76 results about "Reference patterns" patented technology

The systems and methods disclosed herein monitor application (e.g., artificial intelligence (AI) model) operations using interactions between the application and a kernel. The systems and methods disclosed herein intercept, using a kernel interface, one or more function invocations transmitted from the application (e.g., an AI model without model modification). Event record(s) are generated for one or more functions to define process identifiers, resource interaction types, timestamps, and / or resource identifiers. Observed pattern(s) for the application are identified by comparing current event record(s) with previous record(s), and the identified observed pattern(s) are evaluated against reference pattern(s) to generate score(s). Data packet(s) that indicate observed pattern(s), corresponding score(s), and / or cryptographic digital fingerprint(s) of the one or more functions are generated. The data packet(s) are transmitted to distributed ledgers for immutable storage.

The invention relates to the technical field of electric heat tracing intelligent temperature control, and discloses a control box electric heat tracing band intelligent temperature control system and method. The method comprises the steps of collecting data of a plurality of temperature sensors in a control box, constructing a temperature sequential sequence, and forming a sequential diagram structure reflecting correlation strength among the sensors by calculating spatial proximity and time correlation. And inputting the sequential graph into a state space model, and dynamically adjusting a state transition matrix of the model according to an edge weight of the graph so as to accurately simulate a heat transfer dynamic process in the box. A state output by the model is separated into a periodic component and a trend component, the periodic component is matched with a reference pattern library to identify an abnormal fluctuation phase, and multi-scale decomposition and slope curvature analysis are performed on the trend component to quantify a change trend. According to the method, dynamic and accurate modeling of the complex thermal environment is realized, the temperature can be controlled more accurately, and abnormity can be warned in advance.

The present disclosure provides a mode representation recall method and a memory branch network training method and device, relates to the technical field of large models, and in particular relates to the technical field of artificial intelligence such as natural language processing, and the method comprises the following steps: obtaining a target memory branch network of a large model, and obtaining an associated latent feature representation of an input token sequence in an input text of the large model through the target memory branch network; obtaining a reference mode representation set of the large model; based on the associated latent feature representation and the reference mode representation set, performing recall of a mode representation corresponding to the input token sequence to obtain a target mode representation of the input token sequence.

A self-detection circuit is used in a self-adaptation circuit to detect the convergence of the self-adaptation process and / or for self-adapting of the training circuit parameters. The self-detection circuit includes a decision history circuit to track the history of the training decisions made by the self-adaptation circuit and determine a pattern for a number of decisions, which is compared with reference patterns by a pattern recognition circuit. The reference patterns correspond to decision patterns when a self-training process has concluded or when the adapted parameters have reached target values. Based on the comparison result of the pattern recognition circuit, the progress of the self-training / self-adaptation process is determined and corresponding actions are performed (e.g., ending the self-training process, increase / decrease the training circuit parameters). The self-detection circuit enables time and power efficient self-training processes and on-the-fly adjustments (e.g., real-time adjustment, unexpected adjustment) to the training circuit parameters.

The invention relates to the technical field of optical measurement, in particular to an optical measurement system and a measurement method thereof.The optical measurement system comprises a light source, a projection assembly, an imaging assembly and a receiving assembly, the projection assembly modulates light beams emitted by the light source through an optical mask, generates detection light carrying geometric patterns and projects the detection light to the surface of a sample to be measured; the detection light forms return light comprising reflected light and diffracted light on the surface of the to-be-detected sample, and the diffracted light is formed by diffraction of the detection light through a physical structure on the surface of the to-be-detected sample; the imaging assembly generates signal light carrying moire fringe information and diffracted light information by superposing the return light through a reference pattern structure; the receiving assembly comprises a filtering structure and a receiving module, diffraction light of the signal light is filtered out through the filtering structure to form target signal light, and the receiving module obtains defocus data based on the target signal light. According to the invention, diffracted light in signal light can be effectively filtered out, optical interference is avoided, and the accuracy of automatic focusing is improved.

