35211results about "Cleaning using liquids" patented technology

The invention provides a multifunctional integrated cleaning robot for a photovoltaic module of a power station, which belongs to the technical field of photovoltaic module cleaning and comprises a control chip, a robot body device, an automatic cleaning device, a dust collection device, a water spraying system device, a solar charging device, an intelligent navigation device, an environment monitoring device, a communication interface device and a power management device. An intelligent cleaning control module is arranged in the control chip. The method comprises the following steps: constructing a three-dimensional map through environment perception; evaluating the pollution state of the photovoltaic module by using a sensor to generate a thermodynamic diagram; a double-layer optimization model is adopted for path planning and resource allocation, an upper layer adopts an improved ant colony algorithm to take charge of a global path, and a lower layer optimizes cleaning parameters based on a particle swarm algorithm; cleaning operation is executed, and real-time monitoring is carried out; evaluating the cleaning effect; water resource and energy intelligent management is carried out; multi-machine collaboration and task allocation are realized; processing an abnormal condition; the cleaning strategy is continuously optimized through machine learning, and efficient and accurate photovoltaic module cleaning is achieved.

The invention discloses a cleaning control method and system based on an electronic cleaning agent, and the method comprises the steps: obtaining the distribution characteristics of pollutants and a material sensitivity judgment result through obtaining the micron-sized particle distribution data, chemical residue concentration data and surface roughness parameters of the pollutants on the surface of an electronic workpiece; according to the pollutant distribution characteristics and the material sensitivity judgment result, matching a candidate formula from a preset cleaning agent formula database, calculating pollutant removal rate predicted values of different concentration and time combinations through a linear regression algorithm, and determining optimized cleaning agent formula parameters and cleaning strength control parameters; and in the cleaning process, the residual quantity of pollutants and the surface damage degree are collected in real time, if the residual quantity of the pollutants exceeds a preset threshold value T1 or the surface damage degree exceeds a preset threshold value T2, cleaning agent injection pressure and cleaning time parameters are dynamically adjusted, and updated cleaning execution parameters are generated. Accurate and efficient cleaning of the surface of the electronic workpiece is achieved.

The invention discloses a photovoltaic module cleaning method and device based on image processing and electronic equipment, and belongs to the technical field of photovoltaic power generation. The method comprises the following steps: acquiring operation information, a visible light image, a near-infrared image and thermal imaging data of a photovoltaic module; the operation information, the visible light image, the thermal imaging data and the near-infrared image are input into a hot spot detection model, a hot spot detection result, output by the hot spot detection model, of the photovoltaic module is obtained, the hot spot detection result comprises a hot spot area and a hot spot level, and the hot spot detection model is obtained based on a plurality of first training samples; the first training sample comprises sample operation information, a sample visible light image, sample thermal imaging data, a sample near-infrared image and a hot spot detection label of the sample photovoltaic module; acquiring environment information and dust information of dust attached to the photovoltaic module, wherein the dust information comprises a dust type and an attachment form; the environment information, the dust information and the hot spot detection result are input into a dust cleaning prediction model, cleaning parameters of each hot spot output by the dust cleaning prediction model are obtained, and the dust cleaning prediction model is obtained based on a plurality of second training samples; the second training sample comprises sample environment information, sample dust information, a hot spot detection label and a cleaning parameter label of the sample photovoltaic module; and cleaning the photovoltaic module based on the cleaning parameters. According to the method, different types of dust can be effectively cleaned, and the dust cleaning effect of the photovoltaic module is improved.

A split ultrasonic cleaning machine, which includes: a base, provided with a mounting groove and a main control module; a cylinder body, detachably mounted in the mounting groove, wherein the cylinder body is provided with a cleaning groove, and a bottom of the cylinder body is provided with an ultrasonic cleaning module electrically connected to the main control module; and a cover body, covering a notch of the mounting groove. According to the technical solution, the cylinder body is detachably arranged in the mounting groove, and the modular design of the integral assembly of the device is achieved, so that when the split ultrasonic cleaning machine needs cleaning or maintenance, the cylinder body can be quickly disassembled from the mounting groove, the cleaning liquid is prevented from entering the base to damage the main control module.

