4650 results about "Megasonic cleaning" patented technology

A split ultrasonic cleaning machine, which includes: a base, provided with a mounting groove and a main control module; a cylinder body, detachably mounted in the mounting groove, wherein the cylinder body is provided with a cleaning groove, and a bottom of the cylinder body is provided with an ultrasonic cleaning module electrically connected to the main control module; and a cover body, covering a notch of the mounting groove. According to the technical solution, the cylinder body is detachably arranged in the mounting groove, and the modular design of the integral assembly of the device is achieved, so that when the split ultrasonic cleaning machine needs cleaning or maintenance, the cylinder body can be quickly disassembled from the mounting groove, the cleaning liquid is prevented from entering the base to damage the main control module.

The invention relates to the field of microelectronic manufacturing, and discloses a high-performance monocrystalline silicon nano wafer manufacturing process which comprises the following steps: preparing a monocrystalline silicon wafer, and obtaining a high-quality monocrystalline silicon wafer through fine cutting, chemical mechanical polishing and surface residual stress elimination treatment; multi-stage cleaning and surface treatment are carried out, and surface pollutants are removed through combination of molecular chromatography, electric field assisted ultrasonic cleaning and low-temperature plasma cleaning; and manufacturing a nano structure, and forming a complex nano structure by adopting multi-stage electron beam lithography, segmented reactive ion etching and self-adaptive deep etching regulation and control. The surface quality, the mechanical strength and the electrical property of the wafer are remarkably improved through the technologies of refined monocrystalline silicon wafer preparation, multi-stage cleaning, advanced nanostructure manufacturing, self-adaptive heat treatment and the like; and through surface functionalization and multi-layer high-precision packaging, the environmental tolerance and long-term reliability of the nanostructure are enhanced.

The high-cleanliness cleaning device comprises a cleaning basin, a plurality of ultrasonic transducers are annularly arranged on the side wall of the cleaning basin, the bottom face of the cleaning basin is connected with the bottom face of a vibration excitation plate through a spring seat, the vibration excitation plate is provided with a vibration exciter, and the center of the vibration excitation plate is rotationally connected with a leakage disc. The bottom surface of the drain plate is connected with the output end of a rotating motor through a universal joint A, the rotating motor is mounted below the cleaning basin, and a spraying mechanism is arranged above the cleaning basin; the technology comprises the five steps of pre-spraying cleaning, ultrasonic cleaning, neutral liquid cleaning, purified water cleaning and workpiece multi-stage drying. The cleaning equipment has the full-automatic rotary spraying function, ultrasonic excitation cleaning can be conducted on workpieces on the drain disc, the problems that the number of particles of the aluminum die-casting workpieces is out of tolerance, and the aluminum die-casting workpieces become yellow after being cleaned can be solved by combining two specially-made cleaning agents, the corrosion speed of elements such as silicon, copper and iron is increased while aluminum corrosion is slowed down, and the cleaning efficiency is improved.

The invention belongs to the technical field of semiconductor chemical plating equipment, and particularly relates to a semiconductor automatic nickel-palladium-gold chemical plating process and chemical plating cleaning device.The chemical plating cleaning equipment comprises a cleaning pool, an ultrasonic cleaning area, a high-pressure cleaning area and a rinsing area are sequentially arranged in the cleaning pool side by side, and the three areas are completely separated through vertical partition plates; the partition plate is fixedly connected with the inner wall of the cleaning pool. In the process of cleaning the semiconductor material, the filtering assembly can filter water, so that water resources are recycled, water is saved, meanwhile, the filtered water is pumped back into the ultrasonic cleaning area, and the cleaning efficiency is improved. The backflow cleaning water can bring oil stains and floatable impurities floating on the liquid level into the collecting tank, so that the oil stains and the floatable impurities are independently collected, and meanwhile, the oil stains and the floatable impurities can be prevented from being adhered to the surface of a semiconductor material which is subsequently cleaned in a subsequent cleaning link.

