843 results about "Ultrapure water" patented technology

The invention provides a photo-thermal evaporation material based on black titanium dioxide as well as a preparation method and application of the photo-thermal evaporation material. The preparation method comprises the following steps: mixing urea, absolute ethyl alcohol and tetrabutyl titanate into a solution A, mixing absolute ethyl alcohol, ultrapure water and hydrochloric acid into a solution B, dropwise adding the solution B into the solution A, mixing to form a white colloid, heating in a water bath, drying, and calcining in a nitrogen atmosphere to obtain black titanium dioxide powder; the preparation method comprises the following steps: fully mixing a certain amount of black titanium dioxide, sodium alginate and ultrapure water to form a uniform dispersion liquid, dipping the pretreated polyurethane sponge in the dispersion liquid, and crosslinking with a calcium chloride solution to prepare the photo-thermal evaporation material of the black titanium dioxide-calcium alginate composite hydrogel. The photo-thermal evaporation material breaks through the photo-thermal application bottleneck of traditional titanium dioxide, has excellent evaporation rate and seawater desalination performance, and can effectively remove various printing and dyeing wastewater to obtain clean water.

The invention discloses a method for enriching light metal ions in a pore channel based on carbon nanofiber / carbon fiber nano confinement, and belongs to the technical field of sample pretreatment, and the method comprises the following steps: S1, preparing a carbon nanofiber / carbon fiber confinement material; and S2, putting the carbon nanofiber / carbon fiber confinement material obtained in S1 into a light metal ion solution, and stirring. According to the method for enriching the light metal ions in the pore channel based on the carbon nanofiber / carbon fiber nano confinement, the carbon nanofiber / carbon fiber is used as a confinement fluid carrier, ultrapure water, methanol or n-hexane is used as an extracting agent, a chelating agent does not need to be introduced, the method is green and environmentally friendly, the mass transfer rate is increased, and the method is suitable for large-scale industrial production. Therefore, high enrichment of light metal ions in water is realized.

The invention discloses a preparation method of an artificial cell coated with a macrophage membrane, and belongs to the technical field of artificial cell preparation. The preparation method comprises the following steps: dissolving poly (diallyldimethylammonium chloride) and sulfobutyl-beta-cyclodextrin in ultrapure water, and mixing an aqueous solution of the poly (diallyldimethylammonium chloride) and an aqueous solution of the sulfobutyl-beta-cyclodextrin to obtain a PDDA / SBE-beta-CD condensation liquid droplet solution; and mixing the macrophage membrane suspension and the PDDA / SBE-beta-CD condensed fluid drops in an equal mass ratio, and realizing in-situ coating of the macrophage membrane by adopting an ultrasonic coating technology to obtain the artificial cell coated with the macrophage membrane. The PDDA / SBE-beta-CD condensation liquid droplet constructed by the invention has good stability under the conditions of physiological salt concentration and pH and at 37 DEG C; the artificial cell coated with the macrophage membrane is prepared by mixing with the macrophage membrane suspension, and the macrophage membrane serving as a shell not only can prevent aggregate aggregation, but also can improve the structural stability and biocompatibility.

The invention discloses bi-crosslinking self-reinforced hydrogel based on endogenous glucose in-situ initiation as well as a preparation method and application of the bi-crosslinking self-reinforced hydrogel, and relates to the technical field of biomedical materials. The double-crosslinking self-enhanced hydrogel is prepared from the following components in concentration: 1 to 3 weight percent of hyaluronic acid-tyramine, 0.8 to 1.2 weight percent of sodium alginate, 1 to 100 mmol / L of calcium carbonate, 0.0001 to 10 U / mL of horse radish peroxidase, 20 to 40 U / mL of glucose oxidase and the balance of ultrapure water. The invention also discloses an application of the double-crosslinking self-reinforced hydrogel in preparation of a filling and repairing product for soft tissue defects. The hydrogel disclosed by the invention can be filled in a tissue defect part in an injection manner, glucose in body fluid is utilized to initiate crosslinking in situ to form the hydrogel with excellent mechanical properties and long-term stability, and meanwhile, the hydrogel is good in biocompatibility and relatively high in application value.

