The invention relates to an efficient SiC
polishing solution based on a core-shell structure functionalized
abrasive, which is prepared from the following raw materials in percentage by
mass: 1 to 10 percent of core-shell structure functionalized
abrasive, 1 to 5 percent of
potassium permanganate, 0.01 to 5 percent of dispersing agent, 0.01 to 5 percent of
buffering agent and the balance of deionized water, the pH value of the SiC efficient
polishing solution is 3-6. According to the invention, the functional
abrasive material taking the hard abrasive material as the core and the
catalytic metal oxide as the shell is constructed, and the catalytic
active component is loaded on the surface of the abrasive material in a chemical bonding manner, so that the interface synergistic efficiency of mechanical
grinding and chemical
catalysis is obviously enhanced; the technical bottlenecks of insufficient synergistic effect and low
material removal efficiency caused by separation of an abrasive and a catalyst in the prior art are solved, efficient
material removal without increasing the concentration of an
oxidizing agent or
external field auxiliary conditions is realized, and excellent surface quality is ensured while the
material removal efficiency is improved; therefore, the urgent demand of
SiC substrate industrialization on high-quality and high-efficiency planarization
processing is met.