994results about "Liquid processing" patented technology

A robotic surface treating device that can perform carpet sweeping, hard-surface dry sweeping / wiping, and hard-surface sweeping / mopping is disclosed. The robotic surface treating device includes a sweeper brush, a dust bin for collecting debris from the brush, a reel-to-reel sheet of cleaning material, and a fluid delivery system for delivering fluid from a fluid reservoir onto the sheet of cleaning material and / or onto the surface to be treated. The dust bin, reel-to-reel sheet of cleaning material, and the fluid reservoir are separately installed from the top of the device, and may be separately removed for replacement.

A photoresist coating and developing apparatus 1 includes a photoresist film forming unit that forms a photoresist film on a substrate; a heat treatment unit that heats the substrate on which the photoresist film is formed by the photoresist film forming unit; a cooling unit that cools the substrate, on which the photoresist film is formed and which is heated by the heat treatment unit, to normal temperature; a heating unit 61 that heats the substrate, which is cooled to normal temperature by the cooling unit, to a predetermined temperature; a load-lock chamber L1 that unloads the substrate under depressurized atmosphere to expose the photoresist film; and a transfer device 62 that transfers the substrate from the heating unit 61 to the load-lock chamber L1.

A battery-powered, upright vacuum sweeper comprises a base assembly and a handle pivotably attached thereto. The base assembly comprises a vacuum fan assembly fluidly communicating with an inlet for vacuuming dust and the debris particles from a surface into a removable reservoir. A rotating roller brush attached to the base assembly sweeps the particles into the inlet. A dust pad assembly comprises a disposable dust cloth extending over a portion of the base assembly in contact with the surface to be cleaned for removing dust particles which are not removed by vacuuming.

Multi-directional wiping elements are disclosed. The wiping elements comprise intersecting squeegee segments that provide top wiping squeegee edges and side wiping squeegee edges. Devices utilizing the multi-directional wiping elements of the present invention can include bristles that are configured to simultaneously wipe a working surface with the wiping elements. In accordance with the embodiments of the invention, the multi-directional wiping elements are utilized in a toothbrush cleaning head that is configured to be operated manually or, alternatively, is motorized and is configured to rotate, oscillate, vibrate and / or move according to a combination thereof.

An interface unit for transferring objects, such as substrates, is presented. The interface unit includes a first object transfer path to transfer objects between a track configured to process objects and a lithographic exposure unit configured to expose objects, wherein the interface unit is also provided with a second object transfer path extending through a closable transfer opening to an external space to transfer objects between the external space and the lithographic exposure unit. Furthermore, the invention relates to a lithographic apparatus provided with a lithographic exposure unit and an interface unit according to the invention.

A robotic surface treating device that can perform carpet sweeping, hard-surface dry sweeping / wiping, and hard-surface sweeping / mopping is disclosed. The robotic surface treating device includes a sweeper brush, a dust bin for collecting debris from the brush, a reel-to-reel sheet of cleaning material, and a fluid delivery system for delivering fluid from a fluid reservoir onto the sheet of cleaning material and / or onto the surface to be treated. The dust bin, reel-to-reel sheet of cleaning material, and the fluid reservoir are separately installed from the top of the device, and may be separately removed for replacement.

Embodiments of an automated camera cleaning system are provided. In one embodiment, the automated camera cleaning system includes an optical path, an optically-transmissive lens shield through which the optical path extends, a housing in which the optically-transmissive lens shield is at least partially disposed, and a motor coupled to the lens shield. When energized, the motor moves the optically-transmissive lens shield relative to the housing to vary the region of the optically-transmissive lens shield positioned in the optical path.

A floor cleaner is provided for cleaning a floor, where the floor cleaner has a front and a rear and includes: a sweeper for sweeping the floor; a scrubber, connected to the sweeper and located in the rear of the sweeper, for wetting and cleaning the floor; and a burnisher, connected to the scrubber and located in the rear of the scrubber, for burnishing the floor.

The brushhead attachment system includes a hub member which is secured to a drive shaft of a personal care appliance for oscillating action. The hub member includes a number of spaced locking elements in the form of protrusions around the periphery thereof. An annular outer brushhead portion with a first group of bristles includes a plurality of spaced grooves in the outer surface thereof which mate with extending pins in the body of the appliance for insertion and removal of the outer brushhead portion. An inner brushhead portion is configured to fit within the annular opening of the outer brushhead portion and includes a plurality of depending legs which mate with the protrusions on the drive member for resulting oscillating action of the inner brushhead portion when the drive member oscillates, at least some of the legs having latch elements which fit onto an interior lip of the outer brushhead portion in such a manner that the inner and outer brushhead portions may be installed and removed as a unit, while permitting the inner brushhead portion to be freely rotatable relative to the outer brushhead portion.