The invention discloses a steel cylinder cleaning method. The method comprises the steps that ethyl alcohol is injected into a steel cylinder; rolling the steel cylinder filled with the ethanol for multiple times to rinse the inner wall of the steel cylinder, and then emptying the ethanol in the steel cylinder; injecting ultrapure water into the steel cylinder cleaned by the ethanol; rolling the steel cylinder filled with the ultrapure water for multiple times, rinsing the inner wall of the steel cylinder, and then emptying the ultrapure water in the steel cylinder; nitric acid is injected into the steel cylinder cleaned by the ultrapure water, metal ions in the steel cylinder are dissolved, and then the nitric acid in the steel cylinder is emptied; injecting ultrapure water into the steel cylinder to rinse the steel cylinder, and emptying the ultrapure water in the steel cylinder; taking the discharged ultrapure water as a sample, and detecting the content of residual metal ions in the steel cylinder; according to the obtained metal ion content, whether the steel cylinder meets the cleanliness requirement or not is judged, if the cleanliness requirement is met, a small amount of nitric acid is added into the steel cylinder, sampling detection is conducted after the steel cylinder is moistened and washed, and if the test result is consistent with the previous metal ion content, the steel cylinder is clean. According to the steel cylinder cleaning method, external source introduction is avoided while metal ion impurities in the steel cylinder are treated.

The invention discloses a high-water-permeability anti-pollution reverse osmosis membrane and a preparation method thereof, and belongs to the technical field of water treatment membranes. The reverse osmosis membrane comprises a porous support layer, a polyamide separation layer and a composite anti-pollution functional layer, and the composite anti-pollution functional layer is composed of a polyvinyl alcohol matrix and a nanoscale water channel material uniformly dispersed in the polyvinyl alcohol matrix. Comprising the steps of coating liquid preparation, base membrane pretreatment, composite functional layer construction, cross-linking and curing, a rapid transmission path is provided for water molecules by introducing a nanoscale water channel material, the water flux of the reverse osmosis membrane is greatly improved on the premise that the excellent pollution resistance of a PVA coating and the high selectivity of the membrane are kept, and the service life of the reverse osmosis membrane is prolonged. The technical problem that the membrane flux is severely reduced due to a traditional PVA coating is solved, and the method has wide application prospects in the fields of seawater desalination, brackish water desalination, ultrapure water preparation, wastewater reuse and the like.

The application discloses a wafer cleaning device based on ultrasonic cleaning and relates to the technical field of wafer cleaning devices. The wafer cleaning device comprises a cleaning machine outer tank body, a wafer cleaning glass tank, an ultrasonic cleaning tank, an ultrasonic device, a bottom plate, a cover, a cleaning tank track, a shunt water supply device and a bubble removing uniform vibration device. The application effectively conducts ultrasonic vibration to the wafer cleaning glass tank by taking ultrapure water as a medium, drives the strong acid solution in the tank to uniformly vibrate and realizes efficient cleaning of the wafer. The oblique water replenishment forms high turbulent pulsation and local shear stress at the junction with the original liquid, shears large bubbles into tiny bubbles, prevents bubble aggregation, improves liquid purity and ultrasonic cleaning efficiency. The centrifugal separation effect of the cyclone connecting seat and the annular cyclone sheet makes the bubbles in the water flow concentrate at the center position, the outer ultrapure water is quickly discharged, the bubbles are efficiently absorbed after contacting the hydrophobic porous membrane, and the bubble removing effect is significantly improved.

