37 results about "Nano-device" patented technology

The invention discloses a micro-nano device photoetching process based on surface energy repair and a micro-nano device, and relates to the technical field of photoetching. The process provided by the invention comprises the following steps: carrying out plasma cleaning on a substrate, immersing the substrate subjected to plasma cleaning into an organic cleaning solvent, and removing an unstable metamorphic layer and pollutants on the surface of the substrate by adopting at least one of soaking, stirring and ultrasonic treatment, then, the cleaned substrate is adopted to carry out subsequent photoetching and micro-nano machining processes; the step of organic solvent cleaning is added after substrate plasma cleaning, an unstable metamorphic layer is disintegrated and other impurities are removed through permeation and slight dissolution effects of an organic solvent on the surface of the substrate, so that the surface of the substrate is recovered to a smooth and stable state; therefore, the defects of edge collapse, side wall roughness and the like of the photoresist pattern in the photoetching process are remarkably reduced, and the photoetching morphology precision and the production yield of the micro-nano device are effectively improved.

The application belongs to the field of organic / polymer neuromorphic devices, and specifically provides a nano neuromorphic device with an organic two-dimensional conjugate symmetric polymer as an active layer, and a preparation method and application thereof. The nano device is manufactured in the form of an 8*8 cross switch array through electron beam lithography technology and stripping method, and the width of the word line and the bit line is 100 nm and 200 nm respectively, which is a very small nano structure. The device realizes record-high yield of the polymer memristor with minimization and low potential, and simultaneously realizes fast response within 20-40 ns, the variation range of D2D is less than 10%, the device yield is higher than 90%, and the device can reach 50-100 nm scale, and the power consumption is lower than 20 J / bit. The polymer memristor array can realize storage and calculation integration, and can be used for information storage, and has excellent application prospect in the field of artificial intelligence.

The invention discloses a spin light current detection method based on a boundary region of a two-dimensional transition metal chalcogenide system. The detection method comprises the following steps: S1, preparing a two-dimensional transition metal chalcogenide micro-nano device; s2, a spin photocurrent detection and regulation platform is built, a laser emits a beam of laser, the beam of laser enters a chopper through a reflector, the laser passing through the chopper enters a polarizer, the laser passes through an electro-optical modulator after being changed, the beam is periodically modulated into linearly polarized light, left circularly polarized light and right circularly polarized light, and the linearly polarized light, the left circularly polarized light and the right circularly polarized light are polarized; then the light beams enter a microscope objective through a semi-reflecting and semi-transmitting flat plate and a light splitting crystal, and light spots are formed at the focus position of the microscope objective through convergence of the microscope objective; and S3, projecting a light spot formed by convergence of the microscope objective in the step S2 on the two-dimensional transition metal chalcogenide micro-nano device, and detecting and extracting spin light current. The method is used for accurately detecting, regulating and controlling the boundary spin photocurrent of WSe2 and promoting research and application of two-dimensional spin photoelectronic devices.

The present application relates to the technical field of micro-nano device manufacturing, and in particular to a micro-nano device based on two-dimensional MOFs material and a preparation method and application thereof.The present application provides a preparation method of a micro-nano device based on two-dimensional MOFs material, which comprises the following steps: peeling off two-dimensional MOFs material under a protective atmosphere to obtain a single crystal wafer; adhering a transfer sheet to the single crystal wafer and picking up the single crystal wafer to obtain an intermediate; adhering the intermediate to a bottom electrode and separating a polydimethylsiloxane film in the transfer sheet to obtain the micro-nano device based on two-dimensional MOFs material.The preparation process provided by the present application can effectively avoid damage to two-dimensional MOFs material caused by oxygen, solvents and high-temperature processes, realize the construction of single-crystal devices and make the single-crystal devices have good electrical properties.

The application provides a photothermal driving bowl-shaped polydopamine nanomotor and a preparation method thereof, and belongs to the technical field of micro-nano devices, wherein the photothermal driving bowl-shaped polydopamine nanomotor comprises a hollow bowl-shaped structure constructed by polydopamine, and the hollow bowl-shaped structure is obtained by removing polyacrylic acid nanoparticles after polydopamine is polymerized on one side of the polyacrylic acid nanoparticles to form a single-sided asymmetric structure. The photothermal driving bowl-shaped polydopamine nanomotor provided by the application has strong driving capacity, fast movement speed, and an easy-to-functionalize surface, and the preparation method is simple and can be used for macro preparation, so that the photothermal driving bowl-shaped polydopamine nanomotor has a wide application prospect in the fields of environmental governance, micro-nano processing and biological medicine.

