The invention discloses a multi-layer thin
film structure capable of achieving vertical
exchange bias and free of
external field auxiliary
total current overturning and a preparation method and application thereof, the multi-layer thin
film structure sequentially comprises a heavy
metal base layer, an atomic level intercalation layer, a ferromagnetic layer and an antiferromagnetic layer from bottom to top, and the multi-layer thin
film structure is prepared through
molecular beam epitaxy. According to the invention, anisotropic epitaxial strain is introduced into the antiferromagnetic layer, so that a remarkable vertical
exchange bias effect at
room temperature is realized. Meanwhile, a global uncompensated
magnetic moment is generated in the anisotropic epitaxial strain induction antiferromagnetic layer, an energy barrier of vertical
exchange bias flipping is reduced, current-driven exchange bias flipping without an
external field is further realized through a spin-
orbit moment effect, the dependence on an external
magnetic field in the prior art is overcome, and the performance of the device is improved. And the integration and the application potential of the
spinning electronic device are obviously improved. The technology lays a foundation for design and development of efficient and high-density
magnetic storage and logic devices.