The invention discloses an ultrasonic controllable multifunctional microneedle patch as well as a preparation method and application thereof, and belongs to the technical field of biological materials. The preparation method comprises the following steps: preparing crystalline CoW-LDH nanosheets from Co (NO3) 2.6 H2O, Na2WO4. 2H2O and NaOH, dispersing the crystalline CoW-LDH nanosheets in PBS (Phosphate Buffer Solution), centrifuging and collecting the crystalline CoW-LDH nanosheets, and re-dispersing the crystalline CoW-LDH nanosheets in ultrapure water to obtain amorphous CoW-LDH nanosheets; adding PEG (Polyethylene Glycol), ultrasonically dispersing, stirring at room temperature, centrifuging, collecting and centrifugally washing with ultrapure water to obtain a PEG modified amorphous CoW-LDH nanosheet; and adding microalgae and an amorphous CoW-LDH nanosheet modified by PEG (Polyethylene Glycol) to prepare the ultrasonic controllable multifunctional microneedle patch. The multifunctional microneedle patch disclosed by the invention is high in biological safety, can realize ultrasonic controllability, has a sonodynamic treatment effect and an oxygen supply effect, remarkably inhibits melanoma recurrence and remarkably promotes wound healing, and has a wide application prospect.

The invention particularly discloses a wafer heavy scratch three-dimensional shape repairing process based on a DFG 8560 single-axis accurate grinding mode, and aims to solve the problems that deep subsurface damage is introduced by rough grinding in a traditional double-stage grinding process, the machining efficiency is low, and material waste is serious. The process comprises the following steps: identifying a heavy scratch defect existing on the surface of a wafer through an automatic optical detection system; a ceramic bond diamond grinding wheel with the particle size of 8000 is adopted, uniaxial accurate grinding is conducted through ultrapure water cooling under the optimized parameters that the rotating speed of a main shaft is 1300-2300 rpm, the rotating speed of a workbench is 1785-2100 rpm and the rotating speed ratio is 0.6-1.3, and three-dimensional shape repairing is directly completed by skipping rough grinding; the rotating speed and pressure of grinding are dynamically regulated and controlled in three stages, the total time is less than or equal to 135 seconds, and the removal amount is 6-12 microns. By the adoption of the technical scheme, the surface roughness Ra can be smaller than 0.5 nm, the subsurface damage layer can be smaller than 50 nm, the repair success rate is larger than 98.5%, the machining time is remarkably shortened by 35% or above, and the material removal amount is reduced by 40%.

The invention relates to the technical field of water electrolysis hydrogen production, and particularly discloses a proton exchange membrane water electrolysis hydrogen production device, which comprises an electrolytic tank, a hydrogen generator, a proton exchange membrane and a hydrogen generator, the pre-compression heat exchanger is used for carrying out primary cooling on the hydrogen generated by the electrolytic cell, and the pre-compression heat exchanger is sequentially connected with a compressor, a gas-liquid separator and a precision filter; the after-compression heat exchanger is used for cooling the compressed hydrogen again and is connected with a hydrogen storage tank; raw material water used for electrolysis of the electrolytic cell sequentially passes through the after-compression heat exchanger and the before-compression heat exchanger to exchange heat with hydrogen, so that the problems of large compressor operation load, low energy efficiency and serious system heat energy waste of traditional electrolytic cell hydrogen production equipment are solved.

The invention provides a method for detecting the content of elements in carbonized resin. The method comprises the steps of resin pretreatment, instrument tuning, standard curve drawing, sample detection and the like. The method comprises the following steps: firstly, transferring a certain amount of dry carbonized resin into a cleaned PFA digestion tank, adding high-purity mixed acid, setting a segmented heating program to start microwave digestion, cooling to room temperature after digestion is completed, adding a proper amount of ultrapure water to dilute a digestion solution, and adding an internal standard solution and a chemical additive to obtain a to-be-detected sample solution; preparing a multi-element mixed standard solution according to the sample element types, adding the standard solution into the sample solution, and measuring the signal intensity ratio R of the to-be-measured element to the internal standard in each solution; and drawing a standard curve by taking the labeling concentration as a horizontal coordinate and R as a vertical coordinate, correcting the standard curve, and detecting the sample to be detected. The method is used for detecting the content of elements in carbonized resin, the carbonized resin is digested through microwaves, and the obtained solution is clear and can be directly subjected to ICP-OES (Inductively Coupled Plasma-Optical Emission Spectrometer) detection.