A device with two or more regions configured to clean or treat a working surface is disclosed. Preferably, the device is an oral-care device with a power cleaning head. The power cleaning head comprises two or more regions, wherein at least one of the regions is configured to move and wherein at least one of the regions comprises a squeegee element. Preferably, the regions are configured to independently rotate, oscillate, vibrate or otherwise move while cleaning teeth and gums and can each include bristles, nodules, squeegee elements, or any combination thereof.

A system includes a UV light source and an optical medium coupled to receive UV light from the UV light source. The optical medium is configured to emit UV light proximate to a surface from which biofouling is to be removed once the biofouling has adhered to the protected surface. A method corresponds to the system.

An upright bare floor cleaner with a handle assembly pivotally mounted to a base assembly. The base assembly has a sweeper that includes a rotatably driven brush adapted to sweep dust and dirt particles into a removable dirt receptacle. The handle includes a water tank to store a quantity of water and a fluid distribution system that includes a heater and a spray nozzle. Steam is generated by the heater and is distributed to a removable mop cloth that applies the steam to the surface to be cleaned.

An optical connector clearing tool (1) includes a holder (2), cleaner (5), and cap (6). The holder (2) includes, e.g., a cylindrical slider (10), a cylindrical body (12) installed to be rotatable and movable in the axial direction with respect to the slider (10), and a slider return spring (13) which biases the body (12) forward to return the slider (10) to the initial position. The slider (10) has a pair of elastic pieces (16) having guide projections (17). In the outer circumferential surface of the body (12), spiral grooves (25, 26) with which the guide projections (17) engage are formed within the angular range of 360°. When the slider (10) moves forward, the body (12) rotates by the cam action of the guide projections (17) and spiral grooves (25, 26). The cleaner (5) includes, e.g., a cleaning thread (41) accommodated in a rotary pod (40), a supply reel (42), a take-up reel (43), and a cleaning pin (44), and is connected to the body (12). The rotary pod (40) and cleaning pin (44) rotate together with the body (12), and the cleaning thread (41) supplied to the distal end face of the cleaning pin (44) cleans the connection surface of an optical connector. The cleaning thread (41) is supplied from the supply reel (42) and taken up to the take-up reel (43) by being given tension by the rotation of the cleaner (5).

An apparatus and method are provided for developing photoresist patterns on electronic component substrates such as semiconductor wafers. The method and apparatus use a specially defined developer composition in sequence with a specially defined rinse composition to develop an exposed photoresist pattern and then to rinse the developed pattern. Both the developer composition and rinse composition contain an anionic surfactant and, when the solutions are used in sequence, have been found to provide a resist pattern which avoids pattern collapse even when small features such as line widths less than 150 nm with aspect ratios of greater than about 3 are formed. It is preferred to use a puddle developing and puddle rinsing process to develop and rinse the exposed wafer. Preferred anionic surfactants are ammonium perfluoroalkyl sulfonate and ammonium perfluoroalkyl carboxylate.

An induction liquid pump includes a power unit and a circulation unit that are oppositely mountable to a tank with a plurality of fixation units. The liquid pump power unit includes a power induction unit to produce a variable magnetic field. The submersible liquid pump circulation unit includes an impeller unit to agitate or induce liquid flow in response to the variable magnetic field. A magnetic scrubber includes a power unit and a pad unit. The scrubber power unit produces a variable magnetic field in response to supplied power. When the scrubber power unit is held against a first surface of a tank, the scrubber pad unit is held oppositely against a second surface of the tank. The scrubber pad unit moves in response to the variable magnetic field to scrub the second surface of the tank.

An upright bare floor cleaner with a handle assembly pivotally mounted to a base assembly. The base assembly has a sweeper that includes a rotatably driven brush adapted to sweep dust and dirt particles into a removable dirt receptacle. The handle includes a water tank to store a quantity of water and a fluid distribution system that includes a heater and a spray nozzle. Steam is generated by the heater and is distributed to a removable mop cloth that applies the steam to the surface to be cleaned.

A cleaning apparatus includes a housing to be moved along a surface to be cleaned. Within the housing, a cleaning ribbon is disposed between a supply reel and a take-up reel. A portion of the cleaning ribbon is held parallel to, and in substantial contact with, the surface to be cleaned, for attracting and retaining smaller debris. Another portion of the cleaning ribbon is configured to create a particle trap. A rotatable brush, also disposed within the housing, sweeps larger debris into the particle trap. The supply reel, the take-up reel, the cleaning ribbon, and / or the rotatable brush are alternatively included in a cartridge which is detachably secured within the housing.

A floor scrubbing apparatus that is particularly well suited to scrubbing carpet materials is disclosed. The floor scrubbing apparatus is manually operated and includes a drive roller coupled to a scrub roller. In one embodiment, the drive roller is coupled to the scrub roller using a gear arrangement that causes the scrub roller to rotate faster than the drive roller. If desired, the apparatus can include a cleaning fluid dispensing system. For instance, the apparatus can include one or more nozzles that dispense a cleaning fluid onto a carpet material as the material is being cleaned.

