219 results about "Reference patterns" patented technology

The Marker Fingerprinting system provides a method for identifying and correlating serial or sequential data patterns across diverse domains such as geological, biological, and financial datasets. This innovation transforms single- or multi-attribute data series into feature matrices, generating unique hash tokens—or fingerprints—that encapsulate specific data patterns. Using advanced signal analysis and spectral transformations, it enables efficient processing and pattern recognition within complex datasets. Fingerprints from reference patterns are matched against target datasets, with quantitative confidence metrics derived from weighted algorithms assessing match accuracy. Iterative data conditioning enhances robustness by addressing noise and inconsistencies, ensuring reliability at scale. The invention improves decision-making by delivering rapid and accurate pattern identification with quantified reliability, making it particularly suited for applications like geological top picking, seismic data analysis, and other fields requiring precise data correlation

The systems and methods disclosed herein monitor application (e.g., artificial intelligence (AI) model) operations using interactions between the application and a kernel. The systems and methods disclosed herein intercept, using a kernel interface, one or more function invocations transmitted from the application (e.g., an AI model without model modification). Event record(s) are generated for one or more functions to define process identifiers, resource interaction types, timestamps, and / or resource identifiers. Observed pattern(s) for the application are identified by comparing current event record(s) with previous record(s), and the identified observed pattern(s) are evaluated against reference pattern(s) to generate score(s). Data packet(s) that indicate observed pattern(s), corresponding score(s), and / or cryptographic digital fingerprint(s) of the one or more functions are generated. The data packet(s) are transmitted to distributed ledgers for immutable storage.

The systems and methods disclosed herein receive a dataset including an observed set of values for a set of variables. The system can use a first set of AI models to identify a set of anomalies in the observed set of values by comparing an observed set of patterns against multiple reference patterns. The system can use a second set of AI models to evaluate the identified anomalies by comparing an observed set of association rules with an expected set of association rules. The system can use a third set of AI models to generate reconfiguration commands to remove the identified anomalies. The reconfiguration commands can be automatically executed to modify the observed association rules to align with the expected association rules.

The invention provides a method and a device for generating an inter-frame color-imitating pattern in FRC. The method comprises the following steps: determining a color depth difference value between a color depth to be displayed and a color depth of a display screen; wherein the to-be-displayed color depth is higher than the color depth; according to the color depth difference value, determining the size and the type of the color-imitated pattern, and screening out a key type from the types; according to the color depth difference value, the color-imitating pattern corresponding to each key type is divided, and a plurality of basic patterns are obtained; determining a reference pattern from the basic pattern, dividing the reference pattern to obtain a plurality of unit patterns, and transforming and splicing the unit patterns to obtain a color-imitating pattern of each frame; wherein the number of the reference patterns is the same as that of the key types. According to the scheme, the chip area occupied by the stored color-imitated patterns is reduced, meanwhile, more kinds of color-imitated patterns can be flexibly generated, and the color shaking effect is improved.

The invention relates to a secondary etching deviation calculation method, a secondary etching pattern and a production method thereof. The secondary etching deviation calculation method comprises the following steps: receiving a secondary etching pattern; the secondary etching pattern comprises an overlay calibration pattern obtained through the same overlay and a defect control group; the defect secondary exposure pattern is a pattern obtained after light-proof defects formed in primary exposure are repaired through secondary exposure; measuring the overlay calibration pattern to obtain an alignment error, measuring the defect-free reference pattern to obtain a corresponding reference size value, and then measuring the defect secondary exposure pattern to obtain a corresponding test size value; the alignment error, the reference dimension value and the test dimension value are dimension values after photoresist removal; and obtaining a mask secondary etching deviation value according to the alignment error, the reference size value and the test size value. After the alignment error is eliminated, the accuracy of the secondary etching deviation value of the mask is improved, and the success rate of secondary repair is improved.

Methods, systems, apparatuses, and computer program products are described. A system may obtain a set of metadata associated with multiple entities of a datastore, the multiple entities including at least two different data types. The system may augment, using a generative artificial intelligence (AI) model, the set of metadata resulting in a set of augmented metadata for the multiple entities of the datastore. The system may generate, using the set of augmented metadata, a set of entity objects for the multiple entities of the datastore and in accordance with a reference schema. The system may identify, using the generative AI model and the set of entity objects as inputs into the generative AI model, first relationships between two or more first entities of the multiple entities of the datastore. Based on the identified relationships and a reference schema relationship model, the system may generate a schema relationship model.

