387results about "Liquid processing" patented technology

A robotic surface treating device that can perform carpet sweeping, hard-surface dry sweeping/wiping, and hard-surface sweeping/mopping is disclosed. The robotic surface treating device includes a sweeper brush, a dust bin for collecting debris from the brush, a reel-to-reel sheet of cleaning material, and a fluid delivery system for delivering fluid from a fluid reservoir onto the sheet of cleaning material and/or onto the surface to be treated. The dust bin, reel-to-reel sheet of cleaning material, and the fluid reservoir are separately installed from the top of the device, and may be separately removed for replacement.

A photoresist coating and developing apparatus 1 includes a photoresist film forming unit that forms a photoresist film on a substrate; a heat treatment unit that heats the substrate on which the photoresist film is formed by the photoresist film forming unit; a cooling unit that cools the substrate, on which the photoresist film is formed and which is heated by the heat treatment unit, to normal temperature; a heating unit 61 that heats the substrate, which is cooled to normal temperature by the cooling unit, to a predetermined temperature; a load-lock chamber L1 that unloads the substrate under depressurized atmosphere to expose the photoresist film; and a transfer device 62 that transfers the substrate from the heating unit 61 to the load-lock chamber L1.

Multi-directional wiping elements are disclosed. The wiping elements comprise intersecting squeegee segments that provide top wiping squeegee edges and side wiping squeegee edges. Devices utilizing the multi-directional wiping elements of the present invention can include bristles that are configured to simultaneously wipe a working surface with the wiping elements. In accordance with the embodiments of the invention, the multi-directional wiping elements are utilized in a toothbrush cleaning head that is configured to be operated manually or, alternatively, is motorized and is configured to rotate, oscillate, vibrate and/or move according to a combination thereof.

A system includes a UV light source and an optical medium coupled to receive UV light from the UV light source. The optical medium is configured to emit UV light proximate to a surface from which biofouling is to be removed once the biofouling has adhered to the protected surface. A method corresponds to the system.

An upright bare floor cleaner with a handle assembly pivotally mounted to a base assembly. The base assembly has a sweeper that includes a rotatably driven brush adapted to sweep dust and dirt particles into a removable dirt receptacle. The handle includes a water tank to store a quantity of water and a fluid distribution system that includes a heater and a spray nozzle. Steam is generated by the heater and is distributed to a removable mop cloth that applies the steam to the surface to be cleaned.

An optical connector clearing tool (1) includes a holder (2), cleaner (5), and cap (6). The holder (2) includes, e.g., a cylindrical slider (10), a cylindrical body (12) installed to be rotatable and movable in the axial direction with respect to the slider (10), and a slider return spring (13) which biases the body (12) forward to return the slider (10) to the initial position. The slider (10) has a pair of elastic pieces (16) having guide projections (17). In the outer circumferential surface of the body (12), spiral grooves (25, 26) with which the guide projections (17) engage are formed within the angular range of 360°. When the slider (10) moves forward, the body (12) rotates by the cam action of the guide projections (17) and spiral grooves (25, 26). The cleaner (5) includes, e.g., a cleaning thread (41) accommodated in a rotary pod (40), a supply reel (42), a take-up reel (43), and a cleaning pin (44), and is connected to the body (12). The rotary pod (40) and cleaning pin (44) rotate together with the body (12), and the cleaning thread (41) supplied to the distal end face of the cleaning pin (44) cleans the connection surface of an optical connector. The cleaning thread (41) is supplied from the supply reel (42) and taken up to the take-up reel (43) by being given tension by the rotation of the cleaner (5).

A cleaning apparatus includes a housing to be moved along a surface to be cleaned. Within the housing, a cleaning ribbon is disposed between a supply reel and a take-up reel. A portion of the cleaning ribbon is held parallel to, and in substantial contact with, the surface to be cleaned, for attracting and retaining smaller debris. Another portion of the cleaning ribbon is configured to create a particle trap. A rotatable brush, also disposed within the housing, sweeps larger debris into the particle trap. The supply reel, the take-up reel, the cleaning ribbon, and/or the rotatable brush are alternatively included in a cartridge which is detachably secured within the housing.

