306 results about "Wet cleaning" patented technology

The invention relates to a surface cleaning device for wet cleaning a surface, comprising a guide part which extends longitudinally between a proximal end and a distal end and is designed for manually guiding the surface cleaning device over the surface, a base part which is connected to the distal end of the guide part, a tool device which is arranged on the base part and is designed to act on the surface, a fluid dispenser which is designed to dispense fluid onto the surface, a fluid receptacle which is designed to receive fluid from the surface which has been delivered to the surface by means of the fluid dispenser, a fluid path which fluidically connects the fluid receptacle to the fluid dispenser for the return of fluid received by means of the fluid receptacle, and a conveying device which is designed to convey fluid along the fluid path.whereby fluid absorbed from the surface by means of the fluid intake can be released onto the surface by means of the fluid discharge. The invention also relates to a fluid tank for such a surface cleaning device, a surface cleaning system, and a method for wet cleaning a surface.

The present embodiment relates to a control method for a cleaning robot and a related device. The method comprises: acquiring a contaminant type and a contaminated area of a floor to be cleaned, wherein the contaminant type comprises a liquid contaminant; when there is the contaminated area having the liquid contaminant on the floor to be cleaned, turning a body of the cleaning robot around and driving the cleaning robot to perform a cleaning operation in a reversing posture, so as to use a wet cleaning member to clean the liquid contaminant in the contaminated area. The present invention solves the problem that a dry cleaning member of the cleaning robot is easily wetted when cleaning the liquid contaminant, improving the cleaning effect on the floor having the liquid contaminant.

The invention belongs to the technical field of photovoltaic equipment, and particularly discloses a solar photovoltaic panel cleaning device which comprises a transverse moving square frame, mounting rods are symmetrically and fixedly arranged on the lower sides of the two ends of two long beams of the transverse moving square frame, and first rolling wheels and second rolling wheels which are perpendicular to each other are rotationally arranged at the inner ends of the mounting rods; longitudinal moving driving mechanisms are arranged at the two ends of the transverse moving square frame in the length direction, a double-layer square frame is arranged above the transverse moving square frame in parallel, an alternate cleaning mechanism is arranged on the lower layer of the double-layer square frame, a washing brush mechanism is arranged above the alternate cleaning mechanism, and a water collecting tank is arranged in the alternate cleaning mechanism. A reciprocating type alternate overturning driving mechanism is arranged at one end of the alternate cleaning mechanism, and a cleaning power mechanism is arranged at the other end of the alternate cleaning mechanism. An alternate cleaning mode is adopted, one cleaning assembly cleans the photovoltaic panel while the other cleaning assembly is cleaned, the cleaning assemblies do not need to be replaced frequently, and meanwhile, a semi-wet cleaning mode is adopted, so that sewage diffusion or flying dust pollution is avoided.

The invention relates to an obstacle cleaning method, a cleaning robot and a computer readable storage medium. The method is applied to the cleaning robot, the cleaning robot comprises a chassis and a wet cleaning part connected with the chassis, and the method comprises the steps that obstacle information is recognized, when the height of an obstacle is larger than a first threshold value, an obstacle avoidance cleaning strategy is executed, and when the height of the obstacle is smaller than a second threshold value, a low obstacle cleaning strategy is executed; the obstacle avoidance cleaning strategy is to clean obstacles along the edges; according to the low obstacle cleaning strategy, the upper surface of the obstacle is kept clean by adjusting the lifting height of a chassis of the cleaning robot and / or the lifting height of a wet type cleaning piece. By adopting the method, the cleaning coverage rate and the cleaning effect are improved.

The invention relates to a control method of cleaning equipment, the cleaning equipment and a computer readable storage medium. The method comprises the steps that obstacle information on a working face can be accurately and timely acquired through a detection system, and when a target obstacle is recognized, a shielding piece can be timely controlled to be switched to a shielding state, so that closing of an opening of a containing cavity is achieved, and the working efficiency is improved. Water in the rotary wet-type cleaning piece rotatably arranged in the containing cavity is prevented from being scattered on the working face, the cleaning effect is prevented from being affected, and the cleaning quality is improved; the shielding piece of the cleaning equipment can comprise the shielding state and the avoiding state, switching between the shielding state and the avoiding state is carried out in time based on the detected obstacle information, and the use scene of the cleaning equipment is expanded.