The invention discloses a pHi probe based on living cell incubation as well as a preparation method and application of the pHi probe. The preparation method comprises the following steps: drawing a capillary tube into a nano suction tube with the inner diameter of 120 nm; inserting the prepared nano-pipette into cells, incubating for a period of time, then washing the nano-pipette with ultrapure water, then putting the nano-pipette into a phosphate buffer solution (PBS) with phosphate radicals removed, and preserving, so as to obtain the pHi probe based on living cell incubation after the preservation is finished. According to the preparation method of the pHi probe disclosed by the invention, the pHi probe is prepared by inserting the nano suction tube into the cell, and the pHi probe can be prepared by inserting the nano suction tube into the cell and incubating for 60 minutes. The preparation method is simple, efficient and low in dependence on equipment, the prepared nanopipette pHi probe is sensitive to pH response, and the dynamic change of single cell pHi can be monitored in real time.

The invention discloses an industrial control system and method for an ultrapure water treatment device, and the method comprises the steps: carrying out the deep excavation and normalization calculation of parameters, such as original pressure, flow, temperature, conductivity and the like, collected in the operation process of an ultrafiltration and reverse osmosis membrane; golden features (such as normalized water yield and desalination rate) reflecting the real performance state of consumables can be effectively extracted, and then the normalized time sequence data without environmental interference are further input into an advanced decline trend prediction model, so that the remaining effective life of the reverse osmosis membrane is assessed and predicted prospectively, and the real performance state of the consumables is predicted. And the control normal form conversion from passive response to active early warning is realized. In this way, the system can get rid of external interference and accurately recognize progressive performance degradation of the ultrafiltration membrane and the RO membrane, and therefore the intelligent operation and maintenance level of the ultrapure water treatment device is remarkably improved.

The invention relates to the technical field of etching solutions, and discloses a molybdenum-aluminum-niobium etching solution for a TFT-LCD (Thin Film Transistor Liquid Crystal Display), which comprises the following components in percentage by mass: 50 to 60 percent of phosphoric acid, 3 to 8 percent of nitric acid, 5 to 10 percent of glacial acetic acid, 1 to 5 percent of aluminum nitrate, 0.1 to 0.5 percent of diphenyl thiourea, 1 to 5 percent of etidronic acid, 3.0 to 5.0 percent of sodium hexametaphosphate, 0.1 to 0.2 percent of fatty alcohol-polyoxyethylene ether, 0.5 to 0.8 percent of amino trimethylene phosphonic acid and the balance of ultrapure water. The invention further discloses a preparation method of the molybdenum-aluminum-niobium etching solution. According to the invention, a phosphorus nitrate vinegar system, a composite additive, a novel corrosion inhibitor, a metal ion chelating agent and a surfactant matched with the etching liquid are adopted, so that the molybdenum-aluminum-niobium multi-layer composite metal film can be simultaneously etched at one time; the etching solution has the advantages of being uniform in etching, capable of inhibiting Mo / Nb etching, high in selectivity, controllable in etching rate, free of residues, long in service life, high in stability and the like.

