performance of building gypsum powder, and ensures the effect of gypsum preparation efficiency.

The invention relates to the technical field of pharmaceutical preparations, in particular to a nimodipine composition and a preparation method thereof.The nimodipine composition is an oil-phase composition and comprises nimodipine, an oil phase and a surfactants, the components and the mass ratio of the components are redesigned, the preparation method is improved, dependence on organic solvents can be completely eliminated, and the nimodipine composition is suitable for large-scale production. A clear solution composition can be obtained by adding a water phase, and the composition has good stability and is not separated out under a low-temperature storage condition, so that the concentration of the medicine is ensured. The materials are easy to obtain, the preparation process is simple and rapid, the defects of conventional means in the prior art are overcome on the whole, and a large reference basis is provided for research and further clinical application of a clinical nimodipine solvent.

The invention provides a solution composition for testing the grafting rate of maleic anhydride, and belongs to the field of high polymer material detection. The solution composition for testing the maleic anhydride grafting rate is prepared from the following components in parts by weight: 80 to 90 parts of a main solvent, 5 to 10 parts of an auxiliary solvent, 3 to 5 parts of a surfactant, 2 to 5 parts of a solubilizer, 0.05 to 0.15 part of a disentangling agent and 0 to 0.15 part of water. The method comprehensively solves the four key problems of high-temperature volatilization / low-temperature precipitation, entanglement embedding, low titration efficiency and free anhydride interference in the traditional method which influence the test accuracy of the maleic anhydride grafting rate.

The invention discloses a tissue slice in-situ hybridization pretreatment liquid and a use method, the tissue slice in-situ hybridization pretreatment liquid is characterized in that the tissue slice in-situ hybridization pretreatment liquid is composed of a compound component A solution and a surfactant component B solution, the compound component A solution and the surfactant component B solution have a proper octanol / water partition coefficient and can effectively remove endogenous fluorescent substances, and a solvent is a hydrophilic solvent; wherein the component A is one or a combination of more of bis (hexamethylene) triamine, dodecyl pyridine chloride, cyclohexylamine, isophorone diamine, N-benzylamino ethanol, N, N, N, N-tetramethyl-1, 6-hexamethylenediamine and 1, 3-bis (aminomethyl) cyclohexane; and the component B is one or a combination of more of triton X-100, tween-20, lauryl sodium sulfate and sodium dodecyl benzene sulfonate. The method is used when the FFPE slice is subjected to fluorescence in-situ hybridization or immunofluorescence experiments, autofluorescence can be reduced in a rapid removal mode, the pretreatment effect is remarkably improved, and the hybridization efficiency of samples difficult to hybridize is improved.

The present invention relates to an etching solution composition for a silver (Ag)-containing metal film, which contains (A) nitric acid, (B) an organic acid containing a plurality of carboxyl groups, (C) an organic acid containing one carboxyl group, (D) a bisulfate, (E) a nitrate, (F) an aliphatic sulfonic acid, (G) an aromatic sulfonic acid, and (H) water, and which has a concave-convex residue control index (J) of 0.5-1.2, and a method for forming a metal pattern using the same. Thus, no silver (Ag) residue is left in the recessed portion of the etched pattern, and the recrystallization of the solid content of the etching liquid composition can be prevented.

The present application relates to the technical field of cleaning solution, in particular to a mask cleaning solution composition and a preparation method thereof.The mask cleaning solution composition is characterized by being composed of the following raw materials in mass percentage: 7-13wt% of inorganic alkali, 1-4wt% of organic alkali, 2-5wt% of oxidizing agent, 0.2-0.8wt% of hydroxyethyl sulfonic acid, 3-7wt% of surfactant, 1-4wt% of corrosion inhibitor, 3-8wt% of cleaning aid, and the rest being water; the cleaning aid is modified magnetic porous carbon material.The present application uses the modified magnetic porous carbon material as the raw material of the mask cleaning solution composition, which not only reduces the amount of chelating agent used, but also achieves the cleaning effect of energy consumption without the need for adsorbent, more efficiently removes photoresist residues, metal ions and other pollutants, and can be reused, improving the cleaning efficiency and saving the cost.

The present invention relates to a surface treatment solution composition capable of improving corrosion resistance, lubricity and the like of a zinc-plated alloy steel sheet, a plated steel sheet surface-treated with the surface treatment solution composition, and a method for manufacturing the plated steel sheet.

