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326 results about "Tunnel magnetoresistance" patented technology

Tunnel magnetoresistance (TMR) is a magnetoresistive effect that occurs in a magnetic tunnel junction (MTJ), which is a component consisting of two ferromagnets separated by a thin insulator. If the insulating layer is thin enough (typically a few nanometres), electrons can tunnel from one ferromagnet into the other. Since this process is forbidden in classical physics, the tunnel magnetoresistance is a strictly quantum mechanical phenomenon.

Double-barrier structure based magnetic memory device

A double-barrier structure based magnetic memory device is disclosed. The double-barrier structure is used to strengthen perpendicular magnetic anisotropy or tunnel magnetoresistance ratio of a magnetic tunnel junction; meanwhile, a three-port device based on a spin orbit torque is formed by combination of metal wire at the bottom; the double-barrier structure of the magnetic memory device comprises a metal oxide barrier layer, a free layer formed by ferromagnetic metal and the other metal oxide barrier layer; a reference layer formed by the ferromagnetic metal and a covering layer formed by non-magnetic metal are deposited on the top of the structure in sequence; the top of the structure is connected with a peripheral circuit through a metal electrode; and the wire at the bottom is formed by metal materials with a larger hall angle and used for data writing. By introducing the double-barrier structure into the magnetic memory device based on the spin orbit torque, the adverse effect on the data writing caused by too high resistance can be effectively avoided, and the thermal stability and the tunnel magnetoresistance ratio of the device are improved; and the good property of the STT-MRAM is maintained by the device, and the double-barrier structure based magnetic memory device is quite suitable for industrial production.
Owner:BEIHANG UNIV
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