The invention relates to the technical field of lead frame cleaning, in particular to a continuous ultrasonic cleaning device for a lead frame. Comprising an ultrasonic cleaning box, an ultrasonic generating device is arranged on the ultrasonic cleaning box, a cleaning basket is arranged above the ultrasonic cleaning box, material carrying frames which are distributed at equal intervals are detachably connected to the interior of the cleaning basket, and rotating blocks which are distributed at equal intervals in a mirror image mode are rotationally connected to the material carrying frames; an electric sliding rail is arranged on the rotating block, sliding blocks distributed in a mirror image mode are arranged in the electric sliding rail of the rotating block, a material clamping plate is jointly and fixedly connected between the sliding blocks with the same height in the electric sliding rail of the rotating block distributed in the mirror image mode, and the material clamping plate is slidably connected with a blocking plate distributed in a mirror image mode. According to the lead frame cleaning device, the lead frame is switched between the fixed state and the free state through cooperation of the plugging plate and the clamping plate, so that all parts of the lead frame can be uniformly cleaned, and the cleaning effect of the lead frame cleaning device on the lead frame is improved.

The invention relates to the technical field of cleaning devices, and particularly discloses an inductance component ultrasonic cleaning device which comprises a rack and a cleaning basket and further comprises a plurality of layered partition plates and a driving mechanism which are arranged in the cleaning basket, and the layered partition plates are sequentially arranged in the height direction of the cleaning basket. Each layered partition plate comprises a plurality of partition rods arranged in the width direction of the cleaning basket, the driving mechanism comprises a first driving assembly and a second driving assembly, and the first driving assembly is used for driving the partition rods to move in the length direction of the cleaning basket, so that the layered partition plates have a contracted state and a stretched state; the second driving assembly is used for driving the multiple layered partition plates to move up and down, so that the distance between every two adjacent layered partition plates is changed; workpieces stacked in the cleaning basket can be layered by switching the states of the layering partition plates and changing the distance between the layering partition plates, the contact area between the workpieces and cleaning liquid is increased, and the cleaning effect is improved.

The invention discloses semiconductor substrate cleaning equipment and a cleaning method thereof. The semiconductor substrate cleaning equipment comprises a control cabinet body, an ultrasonic cleaning box is installed on the control cabinet body, three fixing rods are connected to the ultrasonic cleaning box, the other ends of the fixing rods are fixedly connected with connecting cylinders, and air pipes are connected to the connecting cylinders in a penetrating mode. According to the ultrasonic cleaning device, the ultrasonic cleaning box, the bearing frame, the air suction frame, the air outlet channel, the rotating beads and the guide groove are adopted, dust and particle impurities attached to the surface of a semiconductor substrate are blown and cleaned before the semiconductor substrate enters a cleaning agent in the ultrasonic cleaning box, and multi-angle blown air comprehensively covers the surface of the semiconductor substrate and gaps of the semiconductor substrate; dust and particle impurities are sucked by the air suction frame along with air, the influence of the dust and particle impurities on the cleaning agent is avoided, organic matter, the particle impurities and the dust are treated separately, and the service life of the cleaning agent and the cleaning effect of gaps in the semiconductor substrate are guaranteed.

The invention relates to an ultrasonic cleaner control method and device and a storage medium, and is applied to the technical field of ultrasonic cleaners, and the method comprises the steps: collecting the working state parameters of a transducer in real time, achieving the precise calculation of the output power and the phase angle based on the working state parameters, and achieving the precise monitoring of the output response of the transducer, meanwhile, the output power and the phase angle are compared with preset conditions, so that whether the current working frequency is the optimal resonant frequency in the current environment or not is determined, if not, the current working frequency is updated until the system operates according to the optimal resonant frequency in the current environment, and the system operates according to the optimal resonant frequency in the current environment. Therefore, it is ensured that the ultrasonic cleaning equipment always operates at the optimal frequency, and the cleaning efficiency and effect are remarkably improved. And meanwhile, dynamic adjustment of the duty ratio is realized by dynamically adjusting the dead zone time, so that time-sharing staggered output of two paths of signals is realized, the working time of the power supply system is shortened, and the pressure of the power supply system is reduced.

The invention discloses a feeding method and device capable of automatically adding pig raising feed, and aims to optimize feed management in the pig raising process through an automatic and intelligent technology. Comprising the following steps: monitoring environmental parameters such as temperature, humidity and air quality in a pig house in real time through an environment monitoring device, and transmitting data to a central control system; the central control system dynamically generates and adjusts a feed formula according to environmental parameters and growth stages and health conditions of pigs, and accurately mixes feed components through an automatic proportioning device. The feed trough sensor monitors the residual amount of feed in the feed trough, and when the feed is insufficient, the system automatically controls the feed conveying device to supplement the feed. In the feeding process, the central control system adjusts the feed adding frequency and the feeding amount according to real-time data, and the cleaning device is combined with the ultrasonic cleaning and nano-coating technology, so that the cleanliness and long-term stable operation of the equipment are ensured.

