39 results about "Gate insulator" patented technology

Disclosed herein are high electron mobility transistors (HEMTs) with hysteretic gates, and related IC structures, devices, and techniques. In one aspect, a HEMT may include a channel structure comprising a heterojunction of a first semiconductor material and a second semiconductor material, a gate electrode material, and a gate insulator material, wherein the gate insulator material is between the channel structure and the gate electrode material and includes a hysteretic element.

A metal-oxide-semiconductor (MOS) transistor includes a substrate including a well region, an insulator layer coupled to the substrate, and a source including a source region, a source contact passing through the insulator layer and the source region, and an ohmic contact disposed in the well region. The MOS transistor also includes a gate region including a gate insulator layer and a gate contact and a drain including a drain region and a drain contact passing through the insulator layer to the drain region. The MOS transistor can be an LDMOS transistor, for example, an LNDMOS or LPDMOS transistor.

A method for making a trench field effect transistor (TFET) may include forming a trench in a semiconductor layer, and forming a superlattice layer in the semiconductor layer extending along bottom and sidewall portions of the trench, the superlattice layer comprising a plurality of stacked groups of layers. Each group of layers may include a plurality of stacked base semiconductor monolayers defining a base semiconductor portion and at least one non-semiconductor monolayer, with each at least one non-semiconductor monolayer of each group of layers being constrained within a crystal lattice of adjacent base semiconductor portions. The method may further include forming source and drain regions defining, along with the superlattice layer, a channel region extending between the source and drain regions, and forming a gate within the trench comprising a gate insulator lining the trench and a gate electrode within the gate insulator.

One aspect of the present disclosure pertains to a method. The method forms a stack of semiconductor channels over a semiconductor fin. Each of the semiconductor channels are squared-shaped with rounded corners, and the rounded corners interface between vertical and horizontal surfaces of the semiconductor channels. The method forms a nonconformal interfacial layer over and wrapping around each semiconductor channel of the stack of semiconductor channels. The interfacial layer has a thicker portion at corner portions of the semiconductor channels and a thinner portion at non-corner portions of the semiconductor channels. The method forms a nonconformal high-k dielectric layer over and wrapping around the nonconformal interfacial layer. The high-k dielectric layer has a thicker portion on the thicker portion of the interfacial layer and a thinner portion on the thinner portion of the of the interfacial layer. The method forms a gate electrode over the high-k dielectric layer.

A display device includes a substrate having a transistor disposed thereon. A gate insulator is disposed on the transistor. A plurality of conductive layers is disposed on the gate insulator. The plurality of conductive layers is spaced apart from one another. An interlayer dielectric layer is disposed on the plurality of conductive layers. The interlayer dielectric layer comprises an inorganic material. A planarization layer is disposed on the interlayer dielectric layer and defines an opening. The opening exposes the interlayer dielectric layer. The planarization layer comprises an inorganic material. 1

An active matrix substrate includes a substrate and a plurality of oxide semiconductor TFTs supported on the substrate, in which each of oxide semiconductor TFT includes an oxide semiconductor layer including a first region and a second region having a specific resistance lower than a specific resistance of the first region, and a gate electrode disposed on at least a part of the first region with a gate insulating layer interposed therebetween, the gate insulating layer includes a first insulating layer and a second insulating layer disposed on the first insulating layer, and, when viewed from a normal direction of the substrate, the first insulating layer overlaps with the first region and does not overlap with the second region and the second insulating layer overlaps with the first region and at least a part of the second region.

To provide a semiconductor device having stable electrical characteristics. Or, to provide a semiconductor device having normally-off electrical characteristics. To provide a semiconductor device having normally-off electrical characteristics. 【Solution means】A semiconductor device having a gate electrode, a gate insulator, and an oxide semiconductor, where the oxide semiconductor has fluorine in the channel formation region, and the fluorine concentration in the channel formation region is 1×1 0 0 20 atoms / cm 3 or more and 1×10 22 atoms / cm 3 or less. Also, the addition of fluorine is performed by ion implantation. There is such a semiconductor device. Also, the addition of fluorine is performed by ion implantation.

