Etching solution composition and metal film etching method using same

A technology of composition and etching solution, applied in the field of etching solution, can solve problems such as slow etching speed, loss of critical dimensions, environmental pollution, etc.

Inactive Publication Date: 2017-05-10
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Because molybdenum is not easy to be etched by general etching solution, or the etching speed is slow, there are often molybdenum residues when etching is completed. Prolonging the etching time to avoid molybdenum residues will lead to greater critical dimension loss (CD- Loss, critical dimension-loss, that is, the difference between the border of the PR photoresist and the border of the metal film)
In the prior art, etchant containing fluorine is often used

Method used

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  • Etching solution composition and metal film etching method using same
  • Etching solution composition and metal film etching method using same
  • Etching solution composition and metal film etching method using same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0043] Etching solution composition A, with the total weight of the composition being 100%, comprises the following components:

[0044] 10% by weight of hydrogen peroxide, 0.1% by weight of 6-hydroxyquinoline, 1% by weight of IDA (iminodiacetic acid), 5% by weight of ethylenediaminetetraacetic acid, 0.375% by weight of H 3 PO 4 , 5% by weight of ET (ethanol), the balance being water.

[0045] Taking the copper-molybdenum metal film (copper is the upper metal film, and molybdenum is the lower metal film) as the etching object, the etching test is carried out using the etching solution composition A. After etching with an etchant, the PR glue was peeled off to obtain the desired pattern after etching; the experimental data are shown in Table 1.

[0046] Such as figure 1 and figure 2 As shown, after the etching test is completed, the CD-loss of the copper-molybdenum metal film is 883nm, the etched edge of the metal film has a cone angle of 65.07 degrees, the thickness of th...

Embodiment 2

[0048] Etching solution composition B, with the total weight of the composition being 100%, comprises the following components:

[0049] 10 wt% hydrogen peroxide, 0.1 wt% 6-hydroxyquinoline, 1 wt% IDA, 0.375 wt% H 3 PO 4 And 0.75% by weight of HAc (acetic acid), 10% by weight of ET, the balance is water.

[0050] The etching test was carried out in the same manner as in Example 1 using etching solution composition B, and the test data are shown in Table 1.

Embodiment 3

[0052] Etching solution composition C, based on the total weight of the composition as 100%, comprises the following components:

[0053] 10 wt% hydrogen peroxide, 0.05 wt% 6-hydroxyquinoline, 1 wt% IDA, 0.375 wt% H 2 SO 4 and 0.75% by weight of HAc, 5% by weight of ET, the balance being water.

[0054] The etching test was carried out in the same manner as in Example 1 using etching solution composition C, and the test data are shown in Table 1.

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Abstract

The invention relates to an etching solution composition, prepared from the following components: 4-25wt% of hydrogen peroxide, 0.01-10wt% of an etching inhibitor, 0.01-10wt% of a chelating agent, 0.01-3wt% of etching additives, 0.01-10wt% of a hydrogen peroxide stabilizer and the balance of water, wherein the total weight of the composition is 100%. The invention also provides a conductive metal film etching method. The method comprises the step of enabling the etching solution composition to be contacted with a conductive metal film, wherein an upper layer metal film is formed by at least one of aluminum, aluminum alloy, copper and copper alloy, and a lower layer metal film is formed by molybdenum and/or titanium.

Description

technical field [0001] The invention relates to the field of etching solution, in particular to an etching solution composition and an etching method using the composition. Background technique [0002] A liquid crystal display device (LCD, Liquid Crystal Display) includes a liquid crystal display panel and a backlight module. Generally, a liquid crystal display panel includes a CF (Color Filter) substrate, a TFT (Thin Film Transistor) array substrate, and a liquid crystal (Liquid Crystal) disposed between the CF substrate and the TFT array substrate. By supplying power to the TFT array substrate or not, the liquid crystal molecules are controlled to change direction, and the light from the backlight module is projected onto the CF substrate to generate a picture. [0003] When manufacturing microcircuits such as TFT-LCD, uniformly apply photoresist by forming conductive metal films such as aluminum, aluminum alloy, copper and copper alloys or insulating films such as silic...

Claims

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Application Information

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IPC IPC(8): C23F1/16
CPCC23F1/16
Inventor 李嘉
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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