A cleaning device and methods for cleaning are provided. In one embodiment, the cleaning device includes a head assembly, a body assembly, and a handle assembly. The cleaning device also includes components that enable the cleaning device to operate in dry cleaning modes and wet cleaning modes. Dry cleaning modes can employ a vacuum assembly, including a motor, tubing, and a fluid recovery tank in order to draw in debris and waste into a fluid recovery tank. Wet cleaning modes can further employ a fluid supply tank, a pump, and tubing in order to supply fluid to a brushroll to aid in a cleaning process.

The invention belongs to the technical field of wastewater recovery, and discloses a cleaning fluid recovery device for wet cleaning of semiconductor wafers, which comprises an evaporation tank, a feed pipe fixedly arranged on the side surface of the evaporation tank, and a discharge pipe fixedly mounted at the bottom of the evaporation tank, the valve is arranged on the discharge pipe, the mounting bracket is fixedly arranged outside the evaporation tank and the condensation tank, and one side, close to the evaporation tank, of the condensation tank is fixedly connected with a transmission pipe communicated with the evaporation tank; the cleaning mechanism is arranged in the evaporation tank and used for cleaning the inner wall of the evaporation tank, and through cooperation of a heater, a scraping plate, a cleaning plate and other structures, the interior of the evaporation tank can be conveniently and rapidly heated and cleaned; the problems that when an existing cleaning liquid recycling device is used for removing and recycling impurities through distillation, a large amount of impurity scale is prone to remaining in a distillation chamber, and cleaning is not easy are solved.

A cleaning apparatus, comprising: a mobile platform (100), which is configured to autonomously move on an operating surface; and a wet cleaning module (200), which is arranged at the bottom of the mobile platform (100) and is configured to clean at least part of the operating surface in a wet cleaning manner, wherein the wet cleaning module (200) comprises: a driving assembly (230), which is used for outputting a driving force in a first working mode; and a cleaning assembly (2000), which comprises a first cleaning assembly (210) and a second cleaning assembly (220), the first cleaning assembly (210) being configured to move in a reciprocating manner in the first working mode of the driving assembly (230) so as to clean at least part of the operating surface, the second cleaning assembly (220) being configured to continuously rotate in the first working mode of the driving assembly (230) so as to clean at least part of the operating surface, the second cleaning assembly (220) being arranged at an edge position of a projection surface of the mobile platform (100), and cleaning surfaces, which come into contact with the operating surface, of the second cleaning assembly (220) and the first cleaning assembly (210) being approximately located in the same horizontal plane.

The utility model discloses a cleaning robot and a cleaning system. The cleaning robot comprises a machine body, driving wheels, a fabric wet type cleaning assembly, a water tank assembly and a suction assembly. The driving wheels are arranged at the bottom of the machine body and used for driving the machine body to move. The fabric wet-type cleaning assembly is connected with the machine body and used for conducting wet-type cleaning on the fabric products, and the fabric wet-type cleaning assembly is provided with a liquid spraying hole and a dirt suction opening; the water tank assembly is provided with a clear water cavity and a sewage cavity which are separated from each other, the clear water cavity communicates with the liquid spraying hole, and the sewage cavity communicates with the sewage suction port; the suction assembly comprises a suction source installed on the machine body, and the suction source is used for being communicated with the sewage cavity so that garbage can be sucked into the sewage cavity from the sewage suction opening. The cleaning robot can automatically clean the cloth products, and the cleaning effect is good.

The present invention belongs to the technical field of photovoltaic equipment, and specifically discloses a cleaning device for a solar photovoltaic panel, which includes a horizontally moving square frame. At the lower sides of both ends of the two long beams of the horizontally moving square frame, mounting rods are symmetrically and fixedly provided. At the inner ends of the mounting rods, a first roller and a second roller perpendicular to each other are rotatably provided. At both ends in the length direction of the horizontally moving square frame, a longitudinal movement driving mechanism is provided. Above the horizontally moving square frame, a double-layer square frame is arranged in parallel. An alternating cleaning mechanism is arranged at the lower layer of the double-layer square frame. Above the alternating cleaning mechanism, a flushing brush mechanism is provided. A water collecting tank is arranged inside the alternating cleaning mechanism. At one end of the alternating cleaning mechanism, a reciprocating alternating flipping driving mechanism is provided. At the other end of the alternating cleaning mechanism, a cleaning power mechanism is provided. The present invention adopts an alternating cleaning method, while one cleaning component cleans the photovoltaic panel, the other cleaning component is being cleaned, realizing that there is no need to frequently replace the cleaning component. At the same time, a semi-wet cleaning method is adopted to avoid the diffusion of sewage or dust pollution.