Embodiments relate to devices, circuits, and systems including s-bit generators constructed from memtransistors. Each memtransistor is stacked on a non-volatile and programmable local back-gate stack. Each memtransistor has a 2D channel formed between its source and its drain. The s-bit generator can be used to construct s-bit generator circuits that exploit the different sources of inherent stochasticity in 2D memtransistors (e.g., cycle-to-cycle fluctuations in the carrier trapping and detrapping phenomena in a gate insulator of a 2D memtransistor, thermal conductance fluctuations in a defect-engineered and scaled 2D memtransistor, random telegraph signals (RTS) in a defect-engineered and scaled 2D memtransistor, etc.) and combine it with an inverting amplifier and a programmable thresholding inverter to obtain s-bits. Additional embodiments relate to integration of s-bit generators with 2D memtransistor based logic gates such as AND, MUX, XOR, and OR gates to perform arithmetic operations such as addition, subtraction, multiplication, and / or sorting.

An exemplary semiconductor structure includes first, second and third field effect transistor (PET) stack on a substrate. Each of the first, second and third FET stacks includes a top and a bottom transistor. Each transistor has a channel region, a gate insulator and a gate work function layer. Each of the gate work function layers in the top transistors of the first, second and third FETs having a different composition.

Field-Effect Transistor. This description relates to a transistor (10) comprising, on a semiconductor layer (11), a stack of a gate insulator (13) and a conductive gate (17) arranged on and in contact with the gate insulator, wherein: - the conductive gate has a lower portion (171) and an upper portion (173), the lower portion of the conductive gate having a length shorter than the length of the upper portion of the conductive gate; and - two cavities (27) filled with a gas or a vacuum are disposed between the upper portion of the conductive gate and the gate insulator, on either side of the lower portion of the conductive gate, the transistor further comprising spacers (29) covering the flanks of the upper portion of the conductive gate, said spacers being separated from the flanks of the lower portion of the conductive gate by the cavities. Figure for the abbreviation: Fig. 1

A method of forming a TFT is provided including forming a buffer layer over a substrate. A metal oxide channel layer is formed over the buffer layer and the channel layer is annealed. A gate insulator layer is formed over the channel layer and an ILD is deposited over the gate insulator layer to form the TFT. The TFT is annealed for a first annealing condition to form an annealed TFT. The annealed TFT is shorted or includes a first threshold voltage of about 0 volt or less. The annealed TFT is annealed for a second annealing condition to form a regenerated TFT having a second threshold voltage greater than the first threshold voltage, the second annealing condition includes a temperature of about 150° C. to about 275° C.

A display device includes a semiconductor layer on an opposite side to a light-blocking layer, the semiconductor layer including an active layer overlapping the light-blocking layer, a first gate insulator on an opposite side to a buffer film with the active layer therebetween, and a first gate electrode on an opposite side to the active layer with the first gate insulator therebetween, a side surface of the first gate insulator includes a first inclined portion contacting a first surface of the semiconductor layer, and a second inclined portion contacting the first inclined portion and the first gate electrode, and a first angle between the first surface of the semiconductor layer and the first inclined portion is less than a second angle between the first surface of the semiconductor layer and the second inclined portion.

Provided is a display including a substrate including a display area and a non-display area; a first transistor comprising a first semiconductor layer disposed on the display area of the substrate and a first gate electrode disposed on the first semiconductor layer; and a first gate insulator disposed between the first semiconductor layer and the first gate electrode, wherein the first semiconductor layer includes a first layer and a second layer stacked on one another each other in a direction perpendicular to the substrate, and wherein an indium content of the second layer is higher than an indium content of the first layer, and a height of the first layer is lower than a height of the second layer.

In at least one embodiment, the power semiconductor device (1) comprises: - a semiconductor body (2) having a source region (21) of a first conductivity type and a well region (22) of a second conductivity type different from the first conductivity type, and the well region (22) comprises a channel region (220) starting directly at the source region (21), and - a gate insulator (4) directly between the semiconductor body (2) and a gate electrode (31), wherein the gate insulator (4) has a non-uniform gate dielectric constant profile along the channel region (220), such that a relative dielectric constant (eox) of the gate insulator (4) is lowest in a first section (61) of the channel region (220) remote from the source region (21).

A transistor comprises a pair of source / drain regions having a channel region there-between. A gate is adjacent the channel region with a gate insulator being between the gate and the channel region. A fixed-charge material is adjacent the source / drain regions. Insulating material is between the fixed-charge material and the source / drain regions. The insulating material and the fixed-charge material comprise different compositions relative one another. The fixed-charge material has charge density of at least 1×1011 charges / cm2.