The invention relates to the technical field of biochemical engineering and food processing, in particular to a fish collagen extraction process which comprises the following steps: S100, raw material pretreatment; s200, carrying out crushing and enzymolysis pretreatment; s300, carrying out an enzymatic hydrolysis reaction; s400, carrying out solid-liquid separation; s500, carrying out concentration treatment; and S600, drying treatment is carried out. The advanced spectrum analyzer is used for accurately determining the freshness of the fish body, the automatic cutting and ultrasonic cleaning technologies are combined, the quality of raw materials is effectively guaranteed, the enzymolysis reaction conditions are strictly controlled through the high-precision metering pump and the heat exchange system, the enzymolysis efficiency and the product quality are improved, and the production cost is reduced. By adopting a multi-layer composite membrane structure and a specific concentration technology, the efficiency and purity of solid-liquid separation and concentration treatment are remarkably improved, the production process is optimized, the energy consumption and the cost are reduced, pollutants in the production process are effectively removed through application of a plasma cleaning and air purification system, and the product quality is improved. And reliable guarantee is provided for production of high-quality fish collagen products.

The invention relates to the technical field of intelligent control, in particular to a control method and system of ultrasonic cleaning equipment and the cleaning equipment. The method comprises the steps that feature information of a cleaned object, the output power of the cleaning equipment and the concentration of a cleaning medium are obtained; constructing a material feature vector according to the feature information of the cleaned article; material feature parameters are calculated according to the material feature vectors; pollution factors are calculated according to the material feature vectors and the material feature parameters; calculating a pollution degree value according to the pollution factor; judging the pollution type according to the pollution degree value; power parameters are calculated according to the output power, the cleaning medium concentration and the pollution degree value; pollution control parameters are calculated according to the material characteristic parameters and the pollution factors; optimal cleaning control parameters are calculated according to the pollution control parameters, the power parameters and the pollution factors; and matching the optimal cleaning mode according to the pollution type and the optimal cleaning control parameters. According to the method, the optimal cleaning parameters can be selected to clean the cleaned articles.

The utility model discloses a hanging bracket structure of an ultrasonic cleaning machine, and particularly relates to the technical field of ultrasonic cleaning, which comprises a hoisting cover plate, a material port sound insulation processing structure and a hoisting driving structure, the lifting cover plate is rotationally connected to the ultrasonic cleaning machine through a rotating shaft, a material groove is formed in the lifting cover plate, a carrying frame is fixedly connected to the bottom of the lifting cover plate, a plurality of screen holes are formed in the carrying frame, and the carrying frame corresponds to the position under the material groove. The material opening sound insulation processing structure is arranged on the lifting cover plate, corresponds to the position over the material groove and is used for sound insulation opening and closing of an opening of the material groove. According to the utility model, the problem that a product lifted by a lifting frame structure of an existing ultrasonic cleaning machine is inconvenient to dump, so that the discharging is inconvenient is solved; besides, when the product is cleaned, the cleaning tank of the ultrasonic cleaning machine is in a normally open state, so that the technical problem that noise exists when the product is cleaned and processed is solved.

The invention relates to a cleaning method for removing pollutants deposited on the surface of a fluoride coating heater. The cleaning method comprises the specific steps that appearance inspection is conducted on a part, and a universal meter is used for detecting a resistor; the binding post part is protected; a white corundum sand material is used for sand blasting and film removal; blowing through an air gun; carrying out deprotection and washing; the heater is right placed in an ultrasonic cleaning tank, deionized water is used for ultrasonic cleaning, and the part is rotated by 90 degrees once every 3 min; wiping with isopropyl alcohol; the part is put into an ultrasonic cleaning tank to be cleaned, the part is rotated by 90 degrees once every 3 min, and whether marks are generated or not is observed; purging with nitrogen; performing drying; performing inspection; and vacuum packaging. The white corundum sand material is used for conducting sand blasting and film removing treatment on the surface of the component, a small amount of residual pollutants on the surface of the component can be rapidly removed, and it is guaranteed that the surface of the component keeps uniform; and the part is rotated once every 3 minutes during ultrasonic cleaning, so that the surface can be controlled not to generate marks due to ultrasonic oscillation.

