1063 results about "Water rinsing" patented technology

A low viscosity aqueous cleaning composition provides increasing viscosity upon dilution which provides a high viscosity diluted cleaning composition having solvents compatible with the rod micelle thickener and the cleaning system that clings for an extended period of time in a thickened form containing cleaning system ingredients that can penetrate and remove hard baked-on soils on vertical surfaces in cleaning units. The composition contains active cleaning ingredients (acid, alkaline and enzyme) that, in combination with thickening systems, provide the useful properties. The thickened materials can be applied on cold or hot surfaces and can successfully penetrate, soften and remove baked-on food soil on a variety of surfaces including oven walls, doors and grills, baking dishes, utensils, etc. The material is applied in the form of a thick diluted liquid spray or hot foam directly to the hardened soil, is permitted to penetrate the soil, resulting softened soils are then easily removed by hot or cold water rinse or by mechanical action such as scrubbing, scraping or wiping.

The invention discloses an ultrasonic wave cleaner for a coating of an optical lens and a treatment method thereof, which belong to the fields of metal surface treatment technology, vacuum coating technology and optical technology. The ultrasonic wave cleaner is characterized by performing ultrasonic alkali cleaning, pure water rinsing and ultrasonic pure water rinsing on the optical lens in cleaning medium under the condition of pendular motion respectively, slowly and perpendicularly lifting the optical lens or ensuring that a liquid slowly descends to break away from a workpiece when running water is circularly filtered, and using hot air to dry the optical lens under quiescent conditions. A structure of the ultrasonic wave cleaner is that: a conveyer is provided with traveling girders, the girders are provided with grab hooks, and the hooks are suspended with washing baskets; and different working procedures are finished by different devices, namely a liquid tank body is matched with a pendulous device, a dehydration device and a drying device to finish respective working procedures. The ultrasonic wave cleaner and the method have the advantages that the ultrasonic wave cleaner and the method do not use inflammable, explosive and toxic organic solvents to wash, reduce energy consumption, avoid the air pollution in workshops, can effectively improve the cleanliness of products, and ensure that the adhesive force of the coating of the optical lens is remarkably improved.

The invention relates to the technical field of industrial cleaning agents, is an improvement of the prior art, and particularly relates to a nano water-based cleaning agent and a preparing method thereof. The cleaning agent comprises, by weight, 2.0% to 18.0% of saponifiers, 5.0% to 30.0% of surfactants, 0.05% to 0.5% of inhibiters, 0.05% to 0.5% of nano defoamers, 0.2% to 1.0% of water-soluble nano silica and the balance deionized water, wherein the total weight percentage is 100%. The nano water-based cleaning agent and the preparing method thereof are characterized in that bubbles during a cleaning process are few, water rinsing is not needed after cleaning, the cleaning procedure is reduced, and the energy is saved and the cost is reduced; and volatile organic solvents are not contained, cleaned objects are not corroded, the application range is wide, and heat dissolution is not needed during the preparation so that energy is saved. The nano water-based cleaning agent and the preparing method thereof are practical and large in market potential.

The invention discloses a preparation method of an environment-friendly, antisepsis and deodorant fabric product and comprises following steps: (1) a fabric material or a fabric product is soaked and processed in a tea polyphenol solution with the concentration of 0.05 to 0.5 percent by weight for 30 to 90 minutes, the weight ratio of the fabric material or the fabric product to the tea polyphenol solution is between 1 : 10 to 50, and the soaking temperature is 40 to 60 DEG C; (2) a metallic ion solution that is equimolar with the tea polyphenol is added, and the fabric material or the fabric product is soaked and processed for 60 minutes, water rinsed, and then parched or dried. The preparation method of the environment-friendly, antisepsis and deodorant fabric product is applicable to various fibers such as multiple kinds of natural fibers like cotton hemp, wool and dacron, and synthesized chemical fibers. The preparation method can be adopted to produce various antisepsis and deodorant garment materials, home-textile materials (such as bedding fabrics, decorative sofa materials and carpets), socks and foot pads. The antisepsis and deodorant fabric of the invention is characterized by environmental protection, high efficiency and wash resistance, etc., and the preparation method thereof is characterized by simple technique and low processing cost, etc.

The invention relates to a method for spinning aramid fiber 1313 with low salt content by wet spinning. The method comprises the following steps of: prepolymerizing m-phenylenediamine (MPD) and part m-phthaloyl chloride (IPC); adding the preformed polymer and the rest m-phthaloyl chloride into a double-screw extruder to extrude the aramid fiber 1313 containing chlorine hydride; extruding spinning dope into a aqueous coagulation bath after neutralizing the chlorine hydride with calcium hydroxide; crimping and cutting coagulated tows into the required fiber length via hot water drawing, water rinsing, drying, dry-heat drawing and heat setting after being taken out of the coagulation bath to receive a finished fiber. The method is convenient and simple, can improve the molecular weight of products and the evenness of polycondensate, and reduce the salt content of the final spinning solution.

