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254 results about "Afm atomic force microscopy" patented technology

Atomic Force Microscopy. The atomic force microscope (AFM) was developed to overcome a basic drawback with STM – it can only image conducting or semiconducting surfaces. The AFM has the advantage of imaging almost any type of surface, including polymers, ceramics, composites, glass, and biological samples.

Biological scaffold viscoelasticity evaluation method and related equipment

The invention discloses a biological scaffold viscoelasticity evaluation method and related equipment, and aims to overcome the defects of an existing biological scaffold viscoelasticity test method and biological tissue suitability quantitative evaluation. The method comprises the following steps: determining a target implantation part, and acquiring force relaxation experimental data of a biological scaffold by using an atomic force microscope; judging a contact point of the probe and the bracket based on the data; determining the moment when the force signal is stable after the support is compressed to the preset deformation according to the contact point as a force relaxation starting point; calculating the characteristic time when the force value is attenuated to half by taking the starting point as a timing starting point as a microscopic viscoelasticity index; and finally, realizing quantitative evaluation of viscoelasticity suitability by comparing the characteristic time of the stent and the target tissue.
Owner:XI AN JIAOTONG UNIV +2

Method for cleaning atomic force microscope probe and detecting cleaning effect

The invention relates to the field of atomic force microscope probe cleaning, and provides a method for cleaning an atomic force microscope probe and detecting the cleaning effect, and the method for cleaning the atomic force microscope probe comprises the steps: providing a cleaning object with a tip, and the diameter of the tip of the cleaning object is not greater than the diameter of the tip of the probe of an atomic force microscope; starting the atomic force microscope, enabling the probe and the cleaning object to move relatively, enabling the tip of the cleaning object to face the tip of the probe, and enabling the tip of the cleaning object and the tip of the probe to interact with each other so as to remove pollutants at the tip of the probe. The method can be used for efficiently and conveniently cleaning pollutants at the tip of the probe of the atomic force microscope, so that the service life of the probe can be prolonged, and various measurement performance indexes related to the probe can be improved; and the probe can be more conveniently and widely applied to scanning of various samples, and the application value is high.
Owner:CHINAINSTRU & QUANTUMTECH (HEFEI) CO LTD

Atomic Force Microscope Based Infrared Spectroscopy With Multiple Laser Pulse Repetition Rate Excitation And Optional Force Volume Operation

An apparatus and method directed to sample characterization with an AFM using a pulsed IR laser in force volume mode, i.e., force volume mode combined with AFM-IR, referred to herein as FV AFM-IR. In this way, lateral forces are suppressed during probe positioning, and precise force control allows adjusting the tip-sample interaction force, including keeping the tip-sample interaction force constant or exerting pulling forces. Nano-spectroscopic measurements with sub-20 nm, and even sub-10 nm resolution can be acquired together with nano-mechanical and other property measurements. Notably, probe resonance shifts can be compensated with frequency tracking methods, and signal normalization by the Q-factor can be used to ensure that the extracted light-induced surface pulse force is substantially independent of damping.
Owner:BRUKER NANO INC

Alkali metal gas chamber anti-relaxation self-assembly molecular coating adsorption energy quantification method

The invention relates to an alkali metal gas chamber anti-relaxation self-assembly molecular coating adsorption energy quantification method, which finally realizes the physical quantification of the anti-relaxation coating adsorption energy by establishing a contact angle and surface topography collaborative characterization model and combining an adsorption-desorption dynamic formula, and is characterized by comprising the following steps: 1) establishing a contact angle and surface topography collaborative characterization model; depositing organosilane on a gas chamber glass substrate by adopting a liquid phase self-assembly method to form an anti-relaxation coating sample; step 2, selecting a plurality of measuring points on the anti-relaxation coating sample, dropping a 1 [mu] L ultrapure water liquid drop on each measuring point, determining a polarization retention angle of each measuring point according to the liquid drop height and the liquid drop substrate radius obtained by a contact angle measuring instrument, and scanning a local area of the corresponding measuring point by using an atomic force microscope (AFM), extracting an arithmetic mean value Ra of the surface roughness parameter and a root-mean-square value Rq of the surface roughness parameter as quantitative indexes of the polarization maintaining cross section; and step 3, taking free energy formed by the molecular layer of the coating as coating adsorption energy delta G.
Owner:BEIHANG UNIV +1