A composition for the colorimetric quantification of corrosion inhibiting compounds in an industrial fluid, including an analytic reagent composition comprised of a non-aqueous transition metal-ligand solution mixed with a corrosion inhibitor containing fluid, where the combination produces a color change that quantifies the amount of the corrosion inhibitor in the fluid.

The invention discloses a preparation process and method of a developing solution composition for a color filter. Comprising 18-mega ultrapure water filtering equipment capable of filtering conveyed and filtered tap water into 18-mega ultrapure water, a pure water storage tank for storing pure water, more than one material storage tank, a mixing tank for mixing raw materials, and a finished product delivery tank for storing a developing solution composition, the primary filtering tank is used for carrying out primary filtering on the developing solution composition; the filter is used for carrying out secondary filtering on the developing solution composition filtered by the primary filtering tank; an activated carbon adsorption layer is arranged in the primary filtering tank, and the storage tank is used for storing raw materials for preparing the developing solution composition. According to the invention, a developing solution composition finished product with high purity, few impurities and high stability can be prepared.

The present disclosure relates to a liquid composition, an adjuvant composition, and a concentrate solute composition. The liquid composition comprises an organic solute, a water- immiscible solvent, an aliphatic water-insoluble alcohol, and optionally water. The adjuvant composition comprises a water-immiscible solvent and an aliphatic water-insoluble alcohol. The concentrate solution composition comprises an organic solute, a water-immiscible solvent, and an aliphatic water-insoluble alcohol. The present disclosure relates to a method for suppressing volatility of organic solutes from their aqueous solutions.

The present disclosure relates to a liquid composition, an adjuvant composition, and a concentrate solute composition. The liquid composition comprises an organic solute, a water-immiscible solvent, an aliphatic water-insoluble alcohol, and optionally water. The adjuvant composition comprises a water-immiscible solvent and an aliphatic water-insoluble alcohol. The concentrate solution composition comprises an organic solute, a water-immiscible solvent, and an aliphatic water-insoluble alcohol. The present disclosure relates to a method for suppressing volatility of organic solutes from their aqueous solutions.

The present invention relates to a solution composition capable of improving the corrosion resistance and blackening resistance of a steel sheet, a steel sheet surface-treated using the same, and a method for producing the steel sheet.

The application discloses a method for improving surface quality and fracture toughness of flexible glass, and belongs to the technical field of glass preparation. The method comprises the following steps: (a) cleaning and drying a flexible glass substrate; (b) immersing the flexible glass treated in step (a) into a mixed solvent composed of a hydrofluoric acid solution, a sulfuric acid solution, a hydrochloric acid solution and an oxalic acid solution, and performing acid etching treatment at 15-60 DEG C, then taking out and washing with pure water, drying, and then performing heat preservation treatment; (c) placing the flexible glass treated in step (b) into a preheated strengthening solution to perform ion exchange strengthening treatment, and then cooling to room temperature to obtain finished flexible glass. The method can effectively improve the fracture toughness of the flexible glass.

The invention provides a CMP polishing solution composition and application thereof in copper polishing, the polishing solution composition comprises grinding particles, a complexing agent, a corrosion inhibitor, an anionic surfactant, a bactericide, a pH regulator and an oxidizing agent, and the polishing solution composition is prepared by combining a benzene ring-containing corrosion inhibitor and a benzene ring-free corrosion inhibitor according to a certain proportion. The polishing defects of copper can be greatly reduced, and organic residues are not formed to influence the smoothness of the copper surface; the anionic surfactant is added, so that the removal rate of copper is not influenced while the polishing defects of copper are greatly reduced; a purine compound is further added to serve as a third corrosion inhibitor, the number of scratches can be reduced on the basis that the polishing rate is not affected, and therefore the more excellent polishing effect is achieved.

The present application relates to etching liquid technical field, specifically to a kind of small key size deviation copper etching liquid composition, by mass percentage, including the following components: hydrogen peroxide, ammonium hydrogen fluoride, 2-mercapto-1,3,4-thiadiazole, imidazole, citric acid, malic acid, ammonium sulfate, triethylene glycol, the rest is deionized water.The mass ratio of 2-mercapto-1,3,4-thiadiazole and imidazole is controlled between 1-2 in the present application, and a complementary adsorption layer is formed, wherein imidazole provides basic corrosion inhibition by covering quickly, 2-mercapto-1,3,4-thiadiazole enhances inhibition by strong bonding, and dynamic protection is achieved by the synergistic effect of the two, which can control the rate, improve uniformity and obtain a bright surface;At the same time, strong inhibition side etching, accurate control of etching morphology, especially anisotropy, to obtain steep sidewall and smooth surface;It can meet the etching demand of small CD bias.