The invention is suitable for the technical field of mask plate automatic detection, and provides a thermal compensation intelligent control method and system for a mask plate A0I detection platform, and the method comprises the steps: carrying out the scanning detection of a mask plate, carrying out the interval collection of a reference pattern on the mask plate in the scanning detection process, solving to obtain a drift compensation parameter, and carrying out the calculation of the drift compensation parameter. And triggering interruption calibration when the detection confidence is lower than a critical threshold. The method has the advantages that thermal drift can be inhibited without changing the thermal state or structure of the detection equipment, a high-standard constant-temperature chamber does not need to be constructed, and the cost can be remarkably reduced; in a current thermal state, a drift compensation parameter in coordinate mapping is re-estimated by expanding reference observation, so that geometric errors caused by thermal drift are corrected in a detection result or a detection process which may cause problems is interrupted in time, and the detection precision is maintained without depending on a constant-temperature environment.

A method of conducting operations for an IPG adapted to provide electrical pulses to tissue of a patient for medical therapy is provided. The IPG provides the medical therapy according to pulse parameter data executed according to an execution path. The method can include identifying a root node repeated within the execution path of a first set of the pulse parameter data, identifying a stimulation pulse pattern repeated in the first set between occurrences of the root node, replacing the repeated pattern with (a) a single instance and a recurrence count or (b) a pointer to a reference pattern to generate a second set of the pulse parameter data, and communicating the second set between the external controller and the IPG and / or storing the second set within a memory of the IPG.

The application discloses a structured light emission module and a self-calibration method and device thereof and a medium, relates to the technical field of optical three-dimensional perception, and is applied to a preset integrated structured light emission module, and comprises the following steps: synchronously turning on working light sources and calibration light sources in a VCSEL array under current working parameters; wherein the working light sources are projected to a working area of a metasurface diffractive optical element after being collimated by a preset collimating optical system, so as to generate a working speckle pattern for three-dimensional detection; the calibration light sources are projected to a calibration area of the metasurface diffractive optical element after being collimated by the preset collimating optical system, so as to generate a preset reference pattern; an actual reference pattern generated by the calibration area is collected by using an embedded detector, the actual reference pattern is compared with the preset reference pattern, and a pattern deviation is obtained; a temperature drift compensation amount is calculated based on the pattern deviation and module temperature data collected by a temperature sensor; and the current working parameters of the VCSEL array are adjusted according to the temperature drift compensation amount.

An optical proximity correction method and system, a mask, a device and a storage medium, the optical proximity correction method comprising: providing a design pattern; along the contour of the design pattern, obtaining a step edge as a broken line edge, the broken line edge being alternately composed of a plurality of first line segments extending along the extension direction of the broken line edge, and second line segments connecting adjacent first line segments; performing step elimination processing on the broken line edge of the design pattern, replacing the broken line edge with a straight line type reference edge with the same extension direction as the first line segment, and enclosing a reference pattern corresponding to the design pattern; setting a plurality of initial evaluation points on the reference edge; mapping the plurality of initial evaluation points to the broken line edge along a direction perpendicular to the reference edge to form evaluation points located on the broken line edge; performing optical proximity correction processing on the design pattern until the edge placement error at the evaluation points meets a preset condition to form a corrected pattern. The present application improves the accuracy of optical proximity correction.

We provide the system. [Solution] A means for collecting data from multiple terminals within a distributed network in order to detect abnormal patterns in real time, A data analysis means for generating normal activity patterns and creating a reference pattern based on the aforementioned data, A threat prediction method using generative AI that detects anomalies that deviate from the aforementioned standard pattern and predicts future attack patterns, An automated response means that automatically generates and executes countermeasures in response to anomalies detected by the threat prediction means, Alert sending means for notifying the administrator of the results of the response by the automated response means. A system that includes this.

An optical proximity correction method comprises: providing an initial design layout, the initial design layout having a reference pattern and a plurality of main patterns, the reference pattern having a reference edge, and each main pattern having a plurality of main edges; taking each main edge as a reference, obtaining a first search parameter to determine a first search region; when the reference edge has an overlapping part with any one of the first search regions, marking the main edge corresponding to the first search region as a candidate edge; taking the reference edge as a reference, obtaining a second search parameter according to the first search parameter to determine a second search region; and when any one of the candidate edges has an overlapping part with the second search region, marking the candidate edge as a selected edge. The bidirectional edge selection mechanism of the first search region and the second search region is used for edge selection operation, the cases of multiple selection or misselection are reduced, the edge selection result is more accurate, and the effect of subsequent optical proximity correction is improved.

