23 results about "Ultra-high vacuum" patented technology

Ultra-high vacuum (UHV) is the vacuum regime characterised by pressures lower than about 10⁻⁷ pascal or 100 nanopascals (10⁻⁹ mbar, ~10⁻⁹ torr). UHV conditions are created by pumping the gas out of a UHV chamber. At these low pressures the mean free path of a gas molecule is greater than approximately 40 km, so the gas is in free molecular flow, and gas molecules will collide with the chamber walls many times before colliding with each other. Almost all molecular interactions therefore take place on various surfaces in the chamber.