The invention provides a preparation method of an electromechanical coupling micro-nano device and the electromechanical coupling micro-nano device, and is applied to the technical field of micro-nano manufacturing. The preparation method comprises the following steps: forming a device structure layer on a first side of a substrate, wherein the device structure layer comprises or is preset with a movable structure region and a fixed structure region; a patterned mask aligned with the substrate is fixed on the device structure layer, the pattern of the mask is provided with an opening, and the opening exposes the first area in the movable structure area; depositing a permanent magnet thin film on the first area through the opening of the mask, and removing the mask after deposition; forming a functional unit on a second region different from the first region in the movable structure region or in the fixed structure region, and forming an interconnection structure electrically connected with the functional unit on the fixed structure region; and partially or completely removing the substrate below the movable structure region in the device structure layer, and forming a cavity below the movable structure region to release part of the movable structure region including the first region.

A microelectronic structure including a first nano device that includes a plurality of first transistors and a second nano device that includes a plurality of second transistors. The first nano device and the second nano device are parallel to each other. A double diffusion break that extends across the first nano device and the second nano device. A back-end-of-the-line (BEOL) layer located on a frontside of the first nano device and the second nano device. A backside interconnect located on a backside of the first nano device and the second nano device and the BEOL layer is connected to the backside interconnect through the double diffusion break.

This invention discloses a semi-flexible sealed composite material beam-membrane-island structure for micro / nano devices and its fabrication method. The invention employs both rigid and flexible materials to construct the beam-membrane-island structure of the micro / nano device. The beam and island structures are made of rigid materials that can be fabricated in micro / nano dimensions, while flexible materials fill the periphery of the beam and island structures. The flexible filling layer acts as a "displacement coordination layer," ensuring a clear mechanical response while maintaining the high modulus of the silicon beam. Simultaneously, the local deformation of the flexible layer absorbs lateral coupling stress, allowing strain fields in different directions to be separated and amplified in the beam / island region. The flexible material forms a stress transition zone between the beam and island, preventing strong stress concentration in the pure silicon beam-island structure under concentrated loads. This invention still uses materials compatible with micro / nano fabrication processes as the main structural material, enabling integration with standard photolithography, reactive ion etching, deep silicon reactive ion etching, anodic bonding processes, through-silicon vias (TSVs), and glass vias, among other micro / nano processes.

The present application relates to the field of micro-nano device processing, and particularly relates to a multi-step micro-nano structure and a preparation method thereof. The method comprises the following steps: forming a mask layer on a substrate surface, the mask layer having a plurality of openings with different sizes for exposing the substrate; and performing single etching on the substrate with the mask layer as a mask to obtain the multi-step micro-nano structure on the substrate. The present application realizes the multi-step by designing openings with different sizes to obtain the multi-step through single etching. The complex process flow of traditional multiple exposures and multiple etchings is compressed into one exposure and one etching, which fundamentally eliminates the problems of cumulative error, long production cycle and high cost caused by multiple process cycles. The strict overlay alignment requirement between multiple photolithographies is avoided, the manufacturing precision and yield are greatly improved, the present application is easy to integrate into the existing semiconductor production line, and the present application paves the way for the large-scale and low-cost manufacturing of multi-step devices.

The application discloses a kind of semi-flexible sealing composite beam membrane island structure formula micro-nano device and its processing method.The application uses hard material and flexible material to constitute the beam membrane island structure of micro-nano device, wherein the hard material that can be micro-nano processed is used in beam structure and island structure, and flexible material is filled in the periphery of beam structure and island structure.Flexible filling layer plays the role of "displacement coordination layer", and by the local deformation of flexible layer, transverse coupling stress is absorbed, so that strain field in different directions is separated and enlarged in beam / island area.Flexible material forms stress transition zone between beam and island, to avoid strong stress concentration of pure silicon beam island structure under concentrated load.The application still uses material compatible with micro-nano processing technology as main structure material, and can be integrated with standard photolithography, reactive ion etching, deep silicon reactive ion etching and anodic bonding process, through silicon via, through glass via and other micro-nano processes.