Methods of removing resist residues from semiconductor workpiece surfaces are provided. In one aspect, a method of removing resist from a surface of a workpiece is provided that includes the steps of exposing the workpiece to a plasma and rinsing the workpiece with CO2 and water in a processing chamber to dissolve the resist. Reliance on post plasma strip solvent rinses for resist removal is eliminated. The combination of CO2 with post-plasma strip water rinse increases the solubility and thus the removal rate of resist residues.

A method of forming an intermediate semiconductor device is disclosed that comprises providing a semiconductor substrate, forming a photoresist layer on the semiconductor substrate, implanting a dopant into the semiconductor substrate, and removing a dopant-containing layer from the photoresist layer. The dopant-containing layer includes dopant residuals and a carbon-rich crust and may be formed during implantation. The dopant-containing layer may be removed from the photoresist layer by exposing the dopant-containing layer to a water rinse, a chlorinated plasma or to a fluorinated plasma. The water rinse may include deionized water that is maintained at a temperature that ranges from approximately 25° C. to approximately 80° C. The fluorinated plasma may be formed from a gaseous precursor selected from the group consisting of nitrogen trifluoride, carbon tetrafluoride, trifluoromethane, hexafluoroethane, sulfur hexafluoride, and mixtures thereof. A method of forming an ultrashallow junction is also disclosed.

Hydrofluoric acid (HF) mixed with water and often buffered with ammonium fluoride is a standard silicon dioxide wet etchant which is followed by a rinse. An improved silicon dioxide etch is vapor HF which may be followed by a water vapor rinse. The invention discloses a further improved silicon dioxide etch. Following an initial exposure to vapor HF for oxide removal, a first insitu water rinse occurs. A second exposure to vapor HF then occurs and is followed by a second insitu water rinse. Water, rather than water vapor, aids in freeing particles from the wafer surface. During both the water rinses, the wafer may be rotated at increasing speeds to aid in sweeping particles from wafer surface. The process may be practiced in a commercially available reactor and is suitable for ULSI devices having complex topographies, such as, for example, 64 megabit DRAMs employing crown type memory cells.

The invention relates to a process for producing a hot-rolled acid-pickled 610 L automobile frame steel strip with thin gauge and high elongation and belongs to the technical field of production processes of steel for automobiles. According to the technical scheme, the process specifically comprises a hot rolling production process and an acid pickling process of an automobile frame steel strip, wherein the hot rolling process comprises the steps of heating, rolling, cooling and the like; and the acid pickling process comprises the following steps of: performing three-section continuous hydrochloric acid pickling and five-section water rinsing on the automobile frame steel strip on a continuous acid pickling production line so that the acid-pickled automobile frame steel strip with gray or offwhite surface and metallic luster on the surface can be obtained; next, drying the surface of the acid-pickled automobile frame steel strip and electrostatically spraying anti-rust oil on both sides of the steel strip, and then coiling and packing the automobile frame steel strip to obtain the finished product. The thin-gauge 610 L automobile frame steel produced by using the process disclosed by the invention is used for substituting 510 L automobile frame steel, so that the thickness of a used steel plate as well as the weight of the whole automobile and fuel consumption of the automobile are reduced while the strengths of the frame and related parts are improved; and therefore, the hot-rolled acid-pickled 610 L automobile frame steel strip provided by the invention plays an important role in reducing the weight of vehicles such as SUV (Sport Utility Vehicle) vehicle and pickup truck. Besides, the acid-pickled surface has metallic luster and thereby has excellent electrophoretic paint coating performance.

A method and structure that protects interior electrical components of a pressure sensor (4) from corrosive particles using a sacrificial gel dome (30) to form a vent (34) in a protective gel (32) that covers electrical components that can be corroded such as wires (16), bond pads (18), and electrical leads (14). Sacrificial gel dome (30) is dispensed over a diaphragm (28) of pressure sensor (4) to form vent (34) enabling diaphragm (28) to sense pressure variations without the influence of protective gel (32). Sacrificial gel dome (30) is removed through a water rinsing process (42) to expose vent (34).