The embodiment of the invention provides a control method of a cleaning robot and the cleaning robot, and the method comprises the steps that in the process that the cleaning robot executes a cleaning task in a first cleaning mode along a preset cleaning path, the cleaning robot judges whether at least one part of a wet type target object is in contact with a dry type cleaning assembly of the cleaning robot or not; if the cleaning robot judges that at least one part of the wet type target object is in contact with the dry type cleaning assembly of the cleaning robot, the cleaning robot stops executing the cleaning task along the original preset cleaning path; the cleaning robot is controlled to execute a first cleaning strategy, and the first cleaning strategy comprises the steps that at least one part of the wet type target object is cleaned in a wet type cleaning mode or the cleaning robot is made to bypass the wet type target object. According to the cleaning robot, the current cleaning mode can be stopped in time when an emergency occurs in the cleaning path and the cleaning assembly is in contact with the unmatched target object, an emergency cleaning strategy is switched, and secondary pollution accidents are avoided.

A handheld extraction cleaner system includes a wet cleaning head including a wet suction nozzle, a dry cleaning head including a dry suction nozzle. A handheld base includes a modular receiver configured to interchangeably couple to the wet cleaning head and the dry cleaning head. A suction source is configured to generate a suction air stream through the wet suction nozzle when the wet cleaning head is coupled to the modular receiver and through the dry suction nozzle when the dry cleaning head is coupled to the modular receiver. A fluid delivery system includes a fluid distributor configured to dispense a cleaning solution on a surface to be cleaned, where at least one of the handheld base and the dry cleaning head is configured to at least partially prevent the fluid delivery system from dispensing the cleaning solution when the dry cleaning head is coupled to the modular receiver.

The invention discloses a wet drying method for a wafer with a graphic structure, which comprises the following steps of: carrying out wet cleaning on the wafer with the graphic structure, and after the wet cleaning is finished, filling a cleaning solution in an interval region between the graphic structures. The flowing supercritical gas is adopted to dry the wafer, and in the drying process, the included angle between the flowing direction of the supercritical gas and the extending direction of the graphic structure ensures that the supercritical gas can smoothly flow from one side of the interval area to the other opposite side, so that the cleaning liquid in the interval area is completely replaced. According to the method, the effect of replacing the cleaning liquid in the interval areas between the pattern structures can be improved, complete replacement of the cleaning liquid is achieved, and meanwhile it is guaranteed that the pattern structures are not collapsed or damaged.

The utility model discloses a combined belt conveyor wet-type cleaning device with water mist assistance, which is applied to a belt conveyor body, vertical rods are symmetrically arranged at the top of the belt conveyor body, adjusting mechanisms are arranged on one sides of the vertical rods, a concave frame is arranged between the adjusting mechanisms, a conveying mechanism is arranged in an inner cavity of the concave frame, and the conveying mechanism is connected with the belt conveyor body. A conveying mechanism is arranged on the front surface of the vertical rod, a cleaning mechanism is arranged below the conveying mechanism, a spraying mechanism is arranged in the middle of the front surface of the vertical rod, and the multiple mechanisms such as the adjusting mechanism, the conveying mechanism, the cleaning mechanism, the spraying mechanism, the supplying and conveying mechanism and the scraping mechanism are matched in an assisting mode; the cleaning efficiency is remarkably improved, the combined cleaning structure enables the cleaning efficiency to be improved to 99% or above, the residue amount is smaller than 50 g / m < 2 >, the efficiency is far higher than 85% of a traditional cleaning device, adaptability is high, various viscous materials (such as wet coal and ore pulp) can be treated, and the problem that the traditional cleaning device cannot thoroughly clean the high-humidity and high-viscosity materials is solved.

A cleaning device includes: a housing; a drive device for automatically moving the cleaning device in a movement direction; and a wet-cleaning module accommodated in the housing, the wet-cleaning module including a moveable cleaning element for wet cleaning of surfaces. The cleaning element is belt-shaped. In an embodiment, the wet-cleaning module has three positions for the belt-shaped cleaning element: a cleaning position, in which the cleaning element is configured to contact a surface to be cleaned with a cleaning surface; a parking position, in which the cleaning element is at a distance from the surface to be cleaned; and a regeneration position located between the cleaning position and the parking position, or a regeneration position located in the parking position in which the cleaning element is regeneratable. The wet-cleaning module has a transport mechanism for moving the cleaning element into its cleaning, parking, and regeneration positions.