A compact, hand held carpet and upholstery extractor nozzle is provided having an air turbine and a compact gear reduction operatively connected to and driven by said turbine. At least a pair of scrub modules are interchangeably attachable to said gear reduction. A first scrub modules includes at least a pair of vertical axis scrub brushes for cleaning upholstery, carpeting and the like. When said first scrub module is attached to said gear reduction, the scrub brushes are operatively connected to and driven by said gear reduction. A second scrub module includes a single vertical axis scrub pad that is driven by said gear reduction for scouring hard surfaces, such as tiles, tubs, counter tops, etc.

A cleaning substrate for use in the cleaning operation for a substrate stage in an exposure unit compatible with immersion exposure and a dummy substrate for use during the adjustment of an exposure position of a pattern image in the exposure unit are held in a cleaning substrate housing part and a dummy substrate housing part, respectively, which are provided in a substrate processing apparatus. For the cleaning operation for the substrate stage or an alignment operation in the exposure unit, the cleaning substrate or the dummy substrate is transferred from the substrate processing apparatus to the exposure unit. A back surface cleaning process on the cleaning substrate or the dummy substrate is performed in a back surface cleaning unit of the substrate processing apparatus immediately before or immediately after the cleaning operation for the substrate stage or the alignment operation.

The invention relates generally to the conditioning of bowling lanes, and, more particularly to an apparatus and method for automatically applying a predetermined pattern of dressing fluid along the transverse and longitudinal dimensions of a bowling lane.

A floor cleaning machine is provided with at least two movable squeegees to provide coverage of the liquid applied to the floor in a path with the squeegees extending beyond the outer perimeter sides of the liquid path both during straight ahead movement and during turning maneuvers. The squeegee assemblies are carried by a chassis. A floor scrubbing device is provided to apply liquid to the floor and to mix dirt on the floor with the applied liquid. A liquid pickup device is also provided to remove the applied liquid from the floor at a position adjacent to each of the squeegee assemblies.

A developer nozzle is moved from a periphery of a wafer toward the central portion while an exposed substrate held at a spin chuck is being rotated about a vertical axis and while a developing solution is being discharged from the developer nozzle, and this way the developing solution is supplied to the surface of the wafer, the developer nozzle having a slit-like ejection port whose longitudinal direction is oriented to the direction perpendicular to the radial direction of the wafer. The movement speed of the nozzle is higher than a case where a nozzle with a small-diameter circular nozzle is used, and this enables a development time to be reduced. Further, the thickness of a developing solution on a substrate can be reduced, so that the developing solution can be saved.

A substrate cleaning apparatus is provided. The apparatus includes a transducer capable of resonating at a high frequency and a brush material attached to a surface of the transducer. The brush material includes at least one passage extending to the surface of the transducer and is configured to be applied to a surface of a substrate. When the transducer resonates at the high frequency, the transducer is capable of imparting acoustic energy to the surface of the substrate at a location of the at least one passage.

A wet-processing apparatus, which spouts a coating liquid onto a surface of a substrate of a substrate, includes: nozzles provided with passages for the coating liquid; a light source which illuminates an area between a plane containing the tips of the nozzles and the surface of the substrate; a camera for forming an image of the area; a control unit which provides a spout signal requesting spouting the liquid from the nozzle toward the substrate, and an imaging signal requesting the camera to start an imaging operation; and a decision unit which decides whether or not the liquid was spouted from the nozzle and whether or not changes occurred in the condition of the liquid spouted from the nozzle toward the substrate on the basis of an image formed by the camera and expressing the brightness of the liquid spouted toward the substrate and illuminated by light emitted by the light source.

The present invention relates to a steam cleaner that is light-weight and is prepared for operation quickly and easily and comprises handle assembly, a pivoting connector, a reservoir, a reservoir socket, a steam head and an electric wire. The handle assembly comprises a grip and a lever. The pivoting connector is attached to the steam head. The reservoir is mounted detachably in the pivoting connector and is easily removed to fill the reservoir with tap water. Squeezing the handle assembly releases water from the reservoir into the steam head where steam is generated to clean a floor.