The invention relates to the technical field of electric heat tracing intelligent temperature control, and discloses a control box electric heat tracing band intelligent temperature control system and method. The method comprises the steps of collecting data of a plurality of temperature sensors in a control box, constructing a temperature sequential sequence, and forming a sequential diagram structure reflecting correlation strength among the sensors by calculating spatial proximity and time correlation. And inputting the sequential graph into a state space model, and dynamically adjusting a state transition matrix of the model according to an edge weight of the graph so as to accurately simulate a heat transfer dynamic process in the box. A state output by the model is separated into a periodic component and a trend component, the periodic component is matched with a reference pattern library to identify an abnormal fluctuation phase, and multi-scale decomposition and slope curvature analysis are performed on the trend component to quantify a change trend. According to the method, dynamic and accurate modeling of the complex thermal environment is realized, the temperature can be controlled more accurately, and abnormity can be warned in advance.

The systems and methods disclosed herein receive a dataset including an observed set of values for a set of variables. The system can use a first set of AI models to identify a set of anomalies in the observed set of values by comparing an observed set of patterns against multiple reference patterns. The system can use a second set of AI models to evaluate the identified anomalies by comparing an observed set of association rules with an expected set of association rules. The system can use a third set of AI models to generate reconfiguration commands to remove the identified anomalies. The reconfiguration commands can be automatically executed to modify the observed association rules to align with the expected association rules.

A method for the automated detection of conveyor belt faults consists in acquiring vibration measurement data from a vibration measuring device disposed on structural elements of a conveyor belt, and processing the measurements. During processing, the measurements are compared with a vibration parameter reference value that indicates the presence of a fault in the conveyor belt. The presence of a fault in the conveyor belt is determined if the vibration measurements differ from the vibration parameter reference value and / or correspond to a reference pattern of vibration which indicates the presence of a fault in the conveyor belt. Data about detected faults are recorded in a memory of a computing device and / or are transmitted to an external device. The technical result is an increase in the accuracy with which conveyor belt faults are detected by the analysis of conveyor vibration data.

The invention relates to a method capable of measuring peripheral aberration of a retina. The method comprises the following steps: acquiring wavefront images at a plurality of positions on a retina, and for each wavefront image, carrying out the following processing: searching each light spot in the wavefront image; the light spot located at the centermost position in all the light spots serves as a standard light spot, the wavefront reference pattern is integrally moved, the center position of the wavefront reference pattern is made to coincide with the center of the standard light spot, and a corrected reference pattern is obtained; calculating the deviation condition of each light spot and the corresponding reference position in the correction reference pattern; and determining the aberration of the retina at the position according to each offset condition. The method can realize rapid and accurate wavefront image acquisition in multiple scanning modes, and is high in automation level and convenient to operate.

The invention discloses an optical proximity correction method, a mask plate and a semiconductor structure forming method, and the optical proximity correction method comprises the steps: obtaining a reference layout which comprises a plurality of first metal wire patterns, a plurality of second metal wire patterns and a plurality of cutting patterns; a to-be-corrected graph is obtained from the multiple cut-off graphs, the to-be-corrected graph comprises a first to-be-corrected graph and a second to-be-corrected graph, the first to-be-corrected graph and the second to-be-corrected graph are adjacent, and the distance between the first to-be-corrected graph and the second to-be-corrected graph is smaller than a first preset size; determining a target reference pattern corresponding to the to-be-corrected pattern from the plurality of second metal wire patterns; on the basis of the target reference graph, the first to-be-corrected graph and the second to-be-corrected graph are combined and corrected, a combined graph is obtained, the combined graph is formed, and the situation that a mask design rule is violated is avoided.

A line-field optical coherence tomography (OCT) system and method provide enhanced imaging accuracy through k-linearization of interference data. The system includes a swept laser source, a line-field sensor, and a single board computer (SBC) with processing capabilities. The system uses a frequency reference to produce a periodic reference pattern, which is detected by a subset of pixels in the line-field sensor. The SBC determines a resampling curve based on the reference pattern to correct non-linearities in the wavelength tuning of the laser. The resampling curve is applied to k-linearize the interference data, enabling the generation of high resolution transform-limited depth profiles through inverse Fourier transform. Methods are disclosed for recalculating the resampling curve periodically, continuously, or adaptively based on a linearity threshold. The system can further update the laser's tuning function dynamically to ensure consistent performance. These advancements enable precise and efficient OCT imaging for applications such as ophthalmology, angiography, and other diagnostic uses.