The manufacturing method comprises the following steps that S1, raw materials, an organic auxiliary agent and pure water are subjected to slurry preparation in a ball milling tank according to the proportion, a boat support splitting part blank is obtained through a slip casting technology, and a boat support splitting part blank is obtained; performing natural drying and hot air drying on the green body to discharge moisture, and then fettling and carving the green body into a boat support splitting part semi-finished product meeting the size requirement; s2, putting the semi-finished product in S1 into an induction furnace, purifying and sintering at high temperature of 2000-2300 DEG C under the protection of inert gas, and obtaining a silicon carbide boat support splitting part biscuit which has the open pore porosity of 8-10% and the strength of more than 70 Mpa and contains a small amount of free carbon after high-temperature purifying and sintering; and S3, splicing the silicon carbide boat support splitting part biscuits, feeding the spliced whole boat support into a vacuum furnace, carrying out high-temperature siliconizing sintering treatment at 1650-1700 DEG C, and carrying out grinding, sand blasting, fine cleaning, impurity removal, ultrasonic cleaning and drying process treatment after discharging to obtain the low-iron-content boat support.

The invention discloses a fuel cell rapid activation method, and relates to the technical field of fuel cells, and the activation method comprises the steps of early-stage preparation, electrode pretreatment, activation reagent injection, activation treatment, post-treatment and evaluation and optimization. The method has the advantages that the electrochemical impedance spectrometer is used for state inspection of the electrode and other components in the electrode pretreatment stage, the reliability of the fuel cell to be detected is ensured, the surface of the electrode is deeply cleaned through the cleaning agent and the ultrasonic cleaning machine, dust, oil stains and impurities on the surface of the electrode can be effectively removed, and the detection accuracy is improved. Meanwhile, the microstructure and chemical composition of the surface of the electrode are improved by utilizing a plasma technology, and the catalytic activity and corrosion resistance of the electrode are improved, so that the activation efficiency and the operation stability of the fuel cell are improved, and potential abnormities can be found and treated in time by evaluating the performance in real time; and the fuel cell is ensured to operate in an optimal state.

The utility model discloses a double-groove ultrasonic cleaning device for optical lenses, which belongs to the technical field of optical lens processing, and comprises two cleaning grooves arranged side by side, an ultrasonic vibration plate and an ultrasonic generator, a displacement component is arranged above the cleaning grooves, and a connecting rod is connected onto the displacement component. The connecting rod is connected with a cleaning frame for placing a lens, and the displacement assembly is used for driving the cleaning frame to move up and down and left and right. The cleaning frame can be driven to conduct ultrasonic cleaning operation in the two cleaning tanks, the displacement assembly drives the cleaning frame to meet the requirement for slow pulling dehydration, the labor intensity of workers is reduced, and the lens cleaning efficiency is improved; double-groove ultrasonic cleaning can be conveniently carried out on the optical lens, and the machining requirements of different lenses are met; and the inclined middle plate is arranged between the two cleaning tanks, so that the mixing of solutions in the two cleaning tanks caused by the movement of the cleaning frame is reduced, and the cleaning effect in each tank is ensured.

Cleaning equipment of a roller cleaner comprises a cleaning box, the cleaning box is provided with a cleaning tank and a precipitation tank which are arranged side by side and separated from each other, and an ultrasonic device is arranged at the bottom of the cleaning tank; end spaces are arranged at the two ends of the cleaning tank and the two ends of the precipitation tank, and bearing seat supports are arranged in the end spaces. A driving system is further arranged in the end space located at one end of the cleaning tank and used for driving the roller cleaner to rotate in the ultrasonic cleaning process. The two bearing seats are used for rotatably supporting the roller cleaning device, and the roller cleaning device is placed on the bearing seat supports at the two ends of the cleaning tank or the two ends of the precipitation tank through the bearing seats at the two ends. The cleaning time of the roller cleaner is greatly shortened, cleaning dead angles are eliminated, and the cleaning effect is improved.