The application relates to a preparation method of PdAg nanosponge and application of the PdAg nanosponge. A certain amount of ethylene glycol is configured into an ethylene glycol aqueous solution, a certain volume of the ethylene glycol aqueous solution is added into a reaction container, then a certain amount of a Pd precursor is quickly added into the ethylene glycol aqueous solution, a certain amount of an Ag precursor is further added, the reaction system is uniformly mixed through ultrasonic, and then the reaction system is statically reacted at 20-60 DEG C for 0.5-3.0 h. After the reaction is completed, the reaction product is centrifuged, the obtained precipitate after centrifugation is washed through ultrapure water, and the PdAg nanosponge is obtained after drying. The application does not need to use a surfactant and a template agent, does not need to additionally add a reducing agent, does not need high temperature, high pressure, stirring and other reaction conditions, and can be statically reacted at 20-60 DEG C, so that the reaction condition is mild and the reaction step is simple. The prepared PdAg nanosponge has a 3D sponge-like structure and is a self-supporting catalyst, the purity is high, and the PdAg nanosponge has excellent catalytic activity and selectivity for selective hydrogenation reaction of furfural.

The present application relates to the technical fields of iodine removal of crude salt, and discloses a high-efficiency and energy-saving iodine removal device for crude salt, which comprises a salt dissolving pool assembly, a reagent tank assembly, a reaction tank assembly, a combustion tank assembly and an adsorption tower assembly, mainly solves the problems of low iodine removal efficiency and high energy consumption in the prior art, by injecting fresh brine into the salt dissolving pool, driving the ultrapure water metering pump to dilute, opening the stirring motor to disturb and pre-oxidize the brine, driving the hydrochloric acid metering pump to adjust the pH of the brine, driving the water inlet pump to inject the brine into the reaction tank, adding hydrogen peroxide by the hydrogen peroxide metering pump, opening the ultrasonic vibrator and the aeration ring, and through the synergistic effect of cavitation and micro-bubble aeration, the oxidation reaction is strengthened, the oxygen generated by the reaction is transported to the combustion chamber to mix and burn with hydrogen, the heat energy generated by the combustion is converted into electricity by the thermoelectric generator to supply power to the ultrasonic vibrator, the ultrapure water in the cold liquid cavity absorbs the waste heat to warm up and preheat the salt dissolving, and after the oxidation reaction is completed, the brine is collected into the adsorption tower assembly for adsorption, so that the content of iodine in the crude salt is efficiently removed.

This invention relates to the field of inorganic non-metallic material purification technology, and particularly to a purification method for deep removal of difficult-to-remove impurities from quartz sand. The technical solution includes the following steps: quartz ore is electrically melted, cooled, and then crushed to obtain amorphous fused quartz sand; the amorphous fused quartz sand is magnetically separated, then calcined, and subsequently quenched in ultrapure water; the water-quenched quartz sand is pretreated with dilute hydrochloric acid solution, dried, and then pretreated to obtain pretreated quartz sand; the pretreated quartz sand is then heated and acid-leached with a mixed acid solution that does not contain hydrofluoric acid. This invention, under green conditions that completely eliminate hydrofluoric acid, utilizes the amorphous fused quartz method to eliminate the locking effect of the quartz lattice on impurities, achieving efficient and deep removal of difficult-to-remove impurities such as aluminum, lithium, titanium, calcium, and magnesium, stably obtaining ultra-high purity quartz materials with a purity of 5N or higher, and the process conditions are mild and compatible with existing industrial equipment.

The application discloses a preparation method of a cobalt-based biochar composite material and application of the cobalt-based biochar composite material in persulfate oxidation, and comprises the following operation steps: a proper amount of sodium alginate is weighed, calcined, activated and dried to obtain a derived original biochar SA; after the SA is used as an adsorbent to adsorb cobalt ions, drying is performed to obtain a cobalt-containing biochar CoSA; the CoSA is uniformly ground with urea, pyrolysis is performed, washing, filtering and drying are performed, and vacuum drying is performed to obtain a cobalt-based biochar composite material CoNBC based on sodium alginate; and the activation method is that the SA is mixed with potassium hydroxide, ground in a jade mortar for 5-30 min, and then activated in ultrapure water for 1-8 h.The raw material used in the application is environment-friendly, the preparation process is simple, the cobalt-based biochar composite material obtained has excellent catalytic capacity for persulfate, can effectively control the precipitation of transition metals, reduces pollution, and greatly improves the utilization rate of metal elements.

