The invention provides an
MEMS pressure sensor and a manufacturing method thereof, and an electronic device, and the method comprises the steps: providing a first substrate, forming at least two first pressure structures on the surface of the first substrate, each first pressure structure comprises a first
electrode layer, a first sacrificial layer, a first supporting layer, a second
electrode layer, a second supporting layer, and a first cavity, and a first release hole; a second substrate is provided, at least two second pressure structures are formed on the surface of the second substrate, and each second pressure structure comprises a third
electrode layer, a second sacrificial layer and a second cavity; bonding the second supporting layer with the second sacrificial layer; the second substrate is removed to
expose the third electrode layer, the third electrode layer and the second electrode layer form a variable
capacitance structure, the second electrode layer and the first electrode layer form a reference
capacitance structure, and the two variable
capacitance structures and the two reference capacitance structures jointly form a
Wheatstone bridge. According to the scheme, the
measurement precision is improved, and the device performance is further improved.