The invention discloses an astigmatic displacement microscopic imaging method and an astigmatic displacement microscopic imaging device for axial sub-nanometer resolution, namely an astigmatic displacement microscope (ADM). The astigmatic displacement microscopic imaging method and the astigmatic displacement microscopic imaging device for axial sub-nanometer resolution are applied to an astigmatic displacement microscope (ADM). The ADM technology is based on the astigmatism measurement principle, has the advantage of optical non-contact, and can simultaneously realize four measurement functions: microscopic three-dimensional shape scanning imaging, displacement measurement, vibration analysis and film thickness measurement. The Z-axis resolution of three-dimensional morphology imaging is about 0.1 nm, and the thickness detection of a monatomic layer of a two-dimensional material and the like can be met; the device can be matched with any objective lens, such as working media of air, water immersion and oil immersion; a fast scanner is adopted to replace a traditional sample displacement table for scanning, and the imaging time of a single image is fast to a second level; and in combination with a normalization circuit, the influence of different sample reflectivity on a measurement signal can be eliminated. The astigmatic displacement microscope can meet the test requirements of application scenes such as micro-nano devices, semiconductors, piezoelectric sensing, material morphology measurement, in-situ surface and interface research, precise displacement measurement, microscopic vibration analysis and the like.

The application provides a three-dimensional micro-nano spherical surface multi-parameter synchronous mapping method based on a longitude and latitude scanning track, belongs to the technical field of micro-nano device and cell surface physical property characterization methods, adopts a priori knowledge pre-calibration mode, establishes a longitude scanning path parameter, establishes a latitude scanning path parameter based on a rotating sample table hardware unit and in combination with an eccentricity real-time compensation control algorithm, realizes online compensation of eccentric displacement in the process of rotating along the latitude, takes the normal bending deformation signal of a probe micro-cantilever as feedback through an upper computer, realizes displacement control of a scanning positioning platform, and further realizes synchronous scanning imaging of sample surface topography and nano-mechanical properties. The probe integrated with a front protruding needle tip structure is used as a micro force sensor, a new controllable vector angle single-point servo detection method is combined, the normal bending signal of the probe is used as feedback, the longitude and latitude scanning paths are realized, and synchronous measurement of three-dimensional surface topography and three-dimensional surface mechanical properties of micro-nano spherical samples is realized.

The invention belongs to the field of particle suspension evaporation, and relates to a particle suspension evaporation method and system based on a vibration substrate. According to the method, particle suspension liquid drops are deposited on a vibration substrate, and the substrate is driven to generate periodic vibration with specific frequency and amplitude, so that the liquid drops enter a resonance state. Under the resonance condition, complex convection is formed in the liquid drops, single circulation driven by evaporation is broken, the trend that particles continuously migrate to the edge is remarkably weakened, and therefore the coffee ring effect is effectively restrained. Compared with the prior art, the method has the advantages that the structure is simple, the operation is convenient, uniform deposition of particles can be realized without adding a surfactant or special surface modification, and the method has good universality and wide application prospect, and is suitable for the fields of biological detection, ink-jet printing, functional coating, micro-nano device manufacturing and the like.

The invention belongs to the field of semiconductor materials and micro-nano manufacturing, and provides a method for improving the elastic limit of micro-nano-scale diamond. According to a diamond micro-nano structure prepared through a traditional method, due to surface defects and an amorphous layer, the mechanical property is far lower than a theoretical value, and the elastic strain and the fracture resistance are limited. According to the method, controllable plasma surface treatment is carried out on the diamond nanostructure processed by a focused ion beam (FIB) at room temperature, the thickness of a surface amorphous carbon layer is accurately regulated and controlled, and the elastic modulus and the elastic strain range are actively regulated. The core of the method is to reduce or optimize interface mismatch of a surface amorphous layer and internal crystalline diamond and relieve the problem of deformation and non-collaboration. After treatment, the ductility of the diamond is improved, the theoretical ultimate tensile strain is approached, the fracture resistance is enhanced, and the multi-field mechanical reliability and working stability are improved. The method is simple in process, mild in condition and high in controllability, and provides support for application of diamond-based micro-nano devices.

The invention relates to the technical field of nano material preparation, and particularly discloses a substrate growth pulling method of an ultra-long few-walled carbon nanotube array. The method comprises the following steps: firstly, pretreating a substrate, loading a zinc-based MOF derivative catalyst and forming a polymer transition layer; then in a reaction environment capable of providing an alternating magnetic field, a gradient electric field, a near-infrared light thermal field and layered gas flow, heating and introducing a carbon source gas in a pulse manner to grow the array, and meanwhile, carrying out on-line monitoring and real-time closed-loop regulation on growth parameters by utilizing a laser Raman spectrum; after the array grows to a preset height, staged gradient stress release lifting is executed, and layered airflow is used for assisting in stripping; and finally, removing the residual catalyst in an oxidizing atmosphere. The carbon nanotube array can be used in the fields of nano devices, composite material reinforcement and the like, and has the advantages of excellent directionality, low defect rate and strong structural integrity. The preparation method provided by the invention can be used for efficiently preparing the high-performance ultra-long few-walled carbon nanotube array.