The invention relates to an electric energy meter which comprises an electric energy meter body and a reactive electric energy meter body state judgment system. The composition curve of the pattern occupied in the last-stage enhanced image obtained after targeted optimization processing of the reactive electric energy meter can be analyzed, the composition curve of the reference pattern corresponding to the reactive electric energy meter is obtained, and then whether the current shape of the reactive electric energy meter reaches the standard or not is judged; therefore, targeted visual identification of the distortion state of the reactive electric energy meter body is completed.

The invention discloses a four-color splitting method based on relevant layer assistance. The method comprises the steps that S1, a layout file of a target metal truncation layer is provided; s2, providing a matrix general solution conforming to a preset splitting rule; s3, according to the matrix general solution, writing a script to carry out Y-direction image splitting on the layout file of the target metal truncation layer to obtain a Y-direction reference graph; s4, according to the matrix general solution, writing a script to perform mask splitting on the layout file of the metal layer of the target active region; wherein the target active region metal layer is a related layer of the target metal truncation layer; s5, taking the splitting result in the step S4 as an anchor point, and performing X-direction image splitting on the layout file of the target metal truncation layer to obtain an X-direction reference graph; and S6, according to the Y-direction reference graph and the X-direction reference graph, writing a script to perform ordered splitting on all basic graph units in the layout file of the target metal truncation layer to obtain a final four-color splitting result.

Based on the reference waveform (112) and the BSE signal waveform (211) representing the intensity of the backscattered electron signal from the pattern along the first direction extracted from the backscattered electron image, a difference waveform is generated, representing the relationship between the difference between the coordinates of the BSE signal waveform with the same backscattered electron signal intensity and the coordinates of the reference waveform, and the backscattered electron signal intensity. Based on the difference waveform, it is determined whether there is a shielding area (203) on the sidewall of the pattern that was not irradiated by the primary electron beam. Here, the reference waveform represents the intensity of the backscattered electron signal from the reference pattern along the first direction when a primary electron beam is scanned on the reference pattern, wherein the reference pattern is a pattern with sidewalls formed perpendicularly to the surface and bottom surface of the pattern.

The invention relates to a graph measurement method and device, semiconductor manufacturing equipment, a storage medium and a program product. The pattern measuring method comprises the following steps: etching a first photoresist pattern on a first structural layer of a semiconductor silicon wafer to obtain an etched pattern; a second photoresist pattern on a second structural layer of the semiconductor silicon wafer is used as a reference pattern, target parameters of the etched pattern are measured, the first structural layer and the second structural layer are adjacent structural layers, and the target parameters are used for adjusting the photoresist pattern etched next time. According to the technical scheme, the related parameters of the etched pattern can be effectively and simply measured, so that the pattern etching error of the semiconductor silicon wafer can be reduced according to the related parameters.

The invention relates to a system (1) for improved reference pattern recognition comprising an optical sensor (K), wherein at least two polarization filters (P1, P2) are arranged one behind the other in the direction of the image axis of the optical sensor, wherein the at least two polarization filters (P1, P2) are adjustable relative to each other, wherein at least one of the polarization filters (P1, P2) is electrically controllable for the purposes of adjustment, wherein the system further comprises a processing unit (uC) which, depending on an image captured by the optical sensor (K) and at least one further setting of the optical sensor (K), controls the at least one electrically controllable polarization filter (P1, P2) such that the polarization planes of the at least two polarization filters (P1, P2) are adjusted relative to each other when no reference pattern is recognized in the captured image.

The systems and methods disclosed herein monitor application (e.g., artificial intelligence (AI) model) operations using interactions between the application and a kernel. The systems and methods disclosed herein intercept, using a kernel interface, one or more function invocations transmitted from the application (e.g., an AI model without model modification). Event record(s) are generated for one or more functions to define process identifiers, resource interaction types, timestamps, and / or resource identifiers. Observed pattern(s) for the application are identified by comparing current event record(s) with previous record(s), and the identified observed pattern(s) are evaluated against reference pattern(s) to generate score(s). Data packet(s) that indicate observed pattern(s), corresponding score(s), and / or cryptographic digital fingerprint(s) of the one or more functions are generated. The data packet(s) are transmitted to distributed ledgers for immutable storage.