The application discloses a kind of compositions, reagents and its detection method for high-throughput gene sequencing, belong to gene sequencing technical field, the composition includes Tris-HCl buffer 80-120 parts, potassium chloride 40-60 parts, ammonium sulfate 10-20 parts, magnesium chloride 15-25 parts, dNTPs mixed solution 30-50 parts, heat-stable DNA polymerase mutant 8-15 parts, PCR promoter complex 5-12 parts, modified iridium quinoline ketone complex 1-5 parts, glycerol 150-250 parts, Tween-20 1-3 parts, EDTA disodium salt 0.5-2 parts and nuclease-free ultrapure water, by introducing the modified iridium quinoline ketone complex of innovation, effectively solve the technical problems of low amplification efficiency, poor multiplex PCR reaction uniformity and high non-specific amplification background for high GC content, complex secondary structure genomic template, significantly improve the specificity of amplification, uniformity and the quality and reliability of final sequencing data.

This invention relates to the field of functional materials technology, and discloses a ruthenium-based catalyst for the acidic oxygen evolution reaction (OER), its preparation method, and its application. The preparation method includes dissolving 100-200 parts by mass of RuCl3·H2O and 1-40 parts by mass of VCl3 in 20-60 parts by volume of anhydrous methanol, stirring to obtain a mixed solution; slowly adding hydrazine hydrate dropwise to the mixed solution, continuing stirring, centrifuging and filtering; washing alternately with anhydrous methanol and ultrapure water, freeze-drying, and heat-treating at 300-500℃ for 1-4 hours to obtain a V-doped RuO2 catalyst. The prepared V-RuO2 catalyst exhibits excellent initial activity and long-term durability under acidic conditions, providing a new solution for developing high-performance anode catalysts suitable for proton exchange membrane water electrolyzers.

The invention relates to a catalytic hydrolysis method of waste epoxy resin, which comprises the following steps: putting the waste epoxy resin into a reaction kettle, adding ultrapure water, adding a small amount of sodium dodecyl diphenyl ether disulfonate surfactant and a boron trifluoride acetic acid catalyst, and carrying out hydrolysis reaction to realize catalytic degradation of the epoxy resin. Degradation products can be converted into epoxy monomers and anhydride monomers, so that cyclic utilization is realized. Compared with the prior art, the degradation method provided by the invention is not only green and safe, but also high in degradation efficiency, solves the problem that the waste epoxy resin cannot be recycled, saves resources, meets the green development requirement, and has practical engineering application value.

The invention discloses a silicon carbide epitaxial wafer cleaning method. The silicon carbide epitaxial wafer cleaning method sequentially comprises the following steps: S1, pre-cleaning with ultrapure water and high-pressure N2 water-gas two-fluid; s2, transferring into an acid liquor tank filled with a mixed solution of hydrochloric acid, hydrofluoric acid and hydrogen peroxide for treatment; s3, transferring into No.1 alkali liquor filled with a mixed solution of ammonia water and hydrogen peroxide for treatment; s4, transferring into No.2 alkali liquor containing a mixed solution of ammonia water, hydrogen peroxide and an ampholytic surfactant for treatment, wherein the concentration of the ammonia water in the mixed solution in the step is lower than that of the ammonia water in the mixed solution in the step S3; s5, slowly pulling and drying with warm water; and S6, infrared heating and drying. Through cooperation of the steps, the cleaning effect of the silicon carbide epitaxial wafer is improved, and the number of residual metal ions and particles on the surface of the epitaxial wafer is effectively reduced.