The invention provides a steel wire rope broken wire detection device, and belongs to the technical field of steel wire rope detection. The multiple detection assemblies are installed in the circular inner cavity of the annular support in the annular array mode, and each detection assembly is connected with the corresponding roller and the corresponding recognition part through the corresponding telescopic piece, so that when the to-be-detected steel wire rope penetrates through the circle center of the circular inner cavity, the to-be-detected steel wire rope is recognized; the roller of each detection assembly abuts against the outer side of the to-be-detected steel wire rope, when the size of the cross section of the to-be-detected steel wire rope is changed due to wire breakage, the change can be transmitted to the telescopic part through the roller, and the recognition part is triggered through the movement of the telescopic part. The recognition part recognizes the stretching or retracting movement of the telescopic piece so as to correspond to the internal wire breakage or external wire breakage condition of the steel wire rope, detection is more comprehensive, data are more accurate, detection directly acts on the steel wire rope, reference styles do not need to be additionally arranged, the detection efficiency and the accuracy of the detection result are improved, and the detection cost is also reduced.

The invention provides a mask and an overlay error measurement method, and relates to the technical field of detection. The mask plate comprises a test pattern structure arranged in the middle area of the mask plate, the test pattern structure is used for forming an overlay mark on a wafer, and the test pattern structure comprises a first overlay pattern group, a first reference pattern group, a second overlay pattern group and a second reference pattern group which are sequentially arranged in the circumferential direction of a rotation center, the first reference pattern group and the second reference pattern group are of a central symmetry structure, and marks, mapped on the wafer, of the first overlay pattern group and the second overlay pattern group are arranged in a mutually offset mode and do not coincide with the marks, mapped on the wafer, of the first reference pattern group and the second reference pattern group. According to the invention, a plurality of different pattern groups are integrated on a single mask plate at the same time, and three overlay layer marks can be directly formed in the quadrant region corresponding to the wafer, so that more effective overlay mark image information is obtained, and the detection precision of the overlay error is improved.

The invention provides a frame rate control jitter method and device for optimizing a chip area. The method comprises the following steps: determining a color depth difference value between a color depth to be displayed and a color depth of a display screen; wherein the to-be-displayed color depth is higher than the color depth; according to the color depth difference value, determining the size and the type of the color-imitated pattern, and screening out a key type from the types; according to the color depth difference value, the color-imitating pattern corresponding to each key type is divided, and a plurality of basic patterns are obtained; determining a reference pattern according to the basic pattern, and transforming and splicing the reference pattern to obtain a color-imitated pattern; wherein the number of the reference patterns is the same as that of the key types. According to the scheme, the visual effect of the picture is ensured, and meanwhile, the chip area occupied by storing the color-imitating pattern is reduced.

The invention discloses an ink-jet printing calibration method, ink-jet printing equipment, a storage medium and a program product, and relates to the technical field of ink-jet printing.The ink-jet printing calibration method comprises the steps that a first nozzle module is controlled to print a double-head reference pattern on a printing medium; the printing medium is controlled to move by a first stepping distance, and the first spray head module is controlled to print a stepping reference pattern on the printing medium; after the printing module is aligned with the printed image, the first spray head module and the second spray head module are controlled to perform ink-jet printing at least including a bidirectional reference pattern, a double-head comparison pattern and a stepping comparison pattern on the printing medium in the first printing direction; the first spray head module and the second spray head module are controlled to perform ink-jet printing on the two-way comparison pattern on the printing medium in the second printing direction opposite to the first printing direction; and performing image acquisition on the printing medium to obtain an overall calibration image for calibration. The technical problem that the calibration efficiency of existing ink-jet printing equipment is low is solved.

The invention provides an infrared detector readout circuit repairing method, and relates to the technical field of silicon readout circuit repairing, and the method comprises the steps: screening chips with abnormal electrical properties from processed circuit chips, and determining the relative coordinates of a problem line and a nearest bonding pad according to the fault type; under an FIB-SEM double-beam scanning electron microscope, the sample table is moved to reach the relative coordinates, and a reference pattern with the depth shallower than the thickness of the metal layer is formed through etching with the relative coordinates as the center; measuring a problem line operation point coordinate by taking the reference graphic feature point as a zero point; performing etching exposure on the coordinate area of the operation point by using an FIB-SEM double-beam scanning electron microscope; and carrying out line repairing operation. The problems that the reference point distance is long and the positioning deviation is large are effectively solved, and accurate positioning of a small-feature-size circuit needing to be operated in the infrared detector reading circuit repairing process is achieved.