A cleaning head for use with a floor cleaning machine comprises first and second cleaning tools, at least one motor and a cleaning tool support. The at least one motor is configured to respectively drive rotation of the first and second cleaning tools about first and second horizontal axes. The first and second cleaning tools each have an exterior cleaning surface configured to engage the floor during floor cleaning operations. The cleaning tool support is configured to support the first and second cleaning tools for movement of the first and second horizontal axes relative to each other in a plane that is transverse to the first and second horizontal axes. Another embodiment of the invention is directed to a floor cleaning machine that includes embodiments of the cleaning head.

A cleaning implement is provided for cleaning surfaces with a cleaning substrate. The cleaning implement includes a handle connected via a universal joint to a mop head. The mop head includes a bumper pad, which is made of a deformable and nonabsorbent material. The bumper pad can be deformed in the Z direction and within the X-Y plane. The cleaning implement can also include a motor for causing a portion of the mop head to move relative to the handle.

A compact, hand held carpet and upholstery extractor nozzle is provided having an air turbine and a compact gear reduction operatively connected to and driven by said turbine. At least a pair of scrub modules are interchangeably attachable to said gear reduction. A first scrub modules includes at least a pair of vertical axis scrub brushes for cleaning upholstery, carpeting and the like. When said first scrub module is attached to said gear reduction, the scrub brushes are operatively connected to and driven by said gear reduction. A second scrub module includes a single vertical axis scrub pad that is driven by said gear reduction for scouring hard surfaces, such as tiles, tubs, counter tops, etc.

A cleaning substrate for use in the cleaning operation for a substrate stage in an exposure unit compatible with immersion exposure and a dummy substrate for use during the adjustment of an exposure position of a pattern image in the exposure unit are held in a cleaning substrate housing part and a dummy substrate housing part, respectively, which are provided in a substrate processing apparatus. For the cleaning operation for the substrate stage or an alignment operation in the exposure unit, the cleaning substrate or the dummy substrate is transferred from the substrate processing apparatus to the exposure unit. A back surface cleaning process on the cleaning substrate or the dummy substrate is performed in a back surface cleaning unit of the substrate processing apparatus immediately before or immediately after the cleaning operation for the substrate stage or the alignment operation.

Provided is a coating and developing apparatus composed of an assembly of plural unit blocks. A first unit-block stack and a second unit-block stack are arranged at different positions with respect to front-and-rear direction. Unit blocks for development, each of which comprises plural processing units including a developing unit that performs developing process after exposure and a transfer device that transfers a substrate among the processing units, are arranged at the lowermost level. Unit blocks for application, or coating, each of which comprises plural processing units including a coating unit that performs application process before exposure and a transfer device that transfers a substrate among the processing units, are arranged above the unit blocks for development. Unit blocks for application are arranged in both the first and second unit-block stacks. Unit blocks for application which a wafer goes through are determined depending on the layering positional relationship between an antireflective film and a resist film. An exposed wafer goes only through the unit block for development without going through any one of the unit blocks for application.

An apparatus for use in processing a substrate includes a brush enclosure extending over a length. The brush enclosure is configured to be disposed over a surface of the substrate and has an open region that is configured to be disposed in proximity to the substrate. The open region extends over the length of the brush enclosure and enables foam from within the brush enclosure to contact the surface of the substrate. A substrate cleaning system and method for cleaning a substrate are also described.

A floor cleaning machine is provided with at least two movable squeegees to provide coverage of the liquid applied to the floor in a path with the squeegees extending beyond the outer perimeter sides of the liquid path both during straight ahead movement and during turning maneuvers. The squeegee assemblies are carried by a chassis. A floor scrubbing device is provided to apply liquid to the floor and to mix dirt on the floor with the applied liquid. A liquid pickup device is also provided to remove the applied liquid from the floor at a position adjacent to each of the squeegee assemblies.

An autonomous floor cleaning robot includes a transport drive and control system arranged for autonomous movement of the robot over a floor for performing cleaning operations. The robot chassis carries a first cleaning zone comprising cleaning elements arranged to suction loose particulates up from the cleaning surface and a second cleaning zone comprising cleaning elements arraigned to apply a cleaning fluid onto the surface and to thereafter collect the cleaning fluid up from the surface after it has been used to clean the surface. The robot chassis carries a supply of cleaning fluid and a waste container for storing waste materials collected up from the cleaning surface.

A cleaning tool including one or more of the following features in various embodiments: a mop head that pivots with respect to a handle assembly to dispose a motorized power head between a mopping position and a scrubbing position; a nozzle assembly connected to the handle assembly and in fluid communication with a liquid reservoir, the liquid disposed within the liquid reservoir ejected from the nozzle assembly in response to trigger control by an operator; an absorbent or soil attracting mopping cloth attached to a cartridge support; a mopping cartridge ejection member slidably disposed within the mopping platform and manipulated to eject the mopping cartridge from the mopping platform; and a mopping cloth ejection member disposed on a top surface of the mopping platform and manipulated to eject the mopping cloth from the mopping platform.