The invention relates to an environment-friendly process method for improving the surface metal cleaning efficiency of a silicon wafer, and belongs to the technical field of semiconductor silicon wafer processing, and the process method comprises the following operation steps: S1, pre-cleaning and activation: placing the silicon wafer in a first cleaning tank, introducing ozone into ultrapure water, and processing in cooperation with low-frequency ultrasound; and S2, main cleaning and complexing: placing the silicon wafer subjected to pre-cleaning and activating treatment in a second cleaning tank, and treating the silicon wafer in a dilute citric acid solution in cooperation with high-frequency ultrasound. And S3, overflow rinsing: placing the silicon wafer subjected to main cleaning and complexing treatment in a third cleaning tank. And S4, drying: carrying out drying treatment on the silicon wafer subjected to the overflow rinsing treatment. Through the synergistic effect of physical stripping, chemical oxidation and complexing dissolution, under the condition that highly toxic chemicals such as hydrofluoric acid are not used, the cleanliness of metal on the surface of the silicon wafer reaches the ppt level, and the problems that traditional RCA cleaning is serious in environmental pollution and high in operation risk are effectively solved.

The present application relates to a kind of calibration methods for chemiluminescence silicate analyzer, comprising: S1, carries out single-point calibration, comprising: preparation specified concentration silicate standard solution, and obtain original signal value;S2, by multiple calibration stages to chemiluminescence instrument calibration;S1 includes: extract volume X1 of silicate standard solution, concentration C0 ug / L;Extract volume X2 of ultrapure water;Mixing forms specified concentration standard solution;Into chemiluminescence instrument and sequentially add reagent A and reagent B;After waiting, add reagent C, obtain measured voltage V1;S2 includes: first calibration stage, judge V1 whether in a certain range, if yes then enter second calibration stage;If not, adjust until meet;Second calibration stage, take no silicon water and obtain measured voltage V2;Take other concentration silicate standard solution and obtain measured voltage V3;Judge whether |V1-V3|-|V3-V2|≤Voltage fixed threshold value?If meet, then enter third calibration stage;If not, enter fourth calibration stage;Complete calibration.

The invention discloses an electrodeionization device for preparing ultrapure water, and relates to the technical field of water treatment.The electrodeionization device comprises a shell, an electrodeionization cavity, a cathode chamber, an anode chamber and a cation replacement module, a deionization module is arranged between the cation replacement module and the cathode chamber, and a concentrated water chamber is arranged between the deionization module and the cation replacement module; the deionization module comprises a first cation exchange membrane, a decation fresh water chamber, a first bipolar membrane, a deanion fresh water chamber and a first anion exchange membrane which are arranged in sequence, and the cation replacement module comprises a second cation exchange membrane, a cation replacement chamber, a third cation exchange membrane, an ion supply chamber and a second anion exchange membrane which are arranged in sequence; to-be-treated water sequentially flows through the cation replacement chamber, the deanion fresh water chamber and the decation fresh water chamber, and a strong acid and strong alkali salt solution is contained in the ion supply chamber. The device has the advantages of efficiently removing soluble acid gas, reducing the scaling risk of the concentrated water chamber and improving the resistivity of produced water.

An ultrapure water single-phase immersion cooling tank includes a container, a liquid sensing element, a liquid control valve, an oxygen content detector, an exhaust valve, a nitrogen gas filling valve, an electronic pressure gauge, an electronic gas pressure detector, and a pressure analysis module. The container accommodates a non-conductive liquid for immersing an electronic device. The liquid control valve and the liquid sensing element convey or discharge the non-conductive liquid. The oxygen content detector performs oxygen content detection in the space not immersed in the non-conductive liquid. The exhaust valve exhausts a gas mixture of oxygen and nitrogen in the space. The nitrogen gas filling valve conveys nitrogen gas into the space. The electronic pressure gauge, the electronic gas pressure detector, and the pressure analysis module obtain a precise pressure value inside the container to determine activation of the nitrogen gas filling valve.