The present invention belongs to the field of surface treatment and discloses a method for high-precision plating of a cadmium layer with a deep hole structure having a high aspect ratio, comprising the following steps: cleaning excess material from the surface of a product; electrochemically degreasing the product; weakly corroding the electrochemically degreased product; neutralizing the weakly corroded product; plating cadmium on the neutralized product; performing dimensional inspection on a position where the product requires dimensional inspection; photochemically treating the product after measurement; and passivating the photochemically treated product; wherein during the cadmium plating, the temperature of the cadmium plating solution is 15°C to 40°C. The solution composition is 140g / L~180g / L sodium cyanide, 30g / L~50g / L cadmium oxide, 15g / L~25g / L sodium hydroxide, 30g / L~50g / L ammonium sulfate, and 0.5g / L~1.5g / L nickel sulfate; the electroplating method adopts repeated alternation of impact current / normal current; the cadmium layer obtained by this method has uniform thickness, and any plane is tested multiple times using three coordinates. The measured values are all within the tolerance range of 0.003mm, and the coating adhesion and appearance meet the use requirements.

The present invention relates to a technology for gelling a sample (e.g., exfoliated human cells) in a vial, safely transporting the sample to a testing center, restoring the sample to its original state (e.g., converting it to a liquid phase) at the testing center, and then examining the sample. More specifically, the present invention relates to a technology for converting a sample-preserving liquid contained in a vial into a jelly state, safely transporting the sample to a testing center without deforming it, redissolving the sample-preserving liquid into a liquid phase at the testing center, and then examining the sample. The present invention is advantageous in that gelling of the cell-fixing liquid filled in the vial is simplified because the cell-fixing liquid is gelled by mixing a selected solution with a selected material.

The invention belongs to the technical field of metal surface treatment, and particularly relates to a phosphorus-free passivation solution composition, a preparation method thereof and a magnetic steel surface treatment method.The phosphorus-free passivation solution composition comprises a first passivation solution and a second passivation solution; the passivation solution I comprises the following components in percentage by mass: 4-7% of a silane coupling agent; 3%-6% of ammonium molybdate; 4%-6% of a fatty alcohol nonionic surfactant; 1%-3% of amino acid; 6%-8% of citric acid; and the balance of deionized water. The passivation solution II comprises the following components in percentage by mass: 4-7% of a silane coupling agent; 3%-6% of ammonium molybdate; 2%-4% of nano silicon dioxide particles; 1%-3% of amino acid; 6%-8% of citric acid; 2%-4% of cerous nitrate; and the balance of deionized water. The problem of eutrophication of a water body caused by a traditional phosphating solution is solved, and the problems that a non-phosphorus passivation film is not uniform, the adhesive force is poor, and the salt spray resistance is insufficient are solved.

To provide an etchant composition and a method for manufacturing a display device using the same.SOLUTION: The etchant composition includes 8 wt.% to 15 wt.% of an inorganic acid compound, 2.5 wt.% to 8 wt.% of a sulfonic acid compound, 6 wt.% to 14 wt.% of a sulfate compound, 40 wt.% to 55 wt.% of an organic acid compound, 0.01 wt.% to 0.06 wt.% of a metal or a metal salt, and the balance of water.SELECTED DRAWING: Figure 6

To provide a cleaning solution composition that exhibits excellent cleaning performance against post-CMP residues such as abrasive particles derived from slurry and organic residues containing molybdenum (Mo) on a substrate having a molybdenum (Mo)-containing film, and that suppresses deformation due to corrosion of molybdenum (Mo) wiring as much as possible.SOLUTION: A cleaning solution composition for cleaning substrates having molybdenum (Mo)-containing films contains one or more reducing agents and water, and has a pH of 7 or less.SELECTED DRAWING: Figure 1

