The invention belongs to the technical field of micro-nano
processing, and particularly relates to a preparation method and application of a
metal micro-
nano tube array. Comprising the following steps: preparing a
metal layer on the surface of a substrate; coining glue is sprayed on the surface of the
metal layer, then coining is conducted through a template, and a micro glue column array is formed after curing; a
plasma etching process is adopted, the micro glue column array is used as a
mask, the metal layer exposed out of the gaps in the bottom of the micro glue column array is etched, and a structure with the micro glue columns wrapped by metal is formed; and removing the rubber columns in the structure of the metal-coated micro rubber columns to obtain the metal micro-
nano tube array. According to the invention, a residual-layer-free imprinting technology is adopted, the problem of glue layer residue in traditional imprinting is avoided, and the
etching uniformity is improved. A
plasma dynamic balance process is adopted, the side wall redeposition effect of
etching by-products is utilized, and the metal micro-nano tubes are formed in a self-
assembly mode. The prepared metal micro-
nano tube array has high
aspect ratio compatibility, and the nano tube array with the
aspect ratio as high as 10: 1 can be realized.