The invention discloses a double-frequency
grating interferometer displacement measurement
system. The
system comprises a double-frequency
laser device, an interferometer, a measuring
grating and an electrical
signal processing portion. The measurement
system achieves displacement measurement based on optical
grating diffraction, the optical doppler principle and an optical beat frequency principle. The double-frequency
laser device transmits double-frequency
laser, the laser is divided into reference light and measuring light through a polarizing
beam splitter, the measuring light transmits into a position of the measuring grating, positive and negative first-order
diffraction occurs,
diffraction light and the reference light form a beat frequency
signal which contains displacement information in two directions at the position of a
light detection unit, and
linear displacement output is achieved through
signal processing. According to the system, the sub-nanometer-grade or even higher grade of resolution ratio and accuracy can be achieved, and horizontal large-
stroke displacement and horizontal displacement can be measured at the same time. The system has the advantages of being insensitive to the environment, high in measuring accuracy, small in volume and light in weight. The system serves as a
lithography machine ultraprecise workpiece platform position measurement system, the comprehensive performance of the workpiece platform can be improved.