Production process of alumina template with nano holes

A kind of technology of alumina template and production process, which is applied in the direction of anodic oxidation, etc., can solve the problems of endangering the health of operators, uneven distribution of holes, poisonous mercury chloride, etc., and achieve good order and uniformity of holes, breakthrough Confinement, effect of high hole density

Inactive Publication Date: 2004-11-24
INST OF PHYSICS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] 1 The aluminum oxide film obtained by the traditional one-step anodic oxidation method has uneven distribution of pores, poor order, and low pore density (see literature F.Keller at al, J.Electrochem.Soc., 1953, 100:411)
[0008] 2Usually, mercury chloride (HgCl 2 ) solution to remove residual metal aluminum, but mercuric chloride is toxic, in addition to causing environmental pollution, it will also endanger the health of operators

Method used

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  • Production process of alumina template with nano holes
  • Production process of alumina template with nano holes
  • Production process of alumina template with nano holes

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0053] 1) Material selection: The aluminum foil used is high-purity aluminum foil, the mass percentage of aluminum is 99.999%, and the thickness is 0.5 mm. The surface is required to be smooth and clean without bumps, scratches, pits, edge burrs, peeling and other defects.

[0054] 2) Pretreatment: Degrease the selected aluminum foil with acetone and alcohol, rinse with water, and then anneal at 500°C for 3 to 4 hours under nitrogen protection or a vacuum environment. Finally, the volume ratio is H 2 SO 4 (Dense): H 3 PO 4 (Dense): H 2 Electrochemical polishing is carried out in a polishing solution of O=4:4:2 for 2-3 minutes, rinsed with water, and dried.

[0055] 3) Anodizing: Continuously anodize with direct current in an electrolytic solution made of sulfuric acid and water to form a porous aluminum oxide film on the surface of the aluminum foil. The oxidation is carried out in an electrolytic oxidation tank. The moles of sulfuric acid in the oxidation solution The concentrati...

Embodiment 2

[0063] 1) Material selection: The aluminum foil used is high-purity aluminum foil, the mass percentage of aluminum is 99.999%, and the thickness is about 0.5 mm. The surface is required to be smooth and clean without bumps, scratches, pits, edge burrs, peeling and other defects.

[0064] 2) Pretreatment: Degrease the selected aluminum foil with acetone and alcohol, rinse with water, and then anneal at 500°C for 3 to 4 hours under nitrogen protection or a vacuum environment. Finally, the volume ratio is H 2 SO 4 (Dense): H 3 PO 4 (Dense): H 2 Electrochemical polishing is carried out in a polishing solution of O=4:4:2 for 2-3 minutes, rinsed with water, and dried.

[0065] 3) The first step of anodizing: the first step of anodizing is continuously carried out in an electrolytic solution made of sulfuric acid and water with direct current to form a porous aluminum oxide film on the surface of the aluminum foil. The oxidation is carried out in an electrode oxidation tank. The molar co...

Embodiment 3

[0074] 1) Material selection: The aluminum foil used is high-purity aluminum foil, the mass percentage of aluminum is 99.999%, and the thickness is about 0.5 mm. The surface is required to be smooth and clean without bumps, scratches, pits, edge burrs, peeling and other defects.

[0075] 2) Pretreatment: Degrease the selected aluminum foil with acetone and alcohol, rinse with water, then anneal at 500°C for 3 to 4 hours under nitrogen protection or a vacuum environment, and finally set the volume ratio to H 2 SO 4 (Dense): H 3 PO 4 (Dense): H 2 Electrochemical polishing is performed in a polishing solution of O=4:4:2 for 2-3 minutes, rinsed with water, and dried.

[0076] 3) The first step of anodizing: the first step of anodizing is continuously carried out in an electrolytic solution made of oxalic acid and water with direct current to form a porous aluminum oxide film on the surface of the aluminum foil. The oxidation is performed in an electrode oxidation tank. The molar conce...

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Abstract

The present invention is the production process of aluminum template with nano holes, and is especially the combined anode oxidation and ion bombardment process of producing aluminum template with nano holes in high density and high order. The technological process includes annealing aluminum foil, cleaning, electrochemical polishing, anode oxidation in water solution of oxidizing acid, such as sulfuric acid, oxalic acid, phosphoric acid, to form alumina film, ion bombardment to form holes in the film physically, water rinsing and stoving. The technological process is simple and low in cost, and the holes are densely distributed in certain order and have controllable shape and size of several nano to 100 nano. The said template may be used widely in direct assembling of nano device except its traditional industrial application.

Description

Technical field [0001] The invention relates to a production process of a nanoporous alumina template, in particular to a production process of a high-density, highly ordered nanoporous alumina template. Background technique [0002] Nanotechnology is the most promising field today. It can make computers operate faster, metal stronger, ceramics more ductile, and nanostructures have strange electrical, magnetic and optical properties. Nanotechnology can be applied to data storage, transistors, lasers, or anything people can imagine. However, so far, the practical applications of this amazing technology are very limited and disappointing, especially in the field of electronics. [0003] The development trend of electronic components is miniaturization, intelligence, high integration, high-density storage and ultra-fast transmission, etc. This requires the smaller the size of the material, the better. When using light, electrons or x-ray beams to fabricate ultra-large-scale integrat...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C25D11/04
Inventor 符秀丽江南王太宏
Owner INST OF PHYSICS - CHINESE ACAD OF SCI
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