The invention relates to the technical field of bridge construction, in particular to an intelligent cleaning device and method for a box girder side formwork. The device comprises a mobile platform, a control device, a mechanical arm assembly, a cleaning device, an infrared induction sensor, a dust collection device, a multispectral visual recognition module, a 3D environment modeling module, a path planning module, a cleaning quality detection module and a self-adaptive learning database. The multispectral visual recognition module recognizes the stain type and the adhesion strength. The 3D environment modeling module is used for constructing a three-dimensional point cloud model of a working area in real time; the path planning module generates an optimal cleaning path based on a reinforcement learning algorithm; the cleaning quality detection module detects residual stains and triggers secondary cleaning; the adaptive learning database stores historical cleaning data and optimizes a cleaning strategy through a machine learning model. The full-process automatic cleaning operation of the box girder side form can be achieved, and the comprehensive functions of dirt recognition, autonomous path planning, efficient cleaning, real-time detection and the like are achieved.

The invention relates to the field of lucid ganoderma processing equipment, and discloses lucid ganoderma slicing equipment which comprises a conveying belt, a portal frame is fixedly mounted on one side of the top of the conveying belt through a support, a movable frame is movably mounted on the lower side in the portal frame, and a variable-pitch shaft is movably mounted on the upper side in the movable frame; two guide rods are fixedly installed on the lower side of the interior of the movable frame, a plurality of movable blocks are evenly and movably installed on the outer diameters of the guide rods, blades are fixedly installed at the bottom ends of the movable blocks, and a sleeve is movably installed in the middle of the interior of the portal frame through two supporting rods; a rotating column is movably mounted at the inner top of the portal frame, the bottom end of the rotating column extends into the sleeve, and a bidirectional spiral groove is formed in the outer diameter of the rotating column. The ganoderma lucidum cutting device can efficiently clean ganoderma lucidum and automatically complete cutting, the blade can vibrate to prevent tearing and breaking during cutting, the slicing thickness is uniform and adjustable, the automation degree is high, and the finished product quality and the production efficiency are effectively improved.

The invention belongs to the technical field of cleaning and dirt prevention and removal, and discloses a control system and a control method of an ultrasonic cleaning device, stable energy coupling and dead-corner-free cleaning are realized through double-closed-loop driving and dynamic modulation in an ultrasonic cleaning link, and the uniformity of tank liquid cavitation intensity is remarkably improved. Meanwhile, control strategies are customized in the aspects of a rinsing link, a water cutting and drying link, liquid level control, manipulator control and the like, so that the defects of high energy consumption, incomplete drying, low rinsing efficiency, manipulator conflict and the like in the prior art are overcome while the surface and the interior of the workpiece are thoroughly cleaned; and the cleaning effects of high cleanliness, complete drying and no physical or chemical damage are ensured.

The invention relates to the technical field of aluminum plate processing, and discloses an aluminum plate processing cleaning intelligent monitoring system, which comprises a three-dimensional deformation sensing module, a surface residue detection module, a thermal stress distribution analysis module, a vibration spectrum identification module, a processing track optimization module, an environmental parameter fusion module, an intelligent cleaning regulation module and the like. The three-dimensional deformation sensing module realizes aluminum plate surface three-dimensional reconstruction and deformation characteristic spectrum generation through an industrial camera and an algorithm; the surface residue detection module identifies residue distribution and classification by using a laser speckle interferometer and the like; the thermal stress distribution analysis module inverts thermal stress by means of an infrared focal plane array; the vibration spectrum identification module analyzes the equipment vibration signal; the processing track optimization module generates an optimized track based on an ant colony algorithm and the like; the environmental parameter fusion module generates a fusion decision index through data dimension reduction and correlation analysis; and the intelligent cleaning regulation and control module combines feedback and learning to optimize cleaning parameters. The system achieves multi-dimensional monitoring and intelligent cleaning regulation and control, and the machining precision and efficiency are improved.

