The application relates to a method for improving
spin injection efficiency by using a buffer layer, relating to
spintronics. A long strip-shaped single-layer
graphene is prepared on a
silicon substrate, a double-layer h-BN is prepared and transferred onto the single-layer
graphene as a tunneling layer, PMMA is spin-coated, a ferromagnetic
electrode shape is exposed by using an EBL
system, and development is carried out after the
exposure is completed; the sample is placed into an
electron beam / thermal
evaporation composite plating film
system, a low-melting-point
metal indium is pre-evaporated as a buffer layer by using a thermal
evaporation method,
cobalt is
electron beam evaporated as a ferromagnetic
electrode, an In / Co miscible
alloy interface is formed by annealing at 200 DEG C under an
argon atmosphere for 1 h, and a
spin valve device with a buffer layer is obtained. The method forms a lossless interface of a ferromagnetic
electrode layer-buffer layer-tunneling layer, and
spin injection efficiency is improved. The method is easy to realize, low in cost, low in operation difficulty and technical requirement, and beneficial to large-scale industrial application; the method is very good in universality, and can be popularized to other spin electronic devices with a tunneling layer to improve the
spin injection efficiency of the devices.