The invention provides an automatic indium removal device and method for a target material. The automatic indium removal device for the target material comprises a rack, a target material clamping module, an indium removal liquid supply module, an ultrasonic cleaning module, a mechanical scrubbing module, a flushing module, a drying module and a control module. The target material clamping module, the ultrasonic cleaning module, the mechanical scrubbing module, the flushing module and the drying module are all arranged on the rack; the indium removal liquid supply module is connected with the ultrasonic cleaning module; the target clamping module, the indium removal liquid supply module, the ultrasonic cleaning module, the mechanical scrubbing module, the flushing module and the drying module are all connected with the control module. According to the method, automatic and efficient removal of indium residues on the surface of the target material is achieved, cleaning dead corners are avoided, damage to the surface of the target material is avoided, and the method has wide market application prospects.

The invention relates to the technical field of oral instrument cleaning, and particularly discloses an oral instrument disinfection and cleaning device and a cleaning method.The oral instrument disinfection and cleaning device comprises a cleaning and disinfection box, and a disinfection isolation frame is arranged in the cleaning and disinfection box; the cleaning mechanism comprises an ultrasonic cleaning tank, a circulating pump, two water conveying pipes, a cleaning pipe, a lifting mechanism and two positioning strips, the circulating pump is installed in the middle of the bottom end of the ultrasonic cleaning tank, and the number of the water conveying pipes and the number of the positioning strips are both two; a synchronous belt is driven through a motor, two lifting screws are driven to enable two lifting frames to move upwards, then an ultrasonic cleaning tank is driven to ascend, oral instruments are soaked in cleaning liquid in the ultrasonic cleaning tank, high-frequency vibration of ultrasonic waves can penetrate through small gaps and grooves of the oral instruments, meanwhile, a circulating pump inputs the cleaning liquid into a cleaning pipe and sprays the cleaning liquid out, and the cleaning effect is achieved. The flowing effect of cleaning liquid is enhanced, more thorough cleaning is achieved, and the risk of cross infection is effectively reduced.

The invention discloses an efficient glass fiber plate cleaning and drying process which comprises the following steps: S1, pretreatment: performing appearance inspection on a to-be-cleaned glass fiber plate, and removing unqualified plates of which the surfaces are obviously damaged and cracked; s2, pre-cleaning: putting the glass fiber plate subjected to primary treatment into an ultrasonic cleaning tank, injecting clear water into the cleaning tank, enabling the liquid level of the clear water to completely submerge the glass fiber plate, starting an ultrasonic generator at the same time, and separating dust, loose chippings and other impurities on the surface of the glass fiber plate through the cavitation effect of ultrasonic waves to complete pre-cleaning; and S3, chemical cleaning, wherein after pre-cleaning is completed, the glass fiber plate is fed into a chemical cleaning tank containing alkaline pre-cleaning liquid. According to the technology, multiple cleaning procedures are combined with ultrasonic waves, chemical reagents and nano-particles, vacuum and hot air drying are matched, efficient cleaning and rapid drying of the glass fiber plate are achieved, few impurity residues exist, the water content is low, the surface flatness is good, parameter adaptability is high, energy is saved, environment friendliness is achieved, and the automation degree is high.

The invention provides a concentration analyzer automatic cleaning system for an explosion-proof area and a control method.The concentration analyzer automatic cleaning system comprises a brush cleaning unit, a high-pressure water cleaning unit, an ultrasonic cleaning unit, a cleaning pollution judging unit and a data interaction interface, and a brush assembly arranged in the brush cleaning unit is installed on one side of an optical window of a refractometer; a brush assembly is arranged in the window to ensure that the brush covers the surface of the window, a driving unit of the brush assembly performs data interaction with the data interaction interface, a plurality of parameters are built in the driving unit, the driving unit controls the movement speed and driving pressure of the brush in the brush assembly, and adjustment is performed by receiving a control instruction of the data interaction interface; a high-pressure pump, nozzles and a connecting pipeline are arranged in the high-pressure water cleaning unit, the nozzles are arranged around an optical window of the refractometer and connected with the high-pressure pump through the connecting pipeline, a control unit is arranged on the high-pressure pump, and water pump pressure parameters and time interval parameters are preset in the control unit.

