912 results about "Reference patterns" patented technology

A baggage scanning system and method employ combined angular and energy dispersive x-ray scanning to detect the presence of a contraband substance within an interrogation volume of a baggage item. The interrogation volume is illuminated with penetrating, polychromatic x-rays in a primary fan beam from a source such as a tungsten-anode x-ray tube. An energy-dependent absorption correction is determined from measurement of the attenuation of the fan beam at a plurality of different energies. Radiation coherently scattered by substances in the interrogation volume is detected by an energy-resolved x-ray detector operated at a plurality of scattering angles to form a plurality of scattering spectra. Each scattering spectrum is corrected for energy-dependent absorption and the corrected spectra are combined to produce a scattering pattern. The experimental scattering pattern is compared with reference patterns that uniquely characterize known contraband substances. The system and method can locate and identify a wide variety of contraband substances in an accurate, reliable manner. The system provides for automated screening, with the result that vagaries of human performance are virtually eliminated. False alarms and the need for hand inspection are reduced and detection efficacy is increased.

First, a pattern inspection apparatus detects the first edge from an image of a pattern to-be-inspected. Next, the pattern inspection apparatus conducts matching of the image of the pattern to-be-inspected and the first reference pattern by comparing the first edge and an edge of the first reference pattern. Since, as a result of the matching, a shift quantity S1 can be obtained, and then the first reference pattern is shifted by this shift quantity S1. Subsequently the pattern to-be-inspected is inspected by comparing the first edge and the edge of the first reference pattern so shifted. In this first inspection, pattern deformation quantities are obtained and defects are detected. A shift quantity S2 can be obtained as one of the pattern deformation quantities. Next, in order to detect the second edge from the pattern image to-be-inspected, the corresponding second reference pattern is shifted by a shift quantity S1+S2. Using the second reference pattern so shifted, a profile is obtained on the pattern image to-be-inspected and the second edge is detected. Then, by comparing the second edge and the edge of the second reference pattern so shifted, the pattern to-be-inspected is inspected. Also in this second inspection, the pattern deformation quantities are obtained and defects are detected. A shift quantity S3 can be obtained as one of the pattern deformation quantities.

A fine pattern, such as a semiconductor integrated circuit (LSI), a liquid crystal panel, and a photomask (reticle) for the semiconductor or the liquid crystal panel, which are fabricated based on data for fabricating the fine pattern such as design data is inspected by a pattern inspection apparatus. The pattern inspection apparatus for inspecting a pattern to-be-inspected uses an image of the pattern to-be-inspected and data for fabricating the pattern to-be-inspected. The pattern inspection apparatus includes a reference pattern generation device configured to generate a reference pattern represented by one or more lines from the data, an image generation device configured to generate the image of the pattern to-be-inspected, a detecting device configured to detect an edge of the image of the pattern to-be-inspected, and an inspection device configured to inspect the pattern to-be-inspected by comparing the edge of the image of the pattern to-be-inspected with the one or more lines of the reference pattern.

The present invention provides an apparatus and method for correcting an inspection reference pattern image in order to properly inspect a pattern image of a specimen. The pattern image correcting apparatus is characterized by including: a first pattern synthesizing unit for synthesizing an assist pattern image and a pattern image to be inspected, thereby generating a pattern image to be inspected with an assist pattern; an assist pattern shift processor; a second pattern synthesizing unit for synthesizing the shifted assist pattern image and the inspection reference pattern image, thereby generating an inspection reference pattern image with an assist pattern; a model generating unit for generating a position shift model by using the pattern image to be inspected with the assist pattern and the inspection reference pattern image with the assist pattern; and a correction pattern image computing unit for correcting the inspection reference pattern image.

First, a pattern inspection apparatus detects the first edge from an image of a pattern to-be-inspected. Next, the pattern inspection apparatus conducts matching of the image of the pattern to-be-inspected and the first reference pattern by comparing the first edge and an edge of the first reference pattern. Since, as a result of the matching, a shift quantity S1 can be obtained, and then the first reference pattern is shifted by this shift quantity S1. Subsequently the pattern to-be-inspected is inspected by comparing the first edge and the edge of the first reference pattern so shifted. In this first inspection, pattern deformation quantities are obtained and defects are detected. A shift quantity S2 can be obtained as one of the pattern deformation quantities. Next, in order to detect the second edge from the pattern image to-be-inspected, the corresponding second reference pattern is shifted by a shift quantity S1+S2. Using the second reference pattern so shifted, a profile is obtained on the pattern image to-be-inspected and the second edge is detected. Then, by comparing the second edge and the edge of the second reference pattern so shifted, the pattern to-be-inspected is inspected. Also in this second inspection, the pattern deformation quantities are obtained and defects are detected. A shift quantity S3 can be obtained as one of the pattern deformation quantities.

Methods and devices for detecting eye disease and for assessing the clinical stage of an eye disease in an individual. The methods include projecting test patterns onto the retina of a tested eye and subjecting the individual to a competing sensory stimuli. The competing stimuli may be of various different sensory modalities including visual, auditory, or other sensory modalities. If the individual perceives a difference in at least one localized part of the perceived image of a test pattern as compared to a predefined reference pattern, the individual provides a response indicative of the difference or differences. The responses are processed to assess the severity of eye disease if a disease is detected, or to determine the clinical stage of a detected eye disease.

An apparatus (1) for the assisted performance of a fitness exercise, equipped with a fitness tool (2) configured to interact with the user (3) to enable the user to perform a movement along a preset path overcoming the force of a resistant load (7), comprises: sensing means (4) set up to provide a signal representing the movement of the user (3); feedback means (5) for transmitting a signal to the user (3) during performance of the exercise; a processor (6) connected to the sensing means (4) and to the feedback means (5) to provide the user (3) with feedback in real time on the correctness of performance of the exercise, based on a comparison between the signal representing the movement of the user and a predetermined reference pattern representing an ideal pattern for the movement of the user (3) corresponding to the exercise performed correctly.