A semiconductor structure includes an active layer, a first gate insulator layer disposed over the active layer, a first gate layer disposed over the gate insulator layer, at least one charged layer disposed between the first gate insulator layer and the active layer, and a pair of contact structures disposed over the active layer. The at least one charged layer includes an oxide material.

This application relates to methods and systems for transistors having combined source and well contacts. A metal-oxide-semiconductor (MOS) transistor includes: a substrate including a well region; an insulating layer coupled to the substrate; and a source including a source region, a source contact passing through the insulating layer and the source region, and an ohmic contact disposed in the well region. The MOS transistor further includes: a gate region including a gate insulating layer and a gate contact; and a drain including a drain region and a drain contact passing through the insulating layer to the drain region. The MOS transistor may be an LDMOS transistor, such as an LNDMOS or LPDMOS transistor.

Disclosed herein are transistor arrangements with programmable gates for threshold voltage tuning, and related IC structures, devices, and techniques. As an example, a transistor includes a channel material; a first gate electrode material; a first gate insulator, wherein the first gate insulator is between the channel material and the first gate electrode material; a second gate insulator, wherein the first gate electrode material is between the first gate insulator and the second gate insulator; and a second gate electrode material, wherein the second gate insulator is between the first gate electrode material and the second gate electrode material. Together, the first gate insulator and the first gate electrode material may form the main gate for turning the transistor on and off, while the second gate insulator and the second gate electrode material may form a programmable gate for threshold voltage tuning of the transistor.

The present invention provides an organic gate insulator (OGI) layer having a low dielectric constant (k), said organic gate insulator layer being over-coated with a cross-linked organic layer (OSPL) having a relatively high permittivity (k). The present invention also provides an electronic device comprising such an organic thin film transistor. The invention also provides a solution for producing said OSPL, and a process for producing said OSPL.

A display device, a method for manufacturing the same, and an electronic device including the same are provided. The display device includes: a substrate including a display area and a non-display area; a first transistor including a first semiconductor layer disposed on the display area of the substrate and a first gate electrode disposed on the first semiconductor layer; and a first gate insulator disposed between the first semiconductor layer and the first gate electrode, in which the first semiconductor layer includes a first layer and a second layer stacked on each other in a direction perpendicular to the substrate, and in which an indium content of the second layer is higher than an indium content of the first layer, and a height of the first layer is lower than a height of the second layer.

Electronic devices and related manufacturing methods employing thin-gate insulated transistors coupled to varactor diodes to reduce gate-to-source / drain voltages to prevent voltage breakdown. The electronic device includes a thin-gate insulated transistor coupled in series to provide a single output node, and the gate of the thin-gate insulated transistor is controlled by a single input node to provide an efficient three (3)-terminal single transistor device. The electronic device includes varactor diodes, each varactor diode being coupled in series between the corresponding gate of the thin-gate insulated transistor and the input node to support a single input signal for the electronic device. Each series-coupled varactor diode and thin-gate insulated transistor are coupled in parallel to each other to the input node. Each varactor diode creates a voltage divider between the input signal voltage and the corresponding gate of the series-connected thin-gate insulated transistor to prevent the corresponding gate-to-source / drain voltage of the thin-gate insulated transistor from exceeding its breakdown voltage.

A trench field effect transistor (TFET) may include a semiconductor layer having a trench therein, and a superlattice layer in the semiconductor layer extending along bottom and sidewall portions of the trench. The superlattice layer may include a plurality of stacked groups of layers, with each group of layers comprising a plurality of stacked base semiconductor monolayers defining a base semiconductor portion and at least one non-semiconductor monolayer, and each at least one non-semiconductor monolayer of each group of layers being constrained within a crystal lattice of adjacent base semiconductor portions. The TFET may further include source and drain regions defining, along with the superlattice layer, a channel region extending between the source and drain regions, and a gate within the trench comprising a gate insulator lining the trench and a gate electrode within the gate insulator.

Disclosed herein are transistor channel structures combining GaN and SiC, and related IC structures, devices, and techniques. For example, in some embodiments, a transistor may include a gate electrode material; a gate insulator material; and a channel structure, wherein the gate insulator material is between the channel structure and the gate electrode material, the channel structure includes a first portion, a second portion, and a third portion, and the second portion is between the first portion and the third portion, and wherein either (1) the first portion and the third portion include gallium and nitrogen, and the second portion includes silicon and carbon, or (2) the first portion and the third portion include silicon and carbon, and the second portion includes gallium and nitrogen.