The invention relates to the technical field of photonic crystal materials and micro-nano devices, in particular to a beam-shaped magnetic photonic crystal, a preparation method of the beam-shaped magnetic photonic crystal and application of a micro-nano device of the beam-shaped magnetic photonic crystal. Each one-dimensional magnetic photonic nano chain is formed by assembling a plurality of magnetic nano particles into a chain, and the magnetic nano particles in the beam-shaped magnetic photonic crystal are arranged into a one-dimensional photonic crystal structure along the axial direction of the beam-shaped magnetic photonic crystal and are arranged into a two-dimensional photonic crystal structure along the radial direction of the beam-shaped magnetic photonic crystal. Compared with a single photon nanometer chain, the beam-shaped magnetic photonic crystal shows larger color spots and unique axial-radial two-way color rendering property, the photonic crystal structural color can be displayed in the axial dimension and the radial dimension, and the beautiful structural color is displayed.

A method including forming an oxide layer on a first substrate and forming a second substrate on the oxide layer. Doping a first section of the second substrate while not doping a second section of the second substrate. Forming a first nano device on the second section of the second substrate and forming a second nano device on first section of the second substrate. Flipping the first substrate over to allow for backside processing of the substrate and forming at least one backside contact connected to the first nano device while backside contacts are not formed or connected to the second nano device.

This invention provides a microscopic visual inspection device and calibration method for multi-scale micro / nano device assembly, including a first microscopic vision system and a second microscopic vision system for detecting front and side features of micro / nano devices; a third microscopic vision system for detecting top features of micro / nano parts; and a fourth microscopic vision system for detecting bottom features of micro / nano devices. It also includes a calibration method for the microscopic visual inspection device for multi-scale micro / nano device assembly. Cross-depth-of-field detection is achieved by calibrating the image offset matrix of the microscopic vision system and the image Jacobian matrix for part position and motion control. A relational matrix is ​​derived, and combined with the relational matrix calibration method, the detection of part angular deviation around the Z-axis is achieved. This invention is applicable to microscopic visual inspection of multi-scale micro / nano device assembly, enabling multi-angle detection, and simultaneously detecting part rotational angular deviation through relational derivation.

The application provides an optical transparent structure and a performance optimization method, device, electronic equipment and medium thereof, and comprises a micro-nano device, a first dielectric spacing layer, a disk array, a second dielectric spacing layer, an infrared reflection layer and an anti-reflection layer connected in sequence, wherein the micro-nano device, the first dielectric spacing layer and the disk array form an array, the micro-nano device and the disk array are silver films, the first dielectric spacing layer, the second dielectric spacing layer and the anti-reflection layer are made of silicon nitride, and the optical transparent structure is optimized by using reverse optimization based on a genetic algorithm. The application has the beneficial effects that: through the optical transparent structure and the reverse optimization based on the genetic algorithm, multi-band compatibility of visible light, infrared and laser bands is realized, and a heat management function is realized at the same time.

This invention discloses a multifunctional fiber optic electronic system based on D-shaped optical fiber and its fabrication method, belonging to the technical field of fiber optic optoelectronic integration and information functional devices. The system includes a D-shaped optical fiber and various heterogeneous micro / nano devices integrated in situ on the polished side surface of the D-shaped optical fiber. The D-shaped optical fiber is used for optical signal transmission and also serves as an integration substrate. The flat, processable area formed by polishing its side surface is called the polished side surface, which is used to integrate various heterogeneous micro / nano devices. These heterogeneous micro / nano devices are used to realize in-situ signal detection, logic processing, temperature self-monitoring, and wireless energy and signal interaction functions. This overcomes the losses and complexity caused by the traditional "fiber-chip" discrete architecture, significantly improving system integration, energy efficiency, and reliability.

