The invention provides cleaning equipment, a cleaning method, a cleaning device,
control equipment, a product and a medium, and belongs to the technical field of
semiconductor cleaning. Comprising a liquid
medicine tank which is provided with an accommodating space and is used for accommodating cleaning liquid and a
wafer; the annular
Helmholtz coil comprises two circular conductor coils with the same
radius, the two conductor coils are coaxially arranged, the distance between the two conductor coils is equal to the
radius of the conductor coils, the liquid
medicine groove is formed in the two conductor coils, and the axis of each
conductor coil is perpendicular to the
wafer in the liquid
medicine groove; the monitoring unit is used for monitoring content data of
metal ions in the cleaning liquid; and the
control unit is used for acquiring the content data and / or target information of the cleaning fluid and controlling the
magnetic field intensity of the
magnetic field generated by the annular
Helmholtz coil according to the content data and / or the target information. According to the technical scheme, migration of
metal ions in the cleaning liquid can be accelerated by controlling the
magnetic field intensity, and the cleaning efficiency and the cleaning uniformity are improved.