In one embodiment, the semiconductor device (1) comprises a semiconductor body (2), a gate electrode (33) and a first electrode (31), wherein—the semiconductor body (2) comprises a first region (21) which is a source region or an emitter region, and comprises a well region (22) located next to the first region (21), the first region (21) is of a first conductivity type and the well region (22) is of a second conductivity type, —the well region (22) is separated from the gate electrode (33) by a gate insulator layer (4), —the first region (21) is electrically contacted by means of the first electrode (31), —in the first region (21) there is at least one current limiting region (5), and—the at least one current limiting region (5) is a sub-region of the first region (21) with a decreased electrical conductivity.

In one embodiment, the semiconductor device (1) comprises a semiconductor body (2), a gate electrode (33) and a first electrode (31), wherein—the semiconductor body (2) comprises a first region (21) which is a source region or an emitter region, and comprises a well region (22), the first region (21) is of a first conductivity type and the well region (22) is of a different, second conductivity type,—the well region (22) is separated from the gate electrode (33) by a gate insulator layer (4),—the first region (21) is electrically contacted by means of the first electrode (31) which is a source electrode or an emitter electrode,—in the first region (21) there is at least one current limiting region (5), and—the at least one current limiting region (5) is of at least one electrically insulating material.

A method for manufacturing a semiconductor device with a high yield is provided. In a semiconductor device including an oxide semiconductor over a substrate, when an insulator in contact with the oxide semiconductor, such as a gate insulator or an interlayer film, is deposited, the insulator can be deposited without diffusion of hydrogen into the oxide semiconductor by setting a constant derived from deposition conditions within a given range. Specifically, setting values of deposition power, the effective electrode area, deposition pressure, and the flow rate of a deposition gas containing hydrogen in the deposition conditions can be selected as appropriate.

Embodiments of the present disclosure relate to thin film transistor array substrates and display devices in which a semiconductor layer has a heterogeneous conductive structure including heterogeneous conductive portions having different electrical conductivities, and a gate insulator layer is not etched enough to expose the semiconductor layer between the source electrode portion and the gate electrode portion and between the drain electrode portion and the gate electrode portion, so that the possibility of damage to the semiconductor layer can be eliminated or minimized.

A miniaturizable or highly integrable semiconductor device is provided. The semiconductor device comprises a transistor and an insulator. The insulator is provided over one source and drain terminal of the transistor. The other source and drain terminal of the transistor is provided over the insulator. An opening section leading to the one source and drain terminal is provided in the insulator and the other source and drain terminal. An oxide semiconductor of the transistor is in contact with a top surface of the one source and drain terminal in the opening section, a side surface of the insulator in the opening section, and a side surface of the other source and drain terminal in the opening section. A gate insulator of the transistor is provided over the oxide semiconductor. A gate of the transistor is provided over the gate insulator.The oxide semiconductor comprises a first region in contact with one terminal of the source and drain, a second region in contact with the insulator, and a third region in contact with the other terminal of the source and drain. The first and third regions have a lower resistance than the second region. The second region has a lower potential than the first and third regions.

A semiconductor device and methods of forming the same include a semiconductive fin protruding vertically from a body region and extending along a first direction, an insulator material above the body region and surrounding a lower portion of the fin, and a gap region between first and second ends of the semiconductive fin where at least a top portion of the semiconductive fin is absent. The device includes current terminals coupled to first and second ends of the fin, and a gate electrode and a gate extension coupled to the fin. The gate electrode surrounds the top portion of the semiconductive fin and is separated from the semiconductive by a gate insulator material. The gate extension has a first end adjacent to the gate electrode and a second end above the body region within the gap region.

Provided is a capacitor device, a unit synapse using the capacitor device, a synapse array using the unit synapses. The capacitor device comprises a semiconductor layer which include first and second doping regions formed to be spaced apart from each other and a body region formed between the first and second doping regions; a gate electrode provided above the body region; and a gate insulator stack to have a memory function and disposed between the gate electrode and the semiconductor layer. The capacitance between the gate electrode and the first doping region is determined according to information stored in the gate insulator stack, and the state of the capacitor device is determined according to the capacitance to be one of two preset states. The unit synapse comprises a pair of capacitor devices to perform an XNOR operation.