The invention relates to a preparation method of an etching-resistant and wear-resistant Y2O3-AlxOy composite coating. The preparation method comprises the following steps: carrying out ultrasonic cleaning on a corrosion-resistant matrix; performing plasma bombardment cleaning activation on the surface of the corrosion-resistant matrix; a Y2O3 coating and an AlxOy coating are alternately deposited on a corrosion-resistant base body in a double-target magnetron sputtering mode to form the Y2O3-AlxOy composite coating, the sputtering power of a Y target is larger than that of an Al target, and the ratio of x to y in the AlxOy coating is larger than 1. According to the method, the amorphous AlxOy coating dominated by the metal state is introduced into the Y2O3 coating, growth of Y2O3 columnar crystals is continuously broken, crystal grains are refined, formation of intergranular easy-to-etch point locations is inhibited, and an yttrium aluminum oxide composite strengthening phase is formed at an interface, so that plasma etching resistance is improved; the thickness of a single-layer coating in the composite coating is very thin; under the action of growth stress, the structure of the coating presents a wave-shaped microstructure and a soft and hard alternate mechanical structure, and the soft and hard alternate mechanical structure is beneficial to inhibiting generation of transverse cracks, guiding friction crack level expansion, prolonging the friction life of the coating and reducing the wear rate.

The invention relates to the technical field of ultrasonic cleaning, in particular to ultrasonic rapid cleaning equipment for wire rods, which comprises an ultrasonic cleaning assembly, an ultrasonic cleaning device, an ultrasonic cleaning device, an ultrasonic cleaning device, an ultrasonic cleaning device, an ultrasonic cleaning device and a control device, and is characterized in that the ultrasonic cleaning device comprises a cleaning tank body, a wire rod arranged in the cleaning tank body and an ultrasonic cleaning device; the ultrasonic cleaner is used for generating a cavitation reaction on the cleaning liquid in the cleaning tank body so as to clean dirt on the wire rod; the filtering and cleaning assembly comprises a cleaning box arranged on the outer side of the cleaning tank body and a segmented filtering mechanism arranged in the cleaning box and used for conducting segmented filtering on the cleaning liquid. The wire rod cleaning device has the beneficial effects that the ultrasonic cleaning technology and the precision filtering technology are combined, dirt on the surface of a wire rod is physically impacted through cavitation reaction generated by ultrasonic waves, deep cleaning is achieved, meanwhile, an efficient filtering system is introduced, the cleanliness and recycling of cleaning liquid are guaranteed, and the cleaning efficiency and quality are improved.

The invention discloses a metallization coating method for a magnetic attraction jig, and relates to the technical field of atomic layer deposition of nano-coatings, and the metallization coating method comprises the following steps: cleaning the surface of a substrate by using an ultrasonic cleaning machine, transferring the cleaned substrate into low-temperature plasma equipment, and selecting argon to carry out plasma activation treatment; preparing a precursor solution, storing the precursor solution under the protection of inert gas, and mounting the substrate activated by the plasma into an ALD (Atomic Layer Deposition) clamp; aLD is started, reaction gas and circulation parameters of each circulation are set, the precursor solution is quantitatively conveyed to an ALD reaction chamber each time, and deposition operation is carried out; according to the method, the surface of the substrate is cleaned by using the ultrasonic cleaning machine, and argon is selected for plasma activation treatment, so that the strong binding force between the substrate and the plating layer is ensured, the stability and durability of the plating layer are improved, and the problem of insufficient adhesive force of the plating layer is solved.

The invention relates to the technical field of optical part cleaning equipment, and particularly discloses electronic equipment optical part cleaning and drying equipment which comprises an ultrasonic cleaning pool and a fixing frame, the fixing frame is fixedly connected to the upper portion of the ultrasonic cleaning pool, a drying mechanism is installed on the rear side of the fixing frame, and a cleaning frame is arranged in the fixing frame. By designing the swing mechanism, the connecting plate, the arc-shaped plate and the rolling wheel, the rolling wheel moves back and forth, so that the two ends of the arc-shaped plate swing back and forth, the whole mounting plate is driven to swing, materials moved out of cleaning liquid can be swung, the cleaning liquid on the outer sides of the materials is swung down, and the drying efficiency is improved. By designing the sliding frame, the sliding frame can be moved out from the mounting plate in a sliding manner, so that the optical parts can be conveniently disassembled and assembled from the sliding frame subsequently, and the clamping frame is automatically horizontal after the sliding frame is moved away from the lower part of the mounting plate, so that the multiple optical parts can be conveniently clamped through the clamping frame.