Terahertz near-field imaging light path calibration device and method

The invention relates to a terahertz near-field imaging light path calibration device and a terahertz near-field imaging light path calibration method. The device comprises a first visible light source, a second visible light source, a first collimation visible light source, a second collimation visible light source, a first light path collimation system, a second light path collimation system, a light path adjusting system, a circular reflector, a terahertz quantum cascade laser, a thermal detection array, a terahertz quantum well detector and an atomic force microscope platform. The THz laser source and the detector are simulated through the divergent visible light source, the lifting position point of the light path is calculated, light beams can be accurately coupled to the position of the needle point after being focused, errors caused by improper light path adjustment are reduced, meanwhile, the overlapping effect of light spots at the needle point is calibrated through the circular reflector and the thermal detection array, and the detection accuracy is improved. And the thermal detection array is used for observing the convergence effect of THz reflection light spots at the position of the detector, so that the effective focusing and coupling efficiency of THz waves in a near-field region of a probe sample can be improved.
Owner:SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI

Method for measuring surface energy of wafer in hybrid bonding based on chemically modified probe

The invention relates to a method for measuring wafer surface energy in hybrid bonding based on a chemically modified probe. The method comprises the following steps: carrying out surface pretreatment on an atomic force microscope probe and a wafer sample; constructing same functional group modification layers on the surfaces of the microscope probe and the wafer sample; the bending sensitivity, the elastic coefficient and the curvature radius of the probe are calibrated; acquiring a force-distance curve based on interaction between the probe covered by the functional group modification layer and the surface of the wafer sample, and calculating initial adhesion work based on the force-distance curve; and performing error correction on the initial adhesion work by using the surface energy measured by a contact angle method of a standard wafer sample, and establishing a quantitative mapping relation between the corrected adhesion work and the bonding strength. Compared with the prior art, the method has the advantages that the probe is subjected to functional group modification, the adhesive force of the surface of the sample is measured through the functionalized probe, and the surface energy of the wafer sample in mixed bonding is calculated in mixed bonding, so that the subsequent bonding strength of the sample is estimated.
Owner:SOUTHEAST UNIV

Device for detecting dust removal effect of dust-sticking roll

The invention discloses a dust-sticking roll dust removal effect detection device, which comprises a detection box and a test box, an atomic force microscope is installed on the detection box, a lifting mechanism is installed at the upper end of the test box, and the lower end of the lifting mechanism penetrates through the side wall of the test box and extends into the test box. The lower end of the lifting mechanism is connected with an angle adjusting mechanism, the lower end of the angle adjusting mechanism is connected with a rotating frame, and a reciprocating motion mechanism is installed in the rotating frame. An artificial intelligence algorithm and a real-time dynamic monitoring technology are introduced, errors caused by manual subjective judgment are avoided, the dust removal effect of the sticky roll can be evaluated more accurately, meanwhile, the detection efficiency is greatly improved through the automatic detection process, the requirement of large-scale production is met, the adsorption mechanism and the dust removal effect of the sticky roll can be deeply known, and the dust removal efficiency is improved. Important reference basis is provided for research, development and improvement of the sticky roll, the production process and formula can be adjusted according to the detection result, and the product quality and performance are improved.
Owner:JIANGSU HENGCHANG SMART HOME CO LTD

CNN-Transform-based mechanical property prediction method for rivet-free bonded joint

