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Method for cleaning glass substrate for coating

A glass substrate, ultrasonic cleaning technology, applied in the direction of liquid cleaning methods, cleaning methods and utensils, chemical instruments and methods, etc., can solve the problems of affecting the quality of coating film, long cleaning process, surface damage, etc., to achieve energy saving, The effect of short process and cost saving

Active Publication Date: 2012-08-29
北京鼎臣世纪超导科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

As we all know, strong acid and strong alkali are very corrosive, and will react with sodium silicate, the main component in glass, thereby causing damage to the surface and seriously affecting the quality of the coating; in addition, the cleaning process of the traditional cleaning method is generally: organic Solvent cleaning agent (ultrasonic)-water-based cleaning agent (ultrasonic)-city water rinsing-pure water rinsing-IPA (isopropanol) dehydration-IPA slow drying, the cleaning process is long, and requires large-scale cleaning equipment and a lot of cleaning liquid, consumes electricity and time, and seriously pollutes the environment

Method used

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  • Method for cleaning glass substrate for coating
  • Method for cleaning glass substrate for coating
  • Method for cleaning glass substrate for coating

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0040] Apply the cleaning method provided by the present invention to clean the K9 glass substrate, the specific steps are as follows:

[0041] a. Put the K9 glass substrate into 10% hydrogen peroxide and ultrasonically clean it for 1 minute;

[0042] b. Put the K9 glass substrate into the ultrapure water for 5 minutes;

[0043] c. Put the K9 glass substrate into acetone and sonicate for 5 minutes;

[0044] d. Put the K9 glass substrate into ethanol and sonicate for 5 minutes;

[0045] e. Dry the K9 glass substrate with argon;

[0046] f. Gently wipe the surface of the K9 glass substrate clockwise with clean silk;

[0047] g. Bake the K9 glass substrate in a clean oven for 5 minutes, and set the oven temperature to 60°C;

[0048] h. Put the K9 glass substrate into the plasma cleaner and clean it with argon for 3 min.

[0049] Coated an aluminum film with a thickness of 3 microns on the surface of the cleaned K9 glass substrate.

Embodiment 2

[0051] Apply the cleaning method provided by the invention to clean the quartz glass substrate, the specific steps are as follows:

[0052] a. First put the quartz glass substrate into 10% hydrogen peroxide and ultrasonically clean it for 3 minutes;

[0053] b. Put the quartz glass substrate into the ultrapure water for 10 minutes;

[0054] c. Put the quartz glass substrate into acetone and sonicate for 10 minutes;

[0055] d. Put the quartz glass substrate into ethanol and sonicate for 10 minutes;

[0056] e. Dry the quartz glass substrate with argon;

[0057] f. Gently wipe the surface of the quartz glass substrate in a clockwise direction with clean silk;

[0058] g. Bake the quartz glass substrate in a clean oven for 10 minutes, and set the oven temperature to 60 degrees;

[0059] h. Put the quartz glass substrate into a plasma cleaner and clean it with argon for 5 minutes; coat a layer of aluminum film with a thickness of 3 microns on the surface of the cleane...

Embodiment 3

[0062] The same cleaning method as in Example 1 was used to clean the K9 glass substrate, except that the concentration of hydrogen peroxide in step a was changed to 3% by mass fraction, and the oven temperature in step g was set to 40°C.

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Abstract

The invention discloses a method for cleaning a glass substrate for coating and belongs to the technical field of preparation methods of materials. According to the cleaning method, the cleaning is realized by hydrogen peroxide ultrasound, ultrapure water ultrasound, acetone ultrasound, ethanol ultrasound, drying, wiping, baking and plasma cleaner; a cleaned glass substrate is obtained; and finally, the surface of the glass substrate can be coated. According to the cleaning method provided by the invention, no strong acid or alkali is used, so that the damage to the surface of the glass can be avoided. The cleaning method is simple in operation and is lower in flow; no great cleaning device or much cleaning liquid is needed; and the space can be effectively saved and the cost, energy sources and the time can be saved.

Description

technical field [0001] The invention belongs to the technical field of material preparation methods, relates to the technical field of film coating, and specifically refers to a method for cleaning a glass substrate for vacuum film coating. Background technique [0002] The quality of the vacuum coating film layer involves many aspects such as structure, physics and chemistry, and function. However, for large-area deposited films on glass and other transparent substrates by vacuum sputtering, pinholes and bonding force are a concern, and they are also relatively common film quality problems. In industrial production, the original glass for coating is generally ordinary flat glass produced by float method. During the process of production, transportation and storage, dust, carbon particles, grease, microorganisms and certain substances in the atmosphere may always accumulate. Some impurity ions and other dirt, these dirt will affect the quality of coated glass, even lead to ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C25/70B08B3/12B08B3/08C23C14/02C23C14/34
Inventor 王三胜张丽
Owner 北京鼎臣世纪超导科技有限公司
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