582 results about "Atomic force microscopy" patented technology

The magnetic recording medium comprises a magnetic layer comprising a ferromagnetic powder and a binder on a nonmagnetic support. In the magnetic recording medium, a number of protrusions equal to or greater than 10 nm in height on the magnetic layer surface, as measured by an atomic force microscope, ranges from 50 to 500/1,600 μm², the binder comprises a polyurethane resin with a weight average molecular weight ranging from 100,000 to 200,000, and the magnetic layer further comprises a carbonic ester having a molecular weight ranging from 360 to 460.

The invention provides a liquid cell for an atomic force microscope. The liquid cell includes a liquid cell housing with an internal cavity to contain a fluid, a plurality of conductive feedthroughs traversing the liquid cell housing between the internal cavity and a dry side of the liquid cell, a cantilevered probe coupled to the liquid cell housing, and a piezoelectric drive element disposed on the cantilevered probe. The cantilevered probe is actuated when a drive voltage is applied to the piezoelectric drive element through at least one of the conductive feedthroughs. A method of imaging an object in a liquid medium and a method of sensing a target species with the liquid cell are also disclosed.

Systems and methods are described for laser ablation of an analyte from a specimen and capturing of the analyte in a dispensed solvent to form a testing solution. A solvent dispensing and extraction system can form a liquid microjunction with the specimen. The solvent dispensing and extraction system can include a surface sampling probe. The laser beam can be directed through the surface sampling probe. The surface sampling probe can also serve as an atomic force microscopy probe. The surface sampling probe can form a seal with the specimen. The testing solution including the analyte can then be analyzed using an analytical instrument or undergo further processing.

An approach is presented for designing the polymeric recording layer for nanometer scale thermomechanical storage devices. Cross linked polymers are used as the recording layers in atomic force microscopy data storage devices, giving significantly improved performance when compared to the previously reported linear polymers. This results in superior wear resistance and enhanced erasing, critical features for the long-term multiple read-write cycles of such thermomechanical storage devices. In addition, this ability to introduce a predetermined extent of cross linking allows fine tuning of the thermal and force parameters in the R/W/E (read-write-erase) cycles.

This invention provides a method of depositing high-quality Si or SiGe epitaxial layers on SiGe substrates. By first depositing a thin Si seed layer on the SiGe substrate, the quality of the seed layer and of the subsequently deposited layers is greatly improved over what is obtained from depositing SiGe directly onto the SiGe substrate. Indeed, whereas the RMS surface roughness of the deposition of SiGe directly on SiGe, as measured by atomic-force microscopy (AFM), was 3-4 nm, it was more than an order of magnitude better when a thin Si seed layer was employed. This work was performed on an ultra-high-vacuum chemical vapor deposition (UHV/CVD) system; however, the same method would apply to other deposition systems such as atmospheric-pressure, low-pressure and rapid-thermal CVD.

Smooth silicon films having low compressive stress and smooth tensile silicon films are deposited by plasma enhanced chemical vapor deposition (PECVD) using a process gas comprising a silicon-containing precursor (e.g., silane), argon, and a second gas, such as helium, hydrogen, or a combination of helium and hydrogen. Doped smooth silicon films and smooth silicon germanium films can be obtained by adding a source of dopant or a germanium-containing precursor to the process gas. In some embodiments dual frequency plasma comprising high frequency (HF) and low frequency (LF) components is used during deposition, resulting in improved film roughness. The films are characterized by roughness (Ra) of less than about 7 Å, such as less than about 5 Å as measured by atomic force microscopy (AFM), and a compressive stress of less than about 500 MPa in absolute value. In some embodiments smooth tensile silicon films are obtained.

A perpendicular magnetic recording medium, comprising:

• • (a) a non-magnetic substrate having a surface; and
  • (b) a layer stack formed over the substrate surface, comprising in overlying sequence from the substrate surface:
    • (i) a magnetically soft underlayer;
    • (ii) an interlayer structure for crystallographically orienting a layer of a perpendicular magnetic recording material formed thereon; and
    • (iii) at least one crystallographically oriented magnetically hard perpendicular recording layer;
  • wherein the magnetically soft underlayer is sputter-deposited at a sufficiently large target-to-substrate spacing and at a sufficiently low gas pressure selected to provide the underlayer with a smooth surface having a low average surface roughness Ra below about 0.3 nm, as measured by Atomic Force Microscopy (AFM).

Sensors and systems for electrical, electrochemical, or topographical analysis, as well as methods of fabricating these sensors are provided. The sensors include a cantilever and one or more probes, each of which has an electrode at its tip. The tips of the probes are sharp, with a radius of curvature of less than about 50 nm. In addition, the probes have a high aspect ratio of more than about 19:1. The sensors are suitable for both Atomic Force Microscopy and Scanning Electrochemical Microscopy.

An atomic force microscopy (AFM) nanoprobe comprising a nanocone base and a nanoprobe tip wherein the length to base diameter aspect ratio is at least 3 or more. The AFM nanoprobe tip structure comprises an orientation-controlled (vertical or inclined), high-aspect-ratio nanocone structure without catalyst particles, with a tip radius of curvature of at most 20 nm.

An improved method is provided for performing nanomanipulations using an atomic force microscope. The method includes: performing a nanomanipulation operation on a sample surface using an atomic force microscope; determining force data for forces that are being applied to the tip of the cantilever during the nanomanipulation operation, where the force data is derived along at least two perpendicularly arranged axis; and updating a model which represents the topography of the sample surface using the force data.