The invention belongs to the technical field of micro-nano device testing, and particularly discloses an MEMS gyroscope high and low temperature testing device which comprises a double-shaft rotary table, a signal acquisition assembly and a heat preservation clamp. The double-shaft rotary table comprises an outer frame, an inner frame and a driving mechanism, the outer frame is configured to rotate around a preset rotating axis, and the inner frame is rotatably mounted on the outer frame; the signal acquisition assembly comprises a signal adapter plate and a device loading plate which are respectively mounted on two sides of the inner frame, the device loading plate is provided with a signal acquisition module used for acquiring a measurement output signal of the MEMS gyroscope to be tested and converting the measurement output signal into a digital signal, and the signal adapter plate is respectively and electrically connected with the device loading plate and the double-shaft turntable; the digital signal and an angular velocity signal of the double-shaft turntable are transmitted to an external analysis device; the heat preservation clamp is detachably installed on the device loading plate. Through the integrated design of the double-shaft rotary table, the signal acquisition assembly and the heat preservation clamp, the device structure is greatly simplified, the equipment size is reduced, and compared with a traditional device, the size, the weight and the like are obviously reduced.

The invention discloses a multi-channel micro-nano imaging spectrometer, and belongs to the technical field of imaging spectrometers. The system sequentially comprises a telescope objective, a field diaphragm, a telescope eyepiece, an aperture diaphragm array, a micro-nano device group, a lens group array, a focus lens and a detector along a light path. An aperture segmentation method is adopted, an image plane of a detector is divided into N2 blocks, the size of a micro-nano device applied to an existing micro-nano imaging spectrometer is reduced, complex and precise electric control and mechanical structures are avoided, a spectral image can be obtained only through later calculation, and the time resolution is high; the micro-nano imaging spectrometer after aperture segmentation can enlarge the spectral range of the system. The spectral image containing all the spatial information of the object can be obtained through later solution, and the obtained information is more comprehensive. A micro-nano device with a spectrum sensing function is placed at an aperture diaphragm of an optical system, so that direct coupling of the micro-nano device and a detector is avoided, and the difficulty of system processing and adjustment is reduced.

The invention discloses atomic layer deposition equipment and method based on a local direct writing technology. The equipment comprises a deposition cavity for limiting a vacuum environment, a temperature-controllable precise displacement platform, a movable local reaction unit integrated with a micro reaction head array and a micro-area sealing structure, a three-dimensional micro-motion mechanism for driving the local reaction unit to do spatial motion, and a multi-source precursor conveying system. According to the method, the local closed or semi-closed reaction micro-area is formed on the surface of the substrate through the micro-area sealing structure, and the atomic-scale high-quality patterned film is directly drawn according to the preset path under the condition that mask and photoetching are not needed in combination with the alternating pulse time sequence of three-dimensional motion control and atomic layer deposition. According to the method, the flexibility of direct writing type printing is combined with the high-quality thin film growth capacity of atomic layer deposition, the problem that high-resolution and complex patterning deposition is difficult to achieve through a traditional ALD technology is effectively solved, and the method is particularly suitable for flexible manufacturing of multi-layer heterostructures and complex micro-nano devices.

This invention provides a robotic hand for micro / nano manipulation, comprising a micro-motion positioning device, a motion control device, an end effector, and a drive device. The end effector is mounted on the micro-motion positioning device. The motion control device can control the micro-motion positioning device to drive the end effector to move in at least three non-collinear directions, thereby adjusting the distance between the end effector and the micro / nano device. The drive device is electrically connected to the end effector via wires and is used to drive the end effector to generate electrostatic force on the micro / nano device, realizing direct grasping and release of the micro / nano device. The technical solution of this invention solves the problems of existing micro / nano manipulation devices, such as complex structure, difficulty in miniaturization, low accuracy of feedback information, poor stability, and high cost.

This invention relates to the fields of micro / nano fabrication and micro-assembly technology, specifically to a microneedle array-based mass transfer device and its fabrication method, and a micro / nano device transfer method. The micro / nano device transfer method includes providing a mass transfer device comprising a carrier and a microneedle array. The mass transfer device is moved above the micro / nano device, and near-infrared light irradiation and pressure are applied to the mass transfer device to cause the microneedles to bend. The near-infrared light is removed, and the microneedles are allowed to cool to room temperature. The microneedles then pick up the micro / nano device based on dry adhesion and move it to a target substrate. Patterned near-infrared light is used to irradiate the microneedles, triggering deformation recovery and achieving selective release of the micro / nano device. This solution utilizes the synergy of near-infrared light, photothermal conversion materials, and shape memory polymers to enable the microneedle array to respond rapidly, achieving precise control of the microneedle adhesion force, thereby realizing precise and efficient pickup, mass transfer, and selective release of micro / nano devices.