Apparatus for cleaning a horizontally extending floor surface. In some embodiments, a flat surface cleaning machine has an inverted cup-shaped deck and a swivel coupled to a source of pressurized liquid such as water. A rotatable spray bar assembly extends from the swivel and includes an elongated hub member, an arm member threadingly coupled to the hub member, and a nozzle threadingly coupled to the arm member. Shoulder limit surfaces set the rotational position of the arm member relative to the hub member to position the nozzle at a desired operational angle such as from 5-30 degrees. Interior channels along the hub and arm members are shaped to efficiently convey the pressurized fluid to the nozzle. Multiple hub and arm members may form a T, X, Y or star-shaped pattern. The spray bar has an aerodynamically shaped outer surface profile to reduce weight, vibration and turbulence during operation.

The invention relates to a semiconductor cleaning anti-splash shield and semiconductor cleaning equipment, and the semiconductor cleaning anti-splash shield is used for preventing liquid drops thrown out by a rotating wafer (101) in the tangential direction from being splashed and comprises a shield body (1) which comprises a side wall (11), and the side wall (11) is annular and coaxially surrounds the wafer (101); the anti-splash assembly (2) is arranged in the cover body (1), the anti-splash assembly (2) comprises a first annular plate (21), a second annular plate (22) and an anti-splash component (20), the first annular plate (21) and the second annular plate (22) are both connected to the side wall (11) and are arranged at intervals from top to bottom in the height direction, and the anti-splash component (20) is connected between the first annular plate (21) and the second annular plate (22); the anti-splash component (20) and the side wall (11) are arranged at intervals in the radial direction of the cover body (1) to form an annular containing cavity (4), and the anti-splash component (20) is provided with a channel for liquid drops to enter the containing cavity (4).

The invention relates to the technical field of solar panel maintenance, in particular to a photovoltaic power station solar cell panel intelligent flushing system, which comprises an image analysis module, an intelligent control module, an image processing module, a data processing module, a data processing module, a data processing module, a data processing module and a data processing module, and is characterized in that the image analysis module is used for monitoring smudginess data of the surface of a solar cell panel and transmitting the smudginess data to the intelligent control module in real time; the multispectral camera collects surface images of a current cell panel and a next cell panel, the surface images comprise cell panel surface images collected under different spectral bands or angles, and smudginess distribution and smudginess degree of the next cell panel are obtained; a cleaning strategy is generated according to the cleaning requirement through a preset intelligent algorithm, a control instruction is output and sent to the intelligent control module through the communication unit, and the intelligent control module adjusts the working state of the flushing device. According to the system, the precise recognition capability of the system on the dirty area is improved, it is ensured that water flow can effectively cover the part needing to be cleaned in the cleaning process, and waste of the non-dirty area is avoided.

The invention relates to the technical field of photovoltaic cleaning control, and discloses a spraying cleaning control method of a photovoltaic cleaning unmanned aerial vehicle. The method comprises the following steps: receiving photovoltaic panel surface state data and environmental parameters, comparing dirt grade standards to obtain dirt distribution characteristics and stubborn stain positions, and determining initial spraying parameters through a self-adaptive control algorithm in combination with the environmental parameters; after the spraying executing mechanism is driven to conduct preliminary cleaning, an image collecting device is used for obtaining surface image data, and a deviation value is calculated by comparing a cleanliness threshold value; and in combination with flight attitude data of the unmanned aerial vehicle, a fuzzy decision system is adopted to dynamically adjust initial spraying parameters to generate a real-time control instruction, an execution mechanism is controlled to perform fine cleaning until surface image data accords with a cleanliness threshold, and a final scheme is generated. According to the method, through real-time feedback and dynamic adjustment, spraying parameters are made to adapt to different dirt states and environment conditions, targeted cleaning is achieved, and the intelligence and accuracy of photovoltaic panel cleaning are improved.

Chemical recycling facilities for processing mixed plastic waste are provided herein. Such facilities have the capability of processing mixed plastic waste streams and utilize a variety of recycling facilities, such as, for example, solvolysis facility, a pyrolysis facility, a cracker facility, a partial oxidation gasification facility, an energy generation / energy production facility, and a solidification facility. Streams from one or more of these individual facilities may be used as feed to one or more of the other facilities, thereby maximizing recovery of valuable chemical components and minimizing unusable waste streams.