The invention belongs to the technical field of rivet-free bonding, discloses a CNN-Transform-based mechanical property prediction method for a rivet-free bonded joint, and aims to solve the problems that the existing mechanical property detection of the rivet-free bonded joint needs a destructive test, the prediction efficiency is low, and the prediction precision is insufficient. The method comprises the following steps: firstly, acquiring micron-scale and nano-scale morphology images of an upper plate and a lower plate of a rivet-free bonded joint through a white light interference microscope and an atomic force microscope, and completing standardized pretreatment; feature re-calibration is completed through a double-plate cross-scale interaction attention enhancement module, depth features are extracted through a four-branch CNN, and global association is established through cross-plate interaction Transformer; and finally, predicting the maximum peak load and failure displacement of the joint under the tensile shear working condition through the multi-regression head optimized by the same variance uncertainty loss. The method has the advantages of low prediction cost, high prediction efficiency, accurate precision and the like.
Owner:CHANGCHUN UNIV OF TECH

Low-stress chemical mechanical etching process suitable for brittle material

The invention relates to a low-stress chemical mechanical etching process suitable for fragile materials, which belongs to the technical field of etching processing of fragile materials and comprises a precise chemical mechanical polishing machine, a polishing pad, a polishing solution conveying and managing system and end point detection equipment. The precise chemical mechanical polishing machine comprises a multi-zone pressure controllable polishing head, a high-precision rotating speed control system and a real-time thickness measuring system, a polishing pad is a polishing disc made of porous polyurethane materials, and the polishing liquid conveying and managing system comprises a multi-channel metering pump system and a stirring and temperature control unit. And the end point detection equipment comprises a surface profilometer, an atomic force microscope and a transmission electron microscope. According to the method, through fine cooperation of chemical reaction and mechanical grinding, microcrack initiation and propagation in the polishing process are effectively inhibited, surface and subsurface damage of the fragile material is remarkably reduced, the machined surface which is ultrahigh in smoothness and free of damage is obtained, and meanwhile the high material removal rate is kept.
Owner:JIANGSU BAIYUANHONG METAL TECH CO LTD

All-solid-state battery thin-layer electrode device for multi-mode in-situ interface research and application of all-solid-state battery thin-layer electrode device

The invention relates to an all-solid-state battery thin-layer electrode device for multi-mode in-situ interface research. The all-solid-state battery thin-layer electrode device comprises the following components: a solid electrolyte substrate; the functional thin layer is arranged on the surface of the solid electrolyte substrate; the functional thin layer has conductivity; the functionalized thin layer allows a detection signal of an in-situ characterization technology to effectively penetrate or be reflected from the surface of the functionalized thin layer; the in-situ characterization techniques include atomic force microscopes, optical microscopes, and Raman spectroscopy, X-ray photoelectron spectroscopy, infrared spectroscopy, or X-ray diffraction. The invention provides a universal thin-layer electrode design and system and a thin-layer electrode in-situ imaging and spectroscopic characterization method for all-solid-state battery interface reaction. The objective of the invention is to expose a solid electrolyte-electrode interface reaction process which is difficult to observe in an effective detection range of various characterization technologies so as to realize real-time and in-situ visualization and accurate analysis of a dynamic evolution process of an internal interface of an all-solid-state battery.
Owner:INST OF CHEM CHINESE ACAD OF SCI

Apparatus and method for identifying target position in atomic force microscope

Provided are an apparatus and a method for identifying a target position in an atomic microscope. An apparatus is configured to acquire result data identifying the cantilever from an image using an identification model learned to identify the cantilever based on the image photographed by a photographing unit, and calculate a target position from the cantilever using the acquired result data, in which the result data include at least one of bounding box data representing a bounding box including a boundary of the cantilever and segmentation data obtained by segmenting the cantilever and an object other than the cantilever.
Owner:PARK SYST CORP

Magnetic tape, magnetic tape cartridge, and magnetic tape apparatus

The magnetic tape includes a non-magnetic support, and a magnetic layer containing a ferromagnetic powder. A rate of change in an area ratio of a protrusion having a height of 5 nm or more and 10 nm or less, which is obtained by measuring a measurement region of 5 μm×5 μm on a surface of the magnetic layer before and after 1000 reciprocating slides with respect to an LTO 8 head at a head tilt angle of 15° in an environment of a temperature of 35° C. and a relative humidity of 80%, with an atomic force microscope, is 10.0% or less.
Owner:FUJIFILM CORP