The invention relates to an ultrasonic cleaning device for cleaning the surface of an aluminum pipe, and relates to the field of aluminum pipe cleaning. The cleaning device comprises a cleaning tank, a lifting mechanism installed in the cleaning tank, a cleaning mechanism installed in the cleaning tank, a liquid level cleaning assembly installed in the cleaning tank, a filter installed in the cleaning tank and a collecting bin installed in the cleaning tank. During use, the lifting mechanism drives the aluminum pipe to be immersed in cleaning liquid, the ultrasonic assembly cleans the aluminum pipe, in the working process of the ultrasonic assembly, the circulating assembly drives the cleaning liquid in the cleaning groove to circulate, the vibration assembly drives the aluminum pipe to vibrate on the lifting mechanism, and stains falling off from the interior of the aluminum pipe can be brought out when the cleaning liquid circulates; and the vibration assembly can accelerate stain falling and promote the falling stains deposited at the bottom of the aluminum pipe to move towards the lower end of the aluminum pipe. According to the aluminum pipe cleaning device, stains which fall off from the inner wall of the aluminum pipe and then are attached to the aluminum pipe again can be reduced, and the cleaning effect on the aluminum pipe is improved.

The utility model relates to the technical field of ultrasonic cleaning, in particular to an automatic lifting structure for ultrasonic cleaning of materials. An automatic lifting structure for ultrasonic cleaning of materials comprises an ultrasonic cleaning machine body, and the ultrasonic cleaning machine body comprises a built-in cleaning tank; the cleaning basket is located in the cleaning tank, and the size of the cleaning basket is smaller than that of the cleaning tank; the connecting arm is in an inverted L shape, and the connecting arm is fixed on one side of the cleaning basket. The cleaning structure has the advantages that the cleaning basket moves in the cleaning tank, so that a cleaned object is driven away from a cleaning position, separated dirt is prevented from being attached to the object again, the surface of the object can be further scoured through cleaning liquid in the cleaning tank, the cleaning efficiency is improved, the cleaning time is shortened, and the cleaning effect is good. And secondly, the cleaning basket can be lifted through the lifting assembly, and objects in the cleaning basket can be conveniently and automatically placed in and taken out of the cleaning tank.

The invention discloses a fluorine oil cleaning method and device for precision electronics, and relates to the field related to intelligent cleaning.The method comprises the steps that target component characteristics are collected to determine target fluorine oil, and first cleaning control data of soaking and cleaning a target precision electronic component through the target fluorine oil are obtained, analyzing the first cleaning control data through a soak cleaning evaluation model, obtaining a first soak cleaning cleanliness index as an analogy screening constraint, screening historical fluorine oil cleaning records to obtain a target historical record, and introducing a cleaning fitness function as an optimization evaluation function, and taking the target historical record as an optimization space to obtain second cleaning control data to perform ultrasonic cleaning on the target precision electronic component. The technical problem that the cleaning effect is poor due to the fact that tiny stains or residues on the surfaces of precision electronic parts cannot be thoroughly removed through a traditional precision electronic cleaning mode is solved, and the technical effects that dirt on the surfaces of the precision electronic parts is effectively removed, and the performance of the parts is not affected by cleaning are achieved.

The invention provides a method for removing residual fluorescent liquid before part welding, and relates to the technical field of part machining. The method for removing the residual fluorescent liquid before welding of the part comprises the following steps that (1) the part subjected to preliminary flushing is heated and cooled; (2) the cooled part is put into an ultrasonic cleaning machine, a cleaning agent is added for vibration treatment, and then clean water is used for washing; (3) the washed part is dried, and no fluorescent reaction exists when the part is irradiated by a black light lamp; the cleaning agent is prepared from the following components in parts by weight: 10 to 20 parts of hyperbranched polymer grafted modified activated carbon, 10 to 15 parts of modified bentonite and 3 to 7 parts of sodium gluconate. Fluorescent liquid which is not easy to remove in part holes can be thoroughly removed at a time, and repeated cleaning work can be reduced.