The invention discloses a graphite negative electrode powder laser particle size detection device, relates to the field of particle size detection, and solves the problem that an existing particle size detection device is difficult to continuously detect multiple batches of graphite samples, the graphite negative electrode powder laser particle size detection device comprises a device shell and a control top plate arranged above the device shell, and a driving rod and a laser detection head are mounted at the bottom of the control top plate; stirring fan blades are installed at the bottom of the driving rod, a rotating disc is rotationally installed at the top of the device shell, and two symmetrically-distributed detection cylinders and two symmetrically-distributed cleaning cylinders are arranged at the top of the rotating disc; the lifting mechanism is used for lifting the driving rod upwards, and the lifting mechanism is mounted on the inner side of the device shell; through the lifting mechanism, in the rotating process of the rotating disc, the stirring fan blades and the driving rod are lifted upwards and reset downwards, so that the stirring fan blades and the driving rod enter the detection barrel and the cleaning barrel conveniently, particle size detection of a graphite sample and cleaning of the stirring fan blades are realized, and the effect of continuous detection is achieved.

The invention discloses a wafer cleaning system and method, the wafer cleaning system comprises a front end module, a cleaning unit and a wafer cache module, the front end module is arranged on one side of the cleaning unit, and the wafer cache module is arranged on the other side of the cleaning unit; the cleaning unit comprises a wafer scrubbing module and a single wafer cleaning module; the wafer cache module comprises a standing type cache sub-module and a soaking type cache sub-module; the wafer cleaning system further comprises a wafer transmission module which is arranged among the functional modules so as to transmit the wafer from the front-end module to the standing type cache submodule through the cleaning unit, then the wafer is cleaned by the standing type cache submodule through the wafer scrubbing module and the single-chip cleaning module in sequence, and finally the wafer is transmitted back to the front-end module. Or, the wafer transmission module transmits the wafer from the soaking type cache submodule to the standing type cache submodule, the wafer surface is cleaned through the wafer scrubbing module and the single wafer cleaning module in sequence, and finally the wafer is transmitted back to the front-end module.

The invention provides a poultry house cleaning system and a cleaning control method, and the method comprises the steps: constructing global path data according to the three-dimensional information of a chicken house region; acquiring chicken coop image data in the advancing direction of the chicken coop cleaning process; inputting the chicken house image data into a smudginess identification model to obtain a target smudginess identification result; on the basis of a preset mapping relation between the smudge classification result and a smudge cleaning mode, according to the target smudge identification result, determining cleaning control data of a region corresponding to the chicken house image data; according to the target smudginess identification result, smudginess area information in the chicken house image data is acquired; performing path planning according to the global path data and the dirty area information so as to drive the walking module to a target cleaning position of the chicken house area; and after it is determined that the walking module is driven to the target cleaning position, corresponding cleaning operation is executed on the target cleaning position according to the cleaning control data. While the henhouse cleaning effect is ensured, the henhouse cleaning efficiency is also improved.

The invention provides a photovoltaic power station cleaning robot path planning method, medium and system, and belongs to the technical field of photovoltaic power station operation and maintaining.The photovoltaic power station cleaning robot path planning method includes the steps that firstly, a photovoltaic panel grid division model is established, and stain distribution information is obtained through the image processing technology to construct a stain distribution matrix; secondly, calculating a cleaning water demand matrix based on stain distribution, and meanwhile, considering an influence relationship among vertical column grid units; determining the cleaning duration by combining the efficiency of the cleaning device; constructing a robot energy consumption model; calculating an optimal cleaning path by applying a resource optimization distribution function; integrating the environmental parameters and inputting the environmental parameters into a photovoltaic cleaning neural network model to predict the actual cleaning difficulty; a cleaning strategy is dynamically adjusted accordingly; and executing the final path and recording data to update the related model. According to the method, through real-time sensing and analysis of the stain distribution characteristics, intelligence of path planning of the cleaning robot is realized, and the technical problem that the cleaning robot cannot perform intelligent path planning according to the surface stain distribution characteristics of the photovoltaic panel is solved.