Conductive member, electrifying device, process cartridge, and image forming apparatus

To provide a conductive member that is excellent in color streak generation prevention properties.SOLUTION: A conductive member has a particulate conductive part having an area ratio of 15 area% or more, which is measured when a conductive point on its surface is measured using a current simultaneous measurement atomic force microscope. The conductive member has the particulate conductive part having an average area of 0.05 μm2 or more, which is measured when the conductive point on its surface is measured using the current simultaneous measurement atomic force microscope.SELECTED DRAWING: Figure 1
Owner:FUJIFILM BUSINESS INNOVATION CORP

Sulfide-based solid electrolyte and all-solid-state battery comprising same

The present invention relates to a sulfide-based solid electrolyte containing lithium (Li), phosphorus (P), sulfur (S), boron (B), and a plurality of halogen elements and having an argyrodite-type crystal structure, wherein the sulfide-based solid electrolyte satisfies formula 1. [Formula 1] 3.6 ≤ (CxB) / A ≤ 5.5 In formula 1, A is Dmax measured by a laser diffraction and particle size distribution measurement method, B is D50, and C is an elastic modulus measured using an atomic force microscope (AFM).
Owner:POSCO HLDG INC

Lithium secondary battery

A lithium secondary battery according to the present invention includes a positive electrode and a negative electrode disposed opposite the positive electrode. The slip step difference of the positive electrode is 20 nm or less. The slip segment difference is defined in such a manner that, in a line scan pattern obtained by measuring the surface of the positive electrode in a fully discharged state after 500 times of charging and discharging of the battery using an atomic force microscope (AFM), the distance between a pair of parallel lines in which the slope of the observed mountain shape is not zero may include two or more.
Owner:SK ON CO LTD +1

Vacuum sample holder device for femtosecond laser sample preparation and atomic force microscope (afm)

The application discloses a vacuum sample clamp device combined with femtosecond laser sample preparation and atomic force microscope (AFM), and relates to the technical field of clamps.The vacuum sample clamp device combined with femtosecond laser sample preparation and atomic force microscope (AFM) comprises an outer shell, a supporting table, a sample table and a position recorder, the outer shell is provided with an inner cavity, a laser inlet and a communication hole, the laser inlet and the communication hole are communicated with the inner cavity respectively, the laser inlet is used for allowing sample preparation laser to enter, and the communication hole is used for being communicated with a vacuum device; the supporting table is movably connected to the inner cavity; the sample table is placed on the supporting table, the sample table is provided with a placing position and a mounting cavity, the placing position is located above the mounting cavity, and the placing position is used for placing a sample; and the position recorder is mounted in the mounting cavity and is used for recording displacement coordinates in a laser sample preparation process after the sample is placed in the placing position. The technical scheme provided by the application can realize fast transfer between a femtosecond laser sample preparation processing environment and an AFM test environment without repositioning.
Owner:JIHUA LAB

Atomic Force Microscope Cryogenic Probe

The present invention discloses an atomic force microscope low-temperature probe, which is used to be placed in a low-temperature dewar and includes: a low-temperature objective lens barrel; a sample stage, which is located below the low-temperature objective lens barrel and is provided with a sample placement groove, which is used to place the sample, and the sample placement groove is suitable for moving relative to the low-temperature objective lens barrel; a sample displacement assembly, which is used to install the sample stage and to drive the sample stage to move in space; a probe displacement assembly, which is equipped with an NV probe, which is used to drive the NV probe to move in space, and the NV probe is suitable for moving above the sample placement groove, and the probe displacement assembly and the sample displacement assembly are arranged side by side. The atomic force microscope low-temperature probe of the present invention can ensure that the probe is completely placed in a low temperature, improve the accuracy of sample observation, and the sample placement groove can quickly disassemble and replace the sample during the movement of the low-temperature objective lens barrel.
Owner:CHINAINSTRU & QUANTUMTECH (HEFEI) CO LTD

