2326 results about "Pulsed power" patented technology

A waveform adaptive transmitter that conditions and / or modulates the phase, frequency, bandwidth, amplitude and / or attenuation of ultra-wideband (UWB) pulses. The transmitter confines or band-limits UWB signals within spectral limits for use in communication, positioning, and / or radar applications. One embodiment comprises a low-level UWB source (e.g., an impulse generator or time-gated oscillator (fixed or voltage-controlled)), a waveform adapter (e.g., digital or analog filter, pulse shaper, and / or voltage variable attenuator), a power amplifier, and an antenna to radiate a band-limited and / or modulated UWB or wideband signals. In a special case where the oscillator has zero frequency and outputs a DC bias, a low-level impulse generator impulse-excites a bandpass filter to produce an UWB signal having an adjustable center frequency and desired bandwidth based on a characteristic of the filter. In another embodiment, a low-level impulse signal is approximated by a time-gated continuous-wave oscillator to produce an extremely wide bandwidth pulse with deterministic center frequency and bandwidth characteristics. The UWB signal may be modulated to carry multi-megabit per second digital data, or may be used in object detection or for ranging applications. Activation of the power amplifier may be time-gated in cadence with the UWB source thereby to reduce inter-pulse power consumption. The UWB transmitter is capable of extremely high pulse repetition frequencies (PRFs) and data rates in the hundreds of megabits per second or more, frequency agility on a pulse-to-pulse basis allowing frequency hopping if desired, and extensibility from below HF to millimeter wave frequencies.

A data-modulated ultra wideband transmitter that modulates the phase, frequency, bandwidth, amplitude and / or attenuation of ultra-wideband (UWB) pulses. The transmitter confines or band-limits UWB signals within spectral limits for use in communication, positioning, and / or radar applications. One embodiment comprises a low-level UWB source (e.g., an impulse generator or time-gated oscillator (fixed or voltage-controlled)), a waveform adapter (e.g., digital or analog filter, pulse shaper, and / or voltage variable attenuator), a power amplifier, and an antenna to radiate a band-limited and / or modulated UWB or wideband signals. In a special case where the oscillator has zero frequency and outputs a DC bias, a low-level impulse generator impulse-excites a bandpass filter to produce an UWB signal having an adjustable center frequency and desired bandwidth based on a characteristic of the filter. In another embodiment, a low-level impulse signal is approximated by a time-gated continuous-wave oscillator to produce an extremely wide bandwidth pulse with deterministic center frequency and bandwidth characteristics. The UWB signal may be modulated to carry multi-megabit per second digital data, or may be used in object detection or for ranging applications. Activation of the power amplifier may be time-gated in cadence with the UWB source thereby to reduce inter-pulse power consumption. The UWB transmitter is capable of extremely high pulse repetition frequencies (PRFs) and data rates in the hundreds of megabits per second or more, frequency agility on a pulse-to-pulse basis allowing frequency hopping if desired, and extensibility from below HF to millimeter wave frequencies.

An implantable medical device communication system communicates information between an implantable medical device and at least one slave device by way of a two-wire bus. Slave devices may include remote sensors, actuators and other implantable medical devices. The implantable medical device includes a communication unit to output commands and power pulses, and receive information from the slave devices over the two-wire bus. The implantable medical device and slaves communicate over the bus by selectively changing one of the lines of the bus between a first and second voltage, the second voltage substantially equal to a reference voltage of the second line, e.g., zero volts. In some embodiments, the power pulses take the form of bipolar pulse pairs. The slave device includes a recovery unit to recover power from the power pulses.

The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.

The present invention provides for pulsed powered drilling apparatuses and methods. A drilling apparatus is provided comprising a bit having one or more sets of electrodes through which a pulsed voltage is passed through a mineral substrate to create a crushing or drilling action. The electrocrushing drilling process may have, but does not require, rotation of the bit. The electrocrushing drilling process is capable of excavating the hole out beyond the edges of the bit with or without the need of mechanical teeth.

Systems and methods for generating a high voltage pulse. A series of voltage cells are connected such that charging capacitors can be charged in parallel and discharged in series. Each cell includes a main switch and a return switch. When the main switches are turned on, the capacitors in the cells are in series and discharge. When the main switches are turned off and the return switches are turned on, the capacitors charge in parallel. One or more of the cells can be inactive without preventing a pulse from being generated. The amplitude, duration, rise time, and fall time can be controlled with the voltage cells. Each voltage cell also includes a balance network to match the stray capacitance seen by each voltage cell.

