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469 results about "Relative Change" patented technology

In any quantitative science, the terms relative change and relative difference are used to compare two quantities while taking into account the "sizes" of the things being compared. The comparison is expressed as a ratio and is a unitless number. By multiplying these ratios by 100 they can be expressed as percentages so the terms percentage change, percent(age) difference, or relative percentage difference are also commonly used. The distinction between "change" and "difference" depends on whether or not one of the quantities being compared is considered a standard or reference or starting value. When this occurs, the term relative change (with respect to the reference value) is used and otherwise the term relative difference is preferred. Relative difference is often used as a quantitative indicator of quality assurance and quality control for repeated measurements where the outcomes are expected to be the same. A special case of percent change (relative change expressed as a percentage) called percent error occurs in measuring situations where the reference value is the accepted or actual value (perhaps theoretically determined) and the value being compared to it is experimentally determined (by measurement).

Method and apparatus for monitoring polishing pad wear during processing

In a chemical-mechanical polishing (CMP) process, semiconductor substrates are rotated against a polishing pad in order to planarize substrate layers. The condition of the polishing pad directly affects the polishing rate of material removal and uniformity of removal from the semiconductor wafer. Conditioning of the polishing pad surface with an abrasive improves polishing uniformity and rates, however, it has the detrimental affect of removing a quantity of pad material. A method and apparatus for monitoring polishing pad wear during processing is developed to extend the pad's useful life, and maintain pad uniformity. This is accomplished in the present invention by measuring and monitoring the diminished pad thickness using a non-intrusive measurement system, and creating a closed-loop system for adjusting the chemical-mechanical polishing tool process parameters. The non-intrusive measurement system consists of an interferometer measurement technique utilizing ultrasound or electromagnetic radiation transmitters and receivers aligned to cover any portion of the radial length of a polishing pad surface. The measurement system is sensitive to relative changes in pad thickness for uniformity, and to abrupt changes such as detecting wafer detachment from the CMP wafer carrier.
Owner:INT BUSINESS MASCH CORP

Capacitive sensing and data input device power management

Capacitive proximity sensing is carried out by detecting a relative change in the capacitance of a “scoop” capacitor formed by a conductor and a surrounding ground plane. The conductor may be a plate provided in the form of an adhesive label printed with conductive ink. Charge is transferred between the “scoop” capacitor and a relatively large “bucket” capacitor, and a voltage of the bucket capacitor is applied to an input threshold switch. A state transition (e.g., from low to high, or high to low) of the input threshold switch is detected and a value (TouchVal) indicative of a number of cycles of charge transfer required to reach the state transition is determined. The presence or absence of an object or body portion in close proximity to or contact with a device can be determined by comparing TouchVal with a predetermined threshold value (TouchOff). TouchOff can be adjusted to take into account environmentally induced (non-touch related) changes in the capacitance of the scoop capacitor. Power management is provided in a user operated data input device utilizing proximity sensing and switching between three or more power states. Switching between the power states occurs based upon the presence or absence of input activity, and an operation instrumentality (e.g., a hand) in close proximity to or contact with the device. In an optical surface tracking cursor control device embodiment, switching to and from a BEACON state, which provides a reduced flash rate of a surface illuminating light source, is carried out based upon a detected presence or absence of a trackable surface.
Owner:MICROSOFT TECH LICENSING LLC

Statistical modeling and on-line monitoring method based on multimodality collaboration time frame automatic division

The invention discloses a modeling and on-line monitoring method based on multimodality collaboration time frame automatic division, which takes variation of process characteristics in batch shaft and time direction as well as time sequence of time frame running into consideration, and includes the steps of diving all the modalities through collaboration time frame, obtaining a unified time frame division result among different modalities, and building a uniform time frame model for similar process characteristics in each modality to simplify the modeling complexity. According to the invention, based on the result of collaboration time frame division, the relative change among all the modalities is analyzed, a multimodality statistic model based on different fluctuation types is built and applied in on-line monitoring, and the on-line monitoring performance is improved; the method is easy to implement, is successfully applied during the injection molding, not only facilitates the understanding of process characteristic, but also enhances the reliability and confidence level of actual on-line process monitoring, facilitates judging the running state of the industrial process, and timely discovers faults, thereby guaranteeing the safe and reliable running of actual production and the pursuit of high-quality products.
Owner:ZHEJIANG UNIV
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