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757 results about "Negative potential" patented technology

Negative potential. An electrostatic potential which is lower than that of the ground, or of some conductor or point in space that is arbitrarily assigned to have zero potential.

Electrical storage device and manufacturing electrical storage device

An electrical storage device of the present invention is characterized in that a positive electrode, a negative electrode, a lithium electrode, and an electrolyte capable of transferring lithium ion is included, the lithium electrode is arranged to be out of direct contact with the negative electrode, and lithium ion can be supplied to the negative electrode by flowing a current between the lithium electrode and the negative electrode through an external circuit. With the above characteristic, problems such as non-uniform carrying of lithium ion to the negative electrode, shape-change of a cell, and temperature increase of an electrolytic solution under incomplete sealing of a cell and the like can be easily solved. A using method of the electrical storage device is characterized in that, by using the lithium electrode as a reference electrode, the positive electrode potential and negative electrode potential can be measured, and the potential of the positive or negative electrode can be controlled when the electrical storage device is charged or discharged. Therefore, the potentials of the positive electrode and negative electrode can be monitored, thereby it can be easily determined whether deterioration of the electrical storage device is caused by the positive electrode or the negative electrode. Also, it is possible to control the device with the potential difference between the negative electrode and reference electrode, that is, the negative potential. In addition, when characteristics deteriorate such as the internal resistance increase, an appropriate amount of lithium ion can be supplied to the negative electrode and/or positive electrode by the lithium electrode.
Owner:FUJI JUKOGYO KK

Ion assisted deposition source

In accordance with one specific embodiment of the present invention, the ion assisted deposition source for thin films comprises an axially symmetric discharge region into which an ionizable gas is introduced, a sputter target at one end of that region, an axially symmetric magnetic field within and extending out the opposite and open end of that region, an anode around the circumference of that region, and an electron emitting cathode located near the open end of that region. Particles are sputtered from the sputter target, pass through the discharge region, and are deposited on a deposition substrate located exterior of both the discharge region and the deposition source. A beam of energetic ions from the discharge region bombards the film being deposited to improve the adhesion, density, and other properties of that film. The density of the plasma can be controlled with the emission from the cathode, the emission of sputtered particles from the sputter target can be controlled with the negative potential of that target, while the energy of the ions used to assist in the deposition can be controlled with the positive potential of the anode. The deposition source thus simultaneously generates a flux of sputtered material with which to deposit a film on a substrate and a beam of energetic ions to assist in that deposition, and does so with a simple and economical apparatus.
Owner:KAUFMAN & ROBINSON

Ceramal material for manufacturing hydrogen-enriched water and preparing method and application thereof

The invention belongs to the technical field of new environment-friendly materials, and particularly relates to a ceramal material for manufacturing hydrogen-enriched water and the preparing method and application thereof. The ceramal material is prepared from, by weight, 30-85 parts of base material component, 20-60 parts of hydrogen-enriched component, 2-25 parts of anti-microbial component, and 3-30 parts of binder. The base material component is prepared from tourmaline, serpeggiante, silicon oxide, calcium oxide and zeolite. The hydrogen-enriched component is prepared from magnesium metal powder, magnesia powder and KDF alloy powder. The anti-microbial component is prepared from zinc oxide, titanium oxide and cerium oxide. The binder is prepared from one or more of high-purity distilled water, carboxypropyl cellulose and bentonite. The ceramal material can be used for manufacturing alkalescent water, negative-potential water and hydrogen-enriched water and also has an anti-microbial function and a water activating function. The invention further provides the preparing method and application of the ceramal material. The technology is simple and easy to realize. The ceramal material can be applied to products including water purifiers, water purifying kettles and cups.
Owner:山东木齐健康科技有限公司

Drive circuit and inverter for voltage driving type semiconductor device

The invention provides a drive circuit for voltage driving type semiconductor device capable of solving the problem that the grid is required being negative potential state and the negative voltage power is required in the drive circuit when the semiconductor device is turn off, in order to prevent erroneously being ignited. The drive circuit for driving a semiconductor element is equipped with: a first switch connected to a positive side of a DC power supply; a second switch connected to the other terminal of the first switch and to a negative side of the DC power supply; a third switch connected to the positive side of the DC power supply; a fourth switch connected to the other terminal of the third switch; a fifth switch connected to the other terminal of the fourth switch and to the negative side of the DC power supply; and a capacitor connected to the other terminal of the first switch and to the other terminal of the fourth switch. In the drive circuit, a gate of the semiconductor element is connected to the other terminal of said third switch; and a source of the semiconductor element is connected to the negative side of the DC power supply. Therefore the negative voltage is applied on the grid of the semiconductor device only using the source supply of position voltage.
Owner:HITACHI LTD
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