This invention discloses a
laser post-
processing device and method for large-aperture optical
dielectric thin film nodule defects, relating to the field of
laser technology. The
laser post-
processing device for large-aperture optical
dielectric thin film nodule defects includes: an
ultraviolet pumped laser, a focusing lens, a
femtosecond laser, a scanning
galvanometer, a scanning field mirror, a centrally located aperture mirror, an observation camera, an electrically driven displacement platform, and a control computer. The laser post-
processing device and method for large-aperture optical
dielectric thin film nodule defects provided by this invention utilize the characteristics of small focal spot and small heat-affected zone of
femtosecond lasers, and with the assistance of an optical camera, accurately remove nodule defects in localized areas in real time. Furthermore, it can automatically identify and accurately locate nodule defects, achieving rapid removal of nodule defects and reducing the
impact of the post-processing process on the surrounding normal film layer. Simultaneously, it reduces manual intervention, improves the degree of
automation, and effectively improves the post-processing efficiency of optical dielectric thin film nodule defects.