Atomic force microscope probe box convenient for taking and placing probe

The utility model is suitable for the technical field of microscope probe boxes, and provides an atomic force microscope probe box convenient for taking and placing a probe. The groove is formed in the center of the top of the box body; the containing groove is formed in the bottom of the interior of the groove; the rotating plate rotates at the central position of the inner wall of one side of the accommodating groove; the supporting plate is fixed to the position, close to the lower side of the rotating plate, of the inner side wall of the containing groove. The sliding table slides on the inner wall of the side, adjacent to the rotating plate, of the containing groove; the fixed table is fixed on the inner wall of the other side, adjacent to the rotating plate, of the storage groove through a bolt; one side end of the rotating plate rotates downwards when the linkage pressing rod is pressed downwards according to the lever principle, the other side end of the rotating plate tilts upwards, a probe on the rotating plate is in the state that one side of the probe is low and the other side of the probe is high, the rotating plate is shorter than the probe, the upward side end of the probe is not blocked, the probe can be directly taken conveniently, and the taking operation of the probe is convenient.
Owner:FREESI (SUZHOU) INSTR CO LTD

Laminate and method for manufacturing same

The purpose of the present invention is to provide a laminate excellent in light resistance without being provided with a flattening layer, and a manufacturing method capable of efficiently manufacturing the laminate. The present invention relates to a laminate having a dye-containing resin layer and an inorganic compound layer on both surfaces of the dye-containing resin layer, wherein the arithmetic average roughness Ra1 of both surfaces of the dye-containing resin layer as measured with an atomic force microscope is 2.5 nm or less, or the arithmetic average roughness Ra2 of the surfaces of the two inorganic compound layers as measured with an atomic force microscope is 2.3 nm or less.
Owner:NIPPON SHOKUBAI CO LTD

Wafer detection device and detection method

The invention relates to the field of wafer detection, in particular to a wafer detection device and method, the device comprises a scanning electron microscope, an atomic force microscope and piezoelectric ceramics, the scanning electron microscope comprises a lens cone, an objective lens and a sample chamber, the objective lens is arranged in the sample chamber, and a sample table for bearing a wafer to be detected is arranged in the sample chamber; the objective lens is used for acquiring a two-dimensional morphology image of the surface of the wafer to be detected; the atomic force microscope is arranged in the sample chamber, the atomic force microscope is not in contact with the sample table, the atomic force microscope comprises a cantilever and a probe installed at the end of the cantilever, the probe is used for obtaining the three-dimensional structure of a wafer to be detected, and the piezoelectric ceramic is arranged at the end, away from the probe, of the cantilever; and the piezoelectric ceramic pressure realizes fine adjustment of the probe in horizontal and height directions through directional deformation. Vibration of the sample table and transmission of heat to the atomic force microscope are effectively isolated, and measurement errors caused by mismatch of vibration noise and thermal expansion are reduced. Precise control of the position of the probe is realized through piezoelectric ceramics.
Owner:JINGDIAN OPTOELECTRONICS (BEIJING) TECHNOLOGY CO LTD

A feature region recognition method and system based on atomic force microscope topography

The application provides a feature region identification method and system based on an atomic force microscope (AFM) topography, and the method comprises the following steps: acquiring an AFM topography data matrix of a nano preparation region; dividing the AFM topography data matrix into a plurality of sub-regions corresponding to preparation structures according to the number of the preparation structures; performing a region positioning step on each sub-region to determine the start and end ranges of a feature region representing a nano structure in a vertical direction in each sub-region; performing a center line fitting step in the start and end ranges of the feature region, fitting feature points in multiple rows of data to obtain a feature center line representing an extension direction of the nano structure; and performing a row-by-row identification operation on multiple rows of topography data in the feature region along the feature center line to identify feature region boundary points in each row of data. The technical scheme provided by the application realizes batch, automatic and high-precision identification of a plurality of nano structure feature regions in a complex AFM topography.
Owner:CHINA COAL SCIENCE & TECHNOLOGY (TIANJIN) ROCK FORMATION INTELLIGENT CONTROL TECHNOLOGY CO LTD +2

