The invention belongs to the technical field of diluted
magnetic semiconductor films, and particularly discloses a method for enhancing the
magnetism of a Y-doped HfO2 diluted
magnetic semiconductor film through
gamma ray induction, and the method comprises the following steps: S1, placing a Y-doped HfO2 target material in a
radio frequency device, fixing a 111-oriented YSZ substrate at the central position of a dial plate of the
radio frequency device, and enabling the target material to correspond to the substrate; s2, turning on a
radio frequency power supply, and officially
sputtering after glow is stable to obtain a thin film; s3, annealing the film in a
muffle furnace; and S4, placing the annealed film sample in a
gamma ray device with 60Co as an
irradiation source for
irradiation to realize total
ion implantation
dose treatment. According to the method for enhancing the
magnetism of the Y-doped HfO2 diluted
magnetic semiconductor thin film through
gamma ray induction, the problem that the saturation
magnetization intensity of an existing diluted magnetic
semiconductor thin film is not high is solved, and the
magnetism of the Y-doped HfO2
epitaxial thin film is enhanced, regulated and controlled through gamma
ray micro
dose.