The invention discloses pretreatment equipment for LCD (liquid crystal display) glass substrate processing, which comprises a roller conveyor, a cleaning device and a drying device, the cleaning mechanism comprises a spraying pipe arranged in the isolation hood, and air knives are arranged on the two sides of the spraying pipe in an inwards inclined mode respectively; the water collecting and draining tank is arranged on the lower side of the roller conveyor on the lower side of the isolation hood; the demisting mechanism comprises an adsorption cotton roller rotationally mounted on the inner side of the air knife, and the air knife is provided with a guide groove for extruding and scraping the adsorption cotton roller; the drying device comprises a drying chamber; the air inlet mechanism comprises an air blower, the air inlet end of the air blower is connected to the corresponding air distribution pipe, a connecting pipe is rotationally installed in the air distribution pipe, a cylindrical filter element is fixedly connected to the connecting pipe, and an impeller of the air blower and the connecting pipe are in transmission connection to the output shaft ends of the corresponding driving motors respectively. The LCD glass substrate cleaning and drying device can effectively ensure the cleaning effect and the drying effect on the LCD glass substrate.

The invention discloses an easy-to-install photovoltaic power generation device, and relates to the technical field of photovoltaic power generation, the easy-to-install photovoltaic power generation device comprises a support, the front part of the support is fixedly provided with a motor I, the output end of the motor I is fixedly provided with a rotating shaft, the circumferential surface of the rotating shaft is fixedly provided with a photovoltaic panel, and the top of the photovoltaic panel is provided with a cleaning device, the cleaning device comprises a second motor, a reciprocating screw rod, a moving block, a scraping rod, a bottom plate, a push rod, a sliding rail and a limiting block, impurities falling on the photovoltaic panel are cleaned through movement of the scraping rod, the photovoltaic panel keeps high light transmittance, more sunlight penetrates through the photovoltaic panel and is converted into electric energy, and therefore the power generation efficiency is improved, meanwhile, the hot spot effect caused by pollutant shielding is avoided, and the service life of the photovoltaic panel is prolonged. The service life of the photovoltaic panel is prolonged, and the maintenance workload and cost caused by corrosion and other problems are reduced.

A machine for cleaning lenses, like eyeglass lenses. The machine comprises a handling unit for carrying and transferring a lens along a processing path, and at least one processing unit having a processing chamber for processing the lens carried by the handling unit at a processing position along the processing path, wherein the processing unit comprises a cleaning unit having a cleaning chamber as the processing chamber for cleaning the lens. The processing unit is movable along a movement path between: (i) a retracted position in which the lens carried by the handling unit is able to be transferred by the handling unit along the complete processing path outside and relative to the at least one processing unit, and (ii) a receiving position in which the lens carried by the handling unit at the processing position is received in the processing chamber to allow the lens be processed.

The invention relates to a polishing process for improving local flatness of a silicon wafer, which belongs to the technical field of semiconductor manufacturing, and comprises the following operation steps of: 1, pretreating the silicon wafer, cleaning the silicon wafer, activating the surface of the silicon wafer, removing surface impurities and an oxide layer, and preparing for subsequent polishing; secondly, partition parameter setting is conducted, the wafer is scanned, the surface of the wafer is divided into a plurality of different areas, and independent polishing parameters are set for each area according to the material characteristics, the thickness and the preset flatness target of each area; and thirdly, dynamic polishing is conducted, specifically, multi-axis linkage polishing equipment is adopted, and the movement tracks and working parameters of the polishing head in different areas are dynamically adjusted in real time according to preset partition parameters. Through silicon wafer pretreatment, partition parameter setting and dynamic polishing process monitoring and feedback adjustment mechanisms, polishing process parameters can be accurately controlled, deviation in the polishing process can be corrected in time, and stability and consistency of polishing quality are ensured.