Atomic force microscope sample real-time heating table

The utility model relates to an atomic force microscope sample real-time heating table which comprises a supporting table and a heating assembly, a sample table is arranged at the upper end of the supporting table, the heating assembly used for stably heating a sample in real time is arranged at the upper end of the sample table, and the heating assembly comprises a PTFE wafer, a conductive silver adhesive, a sample block, a connecting wire and a rubber coating sheet. A conductive silver adhesive is arranged on the surface of the PTFE wafer, a sample block is arranged in the middle of the upper end of the conductive silver adhesive, and a connecting wire is connected to the rear side of the surface of the conductive silver adhesive. According to the real-time sample heating table for the atomic force microscope, the PTFE wafer is adhered to the sample table for rapid fixation, the conductive silver adhesive is coated on the PTFE wafer, the conductive silver adhesive is matched with the connecting wire to be connected with the grounding wire for grounding so as to avoid charge influence, meanwhile, the conductive silver adhesive also plays a role in fixing the sample block, so that the sample block is prevented from deviating during testing, and the test accuracy is improved. The film-coated sheet plays a role in limiting the signal line, and the situation that the signal line is hard and influences subsequent image scanning is avoided.
Owner:SUZHOU UNIV

Atomic force microscope probe and magnetic measurement calibration method

This application relates to an atomic force microscope probe and a magnetic measurement calibration method. The atomic force microscope probe includes a probe arm, one end of which is provided with a magnetic tunnel junction and a needle tip. The magnetic tunnel junction includes a first magnetic tunnel junction disposed between the probe arm and the needle tip, and a second magnetic tunnel junction disposed adjacent to the first magnetic tunnel junction. This method can reduce detection time and improve detection efficiency.
Owner:HANGZHOU INTERNATIONAL INNOVATION INSTITUTE OF BEIHANG UNIVERSITY

Piezoelectric ceramic driving method for high-speed feedback of AFM system

The invention discloses an AFM (atomic force microscope) and a piezoelectric ceramic driving method applied to high-speed feedback of an AFM (atomic force microscope) system, interaction force borne by a probe is enabled to be the same as preset interaction force by controlling the motion depth of piezoelectric ceramic, and the motion depth change of hardness detection piezoelectric ceramic is controlled to accord with a sine curve. Therefore, the movement depth change of the probe is a superposition waveform curve of the movement depth change of the two piezoelectric ceramics. Therefore, surface fluctuation detection and hardness detection of the to-be-detected surface are realized. According to the invention, the motion depth changes of the two piezoelectric ceramics are controlled to be non-interfering motion depth changes, so that the motion depth change (i.e., sinusoidal vibration) for detecting the viscosity of the surface to be detected and the motion depth change for feedback tracking of the appearance of the surface to be detected are two non-interfering motion depth changes. And the stroke of feedback tracking of the to-be-measured surface topography is ensured. Therefore, under the condition that the scanning speed of the atomic force microscope is high, a sample with large surface fluctuation can be measured.
Owner:SHENYANG INST OF AUTOMATION - CHINESE ACAD OF SCI

Cutting force measuring method for atomic precision machining

The invention discloses a cutting force measuring method for atomic precision machining, which belongs to the field of atomic precision machining and comprises the following steps of: 1, determining the elastic rigidity of an atomic force microscope probe; step 2, preprocessing an atomic force microscope probe; step 3, preparing a cut sample; fourthly, the atomic-scale sharp diamond cutter is prepared; step 5, installing the sheet sample on an X-Nano multi-degree-of-freedom in-situ transmission electron microscope sample rod; 6, measuring the cutting force by using an X-Nano multi-degree-of-freedom nano control technology; and 7, calculating the displacement of the diamond cutter and the sheet sample in the x direction under different frames, and drawing a relation curve of the cutting stroke and the cutting force. According to the invention, the cutting force measurement of atomic precision processing is realized under the TEM based on the AFM probe, the cutting force measurement range can be flexibly adjusted according to the amplification factor of the TEM and the elastic rigidity of the AFM probe, and the method is suitable for the cutting force measurement of various materials.
Owner:ZHEJIANG UNIV