The application discloses a typeable soft shaft electric cleaning brush and a control method, relates to the technical field of cleaning tools, and the cleaning brush comprises a handle, a typeable soft shaft waterproof sealing structure and a quick-change brush head; the handle is internally provided with a lithium battery, a driving motor and a control module, and an outer wall is provided with a button switch; the typeable soft shaft is internally provided with a steel wire transmission soft shaft, is matched with a double-layer waterproof sleeve and a front end sealing head, and can be arbitrarily bent and shaped; the conversion head and the brush head are respectively locked and transmitted through a jacking screw, and each component is modularized and can be disassembled; the control method comprises the steps of matching and assembling the brush head, bending and shaping the soft shaft, single-key starting and stopping and speed adjusting and washing, and long-pressing stopping, disassembling, washing and maintaining. The application can be extended into a special-shaped small cavity for dry and wet cleaning, the whole machine is waterproof, convenient to disassemble and assemble, and can effectively adapt to multiple complex cleaning scenes.

Device (1), preferably in the form of a wet scrubber, for cleaning a gas stream of gaseous, liquid and solid impurities, which has a gas inlet (3), at least one first washing section (6) for cleaning the gas stream with a washing liquid, a gas outlet (5) and gas supply lines (24), characterized in that the device (1) further has several gas inlets (3) for different gas streams, wherein the supply lines (24) connected to the gas inlets (3) have a continuous gradient towards the device (1) and preferably a liquid trap (14) upstream of the gas inlets (3), and the device (1) has a pre-wash chamber (16) with at least one spray nozzle (10) and, between a first washing section (6) and a second washing section (7) in the connecting line or after the washing section (6), at least one packing (9) with a specific surface area of ​​at least 400 m² / m³, preferably in the form of a textile packing.and has a spray nozzle (10) above the packing (9), whereby the washing liquid for the packing (9) and the gas flowing through the packing (9) flow in the same direction, and wherein the gas flow is directed from the upper end of the first washing section (6) via the preferably textile packing (9) downwards in the connecting line to the lower end of the second washing section (7) or to the gas outlet (5).

A cleaning robot includes a main body; a wheel to move the main body; a pad holder, the pad holder being rotatable and to which a wet cleaning pad is attachable; a motor to rotate the pad holder; a floor sensor; a controller connected to the wheel, the motor, and the floor sensor; and a lifting assembly to lower the pad holder toward the floor, or to raise the pad holder toward the main body, wherein the controller is to: identify a type of the floor based on a detection signal transmitted from the floor sensor, determine whether a dry cleaning is required based on the type of the floor, and control the motor to rotate the pad holder in the reverse direction such that the pad holder is raised toward the main body, by the lifting assembly, based on the dry cleaning being determined as required.

Embodiments of the present disclosure provide a wet cleaning device and a wet cleaning system, which relate to the technical field of semiconductor equipment and are used for saving liquid consumption of lubricating devices. The display panel comprises a conveying device, a cleaning device and a liquid storage device. The conveying device is used for conveying target objects. The cleaning device comprises a cleaning port and a liquid discharge port. The cleaning port is used for outputting a first liquid to the target objects to clean the target objects. The liquid discharge port is used for discharging a second liquid, which is formed after the target objects are cleaned by the first liquid. The liquid storage device is connected with the liquid discharge port of the cleaning device to store the second liquid. The liquid storage device can also output the second liquid to the conveying device to lubricate the conveying device. The wet cleaning device is used for recycling the liquid used for cleaning the target objects.

The invention provides surface cleaning equipment. The surface cleaning equipment comprises a main body part, a handle part, an electric suction source, a supply tank, a recovery tank and a ground brush assembly, the floor brush assembly is pivotally connected with the main body part, and the to-be-cleaned surface is cleaned through the floor brush assembly; the floor brush assembly comprises a shell assembly, a containing cavity is defined by the shell assembly, and a stirrer is arranged in the containing cavity. Cleaning liquid stored in the supply tank is distributed to the stirrer through the liquid distributor so as to perform wet cleaning on the surface to be cleaned through rotation of the stirrer, and sewage after the surface to be cleaned is cleaned is recycled and stored in the recycling tank; the floor brush assembly further comprises a cleaning head assembly, and the cleaning head assembly is driven to move between a rising position and a lowering position. The cleaning head assembly is farther from the surface to be cleaned in the raised position than in the lowered position; moreover, at the lowered position, the working range of the cleaning head assembly is outside the horizontal plane projection of the housing assembly.