The invention discloses a multi-level fine overlay method for a complex micro-nano structure, and belongs to the technical field of micro-nano machining. The multi-stage fine overlay method comprises the following steps: firstly, based on a double-layer photoresist system, forming a graphical mask with a precise undercut profile by optimizing the thicknesses of an upper photoresist layer and a lower photoresist layer, spin-coating parameters and a twice independent developing process; then, layer-by-layer overlay alignment is carried out within the alignment precision range of 800 nm to 3 microns through a global alignment mark set preset on the mask mold; and finally, realizing residue-free transfer of the high-precision metal or dielectric film pattern by combining magnetron sputtering and a precise stripping process, and sequentially completing preparation of the multi-layer micro-nano composite structure. According to the method, high-precision integrated manufacturing is guaranteed, meanwhile, the technological process can be simplified, technological compatibility is enhanced, equipment investment and manufacturing cost are reduced, a reliable technical path is provided for batch manufacturing of complex micro-nano devices, and the method has wide application prospects in the fields of integrated optics, MEMS, multifunctional sensors and the like.

This invention provides a tin film, its preparation method, and micro / nano devices. The preparation method of the tin film includes the following steps: (1) fixing a cleaned substrate on the turntable support of an electron beam evaporation equipment; installing an evaporation boat containing tin film material on a turntable between the positive and negative electrodes of the electron gun, and covering the evaporation boat with a shield; (2) evacuating the vacuum chamber, then introducing an inert gas, and then heating the evaporation boat to a preset temperature, the preset temperature being 100-150°C; (3) opening the shield for evaporation when the electron gun beam current reaches the target beam current, the target beam current being 0.02-0.15A; (4) ending the evaporation when the thickness of the tin film reaches the target film thickness. The preparation method of this invention, by bombarding the molten tin film material with an electron beam, can prepare a tin film with good uniformity and no appearance defects, significantly improving the quality of the tin film.

The application provides a method for preparing a flexible micro-nano device based on a carbon film, and belongs to the field of micro-nano device manufacturing.The application provides a method for preparing a carbon film for preparing a flexible electrochemical sensor, and comprises the following steps: coating a slurry containing graphene oxide and a polymer on a first substrate, and then performing a carbonization reaction to form a graphite-like carbon film.The graphene oxide and the polymer are carbonized to form a continuous carbon film structure with high flexibility, excellent conductivity and good adhesion force.The carbonized film can be directly used for patterned microstructure processing on a wafer-level substrate, has good structure uniformity and repeatability, and is suitable for integrated manufacturing of a large batch of flexible microelectrode arrays.

The application discloses a method for preparing a thin film mask by using a photoetching method and application thereof, and comprises the following steps: step one, spin-coating a photosensitive polyimide photoresist on the surface of a pretreated substrate, and sequentially performing pre-baking, exposure, baking and developing; step two, heat treatment, so that the polyimide photoresist is solidified into a film; and demolding and peeling to obtain a flexible polyimide thin film mask with a target pattern. The pattern resolution of the flexible thin film mask obtained by the application can reach 3 microns, and the thickness ranges from 5 microns to 30 microns, so that the flexible thin film mask is suitable for micro-nano device processing on any three-dimensional curved surface, flexible and fragile substrate surface in a complex environment.

The application belongs to the technical field of micro-nano scale thermal measurement, and particularly relates to a thermal conductivity measurement method and a measurement device. The thermal conductivity measurement method comprises the following steps: providing a heat sink, a plurality of micro-nano devices and a sample to be measured, wherein the micro-nano devices have a first thermal resistance, the sample to be measured has a second thermal resistance, the sample to be measured and the heat sink and each contact area form a contact thermal resistance, the first thermal resistance is greater than the second thermal resistance and greater than the contact thermal resistance; applying a heating power to a thermal measurement circuit of a first micro-nano device; obtaining actual contact temperatures of contact areas of the sample to be measured and adjacent second and third micro-nano devices; obtaining actual heat flow powers of a part corresponding to the second and third micro-nano devices flowing through the sample to be measured; calculating a thermal conductivity of the sample to be measured; and calculating the thermal conductivity of the sample to be measured according to the geometric size and the thermal conductivity of the sample to be measured. The application can exclude the influence of the contact thermal resistance, improve the measurement accuracy, and has a simple structure, low cost and is suitable for mass production.