The invention discloses a printed circuit board assembly (PCBA) on-line cleaning machine which comprises a machine body. A mesh belt for transmitting a PCBA board is arranged in the machine body, and a chemical pre-cleaning room, a chemical cleaning chamber, a chemical diaphragm chamber, a digitally integrated (DI) water pre-cleaning chamber, a DI water rinsing chamber, a spraying chamber, a wind shear drying chamber and a hot air drying chamber are arranged above the mesh belt and sequentially arranged along the operation direction of the mesh belt. The PCBA on-line cleaning machine drives the PCBA board through the mesh belt to sequentially perform chemical pre-cleaning, chemical cleaning, chemical isolation, DI water pre-rinsing, DI water rinsing, spraying, wind shear drying, hot air drying and the like from left to right, achieves full-automatic on-line cleaning of the PCBA board, enables the PCBA board to be comprehensively cleaned and rinsed and improves the cleaning and rinsing quality.

The present invention is the production process of aluminum template with nano holes, and is especially the combined anode oxidation and ion bombardment process of producing aluminum template with nano holes in high density and high order. The technological process includes annealing aluminum foil, cleaning, electrochemical polishing, anode oxidation in water solution of oxidizing acid, such as sulfuric acid, oxalic acid, phosphoric acid, to form alumina film, ion bombardment to form holes in the film physically, water rinsing and stoving. The technological process is simple and low in cost, and the holes are densely distributed in certain order and have controllable shape and size of several nano to 100 nano. The said template may be used widely in direct assembling of nano device except its traditional industrial application.

A method for improving flame retardance of wool by bioenzyme treatment is disclosed, belonging to the field of textile biotechnology. The invention utilizes a catalytic action of transglutaminase (MTG) to graft a type of compounds containing primary amino groups and a large number of phosphorus elements onto the wool so as to improve the flame retardance of the wool, the technological procedures comprise: pretreatment, treatment with a phosphoric finishing agent containing the MTG, water rinsing and drying. Wool yarns and fabrics treated by the inventive technology can not only be improved in the flame retardance, but also be enhanced in some other performances to a certain extent, in particularly the strength of the wool yarns and the fabrics is enhanced to play a role of powerful repair, which is outstandingly superior to other flame-retardant finishing agents or flame-retardant finishing technologies. In addition, in contrast to chemical finishing, the invention is healthier and more environmentally-friendly due to the employment of bioenzyme technique and the pollution-free treatment technology.

The object of the present invention is to provide a novel cleaner composition that not only reduces ignition by flame and has a small influence on the environment, but that also has an excellent property of dissolving flux residues adhered on narrow portions or in narrow gaps in an object to be cleaned that was subjected to soldering with a lead-free solder, and reduces recontamination of the object in the water-rinsing process. The present invention uses a halogen-free organic solvent (A) represented by a specific Formula; an amine-based compound (B) represented by a specific Formula; a chelating agent having no amino group (C); and, as required, water.

The present invention provides a “spunbond wetlaid method for producing non-woven fabrics from natural cellulose” using pulp as raw material and N-methylmorpholine N-oxide (NMMO) as solvent for dissolving into dope. Then, the dope is extruded out of a spinneret to form filament bundle by spunbond method. The dope is extruded out of a spinneret bank of grouped spinnerets to form filament bundle for further stretching process under quench condition. The filament bundle is coagulated with regeneration in a coagulating solution. The coagulated filament bundle is rapidly stretched under high pressure by an air draw-off machine. The stretched filament bundle is collected and stacked on a collecting net as web nonwoven. After post treatments of water rinsing, hydro-entangled needle punching, drying, winding-up and the like have been orderly applied then final product of nonwoven fabrics with continuous filament are produced from natural cellulose.

The invention provides a method for the comprehensive treatment of industrial waste, which comprises the steps of: adding water to sintering smoke dust ash for leaching in order to separate leaching residue from a leaching solution; adding a displacer to the leaching solution for displacement, and obtaining displacement residue and a displacement solution through separation; adding a precipitant to the displacement solution for precipitation, and obtaining residue and a solution through separation; concentrating and crystallizing the solution to obtain a potassium chloride product; water-rinsing the leaching residue and separating residue and lotion out, returning the lotion to the leaching step for being recycled; and obtaining iron ore powder and residue through magnetic separation of the residue. The method can be used for effectively recovering potassium chloride and iron ore powder in the sintering smoke dust, wherein the content of the recovered potassium chloride reaches more than 90%, thereby offering a new raw material source for sylvite production factories; and the iron content of the iron ore powder reaches more than 60%, the residues which are rich in valuable metals such as copper, lead, zinc, calcium, silver and the like are simultaneously collected, and the valuable metals are further extracted through subsequent processes in order to change wastes into valuable, reduce the environmental pollution caused by the waste, thereby carving out a new application way for the utilization of the sintering smoke dust ash.