This application relates to a wet cleaning device. The present invention discloses a control valve for controlling fluid transmission. The control valve includes a valve body defining two relatively independent first and second channels, and the control valve is configured to control the opening / closing of the first channel or the second channel. A first inlet and a first outlet fluidly connected to the first channel, and a second inlet and a second outlet fluidly connected to the second channel. Wherein, the first inlet, the first outlet, the second inlet and the second outlet are substantially at the same height. It can effectively reduce the height of the control valve, thereby reducing the installation space of the control valve and making its installation more convenient.

The present disclosure provides a cleaning device, comprising: a moving platform (110) configured to automatically move on an operation surface; and a cleaner (1000) arranged at the bottom of the moving platform (110) and configured to clean at least part of the operation surface in a wet cleaning manner. The cleaner (1000) comprises: a driver (230) for outputting driving forces for a first working mode and a second working mode; a sub-cleaner group (2000) comprising a first sub-cleaner (210) and a second sub-cleaner (220), wherein the first sub-cleaner (210) and the second sub-cleaner (220) are configured to clean at least part of the operation surface in the first working mode of the driver (230), and to be separated from the operation surface in the second working mode of the driver (230); and a water supply port (250) configured to supply water to the first sub-cleaner (210) and the second sub-cleaner (220) in the first working mode of the driver (230), wherein the water supply port (250) is provided with a plurality of water outlets (25261) to supply water to the first sub-cleaner (210) and the second sub-cleaner (220), respectively.

Provided is a wet cleaning device (100) for removing liquid from a surface. The wet cleaning device comprises a user-moveable portion (102) that is moveable by a user, and an underpressure generator system comprising a resiliently deformable assembly (104, 110). The resiliently deformable assembly is deformable, via the user's movement of the user-moveable portion, to store potential energy. The underpressure generator system is arranged to use the potential energy stored by the deformed resiliently deformable assembly to generate an underpressure for drawing liquid from the surface into the wet cleaning device. The liquid drawn into the wet cleaning device is correspondingly removed from the surface. Further provided is a cleaning assembly comprising a surface cleaning appliance, e.g. a vacuum cleaner, and the wet cleaning device. Additionally provided is a method for removing liquid from a surface using such a wet cleaning device.

The utility model discloses a preposed filtering device applied to an N-methyl pyrrolidone circulating pipeline in the field of wet cleaning, which comprises a barrel body and a cover body detachably arranged at the top of the barrel body, a containing cavity with an opening at the top is arranged in the barrel body, the size of the containing cavity is gradually reduced along the vertical direction, and the cover body is arranged in the containing cavity. A containing cavity is formed in the cover body, at least two horizontal ladder surfaces are formed in the inner wall of the containing cavity in the vertical direction, at least two filter screens different in size are installed in the containing cavity and fixed through the horizontal ladder surfaces at the corresponding positions, and a glass sheet which can be seen into the containing cavity is installed in the middle of the cover body. Three filter screens with different sizes are arranged in the big-end-up accommodating cavity for filtering in sequence, so that the filtering effect is improved, and the organic medicine liquid is prevented from staying in the accommodating cavity; the filter screen is fixed through the horizontal ladder surface on the inner wall of the accommodating cavity, so that the filter screen is convenient to mount and dismount; and the cover body is provided with the glass sheet for directly viewing the interior of the accommodating cavity, so that the accumulation condition of photoresist and a film layer on the filter screen can be conveniently observed, and timely cleaning is realized.

The utility model discloses an in-line wet-type cleaning machine which comprises a first cleaning cavity, a second cleaning cavity, a first rinsing cavity, a second rinsing cavity and a drying cavity which are arranged in sequence, and products pass through the cavities in sequence during cleaning. The counting sensor is arranged at an inlet of a first cleaning cavity of the in-line wet type cleaning machine and used for calculating the number of products entering the first cleaning cavity and sending the number to the logic unit; the first valve is connected to an external pipeline of the first rinsing cavity; an external pipeline of the first rinsing cavity is connected with a high-concentration waste liquid collecting device; the second valve is connected between the first rinsing cavity external pipeline and the second rinsing cavity external pipeline; an external pipeline of the second rinsing cavity is connected with a low-concentration waste liquid collecting device; the logic unit is used for comparing the product quantity with a pre-stored threshold value and sending an electric signal to the first valve and the second valve according to a comparison result, so that the first valve and the second valve execute opening and closing actions corresponding to the electric signal; the first valve and the second valve are always kept in a mutual exclusion state in the cleaning process.