The invention relates to pulse oximeters used to measure blood oxygenation. The current trend towards lower power consumption has brought a problem of erroneous readings caused by intrachannel crosstalk, i.e. errors due to the coupling of undesired capacitive, inductive, or conductive (resistive) pulse power from the emitting side of the pulse oximeter directly to the detecting side of the oximeter. The pulse oximeter of the invention is therefore provided with means for detecting whether intrachannel crosstalk is present and whether it will cause erroneous results in the oxygenation measurements. The pulse oximeter is preferably further provided with means for eliminating intrachannel crosstalk which are adapted to control the measurement so that measurement signals can be obtained which are substantially void of crosstalk components.

Apparatus and method for driving laser diodes with electrical power in pulsed operation. Pulsed power, for example using pulse-width modulation, is applied through an inductor in one or more parallel regulator circuits having little or no output capacitance to provide a high-efficiency laser-diode-driver power supply. Some embodiments that use two or more parallel regulator circuits in the laser-diode driver, drive each from a different phase of a clock signal. Some embodiments provide a first DC-to-DC converter has a relatively high-voltage input (e.g., about 275 volts, 0.75 amps) and an intermediate output of e.g., 11 to 15 volts, 15 to 11 amps used to charge a storage capacitor, and a second DC-to-DC converter diode driver having one or more parallel circuits (each having, e.g., a PWM switching-mode controller and its respective switch, inductor, and diode) to turn on, regulate, and turn off a constant laser-diode current through one or more laser diodes.

A method and apparatus for operating a matching network within a plasma enhanced semiconductor wafer processing system that uses pulsed power to facilitate plasma processing.

A hybrid energy storage system is configured to control pulsed power. A first dynamo-electric machine is coupled to an inertial energy storage device and has multiple input stator windings configured to accept input power from a source. A polyphase output stator winding is configured to deliver electric power having a first response time to a DC bus. A secondary energy storage system is coupled to the DC bus and is configured to convert its stored energy to electric power in a bidirectional manner. A second dynamo-electric machine has an input stator winding and at least one polyphase output stator winding coupled to a converter, the converter coupled to a DC output. A polyphase boost exciter is configured to derive energy from the DC bus and excite the second machine input stator winding, wherein the second machine is configured to be excited at a faster rate than the first response time of the first machine.

A series of radio frequency identification (RFID) systems are delineated. One such RFID system comprises an RFID signpost, and a plurality of infrared transmitters, wherein each infrared transmitter of the plurality of infrared transmitters is arranged to cover, when transmitting, a distinct sector relative to the RFID signpost. Another RFID system comprises an RFID signpost having a transmitter for transmitting signals of a predefined type, and a receiver for receiving signals of the predefined type, wherein the transmitter for transmitting signals of the predefined type cannot transmit until a determination is made that the predefined type of signal is not present at the receiver. Still another RFID system comprises an RFID signpost including a transmitter having a continuous power dissipation rating, and a processor for controlling the transmitter such that peak pulse power of a transmission from the transmitter multiplied by its duty cycle does not exceed the continuous power dissipation rating for the transmitter.

An energy harvesting circuit harvests energy from a voltage source and charges a storage element with the harvested energy. The energy harvesting circuit includes an energy source, a storage capacitor to store energy output from the energy source, a power converter circuit, an energy storage element, and an enabling circuit. The enabling circuit turns the boost converter circuit on and off according to a monitored capacitance voltage of the storage capacitor. When the boost converter circuit is turned off, the storage capacitor accumulates energy output from the energy source until a reference voltage is reached, whereupon the boost converter circuit is turned on, enabling current flow from the storage capacitor to the storage element. When the storage capacitor discharges to a minimum voltage level, the boost converter circuit is turned off. The enabling circuit and a reference voltage supply are powered by the energy source.

The present invention provides for an electrically insulating fluid or material of high relative permittivity or dielectric constant. The fluid has a low conductivity and high relative strength and is applicable to pulsed power drilling applications.

The invention relates to a device that can be used to expose a person to a magnetic field, including an insulating belt to be placed in contact with a part of the body of the person, at least one substantially rectangular, flat dipole antenna emitting a magnetic field over a vector perpendicular to the surface thereof, the antenna being arranged longitudinally on the belt in the lengthwise direction thereof, and a power source for supplying the antenna with AC or pulsed power.