High frequency passivated AFM cantilever and method of fabrication

A probe assembly for a surface analysis instrument such as an atomic force microscope (AFM), and a corresponding method of fabrication, the probe assembly including a substrate defining a probe body of the probe assembly, and a cantilever of the probe assembly extending from the probe body and having a proximal end and a free distal end. A reflective metal layer is disposed on the cantilever to reflect electromagnetic energy / light from a source (e.g., laser) of a deflection detection apparatus, and is a chemically non-inert metal. A passivating layer is disposed on the reflective layer to preserve the reflective layer when operating the surface analysis instrument to measure a sample in a reactive fluid. The passivating layer is deposited using pinhole free atomic layer deposition (ALD), and is at least one of silicon oxide (SiO2) and silicon nitride (Si3N4).
Owner:BRUKER NANO INC

Fluororesin sheet-like material and laminate containing same

The present invention provides a fluororesin sheet-like material that has excellent adhesiveness to a metal layer even when bonded at a temperature equal to or lower than the melting point of a fluororesin. The fluororesin sheet-like material satisfies, on at least one surface thereof, at least one of the following (1) and (2): (1) The maximum peak height (Rp) when the surface state is measured by an atomic force microscope is 30-150 nm. (2) The maximum peak depth (Rv) when the surface state is measured by an atomic force microscope is -30 to 120 nm.
Owner:DAIKIN INDUSTRIES LTD

Microcantilever, probe and atomic force microscope

The present application provides a kind of micro-cantilever, probe and atomic force microscope, the micro-cantilever is applied to atomic force microscope, the micro-cantilever includes first area, second area and third area, the first area and the third area are respectively arranged in two ends of the micro-cantilever, the second area is between the first area and the third area, the first area is used to fix one end of the micro-cantilever, the third area is provided with needle tip for detecting sample to be measured, and the second area includes at least one micro channel.The embodiment of the present application includes at least one micro channel in the second area of micro-cantilever, to divide the micro-cantilever into smaller cantilever, each cantilever has a respective resonance frequency, the superposition of at least two smaller cantilevers can reduce the Q value of the whole micro-cantilever, so that the micro-cantilever has wider frequency amplitude peak, responds to the signal of wider frequency, and then the requirement of detecting different frequency vibration signal can be met.
Owner:THE NAT CENT FOR NANOSCI & TECH NCNST OF CHINA

Solid substrates for promoting cell and tissue growth

This invention provides solid substrates for promoting cell or tissue growth or restored function, which solid substrate is characterized by a specific fluid uptake capacity value of at least 75%, which specific fluid uptake capacity value is determined by establishing a spontaneous fluid uptake value divided by a total fluid uptake value. This invention also provides solid substrates for promoting cell or tissue growth or restored function, which solid substrate is characterized by having a contact angle value of less than 60 degrees, when in contact with a fluid. This invention also provides solid substrates for promoting cell or tissue growth or restored function, which said substrate is characterized by a substantial surface roughness (Ra) as measured by scanning electron microscopy or atomic force microscopy. The invention also provides for processes for selection of an optimized coral-based solid substrate for promoting cell or tissue growth or restored function and applications of the same.
Owner:CARTIHEAL 2009

conductive roller

The present invention provides a conductive roller that can reduce frictional force without drastically increasing the hardness of the surface layer. [Solution] The present invention provides a conductive roller 1 comprising a shaft 2, an elastic layer 3 provided on the outer circumference of the shaft 2, and a surface layer 4 provided on the outer circumference of the elastic layer 3, wherein the surface layer 4 has an area ratio of 40% or more of the histogram portion where the adhesion force to the entire histogram measured using an atomic force microscope is 6 nN or less, and an area ratio of 30% or more of the histogram portion where the adhesion force to the entire histogram is 8 nN or more.
Owner:SHIN ETSU POLYMER CO LTD