The invention relates to a photoetching ordered microcosmic fixed
abrasive polishing pad and a preparation method thereof. Compared with the prior art, the method has the advantages that the to-be-photoetched surface of the substrate is photoetched according to the photoetched pattern, so that the plurality of microscopic
grinding columns are orderly distributed and formed on the
grinding material base according to the preset distribution and arrangement mode, the distribution shape, direction and position of the microscopic
grinding columns on the grinding material base are kept unchanged, and
regular distribution and uniform distribution can be presented; the distribution and the size of the micro grinding columns can be adjusted according to the photoetching pattern to meet different
polishing requirements, then the micro grinding columns of the substrate are compositely filled with the filling body to keep the stability of the micro grinding columns, and the
polishing pad can be suitable for the
micro level to meet the requirement of the manufacturing procedure below 5nm, so that the production efficiency is improved, and the production cost is reduced. The microcosmic grinding columns are formed through photoetching to replace traditional grinding particles, the
chemical stability of the polishing pad during polishing is improved, the removal rate is increased, the
surface roughness is reduced, and the polishing effect of the polishing pad on a polishing product is improved.