The present disclosure provides a mode representation recall method and a memory branch network training method and device, relates to the technical field of large models, and in particular relates to the technical field of artificial intelligence such as natural language processing, and the method comprises the following steps: obtaining a target memory branch network of a large model, and obtaining an associated latent feature representation of an input token sequence in an input text of the large model through the target memory branch network; obtaining a reference mode representation set of the large model; based on the associated latent feature representation and the reference mode representation set, performing recall of a mode representation corresponding to the input token sequence to obtain a target mode representation of the input token sequence.

1. The name of the design product: TARS-ACC-MM1. 2. The use of the design product: TARS-ACC-MM1 is a calibration board used for computer vision and medical procedure auxiliary positioning. It is mainly applied in the calibration of oral implant navigation systems, AR glasses, surgical medical instruments, and oral surgery simulation training and teaching systems. By providing accurate visual reference patterns, it is used for camera system calibration to improve image processing accuracy and stability. 3. The design points of the design product: The combination of shape and pattern. 4. The picture or photo that best indicates the design points: perspective view.

To prevent a reduction in measurement accuracy in a three-dimensional scanner.SOLUTION: An optical module is used for a three-dimensional scanner that acquires three-dimensional shape information of an object with light from a light source by using a focusing method, and comprises a sensor, a beam splitter, a pattern plate, a housing, and a shim. The sensor detects the light from the light source reflected on the object, and the beam splitter splits the light into an optical path reaching the object from the light source and an optical path reaching the sensor from the object. The pattern plate is arranged between the light source and the beam splitter and configured to project a reference pattern on the sensor with the light from the light source. The sensor, the beam splitter, and the pattern plate are arranged in the housing. The shim adjusts the distance between the pattern plate and the beam splitter. The housing has a recess for arranging the pattern plate. The pattern plate is rotatably supported in the recess within a predetermined angle range around an optical axis of the light from the light source.SELECTED DRAWING: Figure 3

A self-detection circuit is used in a self-adaptation circuit to detect the convergence of the self-adaptation process and / or for self-adapting of the training circuit parameters. The self-detection circuit includes a decision history circuit to track the history of the training decisions made by the self-adaptation circuit and determine a pattern for a number of decisions, which is compared with reference patterns by a pattern recognition circuit. The reference patterns correspond to decision patterns when a self-training process has concluded or when the adapted parameters have reached target values. Based on the comparison result of the pattern recognition circuit, the progress of the self-training / self-adaptation process is determined and corresponding actions are performed (e.g., ending the self-training process, increase / decrease the training circuit parameters). The self-detection circuit enables time and power efficient self-training processes and on-the-fly adjustments (e.g., real-time adjustment, unexpected adjustment) to the training circuit parameters.

The invention discloses an evaluation method and equipment of a photoresist simulation model, a medium and a product, and relates to the technical field of photoetching simulation. The evaluation method of the photoresist simulation model comprises the following steps: obtaining photoresist parameters and an optical modeling file of a to-be-evaluated photoresist simulation model, wherein the optical modeling file comprises original optical modeling parameters for constructing the to-be-evaluated photoresist simulation model; constructing a rotary photoresist simulation model according to the photoresist parameters and the optical modeling file; inputting the rotary optical modeling parameters into the rotary photoresist simulation model to obtain a rotary graph size; comparing the rotation pattern size with a reference pattern size to obtain a size difference value, the reference pattern size being a pattern size obtained by inputting the original optical modeling parameters into the photoresist simulation model to be evaluated; and according to the size difference value, evaluating whether the to-be-evaluated photoresist simulation model has an overfitting phenomenon or not.

The invention relates to the technical field of optical measurement, in particular to an optical measurement system and a measurement method thereof.The optical measurement system comprises a light source, a projection assembly, an imaging assembly and a receiving assembly, the projection assembly modulates light beams emitted by the light source through an optical mask, generates detection light carrying geometric patterns and projects the detection light to the surface of a sample to be measured; the detection light forms return light comprising reflected light and diffracted light on the surface of the to-be-detected sample, and the diffracted light is formed by diffraction of the detection light through a physical structure on the surface of the to-be-detected sample; the imaging assembly generates signal light carrying moire fringe information and diffracted light information by superposing the return light through a reference pattern structure; the receiving assembly comprises a filtering structure and a receiving module, diffraction light of the signal light is filtered out through the filtering structure to form target signal light, and the receiving module obtains defocus data based on the target signal light. According to the invention, diffracted light in signal light can be effectively filtered out, optical interference is avoided, and the accuracy of automatic focusing is improved.