The invention discloses a high-solid low-viscosity acrylic pressure-sensitive adhesive and a preparation method thereof.The high-solid low-viscosity acrylic pressure-sensitive adhesive is composed of an acrylic polymer, an initiator, a solvent and a 10% tackifying resin methanol solution. The preparation method comprises the following steps: adding monomers butyl acrylate, methyl acrylate, 2-ethylhexyl acrylate, acrylamide and pentaerythritol triacrylate as well as solvents methanol, toluene and ethyl acetate, heating to 67 DEG C, starting reflux, adding an initiator, reacting for 1 hour after initiation, subsequently supplementing the initiator every 2 hours, supplementing for 3 times, cooling to 50 DEG C, adding a 10% tackifying resin methanol solution, stirring for 30 minutes, and then adding an initiator after reaction for 2 hours. According to the highly low-viscosity acrylic acid pressure-sensitive adhesive and the preparation method thereof, the problem of compatibility between a high-methanol-content system and tackifying resin is solved from the molecular level, and the finally prepared pressure-sensitive adhesive is kept clear and transparent at the normal temperature and the low-temperature environment of-10 DEG C.

The invention discloses a developing solution composition for an integrated circuit, and belongs to the field of wet electronic chemicals. The composition is prepared from the following components in percentage by mass: 1.0 to 5.0 percent of inorganic base, 1.0 to 3.0 percent of developing accelerant, 0.1 to 1.0 percent of penetrating agent, 0.1 to 2.0 percent of nonionic Gemini surfactant and the balance of water, wherein the sum of the mass percent is 100 percent. According to the developing solution composition, the specific non-ionic Gemini surfactant is used, so that the obtained developing solution composition has excellent developing performance, photoresist with slight difference exposure can be effectively developed within the same developing time, edge residues are avoided, the photoresist can be ensured to be completely dissolved in the developing solution and cannot be adhered to a substrate again, and the developing solution composition has good developing performance. The product yield can be improved, and the environment-friendly water-based cleaning agent has the characteristics of excellent wettability, low irritation, easiness in rinsing, easiness in degradation and the like, is environment-friendly, and meets the environment-friendly requirement.

To provide an aqueous developer composition for flexographic printing plates, which exhibits high removal performance for uncured photosensitive resin composition, achieves superior reproducibility in flexographic printing plates, and yields flexographic printing plates with little printing unevenness during printing.SOLUTION: An aqueous developer composition for flexographic printing plates comprises (a) a polyoxyalkylene alkyl ether compound including a branched structure with 3 to 11 carbon atoms and having an HLB value of less than 10.SELECTED DRAWING: None

The invention provides a budesonide inhalable solution composition and a preparation method thereof. Compared with an existing budesonide suspension preparation, the budesonide inhalable solution composition provided by the invention is stable in property; the budesonide and the terbutaline sulfate contained in the solution composition have excellent delivery performance and pharmacokinetic properties, can be better distributed on the surface of bronchus or lung, and can be quickly dissolved and absorbed, quickly exert efficacy and relieve asthma symptoms. The budesonide inhalable solution composition provided by the invention is simple in preparation method and easy for industrial production.

The present invention relates to an etchant composition that does not contain acetic acid and can be used to form metal wiring on an array substrate. The present invention provides an etchant composition that contains 40 to 65 weight percent phosphoric acid, 2 to 10 weight percent nitric acid, 1 to 10 weight percent non-volatile organic acid, an ammonium salt compound, and an amino acid, wherein the sum of the ammonium salt compound content and the amino acid content is 2 to 10 weight percent. The etchant composition of the present invention can control residue in a single silver (Ag) film or multiple films containing silver (Ag), increase the usable life of the etchant, and reduce the volatility of the etchant, thereby forming uniform wiring on a large-area array substrate.

The invention discloses a metallographic corrosive agent for a molybdenum / steel composite material and a corrosion method, the metallographic corrosive agent comprises a molybdenum metal corrosive agent and a steel corrosive agent, the molybdenum metal corrosive agent is composed of a ferricyanide aqueous solution and a sodium hydroxide aqueous solution, and the steel corrosive agent is composed of copper chloride, a hydrochloric acid solution, a sulfuric acid solution and an ethanol solution; according to the corrosion method, the surface of the molybdenum / steel composite material is wiped and corroded by adopting a steel corrosive agent and then adopting a molybdenum metal corrosive agent. According to the metallographic corrosive agent, the molybdenum metal corrosive agent and the steel corrosive agent have a good corrosive effect on matrixes on the corresponding sides by controlling the composition ratio of the two corrosive agents, and have no corrosive effect on matrixes on the other sides, so that a connecting interface and a matrix metallographic structure of a molybdenum / steel composite material are clearly shown; the step-by-step corrosion method is stable in corrosion process, easy to operate and suitable for the field of metallographic sample preparation, and the use sequence of different corrosive agents is not required.