This invention relates to the field of semiconductor cleaning technology and discloses a cleaning agent for semiconductor silicon wafers and its preparation method. This cleaning agent aims to solve the problem that traditional strong alkaline or phosphate-based wet electronic chemical cleaning agents easily corrode the silicon wafer surface, damage the crystal lattice, and thus affect electrical performance. This cleaning agent utilizes a multi-component synergistic effect: a surfactant system composed of alkyl glycosides and sophorolipids enhances particle wetting and stripping; lipase and silicon-pharmacoprotein precisely catalyze the removal of specific contaminants; sodium gluconate complexes metal ions; gelatin-polyacrylamide copolymer disperses contaminants to prevent secondary contamination; glycerol and trehalose maintain enzyme activity; and ultrapure water ensures the system meets the electronic-grade purity standards for wet electronic chemicals. Overall, it avoids strong alkaline corrosion, maintains the integrity of the silicon wafer lattice, and improves particle removal efficiency, meeting the high standards required for wet electronic chemical-based silicon wafer cleaning agents in advanced processes.

The invention provides semiconductor ultrapure water recycling wastewater treatment equipment and a treatment process thereof, and relates to the field of ultrapure water treatment.The semiconductor ultrapure water recycling wastewater treatment equipment comprises a raw water tank, a raw water pump arranged on the outer side of the raw water tank and a connecting pipe arranged on the raw water pump and the raw water tank; in order to solve the problems that in the prior art, when an activated carbon filter is used, blockage occurs along with time, an activated carbon filter element needs to be replaced at the moment, the filtering work is interrupted, and the wastewater treatment efficiency is affected, a cleaning mechanism is arranged, and activated carbon is driven to rotate through the cleaning mechanism; the activated carbon is backwashed by the wastewater filtered for the first time, so that the condition that the filtering work cannot be carried out due to the blockage of the activated carbon is reduced, and the wastewater treatment efficiency is improved; by arranging the cleaning mechanism, the problem that in the prior art, the efficiency is low due to single-time filtering of a filtering device is solved; and through the arrangement of the cleaning mechanism, the problem of waste caused by direct discharge of backwashing water in the prior art is solved.

The application belongs to the field of polysaccharide preparation technology, and discloses a method for extracting fucoidan from Undaria pinnatifida as raw material, which comprises the following steps: adding Undaria pinnatifida dry powder into ultrapure water, pre-treating by ultrasonic method, extracting fucoidan by using multiple enzymes, secondary extracting of residue, and obtaining fucoidan crude product by processing. The application uses ultrasonic pre-treatment, multiple enzyme combination assisted extraction and secondary processing of residue to improve the extraction rate of fucoidan, and obtains fucoidan by membrane separation. The method of the application not only greatly improves the extraction rate of fucoidan from Undaria pinnatifida raw material, but also prevents excessive use of organic reagents in the extraction process from polluting polysaccharide.

The invention discloses a kHz crystal frequency electronic component production process, and belongs to the technical field of electronic component manufacturing. Comprising the steps of wafer cleaning, film coating, coarse adjustment, wafer feeding, curing, frequency adjustment, press sealing, pin cutting, backflow, wafer sleeving, aging and the like. A compound cleaning solution containing potassium hydroxide, EDTA (Ethylene Diamine Tetraacetic Acid) tetrasodium, sodium silicate and methyl isobutyl ketone is adopted for wafer cleaning, and residual impurities are removed in a gradient manner through five steps of processes of pre-chelation, main cleaning, solvent replacement, weak acid washing and ultrapure water washing in combination with outlet solution monitoring; (2) pre-cleaning by argon-oxygen mixed plasma before coating, activating by pure argon, and preparing a protective film by adopting a composite barrier liquid containing KR-38S, electronic-grade nano Al2O3 and a BHT hydrogen polymerization inhibitor; in the aging stage, a nitrogen-hydrogen-argon mixed atmosphere is adopted, and a honeycomb porous guide plate made of a quartz material is matched, so that the stability of an aging environment is optimized. The technical problems of wafer cleaning hidden residues, silver layer cross-process structure damage, poor frequency stability and the like in the prior art can be effectively solved.