The invention discloses waste gas treatment equipment based on environment-friendly construction, and relates to the technical field of waste gas treatment, the waste gas treatment equipment comprises a spray tower, and further comprises a spray mechanism; the filling mechanism comprises a shell, two pore plates slidably connected to the interior of the shell and a plurality of fillers arranged at the tops of the pore plates, and a plurality of through grooves are formed in the top of the shell; the adjusting mechanism is used for driving the shell to rotate within a set angle; by continuously changing the contact angle of the filler and the gas-liquid and realizing the dynamic contact of the filler and the gas-liquid, the problem that the static filler easily forms a scaling area due to non-uniform liquid distribution is solved, the problem of liquid coverage difference caused by non-uniform spray head distribution or local blockage is solved, the space for placing the filler is increased, and the stability of the filler is improved. Then the filler is driven to turn over back and forth at the top of the pore plate, the filler rubs and collides with each other, the cleaning agent is sprayed to the filler, dirt on the filler is cleaned, and the problem that in the prior art, a filler layer needs to be removed from the interior of the spray tower to be cleaned is solved.

The embodiment of the utility model provides a cleaning base station for a cleaning robot, the cleaning robot comprises a roller, a scraping strip assembly and a dirt collecting box, the scraping strip assembly scrapes and cleans the roller, and the cleaning base station comprises a cleaning tank and a water inlet channel. When the cleaning robot is in butt joint with the cleaning base station, the roller abuts against the cleaning tank, and when the cleaning base station conducts self-cleaning on the cleaning robot through the cleaning tank, in the rotating direction of the cleaning roller, cleaning fluid makes contact with the cleaning roller through the water inlet channel so as to wet the cleaning roller, and the cleaning fluid on the cleaning roller is scraped into the dirt collecting box by the scraping strip assembly; therefore, the dirt collecting box is cleaned. In the self-cleaning process of the cleaning roller, the base station provides the cleaning fluid for the cleaning roller through the water inlet channel, so that the cleaning water consumption of the cleaning roller in the self-cleaning process is guaranteed, and the cleaning effect on the roller is guaranteed.

The invention discloses wafer slice etching equipment and a wafer slice etching method, and relates to the technical field of wafer etching. The device comprises an etching machine table and a machine base, the machine base is fixedly arranged on the lower surface of the etching machine table, an equipment cover is arranged on the upper surface of the etching machine table, and an electric sliding rail is fixedly arranged on the upper surface of the etching machine table; according to the wafer cleaning device, the device cover is driven to move to the position above the cleaning tank, the lifting cleaning mechanism drives the multiple wafers to make contact with cleaning liquid or be separated continuously, the swing cleaning mechanism drives the multiple wafers to swing in a reciprocating mode, swing cleaning is conducted on the multiple wafers, and therefore lifting and swing cleaning of the wafers is conveniently achieved; the cleaning effect and the cleaning efficiency of the wafer are effectively improved; in the wafer cleaning process, the cleaning liquid around the cleaning tank is lifted and stirred through the stirring and cleaning mechanism, so that the cleaning liquid moves, the condition of precipitation is avoided, stirring of the cleaning liquid in the wafer cleaning process is conveniently achieved, and the wafer cleaning effect is further improved.

The present application provides a method for generating a micro-scale columnar high-speed acoustic beam in a liquid environment, comprising: a liquid environment; a high-frequency resonator, which generates 0.5-30 GHz ultrasonic waves to act on the liquid environment during operation, generating a directional fluid motion along the direction of propagation of the sound wave in the liquid at the solid-liquid interface, i.e., a columnar focused acoustic beam; the high-frequency resonator is driven to operate in at least one driving cycle with a first power, each driving cycle including a first stage and a second stage, the first stage driving the high-frequency resonator to operate, and the second stage stopping the driving; the magnitude of the first power causes the high-frequency resonator to generate an acoustic beam in the first stage; and the duration of the first stage at the first power is less than the second threshold or the duty cycle of the first stage in one driving cycle is less than the first threshold. Corresponding applications are also provided, such as a method for directional transport of liquids or particles in liquids, and a method for processing target objects.