The invention discloses a high-power seeker tile type active phased array antenna, and aims at providing an active phased array antenna which is small in size and low in weight and can reliably work with no requirement for temperature compensation. The high-power seeker tile type active phased array antenna is realized by the following scheme that E-type patches act as radiation array elements of a microstrip antenna array which can be extended according to integral multiples of 4x4 array scale, rectangular grid arrays are distributed on an antenna dielectric substrate, and a tile type TR component is closely connected with a heat exchanger integrally; and the microstrip antenna array is connected with the high-power transmit-receive chips of the tile type TR component to form transmit-receive channels through integration, every four high-power transmit-receive chips are connected with one TR multifunctional chip simultaneously, four TR multifunctional chips form one 4x4 subarray circuit module together, and then subsequent connection with a power distribution synthesis network is performed. Power supply, high-power pulse power modulation and amplitude-phase code control of a DC power supply and wave beam control signals are realized via a power supply modulation distributor so that directional diagram scanning of the high-power tile type active phased array antenna can be realized.

A hybrid energy storage system is configured to control pulsed power. A first dynamo-electric machine is coupled to an inertial energy storage device and has multiple input stator windings configured to accept input power from a source. A polyphase output stator winding is configured to deliver electric power having a first response time to a DC bus. A secondary energy storage system is coupled to the DC bus and is configured to convert its stored energy to electric power in a bidirectional manner. A second dynamo-electric machine has an input stator winding and at least one polyphase output stator winding coupled to a converter, the converter coupled to a DC output. A polyphase boost exciter is configured to derive energy from the DC bus and excite the second machine tertiary stator winding, wherein the second machine is configured to be excited at a faster rate than the first response time of the first machine.

A maximum power point tracking system, named flash supercapacitor-solar power device, and method for a solar power system, which mainly adds a pulse-power supercapacitor for being operated in a dynamic equilibrium are disclosed. The duty ratio D is changed and the voltage variance of the supercapacitor is observed to determine the next adjusting direction of the duty ratio D of the DC / DC converter. In the present invention, only a voltage value of the supercapacitor is needed to be monitored and no current-detection is needed. The output power of the solar power system can be actually estimated. The maximum power is traced in an oscillatory way. Therefore, the operation process of the perturbation and observation method, which is generally implemented currently, is simplified. By utilizing the steady-state equilibrium of the supercapacitor, only the voltage of the supercapacitor needs to be detected, and there is no need to measure and calculate the voltage and current values. The system is simple and easily accessible, which is a maximum power point tracking system and method with high efficiency for a solar power system.

A high performance field reversed configuration (FRC) system includes a central confinement vessel, two diametrically opposed reversed-field-theta-pinch formation sections coupled to the vessel, and two divertor chambers coupled to the formation sections. A magnetic system includes quasi-dc coils axially positioned along the FRC system components, quasi-dc mirror coils between the confinement chamber and the formation sections, and mirror plugs between the formation sections and the divertors. The formation sections include modular pulsed power formation systems enabling static and dynamic formation and acceleration of the FRCs. The FRC system further includes neutral atom beam injectors, pellet or CT injectors, gettering systems, axial plasma guns and flux surface biasing electrodes. The beam injectors are preferably angled toward the midplane of the chamber. In operation, FRC plasma parameters including plasma thermal energy, total particle numbers, radius and trapped magnetic flux, are sustainable at or about a constant value without decay during neutral beam injection.

An active voltage drop control-type pulse power generator includes power stages, a power inverter, a power loop, a control inverter, a control loop, and a compensation unit. The power stages include power cells connected in series. Each power cell includes a switch and a capacitor connected in series, a driver for driving the switch, a bypass diode connected to both ends of the switch, and a rectifying diode connected to both ends of the capacitor. The power inverter charges the capacitor via the power loop and the rectifying diode inside each power cell. The control inverter provides a control signal for the switch via the control loop and the driver inside each power cell. The compensation unit is connected to one of the power cells and generates a compensation voltage for compensating for a voltage drop at a load according to a voltage detected in real-time from the power cell.

Filtration systems (40) utilize a pre-treatment method to cause scale formation to occur on particles (94) in the fluid stream (96) rather than on the filter surface and may also destroy microorganisms in the fluid stream. More specifically, but not limited to, a filtration device can be a filtration membrane, such as spiral wound filtration membrane (60), that utilizes an open feed spacer (80), such for example an embossed or printed pattern on the membrane, to create a thin feed spacer channel which replaces a conventional feed spacer mesh material. System (40) further utilizes a treatment device (54) to enable a pulsed power, magnetic, electro-magnetic, electro-static, or hydrodynamic fluid treatment scheme to condition particles in the fluid stream (96) such that scale forming elements precipitate (94) on to the particles in the fluid stream rather than on the filtration surfaces.