The present invention relates to the explicit characterization of handicrafts (100), such as artworks, for example by applying a substrate or coating containing a number of microtransponders (110) dispersed therein. A detection system (130) reads (220) identifiers of transponders (110) detectable at that location and measures one or more of the following parameters for each transponder: RSSI, read speed, response time of each transponder, its location, distance and / or proximity to adjacent transponders. A pattern composed of the information or based on the information is stored (230) as a reference pattern or an identification pattern of the handicraft article (100). The identification scan (240) may be performed by acquiring the same parameter on a portion of the handicraft. A pattern of such parameters in a reference scan may be compared (250, 260) to the reference scan to determine whether it is an original handicraft (280) or a copy (270).

Methods, apparatuses, and systems for haptic signal processing are provided. In one embodiment, a process includes receiving a media stream including data in one of a haptic exchange format and a haptic streaming format; under the condition that the data adopts the tactile exchange format, obtaining a mode of an input document of the media stream, semanteme of the input document, verifying the mode by contrasting a reference mode and verifying the semanteme by contrasting a rule table; where the data is in a haptic streaming format: decoding a code stream from at least a portion of the media stream, and identifying at least one of a syntax and a condition of the code stream; and controlling decoding of the media stream based on any of the verification features.

In a network, a common agnostic data exchange method between two devices native to the network, the devices using different formats and transmission protocols, includes invoking a proxy at each device, and a first proxy receiving a first data record from a first device, the first data record having a first format. The first proxy identifies the first format by comparing a first pattern of the first data record to reference patterns of one or more reference data records and determines if a sufficient pattern match exists between the first pattern and the reference pattern. The first proxy translates the first data record's format into an inter-proxy data record having an inter-proxy format and transmits the inter-proxy data record to a second proxy coupled to a second device. The second proxy translates the inter-proxy data record to a second data record having a format employed at the second device.

The invention is suitable for the technical field of mask plate automatic detection, and provides a thermal compensation intelligent control method and system for a mask plate A0I detection platform, and the method comprises the steps: carrying out the scanning detection of a mask plate, carrying out the interval collection of a reference pattern on the mask plate in the scanning detection process, solving to obtain a drift compensation parameter, and carrying out the calculation of the drift compensation parameter. And triggering interruption calibration when the detection confidence is lower than a critical threshold. The method has the advantages that thermal drift can be inhibited without changing the thermal state or structure of the detection equipment, a high-standard constant-temperature chamber does not need to be constructed, and the cost can be remarkably reduced; in a current thermal state, a drift compensation parameter in coordinate mapping is re-estimated by expanding reference observation, so that geometric errors caused by thermal drift are corrected in a detection result or a detection process which may cause problems is interrupted in time, and the detection precision is maintained without depending on a constant-temperature environment.

A method of conducting operations for an IPG adapted to provide electrical pulses to tissue of a patient for medical therapy is provided. The IPG provides the medical therapy according to pulse parameter data executed according to an execution path. The method can include identifying a root node repeated within the execution path of a first set of the pulse parameter data, identifying a stimulation pulse pattern repeated in the first set between occurrences of the root node, replacing the repeated pattern with (a) a single instance and a recurrence count or (b) a pointer to a reference pattern to generate a second set of the pulse parameter data, and communicating the second set between the external controller and the IPG and / or storing the second set within a memory of the IPG.

The invention belongs to the technical field of semiconductor manufacturing, and provides a photomask defect correction method which comprises the following steps: acquiring the position of a defect; obtaining a target graph corresponding to the defect and a first distance between the target graph and the defect; acquiring a defect graph and a corresponding reference graph; when the first distance is greater than the window size of the repairing machine, sequentially forming a plurality of first intermediate patterns between a target pattern in the reference patterns and the defect contrast pattern; sequentially forming a plurality of second intermediate patterns between the target pattern and the defect in the defect pattern; obtaining a to-be-repaired pattern from the defect pattern according to the second intermediate pattern, and correcting the to-be-repaired pattern; and removing the first intermediate pattern and the second intermediate pattern. According to the method, the defect contrast pattern is accurately positioned by utilizing the first middle pattern, and the defect is accurately positioned by utilizing the second middle pattern, so that the repairing machine can carry out defect correction across a long distance, the size limit of a machine window in the defect correction process is broken through, and the reject ratio of products is reduced.