The application relates to a projection picture distortion correction method and system, computer equipment and a storage medium. The method comprises the following steps: determining the first coordinates of each edge feature point of a reference pattern in a projection picture image in an image coordinate system; for each edge of the reference pattern in a first direction, selecting a target coordinate value closest to the center of the projection picture image in a second direction from the first coordinates of each edge feature point on the edge; replacing the coordinate value in the second direction of the first coordinates of each edge feature point on the edge with the target coordinate value to obtain the adjusted first coordinates of each edge feature point on the edge; converting the adjusted first coordinates into coordinates in a projection device coordinate system to obtain the target second coordinates of each edge feature point; and using the target second coordinates of each edge feature point to enable the projection device to correct the distortion of an original projection picture based on the target second coordinates. The method can correct the distortion of the projection picture.

A method, apparatus and computer system to identify threats on a TCP / IP-based network. The approach leverages a set of reference patterns (or "network spectrals") associated with one or more defined I

A computer implemented method (300) and an apparatus (102) for handling data in an industrial automation infrastructure (100) are disclosed. The method (300) comprises receiving, by a processing unit (202), a stream of binary data from a file; storing the binary data in a data structure; converting the stored binary data to an encoded character sequence; determining whether an identifier (508) associated with a target attribute exists within the character sequence; and when the identifier (508) exists within the encoded character sequence, performing: recording a start position (508-1) and an end position (508-N) of the identifier (508), determining preconfigured positions (520) relative to at least the start position (508-1) and the end position (508-N) that accommodate data elements being indicative of length of attribute values by referencing a schema (516, 600), and extracting attribute values from the character sequence based on the preconfigured positions and length of attribute values.

The invention belongs to the field of magnetic field detection, and relates to a passive magnetic field event recording device and recording method, which can record magnetic field changes, the passive magnetic field event recording device comprises a non-magnetic shell; a damping medium; the magnetic elements comprise permanent magnets and pivot supports, the permanent magnets can rotate, and the whole system can stay in a plurality of metastable state collective configurations through magnetic interaction among the magnetic elements; the method further comprises an initialization tool. The invention also discloses a passive magnetic field event recording method, which comprises the following steps of: after a monitoring period is ended, imaging a current final state pattern of the magnetic element in the device; and comparing the final-state pattern with the reference pattern, and if a difference exists between the final-state pattern and the reference pattern, determining that a magnetic field disturbance event occurs during the monitoring period. The system is free of power supply, simple in structure, easy in function expansion, low in cost, easy in material obtaining and far lower than electronic recording equipment in cost; and the reading can be completed through image comparison only by taking pictures by a common camera.

The invention relates to a computer-implemented method for identifying different layers and for determining mechanical properties in a measurement image of a track bed, wherein: in a first step, with respect to patterns of a signal property over one first set of points in each case, a pattern recognition with stored reference patterns of signal properties of the entire track bed is carried out in order to identify layers, layer transitions and / or layer boundaries defined in a database, wherein points are assigned to a layer or a layer transition over the entire measurement image; in a second step, for each second set of points which are jointly assigned to a single layer or to a single layer transition, at least one mechanical property is determined by carrying out a pattern recognition with respect to signal properties in the measurement image and the second sets of points are assigned those mechanical properties which are stored for the relevant recognized pattern for said single layer or said single layer transition.

A defect inspection method includes: recognizing image peaks that are reference positions of image patterns included an inspection image; performing filtering on a reference image including reference patterns, recognizing reference peaks, and then selecting some of the reference peaks as peak samples; calculating candidate correction constants by overlapping the filtered inspection image and the filtered reference image, and then selecting a primary correction constant among the candidate correction constants; applying the first correction constant to the reference image and selecting a secondary correction constant by matching the image peaks to the reference peaks included in a primary corrected reference image, and then applying the secondary correction constant to the primary corrected reference image and forming a secondary corrected reference image aligned with the inspection image; and performing a defect inspection on the inspection image by matching the image patterns to reference patterns included in the secondary corrected reference image.