The brushhead attachment system includes a hub member which is secured to a drive shaft of a personal care appliance for oscillating action. The hub member includes a number of spaced locking elements in the form of protrusions around the periphery thereof. An annular outer brushhead portion with a first group of bristles includes a plurality of spaced grooves in the outer surface thereof which mate with extending pins in the body of the appliance for insertion and removal of the outer brushhead portion. An inner brushhead portion is configured to fit within the annular opening of the outer brushhead portion and includes a plurality of depending legs which mate with the protrusions on the drive member for resulting oscillating action of the inner brushhead portion when the drive member oscillates, at least some of the legs having latch elements which fit onto an interior lip of the outer brushhead portion in such a manner that the inner and outer brushhead portions may be installed and removed as a unit, while permitting the inner brushhead portion to be freely rotatable relative to the outer brushhead portion.

Transferring apparatus control means movement of a transferring apparatus for transferring a wafer to a resist liquid coating unit from a cooling process unit. A storage section of the transferring apparatus controller stores a coating time required for a resist film coating and a moving time required for the transfer of the wafer. When a coating start time of a resist film is inputted, the control section calculates a coating end time from the stored coating time. Further, the control section calculates time of taking out a wafer W, which is next subjected to a coating process from the cooling process unit, from the coating end time and the stored moving time. Based on the calculated time, the transferring apparatus controller instructs the transferring apparatus about timing to take out the wafer. This makes it possible to improve the throughput.

An exposure apparatus, which exposes a pattern on an original onto a substrate while a liquid fills a gap between a projection optical system and the substrate, includes a liquid holding plate which sets the substrate held on a substrate stage and the peripheral area around the peripheral portion of the substrate to form substantially the same surface to hold the liquid on the peripheral portion of the substrate. The liquid holding plate includes an inner member formed in the peripheral area of the peripheral portion of the substrate and holds the liquid on the peripheral portion of the substrate, an outer member formed on the peripheral portion of the inner member and attaching to the substrate stage, and a connection member which connects the inner member to the outer member.

A developing apparatus includes, to process substrates each coated with a resist and processed by an exposure process by a developing process, includes: plural developing units each provided with a substrate holding device for stably pouring a developer onto the substrate, a first developer nozzle to be used in common by the plural developing units to pour the developer in a band-shaped flow onto the substrates held by each of the substrate holding devices, a nozzle driving mechanism for carrying the first developer nozzle from one to another of the developing units, and moving the first developer nozzle with one end of a band-shaped area into which the developer is to be poured through the first developer nozzle directed toward the center of the substrate in each of the developing units such that a part in a surface of the substrate onto which the developer is poured moves from a central part toward a peripheral part or from a peripheral part toward a central part in the surface of the substrate to coat the surface of the substrate entirely with a developer film, and second developer nozzles for pouring the developer into a circular area or a band-shaped area of a short length shorter than that of the band-shaped area into which the first developer nozzle pours the developer in a central part of the substrate on which the developer film has been formed by the first developer nozzle. The nozzles are used selectively for developing steps.

A cleaning implement having a dirt bin for collecting debris from a floor. The dirt bin has at least one of a cleaning sheet and/or air filter attached thereto, as presented to the user. This arrangement allows for more efficient disposal of debris from the dirt bin and soiled components. The dirt bin may be emptied and reused or may be discarded after a single use.

A substrate conveyance device that conveys a substrate having been exposed with a pattern image via a projection optical system and a liquid, the substrate conveyance device comprising: a liquid detector that detects the liquid adhering on the substrate.