A method of scanning probe microscopy includes using a cantilever having a planar body, generally opposed first and second ends, and a tip disposed generally adjacent the second end and extending downwardly towards a surface of a sample. Preferably, the sample is disposed on a support surface. The method includes directing a beam of light onto the second end in a direction substantially parallel to the support surface. In operation, the second end directs the beam towards a detector apparatus at a particular angle. Then, the method monitors a change in the angle of deflection of the beam of light caused by deflection of the cantilever as the cantilever tip traverses the surface of the sample, the change being indicative of a characteristic of the surface. Preferably, the second end includes a flat reflective surface, with the flat reflective surface being generally non-planar with respect to the planar body of the cantilever. In addition, the flat reflective surface comprises a mirror fixed to the second end, while in another embodiment, the flat reflective surface is microfabricated integrally with the cantilever.

A method for determining properties of a sample surface using an atomic force microscope includes applying a first voltage between the sample and a probe, moving the probe towards the surface of the sample, and stopping movement of the probe towards the surface of the sample when current in the probe is initially detected. An oscillating magnetic field is applied to the probe such that the probe obtains stable contact with the surface of the sample.

An improvement for atomic force microscopes, more generally for light beam detecting systems, but also in part applicable to scanning probe microscopes, providing significant novel features and advantages. Particular features include using different objective lens regions for incident and reflected light, a flexure that allows three dimensional motion of the optics block, forming the housing and optics block of a composite material or ceramic, arranging the components so that the beam never hits a flat surface at normal incidence, and providing a resonant frequency of cantilever vibration greater than 850 HZ between the cantilever and sample and the cantilever and focusing lens.

The invention relates to a characterization method of an atomic force microscope for a micro-pore structure of a reservoir rock core. The method comprises the following steps of: (1) preparing for a characterization sample to ensure that a reservoir rock sample adapts to the characterization of an atomic force microscope; (2) reconstructing a characterization apparatus to ensure that the atomic force microscope adapt to a characterization reservoir rock sample; and (3) analyzing the data of a characterization image, and analyzing the characterization image to obtain useful information to guide production practice. By using the method, the characterization method of the micro-pore structure of the rock can be more complete and accurate so that the characteristics of a nano-grade structure and a micron-grade structure of a reservoir stratum can be indicated three-dimensionally and clearly, and the method has important scientific and economic significances in evaluating reserves of an oil-gas field or the characteristics of the rock micro-pore structure of the oil-gas field to increase the yield of the oil-gas field.

The invention relates to an electrochemical polishing method for the high purity aluminium under ultrasonic agitation, which belongs to the fields of the material chemistry and the electrochemistry. The electrochemical polishing method under the ultrasonic agitation comprises the following steps: high purity aluminium foil is added in absolute ethyl alcohol, so as to be cleaned with deionized water and through ultrasonic oscillations, and the natural oxide film in sodium hydroxide is removed; the aluminium foil after being pretreated is used as an anode, the platinum sheet is used as the cathode, the reference electrode is saturated calomel electrode, and the electropolishing solution is the mixed liquor composed of absolute ethyl alcohol and perchloric acid; the electrolysis vessel is positioned in an ultrasonic wave cleaner, and electrochemical polishing is performed on a constant potential rectifier. The self-organizing structure with nanoscale stripe shape is formed on the aluminium surface, the structure is observed by adopting the atomic force microscopy, and the size of the stripe-shaped nanostructure changes under the ultrasonic agitation; the composition of the polishing surface is analyzed through the Raman spectrum and the X-ray diffraction, so as to indicate that the composition of the polishing surface is amorphous aluminum oxide.

A modular AFM/SPM which provides faster measurements, in part through the use of smaller probes, of smaller forces and movements, free of noise artifacts, that the old generations of these devices have increasingly been unable to provide. The modular AFM/SPM includes a chassis, the foundation on which the modules of the instrument are supported; a view module providing the optics for viewing the sample and the probe; a head module providing the components for the optical lever arrangement and for steering and focusing those components; a scanner module providing the XYZ translation stage that actuates the sample in those dimensions and the engage mechanism; a isolation module that encloses the chassis and provides acoustic and/or thermal isolation for the instrument and an electronics module which, together with the separate controller, provide the electronics for acquiring and processing images and controlling the other functions of the instrument. All these modules and many of their subassemblies are replaceable and potentially upgradeable. This allows updating to new technology as it becomes available.

Various microscopy probes and methods of fabricating the same are provided. In one aspect, a method of fabricating a microscopy probe is provided that includes providing a member and forming a first film on the member. The first film fosters growth of carbon nanotubes when exposed to a carbon-containing compound. A second film is formed on the first film. The second film has an opening therein that exposes a portion of the first film. A carbon nanotube is formed on the exposed portion of the first film.

An atomic force microscope (AFM) tip is used to selectively produce surface enhanced Raman scattering (SERS) for localized Raman spectroscopy. Spectra of thin films, undetectable with a Raman microprobe spectrometer alone, are readily acquired in contact with a suitably gold-coated AFM tip. Similarly, an AFM tip is used to remove sample layers at the nanometer scale and subsequently serve as a SERS substrate for ultra-trace analysis. This demonstrates the interface of an AFM with a Raman spectrometer that provides increases sensitivity, selectivity and spatial resolution over a conventional Raman microprobe. An AFM guiding the SERS effect has the potential for targeted single molecule spectroscopy.

There is disclosed a scanning probe microscope for producing a topographic image of a surface of a sample by noncontact AFM (atomic force microscopy). First, a first topographic image of the sample undergoing magnetic effects is produced from the resonance frequency of a cantilever by FM detection. Then, a second topographic image of the sample free of magnetic effects is produced from the amplitude of the cantilever by slope detection. The difference between these two topographic images is taken. Thus, a magnetic force image is produced.