Methods and apparatus for generating strongly-ionized plasmas are disclosed. A strongly-ionized plasma generator according to one embodiment includes a chamber for confining a feed gas. An anode and a cathode assembly are positioned inside the chamber. A pulsed power supply is electrically connected between the anode and the cathode assembly. The pulsed power supply generates a multi-stage voltage pulse that includes a low-power stage with a first peak voltage having a magnitude and a rise time that is sufficient to generate a weakly-ionized plasma from the feed gas. The multi-stage voltage pulse also includes a transient stage with a second peak voltage having a magnitude and a rise time that is sufficient to shift an electron energy distribution in the weakly-ionized plasma to higher energies that increase an ionization rate which results in a rapid increase in electron density and a formation of a strongly-ionized plasma.

A solar electric system comprises photovoltaic elements having integrated energy storage and control, ideally on each PV-panel. The energy storage media may be primary or secondary cylindrical cells interconnected into a battery and / or an array of capacitors (or super-capacitors) and are accompanied by an electronic control circuit which may perform a variety of functions, including but not limited to: power quality control, load following, pulse powering, active line transient suppression, local sensing, remote reporting, wireless or wired communications allowing two way programmable control through local or remote operation. The operation of the system may yield direct current or with the integration of bidirectional micro-inverters create distributed alternating current generation enhanced with energy storage and control two way energy flows between the solar system and the grid.

The reaction rate of a feed gas flowed into a plasma chamber is controlled. In one embodiment a pulsed power supply repeatedly applies a high power pulse to the plasma chamber to increase the reaction rate of plasma within the chamber, and applies a low power pulse between applications of the high power pulses.

A magnetron sputtering apparatus suitable for coating on a workpiece is provided. The magnetron sputtering apparatus includes a vacuum chamber, a holder, a magnetron plasma source and a high-power pulse power supply set, wherein the magnetron plasma source includes a base, a magnetron controller and a target. A reactive gas is inputted into the vacuum chamber, and the holder supporting the workpiece is disposed inside the vacuum chamber. The magnetron plasma source is disposed opposite to the workpiece, wherein the magnetron controller is disposed in the base, and the target is disposed on the base. The high-power pulse power supply set is coupled to the vacuum chamber, the magnetron plasma source and the holder, and a high voltage pulse power is inputted to the magnetron plasma source to generate plasma to coat a film on the surface of the workpiece.

Disclosed is a Co-base magnetic alloy excellent in high-frequency magnetic properties, of which chemical composition is represented by the following general formula, by atomic %, (Co1-aFea)100-y-cM'yX'c, where M' is at least one element selected from the group consisting of V, Ti, Zr, Nb, Mo, Hf, Sc, Ta and W; X' is at least one element selected from the group consisting of Si and B; and a, y and c are defined by the formulas of a<0.35, 1.5<=y<=15, and 4<=c<=30, respectively. At least a part of the alloy structure of the alloy consists of crystal grains having an average grain size of not more than 50 nm. The alloy has a relative initial permeability of not more than 2000. It is suitably used for members of countermeasure against noise such as zero phase reactors for large current and electromagnetic shielding materials, inverter transformers, choke coils for active filters, antennas, smoothing choke coils, power supplies for lasers, pulse power magnetic members for accelerators.

A plasma doping apparatus includes a pulsed power supply that generates a pulsed waveform having a first period with a first power level and a second period with a second power level. A plasma source generates a pulsed plasma with the first power level during the first period and with the second power level during the second period. A bias voltage power supply generates a bias voltage waveform at an output that is electrically connected to a platen which supports a substrate. The bias voltage waveform having a first voltage during a first period and second voltage with a negative potential that attract ions in the plasma to the substrate for plasma doping during a second period. At least one of the first and second power levels of the RF waveform is chosen to at least partially neutralize charge accumulating on the substrate.

An EUV radiation source device with a chamber that is divided into a discharge space and a collector mirror space provided with EUV collector optics 3a. Between them an aperture component with an opening which is cooled is provided. First and second discharge electrodes are rotated. Sn or Li is irradiated with laser . Pulsed power is applied between the first and second discharge electrodes to form a high density and high temperature plasma between the two electrodes so that EUV radiation with a wavelength of 13.5 nm is emitted, is focused by the EUV collector optics and is guided into the irradiation optical system of an exposure tool. There are a first pumping device and a second pumping device for pumping the discharge space and the collector mirror space. The discharge space is kept at a few Pa, and the collector mirror space is kept at a few 100 Pa.

The present invention provides a pulse power generator using a semiconductor switch, which enables its lifespan to be significantly improved, allows for its miniaturization, and makes it possible to diversely control a high-voltage pulse output finally. According to the pulse power generator, it is possible to address and solve a difficulty in driving the semiconductor switch in series, i.e., the problems related to synchronization and insulation of a driving power supply, and to include a circuit which can cope with the generation of arc and short circuit to thereby significantly improve device protecting performance and stability of the pulse power generator.