The present application relates to a kind of infrared thermal imaging MEMS wafer cutting protection method and wafer cutting protection structure, the wafer surface has photoresist protection, and surface is hydrophobic state simultaneously, the particle introduced when wafer is cut by blade, it is extremely easy to be washed away by cooling water, effectively curb wafer surface particle pollution, while the introduced protective layer does not change the material characteristics of MEMS structure itself, and the protective layer is removed together with the step of infrared chip sacrificial layer dry release.Compared with prior art, the wet cleaning process of single chip after cutting can be omitted, the yield is improved, and a large amount of organic solvent can also be avoided, to reduce the harm to the environment.

To provide an automatic cleaning device having a high cleaning function, a wide application range, and strong cleaning capability, capable of collecting dirty water, and having a lifting adjustment function.SOLUTION: An automatic cleaning device includes a mobile platform, a lifting table, a wet cleaning module, a liquid supplying module, and a collecting module. The mobile platform is configured to automatically move in a target direction on a surface to be cleaned. The lifting table is connected to the mobile platform and is configured to move upwards or downwards with respect to the mobile platform. The wet cleaning module is connected to the lifting table and configured to clean the surface to be cleaned using cleaning liquid. The liquid supplying module is connected to the mobile platform and configured to provide the cleaning liquid to the surface to be cleaned. The collecting module is connected to the mobile platform and configured to collect the cleaning liquid.SELECTED DRAWING: Figure 1

The invention relates to the technical field of semiconductor materials, and particularly discloses an atomization cleaning method for an indium phosphide wafer. The atomization cleaning method comprises the following steps that an indium phosphide wafer rotating at a constant speed is sequentially subjected to atomization cleaning through a first acid solution and deionized water and then subjected to nitrogen purging drying; carrying out atomization cleaning with an alkaline peroxide solution and deionized water, and then carrying out nitrogen purging drying; and finally, carrying out atomization cleaning by using a second acid solution and deionized water, and carrying out nitrogen purging drying to obtain the clean indium phosphide wafer. According to the method, based on an acid-alkali-acid three-step synergistic mechanism, full-spectrum pollutant removal of oxides, organic matters, particles and metal ions is realized; the indium phosphide wafer rotating at a high speed can immediately strip reaction products and waste liquid through centrifugal force, and secondary adsorption is avoided; the technical defects that a traditional RCA wet cleaning process is prone to corroding the wafer, the surface roughness of the wafer is degraded, and secondary pollution is caused are effectively overcome.

The present disclosure relates to a cleaning station 11 for a vacuum cleaner 1 The cleaning station 11 comprises a vacuum cleaner 2 comprising a dust collecting device 3 and a wet cleaning tool 23,24. The cleaning station 11 being configured to remove dust particles from the dust collecting device 2 in the vacuum cleaner 1. The cleaning station comprises a housing 11 having an air inlet 12, for connection to the dust collecting device 3, a dust compartment 15, and an air exhaust 13,13a,13b. The housing 11 also comprises a motor / fan unit 17,30 adapted to create an air flow 40,41 from an air inlet 12,32 to the air exhaust 13,13a,13b. The housing 11 comprises a receiver 20 comprising a holder 21 configured to receive the wet cleaning tool 23,24. Said holder 21 being arranged in the air flow 40,41 and / or close to the air exhaust 13,13a,13b. Intended for publication:

Methods and apparatus for protecting parts of a process chamber from thermal cycling effects of deposited material. In some embodiments, a method of protecting parts of a process chamber includes the steps of wet etching the parts using a weak base or weak acid; cleaning the parts by sandblasting; coating at least a portion of a surface of the parts using a stress release layer. The stress release layer forms a continuous layer of about 50 microns to about 250 microns thick and is configured to maintain structural integrity of the parts from thermal cycling of aluminum deposited on the parts. The method also includes wet cleaning the parts after forming the stress release layer using a heated deionized water rinse.