A coating/developing device includes a processing block having a plurality of coating unit blocks stacked and a developing unit block stacked on the coating unit blocks. Each of the unit blocks is provided with a liquid processing unit for coating a liquid chemical on a substrate, a heating unit for heating the substrate, a cooling unit for cooling the substrate and a transfer unit for transferring the substrate between the units. The liquid processing unit is provided with a coating unit for coating a resist liquid on the substrate, a first bottom antireflection coating (BARC) forming unit for coating a liquid chemical for a BARC on the substrate before the resist liquid is coated thereon, and a second BARC forming unit for coating a liquid chemical for the BARC on the substrate after the resist liquid is coated thereon.

An oral-care device with a power cleaning head configured to dispense an oral-care cleaning solution is disclosed. The power cleaning head comprises squeegees and bristles and one or more apertures for dispensing the oral-care solution. Preferably, the squeegee and bristle are configured to rotate, oscillate, vibrate or otherwise move while dispensing the oral-care solution through the one or more apertures.

A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a washing/development processing block, and an interface block. An exposure device is arranged adjacent to the interface block. A resist film is formed on a substrate by the resist film processing block. The substrate is washed and dried by the washing processing unit in the washing/development processing block before the substrate is subjected to the exposure processing by the exposure device.

A cleaning robot including a main body, a pad mounted below the main body to implement cleaning, and a drive assembly to apply drive power to the pad. The drive assembly moves the main body to a target position by adjusting the drive power. The cleaning robot may move at a high speed owing to omni-directional movement thereof without rotation of the main body. Further, the cleaning robot may imitate a human wiping pattern, thus achieving enhanced cleaning efficiency. Furthermore, various cleaning patterns including a straight pattern and a curvilinear pattern may be applied to the cleaning robot.

When a host issues an analysis order that specifically instructs the analytical contents to an analytical apparatus (step 401), the analytical apparatus collects two types of measurement and/or inspection results from a measurement and/or inspection instrument (steps 403 to 409), and in step 411, the analytical apparatus analyzes the measurement and/or inspection results and optimizes processing conditions of a series of processes related to wafer W. In step 411, data related to a processing state of a processing apparatus is acquired from the processing apparatus as needed. In step 413, the measurement and/or inspection results and the optimization results are accumulated in a database, and the optimization results are transmitted to various processing apparatuses (including the measurement and/or inspection instrument). After that, the analytical apparatus sends a processing end notice to the host (step 417).

A system, method and apparatus for cleaning a substrate edge includes a substrate supporting device for substantially supporting a substrate in a selected plane. The substrate has a circular shape, a circumferential edge, a front side and a back side. The edge has a bevel shaped cross-section. The substrate edge cleaning apparatus also includes a first edge cleaning roller that has an open curved scrubbing surface in contact with at least part of a first portion the edge of the substrate. An interaction of the first edge cleaning roller with the part of the first portion can also be adjusted dynamically.

A coating and developing apparatus comprises a process block which forms a resist film on a wafer, then transfers the wafer to an exposure apparatus, and performs a developing process on the wafer after exposure, and an interface transfer mechanism provided between the process block and the exposure apparatus. The process block includes unit blocks for coating-film formation and unit blocks for development laid out in a stacked manner. When an abnormality occurs in the interface transfer mechanism, an ordinary process in the unit block for coating-film formation is performed on those substrates which are present in that unit block for coating-film formation, after which processed wafers are retreated to a retaining unit and transfer of any wafer into the unit block for coating-film formation is inhibited.

An improvement is disclosed in a brush cleaning apparatus for cleaning a major surface of a wafer and including wafer guide wheels for transporting the wafer. The improvement includes a polish pad material disposed on a circumference of the guide wheels. The polish pad material is a material used in chemical-mechanical polishing of the wafer. The polish pad material contacts an edge portion of the wafer during cleaning thereof, thereby removing contaminants from the edge portion of the wafer, so that edge cleaning is performed in situ in addition to the brush cleaning of the major surface of the wafer.

A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to the interface block. The interface block comprises washing processing units and an interface transport mechanism. Before a substrate is subjected to exposure processing by the exposure device, the substrate is transported to a washing processing unit by the interface transport mechanism. The substrate is washed and dried by the washing processing unit.