According to one embodiment of the present invention, there is provided a method for supporting a virtual golf simulation, the method comprising the steps of: determining a positional relationship between coordinates determined in a first photographing module configured to photograph a subject in motion and coordinates determined in a display region, with reference to information about a first reference pattern determined in an image photographed by the first photographing module and information about a second reference pattern determined in an image photographed by a second photographing module configured to photograph the display region displaying information about the subject; and determining information about a movement track of the subject in the display region, with reference to the positional relationship.

The systems and methods disclosed herein monitor application (e.g., artificial intelligence (AI) model) operations using interactions between the application and a kernel. The systems and methods disclosed herein intercept, using a kernel interface, one or more function invocations transmitted from the application (e.g., an AI model without model modification). Event record(s) are generated for one or more functions to define process identifiers, resource interaction types, timestamps, and / or resource identifiers. Observed pattern(s) for the application are identified by comparing current event record(s) with previous record(s), and the identified observed pattern(s) are evaluated against reference pattern(s) to generate score(s). Data packet(s) that indicate observed pattern(s), corresponding score(s), and / or cryptographic digital fingerprint(s) of the one or more functions are generated. The data packet(s) are transmitted to distributed ledgers for immutable storage.

The systems and methods disclosed herein monitor application (e.g., artificial intelligence (AI) model) operations using interactions between the application and a kernel. The systems and methods disclosed herein intercept, using a kernel interface, one or more function invocations transmitted from the application (e.g., an AI model without model modification). Event record(s) are generated for one or more functions to define process identifiers, resource interaction types, timestamps, and / or resource identifiers. Observed pattern(s) for the application are identified by comparing current event record(s) with previous record(s), and the identified observed pattern(s) are evaluated against reference pattern(s) to generate score(s). Data packet(s) that indicate observed pattern(s), corresponding score(s), and / or cryptographic digital fingerprint(s) of the one or more functions are generated. The data packet(s) are transmitted to distributed ledgers for immutable storage.

A method for supporting a virtual golf simulation is provided. The method includes the steps of: determining, with reference to information on a first reference pattern specified in an image photographed by a first photographing module positioned to photograph a moving subject and information on a second reference pattern specified in an image photographed by a second photographing module positioned to photograph a display area where information associated with the subject is displayed, a positional relationship between coordinates specified in the first photographing module and coordinates specified in the display area; and determining information on a trajectory of the subject in the display area with reference to the positional relationship.

A system for monitoring data representative of a user's general wellbeing and for delivering digital content to the user, the system comprising a pre-defined module comprising a plurality of reference patterns mapped to digital content for delivery to the user, the system further comprising at least a processing means, wherein the processing means is configured to: identify user activity and select a user based on the identified user activity; for the selected user, interrogate user data representative of the user's general wellbeing and identify a pattern in said user data; and compare the identified pattern to the reference patterns in the pre-defined module to identify digital content mapped with the identified pattern.

A pattern identification system is disclosed. The pattern identification system includes a memory configured to store instructions and a processor coupled to the memory and configured to execute the instructions to perform a process. The process includes receiving measurement data associated with the wafer pattern. The process may also include determining a similarity value between the wafer pattern and a reference pattern associated with a reference wafer based on the measurement data. The process may further include determining whether the similarity value satisfies a similarity condition. Responsive to the similarity value satisfying the similarity condition, the process may additionally include identifying a failure mode associated with the wafer pattern based on the reference pattern of the reference wafer.

The invention relates to a laparoscope ultrasonic puncture positioning device and method based on structured light, belongs to the technical field of medical instruments, and solves the problems that an existing puncture point outside an abdominal wall is difficult to accurately correspond to a probe inside an abdominal cavity, and closed-loop verification and quantitative guidance are lacked. The reverse optical indication module is used for projecting structured light from the inner side of an abdominal cavity to the inner surface of an abdominal wall and forming a reference pattern on the inner surface of the abdominal wall; the image processing and guiding calculation unit is used for receiving a laparoscope real-time video image, identifying the center of a reference pattern and a deformation feature center formed by applying pressure to the inner surface of the abdominal wall by the outer side of the abdominal wall, and generating guiding information; according to the guiding information, the abdominal wall outer side pressure applying position is adjusted till the center of the reference pattern is matched with the deformation feature center, and the abdominal wall outer side pressure applying position at the moment serves as a puncture point. Accurate correspondence between an abdominal wall outer puncture point and an abdominal cavity inner probe is achieved.