The invention provides an environment-considered photovoltaic panel cleaning scheme determination method, and belongs to the technical field of photovoltaic panel cleaning.The method comprises the steps that firstly, real-time weather data and prediction data are obtained, and an environment stain correlation model is established; a multispectral camera is adopted to identify the types of stains on the surface of the photovoltaic panel and calculate a distribution map; calculating a cleaning index by combining the generating capacity data and the solar irradiation intensity, and determining a cleaning priority; a weather adaptability scoring system is constructed, and a robot operation environment threshold value is set; dividing power generation time periods according to the sunlight intensity and calculating an optimal cleaning time window; cleaning schemes are matched according to different stain types, and parameters are adjusted according to environmental conditions; calling a stain cleaning efficiency optimization function to carry out multi-objective optimization; and finally, generating an optimal cleaning path and parameter configuration by utilizing the photovoltaic cleaning planning network model. The technical problem that a photovoltaic panel cleaning scheme cannot be adaptively optimized according to complex and changeable environmental factors is solved.

The invention relates to the technical field of fire coal control, and discloses a thermal power plant fly ash floating black online detection control method and system, and the method comprises the steps: 1, employing microwave, infrared and laser sensors for cooperative work, detecting carbon dielectric characteristics through microwave dust interference resistance, identifying thermal radiation difference through infrared, and analyzing particle distribution through laser; 2, on the basis of the detection requirements in the step 1, triple protection of air curtain barrier, ultrasonic cleaning and hydrophobic coating is designed, dust condensation is blocked, and it is ensured that the light transmittance of the sensor is larger than 90%; the invention provides a multi-mode sensing fusion-anti-interference current stabilization-closed loop optimization full-link solution for the industrial problem of signal distortion caused by optical window dew formation and dust deposition, airflow disturbance and environmental interference in fly ash floating black online detection. The light transmittance of the optical window is greater than 93% by combining triple protection of air curtain barrier, ultrasonic cavitation stripping and nano hydrophobic coating.

The invention relates to the technical field of photovoltaic supports, and discloses a photovoltaic mounting support which comprises a plurality of cross beams, a plurality of oblique beams erected on the cross beams and a plurality of supporting piles supported at the bottoms of the cross beams, and further comprises a carrying robot movably carried on the oblique beams. The carrying robot comprises a robot body, an adsorption assembly installed at the bottom of the robot body and moving wheel sets located on the two sides of the robot body. Mounting steps for mounting a photovoltaic panel are formed on two side walls of the oblique beam, and a track for the moving wheel set to walk is arranged at the top of the oblique beam; the adsorption assembly comprises a lifting disc fixedly installed at the bottom of the robot body and a plurality of suction cups. The sucker is fixedly connected with the lifting disc through a support arm; the moving wheel set comprises a plurality of self-driven wheels matched with the track and a connecting frame connected between the self-driven wheels and the robot body. The photovoltaic panel can be automatically transferred and carried to a designated area on the support, and the labor intensity of workers is reduced.

A method for efficiently and safely cleaning an apparatus for a tin compound and a highly purified apparatus for a tin compound are provided. A method of cleaning an apparatus that has been in contact with a tin compound having formula (1) includes at least steps (A) to (C) in this order:(A) a step of cleaning the apparatus with a non-protonic solvent,(B) a step of cleaning the apparatus with an acidic aqueous solution and / or alkaline aqueous solution, and(C) a step of cleaning the apparatus with ultrapure water having a resistivity of 17 MΩ·cm at 25° C.RpSnXm  (1)R is a hydrocarbon group, p is an integer of 0 to 3, X is a hydrolyzable substituent, and m=4-p.

The invention relates to the technical field of information, in particular to an intelligent control method for a wafer cleaning and conveying process of a semiconductor wafer cleaning technology, which comprises the following steps of: in the wafer conveying process, detecting vibration and displacement signals of a conveying device in real time by adopting a gyroscope sensor; the collected signals are input into a pre-trained support vector machine model to be classified, whether current vibration and displacement exceed preset threshold values or not is judged, the support vector machine model is obtained through historical data training, and normal and abnormal vibration and displacement states can be accurately distinguished; when vibration or displacement exceeding a threshold value is detected, a servo motor is triggered to carry out compensation control, vibration and displacement are restrained by adjusting the conveying speed and acceleration parameters, it is ensured that the wafer is stably conveyed to the rotary cleaning device, and a compensation control algorithm dynamically adjusts control parameters according to the amplitude of vibration and displacement, so that quick response and accurate compensation are achieved.